Qiaolin Zhang, Ph.D. - Publications
Affiliations: | 2006 | University of California, Berkeley, Berkeley, CA, United States |
Area:
Control, Intelligent Systems, and Robotics (CIR), System identification; Design, Modeling and Analysis (DMA), Design for Manufacturability; Physical Electronics (PHY), Semiconductor ManufacturingYear | Citation | Score | |||
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2008 | Zhang Q, Poolla K, Spanos CJ. One step forward from run-to-run critical dimension control: Across-wafer level critical dimension control through lithography and etch process Journal of Process Control. 18: 937-945. DOI: 10.1016/J.Jprocont.2008.04.016 | 0.59 | |||
2007 | Zhang Q, Tang C, Cain J, Hui A, Hsieh T, Maccrae N, Singh B, Poolla K, Spanos CJ. Across-wafer CD uniformity control through lithography and etch process: Experimental verification Proceedings of Spie - the International Society For Optical Engineering. 6518. DOI: 10.1117/12.711232 | 0.583 | |||
2007 | Zhang Q, Poolla K, Spanos CJ. Across wafer critical dimension uniformity enhancement through lithography and etch process sequence: Concept, approach, modeling, and experiment Ieee Transactions On Semiconductor Manufacturing. 20: 488-505. DOI: 10.1109/Tsm.2007.907627 | 0.579 | |||
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