Year |
Citation |
Score |
2016 |
Joe DJ, Hwang J, Johnson C, Cha HY, Lee JW, Shen X, Spencer MG, Tiwari S, Kim M. Surface Functionalized Graphene Biosensor on Sapphire for Cancer Cell Detection. Journal of Nanoscience and Nanotechnology. 16: 144-51. PMID 27398439 DOI: 10.1166/Jnn.2016.12042 |
0.629 |
|
2016 |
Joe DJ, Hwang J, Johnson C, Cha HY, Lee JW, Shen X, Spencer MG, Tiwari S, Kim M. Surface functionalized graphene biosensor on sapphire for cancer cell detection Journal of Nanoscience and Nanotechnology. 16: 144-151. DOI: 10.1166/jnn.2016.12042 |
0.407 |
|
2015 |
Wang H, Zhang C, Chan W, Tiwari S, Rana F. Ultrafast response of monolayer molybdenum disulfide photodetectors. Nature Communications. 6: 8831. PMID 26572726 DOI: 10.1038/Ncomms9831 |
0.337 |
|
2014 |
Kim J, Tiwari S. Inexact computing using probabilistic circuits Acm Journal On Emerging Technologies in Computing Systems. 10: 1-23. DOI: 10.1145/2564925 |
0.319 |
|
2014 |
Bryce BA, Ilic BR, Reuter MC, Tiwari S. Wafer scale tilt-compensated silicon nanowire atomic force microscopy probes for high aspect ratio geometries Journal of Micromechanics and Microengineering. 24. DOI: 10.1088/0960-1317/24/9/095016 |
0.306 |
|
2013 |
Hyeon Lee S, Kim M, Ha SD, Lee JW, Ramanathan S, Tiwari S. Space charge polarization induced memory in SmNiO3/Si transistors Applied Physics Letters. 102. DOI: 10.1063/1.4790394 |
0.361 |
|
2013 |
Kim J, Lee S, Rubin J, Kim M, Tiwari S. Scale changes in electronics: Implications for nanostructure devices for logic and memory and beyond Solid-State Electronics. 84: 2-12. DOI: 10.1016/J.Sse.2013.02.031 |
0.393 |
|
2012 |
Kim M, Hwang J, Lepak LA, Lee JW, Spencer MG, Tiwari S. Improvement of carrier mobility of top-gated SiC epitaxial graphene transistors using a PVA dielectric buffer layer. Nanotechnology. 23: 335202. PMID 22842470 DOI: 10.1088/0957-4484/23/33/335202 |
0.64 |
|
2012 |
Kim M, Sundararaman R, Tiwari S, Lee JW. Charge trapping devices using a bilayer oxide structure. Journal of Nanoscience and Nanotechnology. 12: 423-7. PMID 22523996 DOI: 10.1166/Jnn.2012.5400 |
0.384 |
|
2012 |
Kim M, Hwang J, Shields VB, Tiwari S, Spencer MG, Lee JW. SiC surface orientation and Si loss rate effects on epitaxial graphene. Nanoscale Research Letters. 7: 186. PMID 22410299 DOI: 10.1186/1556-276X-7-186 |
0.644 |
|
2012 |
Kim J, Solomon PM, Tiwari S. Adaptive circuit design using independently biased back-gated Double-Gate MOSFETS Ieee Transactions On Circuits and Systems I: Regular Papers. 59: 806-819. DOI: 10.1109/Tcsi.2011.2169743 |
0.408 |
|
2012 |
Lee SH, Kim M, Cheong B, Lee J, Tiwari S. $\hbox{Ge}_{2}\hbox{Sb}_{2}\hbox{Te}_{5}$ as a Ferroelectric: A Single-Element Low-Voltage Dynamic Memory Ieee Electron Device Letters. 33: 1231-1233. DOI: 10.1109/Led.2012.2204721 |
0.325 |
|
2012 |
Bryce BA, Robert Ilic B, Reuter MC, Tiwari S. Silicon nanowire atomic force microscopy probes for high aspect ratio geometries Applied Physics Letters. 100. DOI: 10.1063/1.4720406 |
0.31 |
|
2011 |
