Year |
Citation |
Score |
2015 |
Guo T, Yu W, Chien CC, Lin E, Yang NH, Lin JF, Wu JY, Ratkovich A, Kahaian D, Butterbaugh JW, Lauerhaas JM. Single wafer selective silicon nitride removal with phosphoric acid and steam Solid State Phenomena. 219: 97-100. DOI: 10.4028/Www.Scientific.Net/Ssp.219.97 |
0.331 |
|
2015 |
Sih V, Reimer B, Ratkovich AS, Lauerhaas JM, Butterbaugh JW. Selective nitride etching with phosphoric and sulfuric acid mixtures using a single-wafer wet processor Solid State Phenomena. 219: 93-96. DOI: 10.4028/Www.Scientific.Net/Ssp.219.93 |
0.416 |
|
2015 |
Clark BL, Kocsis M, Greer M, Grenville A, Saito T, Huli L, Farrell R, Hetzer D, Hu S, Matsumoto H, Metz A, Kawakami S, Matsunaga K, Enomoto M, Lauerhaas J, ... Ratkovich A, et al. Coater/developer process integration of metal-oxide based photoresist Proceedings of Spie - the International Society For Optical Engineering. 9425. DOI: 10.1117/12.2085982 |
0.304 |
|
2009 |
Ratkovich A, Penn RL. Zinc oxide nanoparticle growth from homogenous solution: Influence of Zn:OH, water concentration, and surfactant additives Materials Research Bulletin. 44: 993-998. DOI: 10.1016/J.Materresbull.2008.11.012 |
0.504 |
|
2008 |
Ratkovich AS, Lee Penn R. Controlling oriented aggregation using increasing reagent concentrations and trihalo acetic acid surfactants Journal of Solid State Chemistry. 181: 1600-1608. DOI: 10.1016/J.Jssc.2008.03.042 |
0.588 |
|
2007 |
Ratkovich AS, Penn RL. Controlling nanosized ZnO growth kinetics using various Zn:OH concentration ratios Journal of Physical Chemistry C. 111: 14098-14104. DOI: 10.1021/Jp071500I |
0.494 |
|
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