Year |
Citation |
Score |
2020 |
Alam K. Physical insight and performance metrics of monolayer MX2 heterojunction TFETs Micro & Nano Letters. 15: 81-85. DOI: 10.1049/Mnl.2019.0588 |
0.524 |
|
2017 |
Alam K. Orientation Engineering for Improved Performance of a Ge-Si Heterojunction Nanowire TFET Ieee Transactions On Electron Devices. 64: 4850-4855. DOI: 10.1109/Ted.2017.2766681 |
0.431 |
|
2016 |
Sylvia SS, Alam K, Lake RK. Uniform Benchmarking of Low-Voltage van der Waals FETs Ieee Journal On Exploratory Solid-State Computational Devices and Circuits. 2: 28-35. DOI: 10.1109/Jxcdc.2016.2619351 |
0.76 |
|
2016 |
Mondol K, Hasan MM, Arafath Y, Alam K. Quantization effects on the inversion mode of a double gate MOS Results in Physics. 6: 339-341. DOI: 10.1016/J.Rinp.2016.06.002 |
0.385 |
|
2014 |
Sylvia SS, Habib KMM, Khayer MA, Alam K, Neupane M, Lake RK. Effect of random, discrete source dopant distributions on nanowire tunnel FETs Ieee Transactions On Electron Devices. 61: 2208-2214. DOI: 10.1109/Ted.2014.2318521 |
0.77 |
|
2013 |
Alam K, Takagi S, Takenaka M. Analysis and Comparison of L-Valley Transport in GaAs, GaSb, and Ge Ultrathin-Body Ballistic nMOSFETs Ieee Transactions On Electron Devices. 60: 4213-4218. DOI: 10.1109/Ted.2013.2285394 |
0.412 |
|
2012 |
Alam K, Abdullah MA. Effects of Dielectric Constant on the Performance of a Gate All Around InAs Nanowire Transistor Ieee Transactions On Nanotechnology. 11: 82-87. DOI: 10.1109/Tnano.2011.2157935 |
0.484 |
|
2012 |
Alam K, Lake RK. Monolayer $\hbox{MoS}_{2}$ Transistors Beyond the Technology Road Map Ieee Transactions On Electron Devices. 59: 3250-3254. DOI: 10.1109/Ted.2012.2218283 |
0.647 |
|
2012 |
Sylvia SS, Khayer MA, Alam K, Lake RK. Doping, Tunnel Barriers, and Cold Carriers in InAs and InSb Nanowire Tunnel Transistors Ieee Transactions On Electron Devices. 59: 2996-3001. DOI: 10.1109/Ted.2012.2212442 |
0.774 |
|
2012 |
Sylvia SS, Park H, Khayer MA, Alam K, Klimeck G, Lake RK. Material Selection for Minimizing Direct Tunneling in Nanowire Transistors Ieee Transactions On Electron Devices. 59: 2064-2069. DOI: 10.1109/Ted.2012.2200688 |
0.779 |
|
2012 |
Alam K. Uniaxial Stress-Modulated Electronic Properties of a Free-Standing InAs Nanowire Ieee Transactions On Electron Devices. 59: 661-665. DOI: 10.1109/Ted.2011.2177096 |
0.305 |
|
2011 |
Sylvia SS, Khayer MA, Alam K, Lake RK. Design issue analysis for InAs nanowire tunnel FETs Proceedings of Spie. 8102. DOI: 10.1117/12.894249 |
0.782 |
|
2010 |
Wahab MA, Alam K. Performance of Zero-Schottky-Barrier and Doped Contacts Single and Double Walled Carbon Nanotube Transistors Japanese Journal of Applied Physics. 49: 25101. DOI: 10.1143/Jjap.49.025101 |
0.536 |
|
2010 |
Alam K, Sajjad RN. Electronic Properties and Orientation-Dependent Performance of InAs Nanowire Transistors Ieee Transactions On Electron Devices. 57: 2880-2885. DOI: 10.1109/Ted.2010.2066569 |
0.484 |
|
2010 |
Wahab MA, Alam K. Performance comparison of zero-Schottky-barrier and doped contacts carbon nanotube transistors with strain applied Nano-Micro Letters. 2: 126-133. DOI: 10.1007/Bf03353630 |
0.455 |
|
2010 |
Bhowmick S, Alam K. Effects of source-drain underlaps on the performance of silicon nanowire on insulator transistors Nano-Micro Letters. 2: 83-88. DOI: 10.1007/Bf03353623 |
0.536 |
|
2009 |
