| Year |
Citation |
Score |
| 2012 |
Sun J, Holzwarth CW, Smith HI. Phase-shift bragg grating in silicon using equivalent phase-shift method Ieee Photonics Technology Letters. 24: 25-27. DOI: 10.1109/Lpt.2011.2171940 |
0.313 |
|
| 2011 |
Orcutt JS, Khilo A, Holzwarth CW, Popovi? MA, Li H, Sun J, Bonifield T, Hollingsworth R, Kärtner FX, Smith HI, Stojanovi? V, Ram RJ. Nanophotonic integration in state-of-the-art CMOS foundries. Optics Express. 19: 2335-46. PMID 21369052 DOI: 10.1364/Oe.19.002335 |
0.33 |
|
| 2011 |
Patel AA, Fucetola CP, Moon EE, Smith HI. 3D fabrication by stacking prepatterned, rigidly held membranes Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 29. DOI: 10.1116/1.3643762 |
0.305 |
|
| 2011 |
Manfrinato VR, Cheong LL, Duan H, Winston D, Smith HI, Berggren KK. Sub-5 keV electron-beam lithography in hydrogen silsesquioxane resist Microelectronic Engineering. 88: 3070-3074. DOI: 10.1016/J.Mee.2011.05.024 |
0.334 |
|
| 2010 |
Holzwarth CW, Khilo A, Dahlem M, Popovic MA, Kärtner FX, Ippen EP, Smith HI. Device architecture and precision nanofabrication of microring-resonator filter banks for integrated photonic systems. Journal of Nanoscience and Nanotechnology. 10: 2044-52. PMID 20355625 DOI: 10.1166/Jnn.2010.2035 |
0.314 |
|
| 2010 |
Reisinger T, Eder S, Greve MM, Smith HI, Holst B. Free-standing silicon-nitride zoneplates for neutral-helium microscopy Microelectronic Engineering. 87: 1011-1014. DOI: 10.1016/J.Mee.2009.11.107 |
0.355 |
|
| 2009 |
Fucetola CP, Patel AA, Moon EE, O'Reilly TB, Smith HI. Coherent diffraction lithography: Periodic patterns via mask-based interference lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2947-2950. DOI: 10.1116/1.3237093 |
0.364 |
|
| 2008 |
Choi WK, Liew TH, Dawood MK, Smith HI, Thompson CV, Hong MH. Synthesis of silicon nanowires and nanofin arrays using interference lithography and catalytic etching. Nano Letters. 8: 3799-802. PMID 18954118 DOI: 10.1021/Nl802129F |
0.513 |
|
| 2008 |
Dai J, Wang Q, Li W, Cui Y, Zhang F, Smith HI. The fabrication of 2-D global fiducial grid with high resolution for spatial phase locked e-beam lithography Materials Science Forum. 575: 1252-1257. DOI: 10.4028/Www.Scientific.Net/Msf.575-578.1252 |
0.362 |
|
| 2008 |
Barwicz T, Popovi? MA, Gan F, Dahlem MS, Holzwarth CW, Rakich PT, Ippen EP, Kärtner FX, Smith HI. Reconfigurable silicon photonic circuits for telecommunication applications Proceedings of Spie - the International Society For Optical Engineering. 6872. DOI: 10.1117/12.772740 |
0.332 |
|
| 2008 |
Holzwarth CW, Amatya R, Dahlem M, Khilo A, Kärtner FX, Ippen EP, Ram RJ, Smith HI. Fabrication strategies for filter banks based on microring resonators Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 26: 2164-2167. DOI: 10.1116/1.3021389 |
0.308 |
|
| 2008 |
Moon EE, Smith HI. Nanometer-level alignment to a substrate-embedded coordinate system Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 26: 2341-2344. DOI: 10.1116/1.3010734 |
0.321 |
|
| 2008 |
Ross CA, Jung YS, Chuang VP, Ilievski F, Yang JKW, Bita I, Thomas EL, Smith HI, Berggren KK, Vancso GJ, Cheng JY. Si-containing block copolymers for self-assembled nanolithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 26: 2489-2494. DOI: 10.1116/1.2981079 |
0.304 |
|
| 2008 |
Barwicz T, Holzwarth CW, Rakich PT, Popovi? MA, Ippen EP, Smith HI. Optical loss in silicon microphotonic waveguides induced by metallic contamination Applied Physics Letters. 92. DOI: 10.1063/1.2903714 |
0.305 |
|
| 2007 |
Barwicz T, Byun H, Gan F, Holzwarth CW, Popović MA, Rakich PT, Watts MR, Ippen EP, Kärtner FX, Smith HI, Orcutt JS, Ram RJ, Stojanovic V, Olubuyide OO, Hoyt JL, et al. Silicon photonics for compact, energy-efficient interconnects [Invited] Journal of Optical Networking. 6: 63-73. DOI: 10.1364/Jon.6.000063 |
0.305 |
|
| 2007 |
Tsai HY, Smith HI, Menon R. Fabrication of spiral-phase diffractive elements using scanning-electron- beam lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 2068-2071. DOI: 10.1116/1.2806961 |
0.333 |
|
| 2007 |
Holzwarth CW, Barwicz T, Smith HI. Optimization of hydrogen silsesquioxane for photonic applications Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 2658-2661. DOI: 10.1116/1.2787832 |
0.314 |
|
| 2007 |
Moon EE, Kupec J, Mondol MK, Smith HI, Berggren KK. Atomic-force lithography with interferometric tip-to-substrate position metrology Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 2284-2287. DOI: 10.1116/1.2787794 |
0.337 |
|
| 2007 |
Ma Y, Cheng YC, Cerrina F, Barwicz T, Smith HI. Local line edge roughness in microphotonic devices: An electron-beam lithography study Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 235-241. DOI: 10.1116/1.2426978 |
0.333 |
|
| 2006 |
Menon R, Smith HI. Absorbance-modulation optical lithography. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 23: 2290-4. PMID 16912755 DOI: 10.1364/Josaa.23.002290 |
0.302 |
|
| 2006 |
Menon R, Gil D, Smith HI. Experimental characterization of focusing by high-numerical-aperture zone plates. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 23: 567-71. PMID 16539052 DOI: 10.1364/Josaa.23.000567 |
0.308 |
|
| 2006 |
Smith HI. Nanometer-precision pattern registration for scanning-probe lithographies using interferometric-spatial-phase imaging Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 3083-3087. DOI: 10.1116/1.2393294 |
