☰

David Charles Tully - Publications

Affiliations: 
2001 University of California, Berkeley, Berkeley, CA, United States 
Tree Info Similar researchers PubMed Report error

13 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2003 Tully DC, Roberts MJ, Geierstanger BH, Grubbs RB. Synthesis of reactive poly(vinyl oxazolones) via nitroxide-mediated "living" free radical polymerization Macromolecules. 36: 4302-4308. DOI: 10.1021/Ma025817M  0.555
2000 Tully DC, Trimble AR, Fréchet JMJ. Dendrimers with thermally labile end groups: An alternative approach to chemically amplified resist materials designed for sub-100 nm lithography Advanced Materials. 12: 1118-1122. DOI: 10.1002/1521-4095(200008)12:15<1118::Aid-Adma1118>3.0.Co;2-I  0.757
2000 Tully DC, Trimble AR, Fréchet JMJ. Dendrimer-based chemically amplified resist materials American Chemical Society, Polymer Preprints, Division of Polymer Chemistry. 41: 142-143.  0.78
2000 Trimble AR, Tully DC, Fréchet JMJ, Medeiros DR, Angelopoulos M. Patterning of hyperbranched resist materials by electron-beam lithography American Chemical Society, Polymer Preprints, Division of Polymer Chemistry. 41: 325-326.  0.764
2000 Trimble AR, Tully DC, Frechet JMJ, Medeiros DR, Angelopoulos M. Patterning of hyperbranched resist materials by e-beam Proceedings of Spie - the International Society For Optical Engineering. 3999: II/-.  0.762
2000 Tully DC, Trimble AR, Frechet JMJ. Dendrimer-based chemically amplified resists for sub-100 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 3999: II/-.  0.774
1999 Pasini D, Niu QJ, Meagley RP, Tully DC, Trimble AR, Predict JMJ. Novel organic resists for nanoscale imaging: From chemically amplified cycloaliphatic resists to dendrimer monolayers Journal of Photopolymer Science and Technology. 12: 405-416. DOI: 10.2494/Photopolymer.12.405  0.771
1999 Pasini D, Niu Q, Meagley R, Tully D, Trimble A, Fréchet J. Novel Organic Resists for Nanoscale Imaging. From Chemically Amplified Cycloaliphatic Resists to Dendrimer Monolayer. Journal of Photopolymer Science and Technology. 12: 405-416. DOI: 10.2494/photopolymer.12.405  0.655
1999 Tully DC, Trimble AR, Fréchet JMJ, Wilder K, Quate CF. Synthesis and preparation of ionically bound dendrimer monolayers and application toward scanning probe lithography Chemistry of Materials. 11: 2892-2898. DOI: 10.1021/Cm990255F  0.762
1999 Tully DC, Wilder K, Fréchet JMJ, Trimble AR, Quate CF. Dendrimer-based self-assembled monolayers as resists for scanning probe lithography Advanced Materials. 11: 314-318. DOI: 10.1002/(Sici)1521-4095(199903)11:4<314::Aid-Adma314>3.0.Co;2-E  0.771
1999 Tully DC, Wilder K, Fréchet JMJ, Trimble AR, Quate CF. Dendrimer-Based Self-Assembled Monolayers as Resists for Scanning Probe Lithography Advanced Materials. 11: 314-318. DOI: 10.1002/(SICI)1521-4095(199903)11:4<314::AID-ADMA314>3.0.CO;2-E  0.471
1999 Tully DC, Trimble AR, Frechet MJ, Wilder K, Quate CF. Nanoscale patterning of self-assembled dendrimer monolayers using scanning probe lithography American Chemical Society, Polymer Preprints, Division of Polymer Chemistry. 40: 402-403.  0.739
1999 Tully DC, Trimble AR, Frechet JMJ, Wilder K, Quate CF. Toward individually addressable nanometer size surface pixels: Ultrathin dendrimer films as resists for scanning probe lithography Proceedings of Spie - the International Society For Optical Engineering. 3678: 544-549.  0.751
Show low-probability matches.