Year |
Citation |
Score |
2009 |
Du X, Zhang K, Holland K, Tombler T, Moskovits M. Chemical corrosion protection of optical components using atomic layer deposition. Applied Optics. 48: 6470-4. PMID 19935967 DOI: 10.1364/Ao.48.006470 |
0.562 |
|
2009 |
King DM, Johnson SI, Li J, Du X, Liang X, Weimer AW. Atomic layer deposition of quantum-confined ZnO nanostructures. Nanotechnology. 20: 195401. PMID 19420639 DOI: 10.1088/0957-4484/20/19/195401 |
0.624 |
|
2008 |
King DM, Du X, Cavanagh AS, Weimer AW. Quantum confinement in amorphous TiO(2) films studied via atomic layer deposition. Nanotechnology. 19: 445401. PMID 21832729 DOI: 10.1088/0957-4484/19/44/445401 |
0.63 |
|
2008 |
Du X, Du Y, George SM. CO gas sensing by ultrathin tin oxide films grown by atomic layer deposition using transmission FTIR spectroscopy. Journal of Physical Chemistry A. 112: 9211-9219. PMID 18710189 DOI: 10.1021/Jp800518V |
0.62 |
|
2008 |
Zhan GD, Du X, King DM, Hakim LF, Liang X, McCormick JA, Weimer AW. Atomic layer deposition on bulk quantities of surfactant-modified single-walled carbon nanotubes Journal of the American Ceramic Society. 91: 831-835. DOI: 10.1111/J.1551-2916.2007.02210.X |
0.611 |
|
2008 |
Cooper R, Upadhyaya HP, Minton TK, Berman MR, Du X, George SM. Protection of polymer from atomic-oxygen erosion using Al2O3 atomic layer deposition coatings Thin Solid Films. 516: 4036-4039. DOI: 10.1016/J.Tsf.2007.07.150 |
0.598 |
|
2008 |
Du X, George SM. Thickness dependence of sensor response for CO gas sensing by tin oxide films grown using atomic layer deposition Sensors and Actuators B-Chemical. 135: 152-160. DOI: 10.1016/J.Snb.2008.08.015 |
0.628 |
|
2005 |
Du X, Du Y, George SM. In situ examination of tin oxide atomic layer deposition using quartz crystal microbalance and Fourier transform infrared techniques Journal of Vacuum Science and Technology. 23: 581-588. DOI: 10.1116/1.1914810 |
0.61 |
|
2005 |
Du Y, Du X, George SM. SiO2 film growth at low temperatures by catalyzed atomic layer deposition in a viscous flow reactor Thin Solid Films. 491: 43-53. DOI: 10.1016/J.Tsf.2005.05.051 |
0.651 |
|
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