Bryce BA, Reuter MC, Wacaser BA, Tiwari S. Contactless measurement of surface dominated recombination in gold- and aluminum-catalyzed silicon vapor-liquid-solid wires. Nano Letters. 11: 4282-7. PMID 21939179 DOI: 10.1021/Nl202279Z |
0.341 |
|
2011 |
Rubin J, Sundararaman R, Kim M, Tiwari S. A low-voltage torsion nanorelay Ieee Electron Device Letters. 32: 414-416. DOI: 10.1109/Led.2010.2099199 |
0.409 |
|
2010 |
Bryce BA, Levendorf MP, Park J, Tiwari S. Structure and interfacial properties of Germanium nanowires grown on titanium Electrochemical and Solid-State Letters. 13: K77-K79. DOI: 10.1149/1.3457852 |
0.324 |
|
2010 |
Sundararaman R, Tiwari S. A universal semiempirical model for the Fowler-Nordheim programming of charge trapping devices Applied Physics Letters. 96. DOI: 10.1063/1.3279153 |
0.376 |
|
2009 |
Gokirmak A, Inaltekin H, Tiwari S. Attofarad resolution capacitance-voltage measurement of nanometer scale field effect transistors utilizing ambient noise. Nanotechnology. 20: 335203. PMID 19636094 DOI: 10.1088/0957-4484/20/33/335203 |
0.678 |
|
2007 |
Kim MK, Chae S, Kim CW, Kim JY, Lee J, Tiwari S. The Effects of the LDD process on Short-channel effects in Nanoscale Charge Trapping Devices Mrs Proceedings. 997. DOI: 10.1557/Proc-0997-I03-13 |
0.428 |
|
2007 |
Kim MK, Chae S, Kim CW, Lee J, Tiwari S. A Comparison of N+ type and P+ type Polysilicon Gate in High Speed Non-Volatile Memories Mrs Proceedings. 997. DOI: 10.1557/Proc-0997-I03-12 |
0.435 |
|
2007 |
LIN H, LIU H, KUMAR A, AVCI U, VAN DELDEN JS, TIWARI S. POWER ADAPTIVE CONTROL OF DENSE CONFIGURED SUPER-SELF-ALIGNED BACK-GATE PLANAR TRANSISTORS International Journal of High Speed Electronics and Systems. 17: 143-146. DOI: 10.1142/S0129156407004357 |
0.731 |
|
2007 |
Kim MK, Tiwari S. Non-Volatile High Speed & Low Power Charge Trapping Devices International Journal of High Speed Electronics and Systems. 17: 147-152. DOI: 10.1142/9789812770332_0023 |
0.466 |
|
2007 |
Kim SK, Xue L, Tiwari S. Low-Temperature Polymer-Based Three-Dimensional Silicon Integration Ieee Electron Device Letters. 28: 706-709. DOI: 10.1109/Led.2007.901661 |
0.369 |
|
2007 |
Lin H, Liu H, Kumar A, Avci U, Delden JSV, Tiwari S. Strained-Si Channel Super-Self-Aligned Back-Gate/Double-Gate Planar Transistors Ieee Electron Device Letters. 28: 506-508. DOI: 10.1109/Led.2007.896896 |
0.747 |
|
2007 |
Gokirmak A, Tiwari S. Accumulated body ultranarrow channel silicon transistor with extreme threshold voltage tunability Applied Physics Letters. 91. DOI: 10.1063/1.2818663 |
0.672 |
|
2006 |
Lin H, Park YW, Tiwari S. A Compact Single-Walled Carbon Nanotube Transistor Integrated with a Silicon MOSFET Using a Single Common Gate Mrs Proceedings. 963. DOI: 10.1557/Proc-0963-Q14-04 |
0.394 |
|
2006 |
Lin H, Liu H, Kumar A, Avci U, Van Delden JS, Tiwari S. Super-self-aligned back-gate∕double-gate planar transistors: Novel fabrication approach Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 24: 3230. DOI: 10.1116/1.2397067 |
0.76 |
|
2006 |
Lin H, Tiwari S. Localized charge trapping due to adsorption in nanotube field-effect transistor and its field-mediated transport Applied Physics Letters. 89: 073507. DOI: 10.1063/1.2337104 |