0.332 |
|
| 2006 |
Holzwarth CW, Barwicz T, Popović MA, Rakich PT, Ippen EP, Kärtner FX, Smith HI. Accurate resonant frequency spacing of microring filters without postfabrication trimming Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 3244-3247. DOI: 10.1116/1.2363402 |
0.304 |
|
| 2006 |
Galus MD, Moon E, Smith HI, Menon R. Replication of diffractive-optical arrays via photocurable nanoimprint lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 2960-2963. DOI: 10.1116/1.2363401 |
0.334 |
|
| 2006 |
Barwicz T, Popović MA, Watts MR, Rakich PT, Ippen EP, Smith HI. Fabrication of add-drop filters based on frequency-matched microring resonators Journal of Lightwave Technology. 24: 2207-2218. DOI: 10.1109/Jlt.2006.872298 |
0.319 |
|
| 2006 |
Smith HI, Menon R, Patel A, Chao D, Walsh M, Barbastathis G. Zone-plate-array lithography: A low-cost complement or competitor to scanning-electron-beam lithography Microelectronic Engineering. 83: 956-961. DOI: 10.1016/J.Mee.2006.01.226 |
0.309 |
|
| 2005 |
Menon R, Gil D, Barbastathis G, Smith HI. Photon-sieve lithography. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 22: 342-5. PMID 15717565 DOI: 10.1364/Josaa.22.000342 |
0.303 |
|
| 2005 |
Menon R, Walsh M, Galus M, Chao D, Patel A, Smith HI. Maskless lithography using diffractive-optical arrays Optics Infobase Conference Papers. DOI: 10.1364/Fio.2005.Fwu5 |
0.329 |
|
| 2005 |
Chao D, Patel A, Barwicz T, Smith HI, Menon R. Immersion zone-plate-array lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 2657-2661. DOI: 10.1116/1.2127942 |
0.319 |
|
| 2005 |
Leonard Q, Malueg D, Wallace J, Taylor JW, Dhuey S, Cerrina F, Boerger B, Selzer R, Yu M, Ma Y, Myers K, Trybendis M, Moon E, Smith HI. Development, installation, and performance of the x-ray stepper JSAL 5C Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 2896-2902. DOI: 10.1116/1.2121711 |
0.303 |
|
| 2005 |
Zhang F, Smith HI, Dai J. Fabrication of high-secondary-electron-yield grids for spatial-phase-locked electron-beam lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 3061-3064. DOI: 10.1116/1.2110341 |
0.304 |
|
| 2005 |
Onoa GB, O'Reilly TB, Walsh ME, Smith HI. Bulk production of singly dispersed carbon nanotubes with prescribed lengths Nanotechnology. 16: 2799-2803. DOI: 10.1088/0957-4484/16/12/010 |
0.307 |
|
| 2005 |
Jung W, Castaño FJ, Morecroft D, Ross CA, Menon R, Smith HI. Magnetization reversal in single-layer and exchange-biased elliptical-ring arrays Journal of Applied Physics. 97. DOI: 10.1063/1.1855461 |
0.336 |
|
| 2005 |
Ross CA, Castaño FJ, Rodriguez E, Haratani S, Vögeli B, Smith HI. Size-dependent switching of multilayer magnetic elements Journal of Applied Physics. 97. DOI: 10.1063/1.1850998 |
0.327 |
|
| 2005 |
Mascaro DJ, Thompson ME, Smith HI, Bulović V. Forming oriented organic crystals from amorphous thin films on patterned substrates via solvent-vapor annealing Organic Electronics: Physics, Materials, Applications. 6: 211-220. DOI: 10.1016/J.Orgel.2005.07.001 |
0.301 |
|
| 2004 |
Qi M, Lidorikis E, Rakich PT, Johnson SG, Joannopoulos JD, Ippen EP, Smith HI. A three-dimensional optical photonic crystal with designed point defects. Nature. 429: 538-42. PMID 15175746 DOI: 10.1038/Nature02575 |
0.335 |
|
| 2004 |
Giermann AL, Thompson CV, Smith HI. Templated formation of ordered metallic nano-particle arrays Materials Research Society Symposium Proceedings. 818: 37-42. DOI: 10.1557/Proc-818-M3.3.1 |
0.515 |
|
| 2004 |
Assefa S, Petrich GS, Kolodziejski LA, Mondol MK, Smith HI. Fabrication of photonic crystal waveguides composed of a square lattice of dielectric rods Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3363-3365. DOI: 10.1116/1.1821573 |
0.348 |
|
| 2004 |
Menon R, Patel A, Moon EE, Smith HI. Alpha-prototype system for zone-plate-array lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3032-3037. DOI: 10.1116/1.1813464 |
0.304 |
|
| 2004 |
Zanke C, Qi M, Smith HI. Large-area patterning for photonic crystals via coherent diffraction lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3352-3355. DOI: 10.1116/1.1813448 |
0.325 |
|
| 2004 |
Menon R, Moon EE, Mondol MK, Castaño FJ, Smith HI. Scanning-spatial-phase alignment for zone-plate-array lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3382-3385. DOI: 10.1116/1.1809631 |
0.31 |
|
| 2004 |
Jung W, Castaño FJ, Ross CA, Menon R, Patel A, Moon EE, Smith HI. Elliptical-ring magnetic arrays fabricated using zone-plate-array lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3335-3338. DOI: 10.1116/1.1809624 |
0.314 |
|
| 2004 |
Assefa S, Rakich PT, Bienstman P, Johnson SG, Petrich GS, Joannopoulos JD, Kolodziejski LA, Ippen EP, Smith HI. Guiding 1.5 μm light in photonic crystals based on dielectric rods Applied Physics Letters. 85: 6110-6112. DOI: 10.1063/1.1840107 |
0.317 |
|
| 2004 |
Wong CW, Rakich PT, Johnson SG, Qi M, Smith HI, Jeon Y, Barbastathis G, Kim SG, Ippen EP, Kimerling LC. Strain-tunable silicon photonic band gap microcavities in optical waveguides Applied Physics Letters. 84: 1242-1244. DOI: 10.1063/1.1649803 |
0.348 |
|
| 2004 |
Gil D, Menon R, Smith HI. The promise of diffractive optics in maskless lithography Microelectronic Engineering. 73: 35-41. DOI: 10.1016/J.Mee.2004.02.012 |
0.356 |
|
| 2003 |
