| Year |
Citation |
Score |
| 2013 |
Cacao E, Sherlock T, Nasrullah A, Kemper S, Knoop J, Kourentzi K, Ruchhoeft P, Stein GE, Atmar RL, Willson RC. Helium beam shadowing for high spatial resolution patterning of antibodies on microstructured diagnostic surfaces. Biointerphases. 8: 9. PMID 24706125 DOI: 10.1186/1559-4106-8-9 |
0.694 |
|
| 2013 |
Cacao EE, Nasrullah A, Sherlock T, Kemper S, Kourentzi K, Ruchhoeft P, Stein GE, Willson RC. High-resolution, high-throughput, positive-tone patterning of poly(ethylene glycol) by helium beam exposure through stencil masks. Plos One. 8: e56835. PMID 23717382 DOI: 10.1371/Journal.Pone.0056835 |
0.684 |
|
| 2012 |
Litvinov J, Nasrullah A, Sherlock T, Wang YJ, Ruchhoeft P, Willson RC. High-throughput top-down fabrication of uniform magnetic particles Plos One. 7. PMID 22693574 DOI: 10.1371/Journal.Pone.0037440 |
0.678 |
|
| 2011 |
Sherlock T, Nasrullah A, Litvinov J, Cacao E, Knoop J, Kemper S, Kourentzi K, Kar A, Ruchhoeft P, Willson R. Suspended, micron-scale corner cube retroreflectors as ultra-bright optical labels. Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures : Processing, Measurement, and Phenomena : An Official Journal of the American Vacuum Society. 29. PMID 25530695 DOI: 10.1116/1.3656801 |
0.68 |
|
| 2009 |
Nasrullah A, Smith D, Sherlock T, Ruchhoeft P, Litvinov D. Near neighbor averaging: A technique for improving image uniformity in aperture array lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2674-2678. DOI: 10.1116/1.3265462 |
0.682 |
|
| 2008 |
Xu L, Nasrullah A, Chen Z, Jain M, Ruchhoeft P, Economou DJ, Donnelly VM. Etching of nanopatterns in silicon using nanopantography Applied Physics Letters. 92. DOI: 10.1063/1.2828208 |
0.685 |
|
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