Henry I. Smith - US grants

Interconnects are playing an increasingly important role in limiting the speed of high performance integrated circuit chips and systems. This motivation has fostered research to use optical rather than electrical interconnects. The research in progress addresses the fabrication problems posed by efforts to use the standard silicon wafer with a gallium arsenide (GaAs) light emitter incorporated. The approach is experimental and investigates use of indium to aid in matching lattices of different materials.

This extremely innovative research proposes to develop an integrated system for X-ray lithography for features less than 100nm in width. This is a factor of 10 smaller than currently obtainable on a reproducible basis. This system concept involves both the development of an appropriate mask technology using electron beam exposure, and ultra-precise techniques to expose photo resist on substrates using these masks in a proximity mode with an X-ray photon source. Nothing like this on this size scale has been done before, and the availability of this kind of technology would constitute a significant breakthrough with certain implications for the study of physics, biological scale structures, and new electronic device concepts.

This proposal is for support of student travel to the 35th International Symposium on Electron, Ion and Photon Beams, in Seattle, Washington, May 28-31, 1991. The symposium will cover the latest research results in the fields of nanofabrication, microfabrication, electron and ion lithographies, x- ray lithography, particle beam optics, and forefront applications of nanofabrication. At this conference the latest research from groups around the world are usually reported first. The proceedings of the conference will be published in the Journal of Vacuum Science and Technology.

Under an NSF Grant we have developed some of the essential elements of an x-ray lithography technology for replicating sum- 100nm features (so called x-ray nanolithography), including: durable mask membranes; means of patterning with e-beam and focused-ion beam systems; gap control via studs and piezoelectric drives; and a first- stage alignment system. In addition, we demonstrated that Auger and photoelectrons are not a limiting factor in nanolithography. As a result of this work, x-ray nanolithography has been used in the fabrication of a number of novel quantum-effect devices and structures, and is now considered a key enabling technology for future nanoelectronics. Renewal of this grant will enable to further perfect the alignment system, making it capable of sub-100nm alignment; improve the methods of making nanolithography masks, including better e- beam techniques and diamond membranes; study in detail the problem of diffraction from x-ray absorber patterns, including the effect of phase shifts; study the feasibility of non- damaging contact. The result of this research should be a reliable means of replicating complex, large-area patterns having features approaching 10nm.

This grant is for support of the 36th International Symposium on Electron, Ion and Photon Beams, Orlando, FL, May 26-29, 1992. This long-standing annual symposium is considered the premier conference for the fields of nano- and micro- fabrication, x-ray, electron and ion lithoqraphies and particle beam optics. This request and previous years support by NSF has been intended to enable graduate students who are working in these fields to attend the meeting and present their work. Because this is an important enabling technology for the microelectronics and other high-tech industries, and the requested use of NSF funds for graduate student support will be very effective in enhancing the base of trained researchers in these fields.

9407078 Smith We propose to develop a capability for placing lithographic features at assigned position to better than 1nm, using both scanning-electron-beam lithography (SEBL) and focused-ion-beam lithography (FIBL). This will be achieved by means of spatial-phase-locking, a technique recently invented at MIT. Based on our recent research, in which sub-1 nm repeatability of spatial-phase-locking was demonstrated, we firmly believe we can develop a convenient, generally applicable, and readily transferrable technology for sub-1 nm feature placement precision within the 3 years proposed. We also believe that the proposed research will lead to a significant reduction in the cost of e-beam and ion-beam lithography systems because the positioning precision will rely upon continuous feedback and computer control rather than expensive, secondary-referencing electromechanical systems. Such a cost reduction could, in turn, make nanotechnology more widely available to the research community, and thereby expand the impact of this technology. ***

9406876 Smith In the fields of nanofabrication, microfabrication, electron and ion lithographies, x-ray lithography, particle beam optics, and forefront applications of nanofabrication, the International Symposium on Electron, Ion and Photon Beams is the premier conference. At this conference the latest research results from groups around the world are usually reported first. the proceedings of the Symposium are published in the Nov/Dec issue of the Journal of Vacuum Science and Technology (an American Institute of Physics archival journal) provided they pass peer review. The NSF support of the conference will be used to enable graduate student participation in this event. ***