Menon R, Gil D, Carter DJD, Patel A, Smith HI. Zone-plate-array lithography (ZPL): a maskless fast-turn-around system for microoptic device fabrication Proceedings of Spie. 4984: 10-17. DOI: 10.1117/12.477856 |
0.321 |
|
| 2003 |
Gil D, Menon R, Smith HI. The case for diffractive optics in maskless lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 2810-2814. DOI: 10.1116/1.1629288 |
0.366 |
|
| 2003 |
Barwicz T, Smith HI. Evolution of line-edge roughness during fabrication of high-index-contrast microphotonic devices Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 2892-2896. DOI: 10.1116/1.1625965 |
0.332 |
|
| 2003 |
Hastings JT, Zhang F, Smith HI. Nanometer-level stitching in raster-scanning electron-beam lithography using spatial-phase locking Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 2650-2656. DOI: 10.1116/1.1622944 |
0.321 |
|
| 2003 |
Moon EE, Chen L, Everett PN, Mondol MK, Smith HI. Interferometric-spatial-phase imaging for six-axis mask control Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 3112-3115. DOI: 10.1116/1.1619960 |
0.321 |
|
| 2003 |
Gil D, Menon R, Smith HI. Fabrication of high-numerical-aperture phase zone plates with a single lithography exposure and no etching Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 2956-2960. DOI: 10.1116/1.1619957 |
0.375 |
|
| 2003 |
Sánchez-Hanke C, Castaño FJ, Hao Y, Hulbert SL, Ross CA, Smith HI, Kao CC. Soft X-Ray Resonant Scattering: An Element-Specific Tool to Characterize Patterned Arrays of Nanomagnets Ieee Transactions On Magnetics. 39: 3450-3452. DOI: 10.1109/Tmag.2003.816179 |
0.313 |
|
| 2003 |
Castaño FJ, Hao Y, Haratani S, Ross CA, Vögeli B, Smith HI, Sánchez-Hanke C, Kao CC, Zhu X, Grütter P. Magnetic force microscopy and x-ray scattering study of 70×550 nm2 pseudo-spin-valve nanomagnets Journal of Applied Physics. 93: 7927-7929. DOI: 10.1063/1.1558076 |
0.315 |
|
| 2003 |
Hao Y, Ross CA, Smith HI. Thermal stability of the magnetization of 150 nm×230 nm Ni19Fe81 elements Journal of Applied Physics. 93: 7909-7911. DOI: 10.1063/1.1557826 |
0.312 |
|
| 2003 |
Hartley JG, Groves TR, Smith HI, Mondol MK, Goodberlet JG, Schattenburg ML, Ferrera J, Bernshteyn A. Spatial-phase locking with shaped-beam lithography Review of Scientific Instruments. 74: 1377-1379. DOI: 10.1063/1.1535740 |
0.312 |
|
| 2002 |
Gil D, Menon R, Tang X, Smith HI, Carter DJD. Parallel maskless optical lithography for prototyping, low-volume production, and research Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 20: 2597. DOI: 10.1116/1.1526353 |
0.357 |
|
| 2002 |
Qi M, Smith HI. Achieving nanometer-scale, controllable pattern shifts in x-ray lithography using an assembly-tilting technique Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2991-2994. DOI: 10.1116/1.1523021 |
0.32 |
|
| 2002 |
Hastings JT, Lim MH, Goodberlet JG, Smith HI. Optical waveguides with apodized sidewall gratings via spatial-phase-locked electron-beam lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2753-2757. DOI: 10.1116/1.1521744 |
0.356 |
|
| 2002 |
Cheng JY, Ross CA, Thomas EL, Smith HI, Vancso GJ. Fabrication of nanostructures with long-range order using block copolymer lithography Applied Physics Letters. 81: 3657-3659. DOI: 10.1063/1.1519356 |
0.326 |
|
| 2002 |
Castaño FJ, Haratani S, Hao Y, Ross CA, Smith HI. Giant magnetoresistance in 60-150-nm-wide pseudo-spin-valve nanowires Applied Physics Letters. 81: 2809-2811. DOI: 10.1063/1.1512327 |
0.353 |
|
| 2002 |
Hao Y, Castaño FJ, Ross CA, Vögeli B, Walsh ME, Smith HI. Magnetization reversal in lithographically patterned sub-200-nm Co particle arrays Journal of Applied Physics. 91: 7989-7991. DOI: 10.1063/1.1453320 |
0.345 |
|
| 2002 |
Castaño FJ, Hao Y, Ross CA, Vögeli B, Smith HI, Haratani S. Switching field trends in pseudo spin valve nanoelement arrays Journal of Applied Physics. 91: 7317-7319. DOI: 10.1063/1.1452261 |
0.32 |
|
| 2002 |
Ross CA, Hwang M, Shima M, Smith HI, Farhoud M, Savas TA, Schwarzacher W, Parrochon J, Escoffier W, Bertram HN, Humphrey FB, Redjdal M. Magnetic properties of arrays of electrodeposited nanowires Journal of Magnetism and Magnetic Materials. 249: 200-207. DOI: 10.1016/S0304-8853(02)00531-0 |
0.302 |
|
| 2002 |
Peuker M, Lim MH, Smith HI, Morton R, Langen-Suurling AKv, Romijn J, Drift EWJMvd, Delft FCMJMv. Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographies Microelectronic Engineering. 61: 803-809. DOI: 10.1016/S0167-9317(02)00538-5 |
0.342 |
|
| 2001 |
Vögeli B, Smith HI, Castaño FJ, Haratani S, Hao Y, Ross CA. Patterning processes for fabricating sub-100 nm pseudo-spin valve structures Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2753-2756. DOI: 10.1116/1.1415507 |
0.334 |
|
| 2001 |
Goodberlet JG, Hastings JT, Smith HI. Performance of the Raith 150 electron-beam lithography system Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2499-2503. DOI: 10.1116/1.1414018 |
0.317 |
|
| 2001 |
Choi JO, Akinwande AI, Smith HI. 100 nm gate hole openings for low voltage driving field emission display applications Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 900-903. DOI: 10.1116/1.1375821 |
0.314 |
|
| 2001 |
Murphy TE, Hastings JT, Smith HI. Fabrication and characterization of narrow-band bragg-reflection filters in silicon-on-insulator ridge waveguides Journal of Lightwave Technology. 19: 1938-1942. DOI: 10.1109/50.971688 |
0.555 |
|
| 2001 |
