Year |
Citation |
Score |
2016 |
Cha MK, Kang CI, Kim SH, Cho SY, Ha YE, Chung DR, Peck KR, Song JH. Emergence of fluoroquinolone-resistant Stenotrophomonas maltophilia in blood isolates causing bacteremia: molecular epidemiology and microbiologic characteristics. Diagnostic Microbiology and Infectious Disease. PMID 27117514 DOI: 10.1016/j.diagmicrobio.2016.02.020 |
0.302 |
|
2016 |
Kim S, Kim H, Jung S, Kim MH, Lee SH, Cho S, Park BG. Tuning resistive switching parameters in Si3N4-based RRAM for three-dimensional vertical resistive memory applications Journal of Alloys and Compounds. 663: 419-423. DOI: 10.1016/j.jallcom.2015.10.142 |
0.334 |
|
2015 |
Kim JE, Kim HJ, Lew BL, Lee KH, Hong SP, Jang YH, Park KY, Seo SJ, Bae JM, Choi EH, Suhr KB, Lee SC, Ko HC, Park YL, Son SW, ... Cho SH, et al. Consensus Guidelines for the Treatment of Atopic Dermatitis in Korea (Part II): Systemic Treatment. Annals of Dermatology. 27: 578-92. PMID 26512172 DOI: 10.5021/ad.2015.27.5.578 |
0.473 |
|
2015 |
Kim JE, Kim HJ, Lew BL, Lee KH, Hong SP, Jang YH, Park KY, Seo SJ, Bae JM, Choi EH, Suhr KB, Lee SC, Ko HC, Park YL, Son SW, ... Cho SH, et al. Consensus Guidelines for the Treatment of Atopic Dermatitis in Korea (Part I): General Management and Topical Treatment. Annals of Dermatology. 27: 563-77. PMID 26512171 DOI: 10.5021/ad.2015.27.5.563 |
0.471 |
|
2004 |
Yamada S, Cho S, Lee JH, Zhang T, Zampini A. Design and Study of Silicone-based Materials for Bilayer Resist Application Journal of Photopolymer Science and Technology. 17: 511-518. DOI: 10.2494/Photopolymer.17.511 |
0.594 |
|
2000 |
Brodsky C, Byers J, Conley W, Hung R, Yamada S, Patterson K, Somervell M, Trinque B, Tran HV, Cho S, Chiba T, Lin SH, Jamieson A, Johnson H, Vander Heyden T, et al. 157 nm resist materials: Progress report Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3396-3401. DOI: 10.1116/1.1321762 |
0.412 |
|
1999 |
Yamachika M, Patterson K, Cho S, Rager T, Yamada S, Byers J, Paniez PJ, Mortini B, Gally S, Sassoulas PO, Willson CG. Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists Journal of Photopolymer Science and Technology. 12: 553-560. DOI: 10.2494/Photopolymer.12.553 |
0.696 |
|
1998 |
Byers J, Patterson K, Cho S, McCallum M, Willson CG. Recent Advancements In Cycloolefin Based Resists For ArF Lithography. Journal of Photopolymer Science and Technology. 11: 465-474. DOI: 10.2494/Photopolymer.11.465 |
0.725 |
|
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