0.316 |
|
2006 |
Silva H, Tiwari S. Random telegraph signal in nanoscale back-side charge trapping memories Applied Physics Letters. 88. DOI: 10.1063/1.2182070 |
0.385 |
|
2005 |
Wahl JA, Van Delden JS, Tiwari S. Multiple-fluorophore-specie detection with a tapered Fabry-Perot fluorescence spectrometer. Applied Optics. 44: 5190-7. PMID 16149341 DOI: 10.1364/Ao.44.005190 |
0.71 |
|
2005 |
Gokirmak A, Tiwari S. Micrometer scale silicon dioxide tunnels for on-chip fluidic sample delivery to nanometer-scale chemical sensors Materials Research Society Symposium Proceedings. 872: 131-136. DOI: 10.1557/Proc-872-J9.1 |
0.656 |
|
2005 |
Gokirmak A, Tiwari S. A silicon nitride based shallow trench isolation with side-gate for CMOS integration with MEMS components for system-on-chip applications Materials Research Society Symposium Proceedings. 833: 235-240. DOI: 10.1557/Proc-833-G6.9 |
0.693 |
|
2005 |
Silva H, Tiwari S. Backside storage non-volatile memories: Ultra-thin silicon layer on a complex thin film structure Materials Research Society Symposium Proceedings. 830: 31-35. DOI: 10.1557/Proc-830-D1.4 |
0.434 |
|
2005 |
Kim SK, Liu CC, Xue L, Tiwari S. Crosstalk reduction in mixed-signal 3-D integrated circuits with interdevice layer ground planes Ieee Transactions On Electron Devices. 52: 1459-1467. DOI: 10.1109/Ted.2005.850641 |
0.358 |
|
2005 |
Rosenblatt S, Lin H, Sazonova V, Tiwari S, McEuen PL. Mixing at 50 GHz using a single-walled carbon nanotube transistor Applied Physics Letters. 87: 1-3. DOI: 10.1063/1.2103391 |
0.328 |
|
2005 |
Gokirmak A, Tiwari S. Threshold voltage tuning and suppression of edge effects in narrow channel MOSFETs using surrounding buried side-gate Electronics Letters. 41: 157-158. DOI: 10.1049/El:20057152 |
0.708 |
|
2005 |
Avci U, Tiwari S. A novel compact circuit for 4-PAM energy-efficient high speed interconnect data transmission and reception Microelectronics Journal. 36: 67-75. DOI: 10.1016/J.Mejo.2004.09.005 |
0.735 |
|
2004 |
Kim SK, Xue L, Tiwari S. Three Dimensional Integration with Benzocyclobutene as the Wafer-Bonding Medium Mrs Proceedings. 833. DOI: 10.1557/Proc-833-G3.5 |
0.376 |
|
2004 |
Silva H, Kim MK, Avci U, Kumar A, Tiwari S. Nonvolatile Silicon Memory at the Nanoscale Mrs Bulletin. 29: 845-851. DOI: 10.1557/Mrs2004.239 |
0.742 |
|
2004 |
Silva H, Tiwari S. A nanoscale memory and transistor using backside trapping Ieee Transactions On Nanotechnology. 3: 264-269. DOI: 10.1109/Tnano.2004.828532 |
0.431 |
|
2004 |
Avci U, Tiwari S. Nanoscale thin single-crystal silicon and its application to electronics Applied Physics Letters. 84: 2406-2408. DOI: 10.1063/1.1689745 |
0.734 |
|
2004 |
Avci U, Tiwari S. Back-gated MOSFETs with controlled silicon thickness for adaptive threshold-voltage control Electronics Letters. 40: 74-75. DOI: 10.1049/El:20040028 |
0.752 |
|
2003 |
Tiwari S, Avci UE, Liu CC, Xue L, Kumar A, Kim SK, Silva HG. Are we there yet? Looking beyond the end of scaling in the Nanometer Era Proceedings of Spie. 5118: 456-465. DOI: 10.1117/12.502018 |