Castaño FJ, Hao Y, Haratani S, Ross CA, Vögeli B, Walsh M, Smith HI. Magnetic switching in 100 nm patterned pseudo spin valves Ieee Transactions On Magnetics. 37: 2073-2075. DOI: 10.1109/20.951057 |
0.349 |
|
| 2001 |
Castaño FJ, Hao Y, Hwang M, Ross CA, Vögeli B, Smith HI, Haratani S. Magnetization reversal in sub-100 nm pseudo-spin-valve element arrays Applied Physics Letters. 79: 1504-1506. DOI: 10.1063/1.1399302 |
0.325 |
|
| 2001 |
Yi SS, Moran PD, Zhang X, Cerrina F, Carter J, Smith HI, Kuech TF. Oriented crystallization of GaSb on a patterned, amorphous Si substrate Applied Physics Letters. 78: 1358-1360. DOI: 10.1063/1.1352657 |
0.368 |
|
| 2000 |
Walsh ME, Hao Y, Ross CA, Smith HI. Optimization of a lithographic and ion beam etching process for nanostructuring magnetoresistive thin film stacks Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3539-3543. DOI: 10.1116/1.1324639 |
0.362 |
|
| 2000 |
Gil D, Menon R, Carter DJD, Smith HI. Lithographic patterning and confocal imaging with zone plates Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 18: 2881. DOI: 10.1116/1.1321293 |
0.336 |
|
| 2000 |
Hastings JT, Zhang F, Finlayson MA, Goodberlet JG, Smith HI. Two-dimensional spatial-phase-locked electron-beam lithography via sparse sampling Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3268-3271. DOI: 10.1116/1.1314371 |
0.303 |
|
| 2000 |
Murphy TE, Mondol MK, Smith HI. Characterization of field stitching in electron-beam lithography using moire metrology Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3287-3291. DOI: 10.1116/1.1313573 |
0.516 |
|
| 2000 |
Grisenti RE, Schöllkopf W, Toennies JP, Manson JR, Savas TA, Smith HI. He-atom diffraction from nanostructure transmission gratings: The role of imperfections Physical Review A. 61. DOI: 10.1103/Physreva.61.033608 |
0.32 |
|
| 1999 |
Smith HI, Carter DJD, Ferrera J, Gil D, Goodberlet J, Hastings JT, Lim MH, Meinhold M, Menon R, Moon EE, Ross CA, Savas T, Walsh M, Zhang F. Soft X-Rays for Deep Sub-100 Nm Lithography, with and Without Masks Mrs Proceedings. 584. DOI: 10.1557/Proc-584-11 |
0.317 |
|
| 1999 |
Lim MH, Ferrera J, Pipe KP, Smith HI. A holographic phase-shifting interferometer technique to measure in-plane distortion Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 2703. DOI: 10.1116/1.591049 |
0.323 |
|
| 1999 |
Moon EE, Everett PN, Meinhold MW, Mondol MK, Smith HI. Novel mask-wafer gap measurement scheme with nanometer-level detectivity Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 2698. DOI: 10.1116/1.591048 |
0.331 |
|
| 1999 |
Schattenburg ML, Chen C, Everett PN, Ferrera J, Konkola P, Smith HI. Sub-100 nm metrology using interferometrically produced fiducials Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 2692. DOI: 10.1116/1.591047 |
0.351 |
|
| 1999 |
Carter DJD, Gil D, Menon R, Mondol MK, Smith HI, Anderson EH. Maskless, parallel patterning with zone-plate array lithography Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 3449. DOI: 10.1116/1.591028 |
0.342 |
|
| 1999 |
Lim MH, Murphy TE, Ferrera J, Damask JN, Smith HI. Fabrication techniques for grating-based optical devices Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 3208. DOI: 10.1116/1.590981 |
0.561 |
|
| 1999 |
Farhoud M, Ferrera J, Lochtefeld AJ, Murphy TE, Schattenburg ML, Carter J, Ross CA, Smith HI. Fabrication of 200 nm period nanomagnet arrays using interference lithography and a negative resist Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 3182. DOI: 10.1116/1.590976 |
0.553 |
|
| 1999 |
Lim K, Ripin DJ, Petrich GS, Kolodziejski LA, Ippen EP, Mondol M, Smith HI, Villeneuve PR, Fan S, Joannopoulos JD. Photonic band-gap waveguide microcavities: Monorails and air bridges Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 1171. DOI: 10.1116/1.590717 |
0.336 |
|
| 1999 |
Twisselmann DJ, Farhoud M, Smith HI, Ross CA. In-plane magnetic anisotropy in CoCrPt and CoCrTa films deposited onto patterned silicon substrates Journal of Applied Physics. 85: 4292-4294. DOI: 10.1063/1.370346 |
0.391 |
|
| 1999 |
Savas TA, Farhoud M, Smith HI, Hwang M, Ross CA. Properties of large-area nanomagnet arrays with 100 nm period made by interferometric lithography Journal of Applied Physics. 85: 6160-6162. DOI: 10.1063/1.370029 |
0.307 |
|
| 1999 |
Choi JO, Jeong HS, Pflug DG, Akinwande AI, Smith HI. Fabrication of 0.1 μm gate aperture Mo-tip field-emitter arrays using interferometric lithography Applied Physics Letters. 74: 3050-3052. DOI: 10.1063/1.124061 |
0.315 |
|
| 1999 |
Ross CA, Smith HI, Savas T, Schattenburg M, Farhoud M, Hwang M, Walsh M, Abraham MC, Ram RJ. Fabrication of patterned media for high density magnetic storage Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 3168. DOI: 10.1016/S0167-9317(00)00267-7 |
0.325 |
|
| 1999 |
Koontz EM, U'Ren GD, Lim MH, Kolodziejski LA, Goorsky MS, Petrich GS, Smith HI. Overgrowth of (In,Ga)(As,P) on rectangular-patterned surfaces using gas source molecular beam epitaxy Journal of Crystal Growth. 198: 1104-1110. DOI: 10.1016/S0022-0248(98)01226-3 |
0.368 |
|
| 1998 |
Twisselmann D, Adekor B, Farhoud M, Smith HI, Dorsey P, Ross C. In-Plane Anisotropy In CoCr(Ta,Pt)/Cr Films Deposited onto Substrates with Controlled Topography Mrs Proceedings. 517. DOI: 10.1557/Proc-517-193 |
0.323 |
|
| 1998 |
Farhoud M, Hwang M, Smith H, Schattenburg M, Bae J, Youcef-Toumi K, Ross C. Fabrication of large area nanostructured magnets by interferometric lithography Ieee Transactions On Magnetics. 34: 1087-1089. DOI: 10.1109/20.706365 |
