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Alan J. Telecky, Ph.D. - Publications

Affiliations: 
2012 Oregon State University, Corvallis, OR 
Area:
materials chemistry
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5 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2016 Stowers J, Anderson J, Cardineau B, Clark B, De Schepper P, Edson J, Greer M, Jiang K, Kocsis M, Meyers S, Telecky A, Grenville A, De Simone D, Gillijns W, Vandenberghe G. Metal oxide EUV photoresist performance for N7 relevant patterns and processes Proceedings of Spie - the International Society For Optical Engineering. 9779. DOI: 10.1117/12.2219527  0.634
2015 Grenville A, Anderson JT, Clark BL, De Schepper P, Edson J, Greer M, Jiang K, Kocsis M, Meyers ST, Stowers JK, Telecky AJ, De Simone D, Vandenberghe G. Integrated fab process for metal oxide EUV photoresist Proceedings of Spie - the International Society For Optical Engineering. 9425. DOI: 10.1117/12.2086006  0.636
2014 Flynn B, Kim D, Clark BL, Telecky A, Arnadottir L, Szanyi J, Keszler DA, Herman GS. In-situ characterization of aqueous-based hafnium oxide hydroxide sulfate thin films Surface and Interface Analysis. 46: 210-215. DOI: 10.1002/Sia.5205  0.525
2011 Stowers JK, Telecky A, Kocsis M, Clark BL, Keszler DA, Grenville A, Anderson CN, Naulleau PP. Directly patterned inorganic hardmask for EUV lithography Proceedings of Spie - the International Society For Optical Engineering. 7969. DOI: 10.1117/12.879542  0.738
2010 Telecky A, Xie P, Stowers J, Grenville A, Smith B, Keszler DA. Photopatternable inorganic hardmask Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: C6S19-C6S22. DOI: 10.1116/1.3507889  0.708
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