0.716 |
|
2003 |
Xue L, Liu CC, Kim H, Kim SK, Tiwari S. Three-dimensional integration: technology, use, and issues for mixed-signal applications Ieee Transactions On Electron Devices. 50: 601-609. DOI: 10.1109/Ted.2003.810465 |
0.371 |
|
2002 |
Kim HS, Xue L, Kumar A, Tiwari S. Fabrication and electrical properties of buried tungsten structure for direct three dimensional integration The Japan Society of Applied Physics. DOI: 10.7567/Ssdm.2002.P3-22 |
0.322 |
|
2000 |
Kumar A, Welser JJ, Tiwari S, Rana F, Chan KK. Investigations of Silicon Nano-crystal Floating Gate Memories Mrs Proceedings. 638. DOI: 10.1557/Proc-638-F2.4.1 |
0.425 |
|
2000 |
Tiwari S, Kumar A, Welser JJ. Straddle-Gate Transistor: A Mosfet In The Limit Of Useful Field-Effect International Journal of High Speed Electronics and Systems. 10: 231-245. DOI: 10.1016/S0129-1564(00)00027-1 |
0.418 |
|
2000 |
Tiwari S, Wahl J, Silva H, Rana F, Welser J. Small silicon memories: confinement, single-electron,. and interface state considerations Applied Physics a: Materials Science & Processing. 71: 403-414. DOI: 10.1007/S003390000553 |
0.764 |
|
1999 |
Tiwari S. Single-electron transistor Access Science. DOI: 10.1036/1097-8542.Yb990795 |
0.375 |
|
1999 |
Tiwari S, Solomon PM, Welser JJ, Jones EC, McFeely FR, Cartier E. CMOS and memories: From 100 nm to 10 nm! Microelectronic Engineering. 46: 3-6. DOI: 10.1016/S0167-9317(99)00004-0 |
0.424 |
|
1998 |
Tiwari S, Welser JJ, Rana F, Kumar A. Nano-Crystal and Quantum Dot Memories: Device Properties The Japan Society of Applied Physics. 1998: 168-169. DOI: 10.7567/Ssdm.1998.C-3-1 |
0.323 |
|
1998 |
Tiwari S, Nair R. Computers made to tolerate defects Physics World. 11: 24-26. DOI: 10.1088/2058-7058/11/10/27 |
0.309 |
|
1998 |
Rana F, Tiwari S, Welser J. Kinetic modelling of electron tunneling processes in quantum dots coupled to field-effect transistors Superlattices and Microstructures. 23: 757-770. DOI: 10.1006/Spmi.1997.0539 |
0.352 |
|
1996 |
Hanafi HI, Tiwari S, Khan I. Fast and long retention-time nano-crystal memory Ieee Transactions On Electron Devices. 43: 1553-1558. DOI: 10.1109/16.535349 |
0.378 |
|
1996 |
Tiwari S, Rana F, Chan K, Shi L, Hanafi H. Single charge and confinement effects in nano‐crystal memories Applied Physics Letters. 69: 1232-1234. DOI: 10.1063/1.117421 |
0.376 |
|
1996 |
Rana F, Tiwari S, Buchanan DA. Self‐consistent modeling of accumulation layers and tunneling currents through very thin oxides Applied Physics Letters. 69: 1104-1106. DOI: 10.1063/1.117072 |
0.324 |
|
1996 |
Tiwari S, Rana F, Hanafi H, Hartstein A, Crabbé EF, Chan K. A silicon nanocrystals based memory Applied Physics Letters. 68: 1377-1379. DOI: 10.1063/1.116085 |
0.404 |
|
1994 |
Tiwari S, Woodall JM. Experimental comparison of strained quantum‐wire and quantum‐well laser characteristics Applied Physics Letters. 64: 2211-2213. DOI: 10.1063/1.111676 |
0.504 |
|
1994 |
Tiwari S, Pettit GD, Milkove KR, Legoues F, Davis RJ, Woodall JM. High efficiency and low threshold current strained V‐groove quantum‐wire lasers Applied Physics Letters. 64: 3536-3538. DOI: 10.1063/1.111264 |