0.325 |
|
| 1997 |
Koontz EM, Lim MH, Wong VV, Petrich GS, Kolodziejski LA, Smith HI, Matney KM, U’Ren GD, Goorsky MS. Preservation of rectangular-patterned InP gratings overgrown by gas source molecular beam epitaxy Applied Physics Letters. 71: 1400-1402. DOI: 10.1063/1.119905 |
0.346 |
|
| 1997 |
Goodberlet J, Ferrera J, Smith H. Analogue delay-locked loop for spatial-phase locking Electronics Letters. 33: 1269. DOI: 10.1049/El:19970858 |
0.317 |
|
| 1997 |
Foresi JS, Villeneuve PR, Ferrera J, Thoen ER, Steinmeyer G, Fan S, Joannopoulos JD, Kimerling LC, Smith HI, Ippen EP. Photonic-bandgap microcavities in optical waveguides Nature. 390: 143-145. DOI: 10.1038/36514 |
0.326 |
|
| 1997 |
Goodberlet J, Silverman S, Ferrera J, Mondol M, Schattenburg M, Smith HI. A one-dimensional demonstration of spatial-phase-locked electron-beam lithography Microelectronic Engineering. 35: 473-476. DOI: 10.1016/S0167-9317(96)00188-8 |
0.3 |
|
| 1996 |
Smith HI. A proposal for maskless, zone-plate-array nanolithography Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 14: 4318. DOI: 10.1116/1.589044 |
0.336 |
|
| 1996 |
Smith HI. X-ray lithography for microelectronics Physica Scripta. 1996: 26-31. DOI: 10.1088/0031-8949/1996/T61/004 |
0.357 |
|
| 1996 |
Smith HI, Schattenburg M, Hector S, Ferrera J, Moon E, Yang I, Burkhardt M. X-ray nanolithography: Extension to the limits of the lithographic process Microelectronic Engineering. 32: 143-158. DOI: 10.1016/0167-9317(95)00183-2 |
0.375 |
|
| 1995 |
Tiberio RC, Rooks, Chapman M, Hammond T, Smith E, Lenef A, Rubenstein R, Pritchard D, Adams S, Ferrera J, Carter JM, Smith HI. Coherence and structural design of free-standing gratings for atom-wave optics Japanese Journal of Applied Physics. 34: 6935-6939. DOI: 10.1143/Jjap.34.6935 |
0.375 |
|
| 1995 |
Wong VV, Ferrera J, Damask JN, Murphy TE, Smith HI, Haus HA. Distributed Bragg grating integrated-optical filters: synthesis and fabrication Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 13: 2859-2864. DOI: 10.1116/1.588305 |
0.566 |
|
| 1995 |
Burkhardt M, Silverman S, Smith HI, Antoniadis DA, Rhee KW, Peckerar MC. Gap control in the fabrication of quantum-effect devices using X-ray nanolithography Microelectronic Engineering. 27: 307-310. DOI: 10.1016/0167-9317(94)00113-9 |
0.315 |
|
| 1993 |
Zhao Y, Tsui DC, Santos M, Shayegan M, Ghanbari RA, Antoniadis DA, Smith HI, Kempa K. Mode softening in the far-infrared excitation of quantum-wire arrays. Physical Review. B, Condensed Matter. 48: 5249-5255. PMID 10009040 DOI: 10.1103/Physrevb.48.5249 |
0.304 |
|
| 1993 |
Schattenburg ML, Carter J, Chu W, Fleming RC, Ghanbari RA, Mondol M, Polce N, Smith HI. Mask Technology For X-Ray Nanolithography Mrs Proceedings. 306. DOI: 10.1557/Proc-306-63 |
0.403 |
|
| 1993 |
Smith HI, Schattenburg ML. X-ray lithography from 500 to 30 nm: X-ray nanolithography Ibm Journal of Research and Development. 37: 319-329. DOI: 10.1147/Rd.373.0319 |
0.366 |
|
| 1992 |
Yen A, Anderson EH, Ghanbari RA, Schattenburg ML, Smith HI. Achromatic holographic configuration for 100-nm-period lithography. Applied Optics. 31: 4540-5. PMID 20725456 DOI: 10.1364/Ao.31.004540 |
0.341 |
|
| 1992 |
Yen A, Schattenburg ML, Smith HI. Proposed method for fabricating 50-nm-period gratings by achromatic holographic lithography. Applied Optics. 31: 2972-3. PMID 20725235 DOI: 10.1364/Ao.31.002972 |
0.316 |
|
| 1992 |
Bagwell PF, Park SL, Yen A, Antoniadis DA, Smith HI, Orlando TP, Kastner MA. Magnetotransport in multiple narrow silicon inversion channels opened electrostatically into a two-dimensional electron gas. Physical Review. B, Condensed Matter. 45: 9214-9221. PMID 10000787 DOI: 10.1103/Physrevb.45.9214 |
0.307 |
|
| 1992 |
Chu W, Schattenburg M, Smith HI. Low-stress gold electroplating for x-ray masks Microelectronic Engineering. 17: 223-226. DOI: 10.1016/0167-9317(92)90046-T |
0.342 |
|
| 1992 |
Early K, Schattenburg M, Olster D, Shepard M, Smith HI. Diffraction in proximity x-ray lithography: Comparing theory and experiment for gratings, lines, and spaces Microelectronic Engineering. 17: 149-152. DOI: 10.1016/0167-9317(92)90030-U |
0.308 |
|
| 1991 |
Karam N, Haven V, Ismail K, Legoues F, Carter J, Smith HI. A New Approach for Low Defect Density GaAs On Patterned Si Substrates by Mocvd Mrs Proceedings. 221. DOI: 10.1557/Proc-221-399 |
0.39 |
|
| 1991 |
Smith HI. A new approach to high fidelity e-beam and ion-beam lithography based on an in situ global-fiducial grid Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 9: 2992. DOI: 10.1116/1.585355 |
0.32 |
|
| 1991 |
Chu W, Smith HI, Schattenburg ML. Replication of 50‐nm‐linewidth device patterns using proximity x‐ray lithography at large gaps Applied Physics Letters. 59: 1641-1643. DOI: 10.1063/1.106256 |
0.339 |
|
| 1991 |
Ismail K, Legoues F, Karam NH, Carter J, Smith HI. High‐quality GaAs on sawtooth‐patterned Si substrates Applied Physics Letters. 59: 2418-2420. DOI: 10.1063/1.106034 |
0.352 |
|
| 1991 |
Geis MW, Smith HI, Argoitia A, Angus J, Ma GHM, Glass JT, Butler J, Robinson CJ, Pryor R. Large-area mosaic diamond films approaching single-crystal quality Applied Physics Letters. 58: 2485-2487. DOI: 10.1063/1.104851 |
0.379 |
|
| 1991 |