Alam K. Uniaxial Strain Effects on the Performance of a Ballistic Top Gate Graphene Nanoribbon on Insulator Transistor Ieee Transactions On Nanotechnology. 8: 528-534. DOI: 10.1109/Tnano.2008.2011811 |
0.348 |
|
2009 |
Alam K. Transport and performance of a gate all around InAs nanowire transistor Semiconductor Science and Technology. 24: 85003. DOI: 10.1088/0268-1242/24/8/085003 |
0.537 |
|
2009 |
Sajjad RN, Alam K, Khosru QDM. Parametrization of a silicon nanowire effective mass model from sp3d5s* orbital basis calculations Semiconductor Science and Technology. 24: 045023. DOI: 10.1088/0268-1242/24/4/045023 |
0.518 |
|
2009 |
Alam K. Transport and performance of a zero-Schottky barrier and doped contacts graphene nanoribbon transistors Semiconductor Science and Technology. 24: 15007. DOI: 10.1088/0268-1242/24/1/015007 |
0.485 |
|
2009 |
Sajjad RN, Alam K. Electronic properties of a strained ⟨100⟩ silicon nanowire Journal of Applied Physics. 105: 044307. DOI: 10.1063/1.3078826 |
0.326 |
|
2008 |
Bhowmick S, Alam K. Dielectric scaling of a top gate silicon nanowire on insulator transistor Journal of Applied Physics. 104. DOI: 10.1063/1.3043662 |
0.452 |
|
2008 |
Alam K. Gate dielectric scaling of top gate carbon nanoribbon on insulator transistors Journal of Applied Physics. 104: 74313. DOI: 10.1063/1.2990067 |
0.553 |
|
2007 |
Alam K, Lake R. Role of Doping in Carbon Nanotube Transistors With Source/Drain Underlaps Ieee Transactions On Nanotechnology. 6: 652-658. DOI: 10.1109/Tnano.2007.908170 |
0.681 |
|
2007 |
Alam K, Lake R. Performance Metrics of a 5 nm, Planar, Top Gate, Carbon Nanotube on Insulator (COI) Transistor Ieee Transactions On Nanotechnology. 6: 186-190. DOI: 10.1109/Tnano.2007.891821 |
0.698 |
|
2007 |
Shah D, Bruque NA, Alam K, Lake RK, Pandey RR. Electronic properties of carbon nanotubes calculated from density functional theory and the empirical π-bond model Journal of Computational Electronics. 6: 395-400. DOI: 10.1007/S10825-007-0147-5 |
0.747 |
|
2006 |
Bruque NA, Alam K, Pandey RR, Lake RK, Lewis JP, Wang X, Liu F, Ozkan CS, Ozkan M, Wang KL. Self-Assembled Carbon Nanotubes for Electronic Circuit and Device Applications Journal of Nanoelectronics and Optoelectronics. 1: 74-81. DOI: 10.1166/Jno.2006.007 |
0.76 |
|
2006 |
Alam K, Lake RK. Dielectric scaling of a zero-Schottky-barrier, 5nm gate, carbon nanotube transistor with source/drain underlaps Journal of Applied Physics. 100: 24317. DOI: 10.1063/1.2218764 |
0.698 |
|
2006 |
Pandey RR, Bruque N, Alam K, Lake RK. Carbon nanotube - molecular resonant tunneling diode Physica Status Solidi (a). 203: R5-R7. DOI: 10.1002/Pssa.200521467 |
0.763 |
|
2005 |
Zheng Y, Rivas C, Lake R, Alam K, Boykin T, Klimeck G. Electronic Properties of Silicon Nanowires Ieee Transactions On Electron Devices. 52: 1097-1103. DOI: 10.1109/Ted.2005.848077 |
0.615 |
|
2005 |
Alam K, Lake RK. Leakage and performance of zero-Schottky-barrier carbon nanotube transistors Journal of Applied Physics. 98: 64307. DOI: 10.1063/1.2060962 |
0.718 |
|
2005 |
Alam K, Lake R. Performance of 2 nm gate length carbon nanotube field-effect transistors with source∕drain underlaps Applied Physics Letters. 87: 73104. DOI: 10.1063/1.2011788 |
0.719 |
|
2002 |
Haque A, Alam K. Accurate modeling of direct tunneling hole current in p-metal-oxide- semiconductor devices Applied Physics Letters. 81: 667-669. DOI: 10.1063/1.1495084 |
0.497 |
|
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