Leland W. Rosenberger, Ph.D. - Publications
Affiliations: | 2007 | Chemical Engineering | Wayne State University, Detroit, MI, United States |
Area:
Chemical Engineering, Materials Science EngineeringYear | Citation | Score | |||
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2008 | McCullen EF, Thakur JS, Danylyuk YV, Auner GW, Rosenberger LW. Investigation of the occupation behavior for oxygen atoms in AlN films using Raman spectroscopy Journal of Applied Physics. 103. DOI: 10.1063/1.2894588 | 0.528 | |||
2008 | Rosenberger L, Baird R, McCullen E, Auner G, Shreve G. XPS analysis of aluminum nitride films deposited by plasma source molecular beam epitaxy Surface and Interface Analysis. 40: 1254-1261. DOI: 10.1002/Sia.2874 | 0.435 | |||
2005 | Georgiev DG, Rosenberger LW, Danylyuk YV, Baird RJ, Newaz G, Shreve G, Auner G. Excimer laser modification of thin AlN films Applied Surface Science. 249: 45-53. DOI: 10.1016/J.Apsusc.2004.11.027 | 0.431 | |||
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