Sairam Agraharam, Ph.D. - Publications
Affiliations: | 2000 | Georgia Institute of Technology, Atlanta, GA |
Area:
Chemical Engineering, Electronics and Electrical EngineeringYear | Citation | Score | |||
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2002 | Tanikella RV, Agraharam S, Allen SAB, Hess DW, Kohl PA. Moisture absorption studies of fluorocarbon films deposited from pentafluoroethane and octafluorocyclobutane plasmas Journal of Electronic Materials. 31: 1096-1103. DOI: 10.1007/S11664-002-0048-0 | 0.504 | |||
2001 | Agraharam S, Hess DW, Kohl PA, Allen SAB. Electrical Properties and Temperature-Humidity Studies of Fluorocarbon Films Deposited from Pentafluoroethane/Argon Plasmas Journal of the Electrochemical Society. 148. DOI: 10.1149/1.1366629 | 0.774 | |||
2001 | Agraharam S, Hess DW, Kohl PA, Bidstrup Allen SA. Comparison of plasma chemistries and structure-property relationships of fluorocarbon films deposited from octafluorocyclobutane and pentafluoroethane monomers Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 439-446. DOI: 10.1116/1.1354980 | 0.775 | |||
2000 | Agraharam S, Hess DW, Kohl PA, Bidstrup Allen SA. Thermal stability of fluorocarbon films deposited from pentafluoroethane/argon plasmas Journal of the Electrochemical Society. 147: 2665-2670. DOI: 10.1149/1.1393587 | 0.744 | |||
1999 | Agraharam S, Hess DW, Kohl PA, Bidstrup Allen SA. Plasma chemistry in fluorocarbon film deposition from pentafluoroethane/argon mixtures Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 17: 3265-3271. DOI: 10.1116/1.582053 | 0.746 | |||
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