Yen A, Ghanbari RA, Ku YC, Chu W, Schattenburg ML, Carter JM, Smith HI. X-ray masks with large-area 100nm-period gratings for quantum-effect device applications Microelectronic Engineering. 13: 271-274. DOI: 10.1016/0167-9317(91)90091-Q |
0.358 |
|
| 1991 |
Karam N, Mastrovito A, Haven V, Ismail K, Pennycook S, Smith HI. Patterning and overgrowth of nanostructure quantum well wire arrays by LP-MOVPE Journal of Crystal Growth. 107: 591-597. DOI: 10.1016/0022-0248(91)90526-B |
0.385 |
|
| 1990 |
Schattenburg ML, Anderson EH, Smith HI. X-ray/VUV transmission gratings for astrophysical and laboratory applications Physica Scripta. 41: 13-20. DOI: 10.1088/0031-8949/41/1/004 |
0.309 |
|
| 1990 |
Thompson CV, Floro J, Smith HI. Epitaxial grain growth in thin metal films Journal of Applied Physics. 67: 4099-4104. DOI: 10.1063/1.344969 |
0.524 |
|
| 1990 |
Early K, Schattenburg M, Smith HI. Absence of resolution degradation in X-ray lithography for λ from 4.5nm to 0.83nm Microelectronic Engineering. 11: 317-321. DOI: 10.1016/0167-9317(90)90122-A |
0.321 |
|
| 1990 |
Ku Y, Smith HI, Plotnik I. Low Stress Tungsten Absorber for X-ray Masks Microelectronic Engineering. 11: 303-308. DOI: 10.1016/0167-9317(90)90119-E |
0.321 |
|
| 1990 |
Yen A, Ghanbari RA, Anderson EH, Smith HI. Fabrication of 100nm-period gratings using achromatic holographic lithography Microelectronic Engineering. 11: 201-205. DOI: 10.1016/0167-9317(90)90098-E |
0.37 |
|
| 1990 |
Smith HI, Ismail K, Schattenburg M, Antoniadis D. Sub-100 nm electronic devices and quantum-effects research using x-ray nanolithography Microelectronic Engineering. 11: 53-59. DOI: 10.1016/0167-9317(90)90072-2 |
0.337 |
|
| 1989 |
Bagwell PF, Ismail K, Ghanbari R, Chu W, Yen A, Antoniadis DA, Smith HI, Orlando TP. IVB-5 Surface Superlattices and Quasi-One-Dimensional Conductors in GaAs HEMT's: How Best to Compare Theory and Experiment? Ieee Transactions On Electron Devices. 36: 2617. DOI: 10.1109/16.43732 |
0.311 |
|
| 1989 |
Ismail K, Antoniadis DA, Smith HI. Lateral resonant tunneling in a double‐barrier field‐effect transistor Applied Physics Letters. 55: 589-591. DOI: 10.1063/1.102267 |
0.305 |
|
| 1989 |
Ismail K, Antoniadis DA, Smith HI. One‐dimensional subbands and mobility modulation in GaAs/AlGaAs quantum wires Applied Physics Letters. 54: 1130-1132. DOI: 10.1063/1.100738 |
0.33 |
|
| 1989 |
Kawata H, Carter JM, Yen A, Smith HI. Optical projection lithography using lenses with numerical apertures greater than unity Microelectronic Engineering. 9: 31-36. DOI: 10.1016/0167-9317(89)90008-7 |
0.324 |
|
| 1988 |
Atwater HA, Thompson CV, Smith HI. Interface-limited grain-boundary motion during ion bombardment. Physical Review Letters. 60: 112-115. PMID 10038212 DOI: 10.1103/Physrevlett.60.112 |
0.539 |
|
| 1988 |
Atwater HA, Thompson CV, Smith HI. Mechanisms for crystallographic orientation in the crystallization of thin silicon films from the melt Journal of Materials Research. 3: 1232-1237. DOI: 10.1557/Jmr.1988.1232 |
0.584 |
|
| 1988 |
Smith HI. A model for comparing process latitude in ultraviolet, deep-ultraviolet, and x-ray lithography Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 6: 346. DOI: 10.1116/1.583994 |
0.32 |
|
| 1988 |
Shahidi G, Antoniadis D, Smith H. Reduction of hot-electron-generated substrate current in sub-100-nm channel length Si MOSFET's Ieee Transactions On Electron Devices. 35: 2430. DOI: 10.1109/16.8835 |
0.31 |
|
| 1988 |
Atwater HA, Thompson CV, Smith HI. Ion-bombardment-enhanced grain growth in germanium, silicon, and gold thin films Journal of Applied Physics. 64: 2337-2353. DOI: 10.1063/1.341665 |
0.596 |
|
| 1987 |
Chou SY, Antoniadis DA, Smith HI. Application of the Shubnikov-de Haas oscillations in the characterization of Si MOSFET's and GaAs MODFET's Ieee Transactions On Electron Devices. 34: 883-889. DOI: 10.1109/T-Ed.1987.23011 |
0.51 |
|
| 1987 |
Palmer JE, Thompson CV, Smith HI. Grain growth and grain size distributions in thin germanium films Journal of Applied Physics. 62: 2492-2497. DOI: 10.1063/1.339460 |
0.518 |
|
| 1987 |
Garrison SM, Cammarata RC, Thompson CV, Smith HI. Surface-energy-driven grain growth during rapid thermal annealing (<10 s) of thin silicon films Journal of Applied Physics. 61: 1652-1655. DOI: 10.1063/1.338055 |
0.518 |
|
| 1987 |
Anderson EH, Kern D, Smith HI. Fabrication by tri-level electron beam lithography of X-ray masks with 50nm linewidths, and replication by X-ray nanolithography Microelectronic Engineering. 6: 541-546. DOI: 10.1016/0167-9317(87)90085-2 |
0.346 |
|
| 1987 |
Schattenburg M, Tanaka I, Smith HI. Microgap x-ray nanolithography Microelectronic Engineering. 6: 273-279. DOI: 10.1016/0167-9317(87)90049-9 |
0.361 |
|
| 1987 |
Chou SY, Antoniadis DA, Smith HI, Kastner MA. Conductance fluctuations in ultra-short-channel Si MOSFETS Solid State Communications. 61: 571-572. DOI: 10.1016/0038-1098(87)90172-4 |
0.502 |
|
| 1986 |
Geis MW, Chen CK, Smith HI. Elimination of Subboundaries in 0.5-µm-Thick Si-on-Insulator Films Produced by ZMR Mrs Proceedings. 74. DOI: 10.1557/Proc-74-567 |
0.355 |
|
| 1986 |
Atwater HA, Tiiompson CV, Smith HI. Ion Beam Enhanced Grain Growth in Thin Films Mrs Proceedings. 74. DOI: 10.1557/Proc-74-499 |
0.489 |
|
| 1986 |
Warren AC, Plotnik I, Anderson EH, Schattenburg ML, Antoniadis DA, Smith HI. FABRICATION OF SUB-100-NM LINEWIDTH PERIODIC STRUCTURES FOR STUDY OF QUANTUM EFFECTS FROM INTERFERENCE AND CONFINEMENT IN Si INVERSION LAYERS Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 4: 365-368. DOI: 10.1116/1.583333 |
