Year |
Citation |
Score |
2020 |
Lai Z, Gu L, Yu L, Chen H, Yu Z, Zhang C, Xu X, Zhang M, Zhang M, Ma M, Zhao Z, Zhang J. Delta opioid peptide [d-Ala2, d-Leu5] enkephalin confers neuroprotection by activating delta opioid receptor-AMPK-autophagy axis against global ischemia. Cell & Bioscience. 10: 79. PMID 32549974 DOI: 10.1186/s13578-020-00441-z |
0.306 |
|
2019 |
Liu Z, Zhang M, Shen Z, Chen H, Zhang W, Xu X, Lai Z, Sun W, Zhao Z, Zhang J. The coordinating role of the human norovirus minor capsid protein VP2 is essential to functional change and nuclear localization of the major capsid protein VP1. Archives of Virology. PMID 30810804 DOI: 10.1007/s00705-019-04192-2 |
0.33 |
|
2019 |
Li M, Yu B, Lin Y, Xu X, Li W, Pan DZ. A Practical Split Manufacturing Framework for Trojan Prevention via Simultaneous Wire Lifting and Cell Insertion Ieee Transactions On Computer-Aided Design of Integrated Circuits and Systems. 38: 1585-1598. DOI: 10.1109/Tcad.2018.2859402 |
0.736 |
|
2018 |
Xu X, Lin Y, Li M, Matsunawa T, Nojima S, Kodama C, Kotani T, Pan DZ. Subresolution Assist Feature Generation With Supervised Data Learning Ieee Transactions On Computer-Aided Design of Integrated Circuits and Systems. 37: 1225-1236. DOI: 10.1109/Tcad.2017.2748029 |
0.701 |
|
2018 |
Lin Y, Yu B, Xu X, Gao J, Viswanathan N, Liu W, Li Z, Alpert CJ, Pan DZ. MrDP: Multiple-Row Detailed Placement of Heterogeneous-Sized Cells for Advanced Nodes Ieee Transactions On Computer-Aided Design of Integrated Circuits and Systems. 37: 1237-1250. DOI: 10.1109/Tcad.2017.2748025 |
0.769 |
|
2017 |
Xu X, Pan DZ. Toward Unidirectional Routing Closure in Advanced Technology Nodes Ipsj Transactions On System Lsi Design Methodology. 10: 2-12. DOI: 10.2197/Ipsjtsldm.10.2 |
0.308 |
|
2017 |
Lin Y, Xu X, Yu B, Baldick R, Pan DZ. Triple/quadruple patterning layout decomposition via linear programming and iterative rounding Journal of Micro-Nanolithography Mems and Moems. 16: 23507-23507. DOI: 10.1117/1.Jmm.16.2.023507 |
0.777 |
|
2017 |
Xu X, Lin Y, Li M, Ou J, Cline B, Pan DZ. Redundant Local-Loop Insertion for Unidirectional Routing Ieee Transactions On Computer-Aided Design of Integrated Circuits and Systems. 36: 1113-1125. DOI: 10.1109/Tcad.2017.2651811 |
0.761 |
|
2017 |
Livramento V, Liu D, Chowdhury S, Yu B, Xu X, Pan DZ, Guntzel JL, Santos LCVd. Incremental Layer Assignment Driven by an External Signoff Timing Engine Ieee Transactions On Computer-Aided Design of Integrated Circuits and Systems. 36: 1126-1139. DOI: 10.1109/Tcad.2016.2638450 |
0.71 |
|
2016 |
Xu X, Yu B, Gao JR, Hsu CL, Pan DZ. PARR: Pin-access planning and regular routing for self-aligned double patterning Acm Transactions On Design Automation of Electronic Systems. 21. DOI: 10.1145/2842612 |
0.679 |
|
2016 |
Xu X, Cline B, Yeric G, Pan DZ. Standard cell pin access and physical design in advanced lithography Proceedings of Spie. 9780. DOI: 10.1117/12.2222289 |
0.48 |
|
2016 |
Lin Y, Xu X, Yu B, Baldick R, Pan DZ. Triple/quadruple patterning layout decomposition via novel linear programming and iterative rounding Proceedings of Spie. 9781. DOI: 10.1117/12.2218628 |
0.78 |
|
2016 |
Xu X, Cline B, Yeric G, Yu B, Pan DZ. Systematic framework for evaluating standard cell middle-of-line robustness for multiple patterning lithography Journal of Micro/ Nanolithography, Mems, and Moems. 15. DOI: 10.1117/1.Jmm.15.2.021202 |
0.668 |
|
2016 |
Yu B, Xu X, Roy S, Lin Y, Ou J, Pan DZ. Design for manufacturability and reliability in extreme-scaling VLSI Science China Information Sciences. 1-23. DOI: 10.1007/S11432-016-5560-6 |
0.693 |
|
2015 |
Xu X, Cline B, Yeric G, Yu B, Pan DZ. A systematic framework for evaluating standard cell middle-of-line (MOL) robustness for multiple patterning Proceedings of Spie. 9427: 942707. DOI: 10.1117/12.2085918 |
0.661 |
|
2015 |
Yu B, Xu X, Gao J, Lin Y, Li Z, Alpert CJ, Pan DZ. Methodology for Standard Cell Compliance and Detailed Placement for Triple Patterning Lithography Ieee Transactions On Computer-Aided Design of Integrated Circuits and Systems. 34: 726-739. DOI: 10.1109/Tcad.2015.2401571 |
0.79 |
|
2015 |
Xu X, Cline B, Yeric G, Yu B, Pan DZ. Self-Aligned Double Patterning Aware Pin Access and Standard Cell Layout Co-Optimization Ieee Transactions On Computer-Aided Design of Integrated Circuits and Systems. 34: 699-712. DOI: 10.1109/Tcad.2015.2399439 |
0.711 |
|
2014 |
Yu B, Gao JR, Xu X, Pan DZ. Bridging the gap from mask to physical design for multiple patterning lithography Proceedings of Spie. 9053: 905308. DOI: 10.1117/12.2048626 |
0.676 |
|
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