0.527 |
|
1992 |
Wang Y, Longenbach K, Teich MC, Wang WI, Tiwari S, Hargis MC. AlGaSb/GaSb-based metal-semiconductor-metal and p-i-n photodetectors Semiconductors. 1680: 169-175. DOI: 10.1117/12.137713 |
0.391 |
|
1992 |
Tiwari S, Burroughes J, Milshtein MS, Tischler MA, Wright SL. Lateral Ga<inf>0.47</inf>In<inf>0.53</inf>As and GaAs p-i-n Photodetectors by Self-Aligned Diffusion Ieee Photonics Technology Letters. 4: 396-398. DOI: 10.1109/68.127226 |
0.354 |
|
1990 |
Tiwari S, Wright SL, Frank DJ. Compound semiconductor heterostructure bipolar transistors Ibm Journal of Research and Development. 34: 550-567. DOI: 10.1147/Rd.344.0550 |
0.425 |
|
1990 |
Tiwari S, Wang WI, East JR. An Analytic Theory of the Auger Transistor: A Hot Electron Bipolar Transistor Ieee Transactions On Electron Devices. 37: 1121-1131. DOI: 10.1109/16.52451 |
0.371 |
|
1990 |
de Lyon TJ, Kash JA, Tiwari S, Woodall JM, Yan D, Pollak FH. Low surface recombination velocity and contact resistance usingp+/pcarbon‐doped GaAs structures Applied Physics Letters. 56: 2442-2444. DOI: 10.1063/1.102903 |
0.532 |
|
1990 |
Tiwari S, Wright SL. Material properties of p-type GaAs at large dopings Applied Physics Letters. 56: 563-565. DOI: 10.1063/1.102745 |
0.344 |
|
1989 |
Tiwari S. Frequency Dependence of the Unilateral Gain in Bipolar Transistors Ieee Electron Device Letters. 10: 574-576. DOI: 10.1109/55.43144 |
0.364 |
|
1989 |
Tiwari S, Frank D. Analysis of the operation of GaAlAs/GaAs HBTs Ieee Transactions On Electron Devices. 36: 2105-2121. DOI: 10.1109/16.40890 |
0.388 |
|
1988 |
Tiwari S, Ginzberg A, Akhtar S, Wright SL, Marks RF, Kwark YH, Kiehl R. Heterostructure Devices Using Self-Aligned p-Type Diffused Ohmic Contacts Ieee Electron Device Letters. 9: 422-424. DOI: 10.1109/55.765 |
0.391 |
|
1988 |
Kiehl RA, Tiwari S, Wright SL, Olson MA. p-Channel Quantum-Well Heterostructure MI3 SFET Ieee Electron Device Letters. 9: 309-311. DOI: 10.1109/55.726 |
0.388 |
|
1988 |
Tiwari S, Wright SL, Batey J. Unpinned GaAs MOS Capacitors and Transistors Ieee Electron Device Letters. 9: 488-490. DOI: 10.1109/55.6954 |
0.408 |
|
1988 |
Patton GL, Iyer SS, Delage SL, Tiwari S, Stork JMC. Silicon-germanium base heterojunction bipolar transistors by molecular beam epitaxy Ieee Electron Device Letters. 9: 165-167. DOI: 10.1109/55.677 |
0.397 |
|
1988 |
Tiwari S. A New Effect at High Currents in Heterostructure Bipolar Transistors Ieee Electron Device Letters. 9: 142-144. DOI: 10.1109/55.2069 |
0.393 |
|
1988 |
Tiwari S, Frank DJ, Wright SL. Surface recombination in GaAlAs/GaAs heterostructure bipolar transistors Journal of Applied Physics. 64: 5009-5012. DOI: 10.1109/16.8868 |
0.307 |
|
1988 |
Nathan MI, Dumke WP, Wrenner K, Tiwari S, Wright SL, Jenkins KA. Electron mobility in p-type GaAs Applied Physics Letters. 52: 654-656. DOI: 10.1063/1.99395 |
0.307 |
|
1988 |
Tiwari S, Frank DJ. Barrier and recombination effects in the base‐emitter junction of heterostructure bipolar transistors Applied Physics Letters. 52: 993-995. DOI: 10.1063/1.99252 |