0.369 |
|
| 1986 |
Wong CC, Smith HI, Thompson CV. Surface‐energy‐driven secondary grain growth in thin Au films Applied Physics Letters. 48: 335-337. DOI: 10.1063/1.96543 |
0.521 |
|
| 1986 |
Geis MW, Smith HI, Chen CK. Characterization and entrainment of subboundaries and defect trails in zone‐melting‐recrystallized Si films Journal of Applied Physics. 60: 1152-1160. DOI: 10.1063/1.337360 |
0.308 |
|
| 1986 |
Smith HI. A review of submicron lithography Superlattices and Microstructures. 2: 129-142. DOI: 10.1016/0749-6036(86)90077-7 |
0.35 |
|
| 1986 |
Plotnik I, Porter ME, Toth M, Akhtar S, Smith HI. Ion-implant compensation of tensile stress in Tungsten absorber for low distortion X-ray masks Microelectronic Engineering. 5: 51-59. DOI: 10.1016/0167-9317(86)90029-8 |
0.305 |
|
| 1985 |
Thompson CV, Smith HI. Secondary Grain Growth in Thin Films Mrs Proceedings. 57. DOI: 10.1557/Proc-57-499 |
0.512 |
|
| 1985 |
Geis MW, Chen CK, Smith HI, Nitishin PM, Tsaur B, Mountain RW. Elimination of Subboundaries from Zone-Melting-Recrystallized Silicon-On-Insulator Films Mrs Proceedings. 53. DOI: 10.1557/Proc-53-39 |
0.363 |
|
| 1985 |
Smith HI, Geis MW, Thompson CV, Chen CK. Crystalline Films on Amorphous Substrates by Zone Melting and Surface-Energy-Driven Grain Growth in Conjunction with Patferning Mrs Proceedings. 53. DOI: 10.1557/Proc-53-3 |
0.55 |
|
| 1985 |
Atwater HA, Smith HI, Thompson CV. Enhancement of Grain Growth In Ultra-Thin Germanium Films By Ion Bombardment Mrs Proceedings. 51. DOI: 10.1557/Proc-51-337 |
0.586 |
|
| 1985 |
Wong CC, Smith HI, Thompson CV. Secondary Grain Growth and Graphoepitaxy in thin Au films on Submicrometer-Period Gratings Mrs Proceedings. 47. DOI: 10.1557/Proc-47-35 |
0.514 |
|
| 1985 |
Chou SY, Antoniadis DA, Smith HI. Observation of electron velocity overshoot in sub-100-nm-channel MOSFET's in Silicon Ieee Electron Device Letters. 6: 665-667. DOI: 10.1109/Edl.1985.26267 |
0.517 |
|
| 1985 |
Warren AC, Antoniadis DA, Smith HI, Melngailis J. Surface Superlattice Formation in Silicon Inversion Layers Using 0.2-μm Period Grating-Gate Electrodes Ieee Electron Device Letters. 6: 294-296. DOI: 10.1109/Edl.1985.26130 |
0.339 |
|
| 1984 |
Yonehara T, Smith HI, Palmer JE, Thompson CV. Surface-Energy-Driven Graphoepitaxy in Ultrathin Films of Ge The Japan Society of Applied Physics. DOI: 10.7567/Ssdm.1984.B-10-1 |
0.488 |
|
| 1984 |
Geis MW, Chen CK, Smith HI, Mountain RW, Doherty CL. Characterization, Control, and Reduction of Subboundaries in
Silicon on Insulators Mrs Proceedings. 35. DOI: 10.1557/Proc-35-575 |
0.375 |
|
| 1984 |
Yonehara T, Smith HI, Thompson CV, Palmer JE. Graphoepitaxy of Ge on SiO2 by solid-state surface-energy-driven grain growth Applied Physics Letters. 45: 631-633. DOI: 10.1063/1.95336 |
0.542 |
|
| 1984 |
Thompson CV, Smith HI. Surface-energy-driven secondary grain growth in ultrathin (<100 nm) films of silicon Applied Physics Letters. 44: 603-605. DOI: 10.1063/1.94842 |
0.536 |
|
| 1984 |
Atwater H, Smith HI, Thompson C, Geis M. Zone-melting recrystallization of thick silicon on insulator films Materials Letters. 2: 269-273. DOI: 10.1016/0167-577X(84)90128-9 |
0.612 |
|
| 1983 |
Yonehara T, Tihompson C, Smith HI. Abnormal Grain Growth in Ultra-Thin Films of Germanium on Insulator Mrs Proceedings. 25. DOI: 10.1557/Proc-25-517 |
0.374 |
|
| 1983 |
Wong C, Keavney C, Atwater H, Thompson C, Smith H. Zone Melting Recrystallization of InSb Films on Oxidized Si Wafers Mrs Proceedings. 23. DOI: 10.1557/Proc-23-627 |
0.625 |
|
| 1983 |
Smith HI, Thompson C, Geis M, Atwater H, Yonehara T, Wong C. Zone Melting Recrystallization of Patterned Films and Low-Temperature Graphoepitaxy Mrs Proceedings. 23. DOI: 10.1557/Proc-23-459 |
0.635 |
|
| 1983 |
Anderson EH, Horwitz CM, Smith HI. Holographic lithography with thick photoresist Applied Physics Letters. 43: 874-875. DOI: 10.1063/1.94533 |
0.324 |
|
| 1983 |
Atwater HA, Thompson CV, Smith HI, Geis MW. Orientation filtering by growth‐velocity competition in zone‐melting recrystallization of silicon on SiO2 Applied Physics Letters. 43: 1126-1128. DOI: 10.1063/1.94255 |
0.585 |
|
| 1983 |
Smith HI, Geis M, Thompson C, Atwater H. Silicon-on-insulator by graphoepitaxy and zone-melting recrystallization of patterned films Journal of Crystal Growth. 63: 527-546. DOI: 10.1016/0022-0248(83)90165-3 |
0.641 |
|
| 1983 |
Smith HI, Thompson CV, Atwater HA. Graphoepitaxy and zone-melting recrystallization of patterned films Journal of Crystal Growth. 65: 337-338. DOI: 10.1016/0022-0248(83)90070-2 |
0.591 |
|
| 1982 |
Hawryluk AM, Smith HI, Osgood RM, Ehrlich DJ. Deep-ultraviolet spatial-period division using an excimer laser. Optics Letters. 7: 402-4. PMID 19714036 DOI: 10.1364/Ol.7.000402 |
0.324 |
|
| 1982 |
Geis MW, Smith HI, Tsaur B, Fan JCC, Silversmith DJ, Mountain RW, Chapman RL. Zone-Melting Recrystallization of Semiconductor Films Mrs Proceedings. 13. DOI: 10.1557/Proc-13-477 |
0.37 |
|
| 1982 |
Bezjian KA, Smith HI, Carter JM, Geis MW. An Etch Pit Technique for Analyzing Crystallographic Orientation in Si Films Journal of the Electrochemical Society. 129: 1848-1850. DOI: 10.1149/1.2124307 |
0.356 |
|
| 1982 |
Atwater HA, Smith HI, Geis MW. Orientation selection by zone‐melting silicon films through planar constrictions Applied Physics Letters. 41: 747-749. DOI: 10.1063/1.93664 |
