Chimaobi Mbanaso, Ph.D.
Affiliations: | 2011 | Nanoscale Science and Engineering-Nanoscale Engineering | State University of New York, Albany, Albany, NY, United States |
Area:
Nanoscience, NanotechnologyGoogle:
"Chimaobi Mbanaso"Parents
Sign in to add mentor| Gregory Denbeaux | grad student | 2011 | SUNY Albany | |
| (Development of a gas-based spectral filter for carbon dioxide laser produced plasma extreme ultraviolet sources.) | ||||
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Publications
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| Mbanaso C, Antohe A, Bull H, et al. (2012) Out-of-band radiation mitigation at 10.6m by molecular absorbers in laser-produced plasma extreme ultraviolet sources Journal of Micro/Nanolithography, Mems, and Moems. 11 |
| Mbanaso C, Denbeaux G, Antohe A, et al. (2011) Gaseous spectral filters to mitigate infrared radiation Spie Newsroom |
| Mbanaso C, Denbeaux G, Antohe A, et al. (2011) Gas-based spectral filter for mitigating 10.6 μm radiation in CO 2 laser produced plasma extreme ultraviolet sources Proceedings of Spie - the International Society For Optical Engineering. 7969 |
| Mbanaso C, Kruger S, Higgins C, et al. (2011) Mass spectrometer characterization of reactions in photoresists exposed to extreme ultraviolet radiation Proceedings of Spie - the International Society For Optical Engineering. 7969 |
| Khopkar Y, Thomas P, Yankulin L, et al. (2011) Dependence of contamination rates on key parameters in EUV optics Proceedings of Spie - the International Society For Optical Engineering. 7969 |
| Thomas P, Yankulin L, Khopkar Y, et al. (2010) Wavelength dependence of carbon contamination on mirrors with different capping layers Proceedings of Spie - the International Society For Optical Engineering. 7636 |
| Fan YJ, Yankulin L, Thomas P, et al. (2010) Carbon contamination topography analysis of EUV masks Proceedings of Spie - the International Society For Optical Engineering. 7636 |
| Fan YJ, Yankulin L, Antohe A, et al. (2010) Effect of carbon contamination on the printing performance of extreme ultraviolet masks Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: 321-328 |
| Antohe AO, Mbanaso C, Fan YJ, et al. (2009) EUV resist outgassing - Scaling to HVM intensity Proceedings of Spie - the International Society For Optical Engineering. 7271 |
| Fan YJ, Yankulin L, Antohe A, et al. (2009) Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging Proceedings of Spie - the International Society For Optical Engineering. 7271 |