0.317 |
|
1987 |
Tiwari S, Wright SL, Kleinsasser AW. Transport and Related Properties of (Ga, Al)As/GaAs Double Heterostructure Bipolar Junction Transistors Ieee Transactions On Electron Devices. 34: 185-198. DOI: 10.1109/T-Ed.1987.22906 |
0.423 |
|
1987 |
Tiwari S, Wright SL. Symmetric-Gain, Zero-Offset, Self-Aligned, and Refractory-Contact Double HBT's Ieee Electron Device Letters. 8: 417-420. DOI: 10.1109/Edl.1987.26679 |
0.402 |
|
1987 |
Murakami M, Price WH, Shih YC, Childs KD, Furman BK, Tiwari S. Thermally stable ohmic contacts to n-type GaAs. I. MoGeW contact metal Journal of Applied Physics. 62: 3288-3294. DOI: 10.1063/1.339336 |
0.354 |
|
1986 |
Tiwari S. Performance of heterostructure FET's in LSI Ieee Transactions On Electron Devices. 33: 554-563. DOI: 10.1109/T-Ed.1986.22532 |
0.364 |
|
1986 |
Wright SL, Marks RF, Tiwari S, Jackson TN, Baratte H. In situ contacts to GaAs based on InAs Applied Physics Letters. 49: 1545-1547. DOI: 10.1063/1.97277 |
0.316 |
|
1984 |
Tiwari S. Threshold and Sheet Concentration Sensitivity of High Electron Mobility Transistors Ieee Transactions On Electron Devices. 31: 879-888. DOI: 10.1109/T-Ed.1984.21625 |
0.395 |
|
1984 |
Tiwari S, Wang WI. p-Channel MODFET's using GaAlAs/GaAs two-dimensional hole gas Ieee Electron Device Letters. 5: 333-335. DOI: 10.1109/Edl.1984.25935 |
0.326 |
|
1983 |
Tiwari S. IIA-6 Sensitivity of Threshold Voltage and Sheet Carrier Concentration to Material and Electronic Parameters in a HEMT Device Ieee Transactions On Electron Devices. 30: 1568-1569. DOI: 10.1109/T-Ed.1983.21346 |
0.377 |
|
1982 |
Low TS, Stillman GE, Collins DM, Wolfe CM, Tiwari S, Eastman LF. Spectroscopic identification of Si donors in GaAs Applied Physics Letters. 40: 1034-1036. DOI: 10.1063/1.92986 |
0.399 |
|
1980 |
Tiwari S, Levy HM, Tiberio R, Eastman LF. WA-B4 Leakage Current in GaAs MESFET's with GaAs and Ga<inf>1−x</inf>Al<inf>x</inf>As Buffer Layers Ieee Transactions On Electron Devices. 27: 2196. DOI: 10.1109/T-Ed.1980.20231 |
0.432 |
|
1980 |
Tiwari S, Eastman LF, Rathbun L. Physical and materials limitations on burnout voltage of GaAs power MESFET's Ieee Transactions On Electron Devices. 27: 1045-1054. DOI: 10.1109/T-Ed.1980.19985 |
0.556 |
|
1980 |
Eastman LF, Tiwari S, Shur MS. Design criteria for GaAs MESFETs related to stationary high field domains Solid-State Electronics. 23: 383-389. DOI: 10.1016/0038-1101(80)90206-3 |
0.533 |
|
1979 |
Pande K, Reep D, Srivastava A, Tiwari S, Borrego JM, Ghandhi SK. Device Quality Polycrystalline Gallium Arsenide on Germanium/Molybdenum Substrates Journal of the Electrochemical Society. 126: 300-304. DOI: 10.1149/1.2129026 |
0.349 |
|
1979 |
Pande K, Reep D, Srivastava A, Tiwari S, Borrego JM, Ghandhi SK. Device Quality Polycrystalline Gallium Arsenide On Germanium/Molybdenum Substrates Cheminform. 10. DOI: 10.1002/Chin.197921011 |
0.349 |
|
1978 |
Tiwari S, Ashok S. A simple power control technique Electronics Letters. 14: 393-394. DOI: 10.1049/El:19780265 |
0.304 |
|
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