0.529 |
|
| 1982 |
Geis MW, Smith HI, Tsaur B, Fan JCC, Maby EW, Antoniadis DA. Zone‐melting recrystallization of encapsulated silicon films on SiO2—morphology and crystallography Applied Physics Letters. 40: 158-160. DOI: 10.1063/1.93021 |
0.391 |
|
| 1981 |
Geis MW, Antoniadis DA, Silversmith DJ, Mountain RW, Smith HI. (Invited) Silicon Graphoepitaxy Japanese Journal of Applied Physics. 20: 39. DOI: 10.7567/Jjaps.20S1.39 |
0.387 |
|
| 1981 |
Efremow NN, Economou NP, Bezjian K, Dana SS, Smith HI. A simple technique for modifying the profile of resist exposed by holographic lithography Journal of Vacuum Science and Technology. 19: 1234-1237. DOI: 10.1116/1.571251 |
0.357 |
|
| 1981 |
Tsumita N, Melngailis J, Hawryluk AM, Smith HI. FABRICATION OF X-RAY MASKS USING ANISOTROPIC ETCHING OF (110) Si AND SHADOWING TECHNIQUES Journal of Vacuum Science & Technology. 19: 1211-1213. DOI: 10.1116/1.571246 |
0.359 |
|
| 1981 |
Hawryluk AM, Ceglio NM, Price RH, Melngailis J, Smith HI. Gold transmission gratings with submicrometer periods and thicknesses ≳0.5 μm Journal of Vacuum Science and Technology. 19: 897-900. DOI: 10.1116/1.571230 |
0.351 |
|
| 1980 |
Smith HI, Flanders DC. X‐ray lithography — A review and assessment of future applications Journal of Vacuum Science and Technology. 17: 533-535. DOI: 10.1116/1.570502 |
0.339 |
|
| 1980 |
Geis MW, Antoniadis DA, Silversmith DJ, Mountain RW, Smith HI. Silicon graphoepitaxy using a strip‐heater oven Applied Physics Letters. 37: 454-456. DOI: 10.1063/1.91962 |
0.379 |
|
| 1979 |
Flanders DD, Hawryluk AM, Smith HI. Spatial period division—A new technique for exposing submicrometer‐linewidth periodic and quasiperiodic patterns Journal of Vacuum Science and Technology. 16: 1949-1952. DOI: 10.1116/1.570362 |
0.313 |
|
| 1979 |
Geis MW, Flanders DC, Smith HI, Antoniadis DA. Graphoepitaxy of silicon on fused silica using surface micropatterns and laser crystallization Journal of Vacuum Science and Technology. 16: 1640-1643. DOI: 10.1116/1.570261 |
0.413 |
|
| 1979 |
Shaver DC, Flanders DC, Ceglio NM, Smith HI. X‐ray zone plates fabricated using electron‐beam and x‐ray lithography Journal of Vacuum Science and Technology. 16: 1626-1630. DOI: 10.1116/1.570258 |
0.343 |
|
| 1979 |
Geis MW, Flanders DC, Smith HI. Crystallographic orientation of silicon on an amorphous substrate using an artificial surface‐relief grating and laser crystallization Applied Physics Letters. 35: 71-74. DOI: 10.1063/1.90936 |
0.396 |
|
| 1978 |
Flanders DC, Smith HI. Surface relief gratings of 3200‐Å‐period fabrication techniques and influence on thin‐film growth Journal of Vacuum Science and Technology. 15: 1001-1003. DOI: 10.1116/1.569722 |
0.345 |
|
| 1978 |
Flanders DC, Smith HI. Polyimide membrane x‐ray lithography masks—Fabrication and distortion measurements Journal of Vacuum Science and Technology. 15: 995-997. DOI: 10.1116/1.569694 |
0.304 |
|
| 1978 |
Smith HI, Flanders DC. Oriented crystal growth on amorphous substrates using artificial surface‐relief gratings Applied Physics Letters. 32: 349-350. DOI: 10.1063/1.90054 |
0.33 |
|
| 1978 |
Flanders DC, Smith HI, Lehmann HW, Widmer R, Shaver DC. Surface relief structures with linewidths below 2000 Å Applied Physics Letters. 32: 112-114. DOI: 10.1063/1.89956 |
0.315 |
|
| 1978 |
Flanders DC, Shaver DC, Smith HI. Alignment of liquid crystals using submicrometer periodicity gratings Applied Physics Letters. 32: 597-598. DOI: 10.1063/1.89864 |
0.338 |
|
| 1977 |
Smith HI, Flanders DC. Invited: X-Ray Lithography Japanese Journal of Applied Physics. 16: 61. DOI: 10.7567/Jjaps.16S1.61 |
0.34 |
|
| 1977 |
Flanders DC, Smith HI, Austin S. A new interferometric alignment technique Applied Physics Letters. 31: 426-428. DOI: 10.1063/1.89719 |
0.307 |
|
| 1975 |
Smith HI, Bernacki SE. Prospects for x‐ray fabrication of Si IC devices Journal of Vacuum Science and Technology. 12: 1321-1323. DOI: 10.1116/1.568528 |
0.323 |
|
| 1975 |
Smith HI, Chinn SR, DeGraff PD. Application of moiré techniques in scanning‐electron‐beam lithography and microscopy Journal of Vacuum Science and Technology. 12: 1262-1265. DOI: 10.1116/1.568513 |
0.332 |
|
| 1975 |
Bernacki SE, Smith HI. Fabrication of silicon MOS devices using X-ray lithography Ieee Transactions On Electron Devices. 22: 421-428. DOI: 10.1109/T-Ed.1975.18155 |
0.322 |
|
| 1975 |
Hawryluk RJ, Smith HI, Soares A, Hawryluk AM. Energy dissipation in a thin polymer film by electron beam scattering: Experiment Journal of Applied Physics. 46: 2528-2537. DOI: 10.1063/1.321929 |
0.337 |
|
| 1974 |
Hawryluk RJ, Hawryluk AM, Smith HI. Energy dissipation in a thin polymer film by electron beam scattering Journal of Applied Physics. 45: 2551-2566. DOI: 10.1063/1.1663629 |
0.31 |
|
| 1973 |
Smith HI, Spears DL, Bernacki SE. X-Ray Lithography: A Complementary Technique to Electron Beam Lithography Journal of Vacuum Science and Technology. 10: 913-917. DOI: 10.1116/1.1318514 |
0.347 |
|
| 1972 |
Spears D, Smith HI. High-resolution pattern replication using soft X rays Electronics Letters. 8: 102. DOI: 10.1049/El:19720074 |
0.334 |
|
| 1971 |
Smith HI, Bachner FJ, Efremow N. A High-Yield Photolithographic Technique for Surface Wave Devices Journal of the Electrochemical Society. 118: 821. DOI: 10.1149/1.2408173 |
0.322 |
|
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