9508418 Smith This award provides support which will enable graduate student participation in the 39th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication. ***

9712488 Smith Support is provided in the amount $5,000, to enable graduate students to attend The 41st International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 1997, to be held in Dana Point, California, May 27- May 30, 1997. The Conference is sponsored by The American Vacuum Society in cooperation with The Electron Device Society of the IEEE, and The Optical Society of America. ***

9871539 Ross This grant is an interdisciplinary collaboration on the synthesis and magnetic characterization of two-dimensional arrays of 50 nm and smaller magnetic particles, known as `nanomagnets.' In this size regime, particles of ferromagnetic metals such as cobalt or nickel exhibit single- domain behavior, and mechanisms for magnetization reversal are observed that do not occur in larger particles. These periodic nanomagnet arrays are used in fundamental studies of magnetic interactions and switching. They are also examined as functional nanostructures for data storage, in which the magnetization state of each particle represents a single data bit. The goals of the research are: i) to establish a synthesis method for periodic nanoparticle arrays with particle sizes in the 10 - 50 nm range, covering areas of several square centimeters; ii) to investigate magnetic interactions, switching and anisotropy as a function of the particle microstructure, anisotropy, and geometry of the array; and iii) to design and test particle arrays for data storage applications in which each particle stores a binary bit. Using interferometric lithography, structures of 100 - 200 nm period have been made with areas of over 80 sq. cm and the aim is to extend the period down to 50 nm. To extend the scope of the investigation soft x- ray nanolithography will be employed to make large-area non- periodic structures, such as patterns with circular geometry. Fabrication of large-area arrays allows characterization by vibrating sample magnetometry (VSM) and torque magnetometry (TM), as well as by magnetic-force microscopy (MFM). Samples with a range of geometries are used to investigate inter-particle interactions using VSM techniques, and time-or temperature-dependent magnetic behavior. The results are related to a micromagnetic model for switching in arrays of nanomagnets. To integrate these nanomagnet arrays into a data storage system, reading and writing schemes will b e investigated. This award is a selection under the NSF 98-20 initiative on Functional Nanocrystalline Materials. %%% The work uses interferometric lithography to fabricate large- area nanomagnet arrays. After exposure of a photoresist using interferometric lithography to form a template, magnets of up to 500 nm in height are made by electrodeposition. This method is ideally suited to making large-area periodic nanostructures quickly and economically. In comparison, other methods for making particles on this size scale are limited to very small areas or to high cost. This fabrication method gives wide latitude to the range of structures and geometries that can be created: square, oblique or hexagonal arrays of cylindrical, disk shape, or elliptical particles, with a range of interparticle spacings with controllable saturation magnetization and controllable direction and magnitude of the magnetic anisotropy. ***

Abstract
CTS-0202150
Henry I. Smith, MIT

Partial travel support for the speakers at the U.S. - Germany Joint Meeting on Nanoscale Science and Engineering to be held at Massachusetts Institute of Technology on December 5 and 6, 2001. The objectives are to evaluate new trends in research and education and exchange information among leading research centers in both countries, to promote the exchange of researchers and establishment of joint projects, to introduce younger investigators to nanotechnology, and create opportunities for long-term collaboration. The main list of topics includes self-organization, molecular electronics, nanotubes and applications, nanoparticles, nanomechanics, catalysts, polymers and pharmaceutics. Representatives of the Nanoscale Science and Engineering Centers (NSEC) from U.S. and Centers of Excellence in Nanotechnology from Germany, as well as leading experts and young reserachers from both countries will participate. The meeting is co-organized by MIT (U.S.) and the University of Munster (Germany). About 60 participants, half from U. S. and half from Germany will have the opportunity to participate in presentations and discussions during the two-day meeting. A website will be created to post the program and contributed papers. Visits at the MIT and Harvard nanotechnology laboratories will be organized.

The 46th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication 2002, sponsored by the American Vacuum Society in cooperation with the Electron Device Society of IEEE and the Optical Society of America, to be held in Anaheim, CA on May 28-31, 2002 will provide a forum for scientific and technical exchange to advance the practice and progress of nano/microfabrication, electron and ion lithographies, particle beam optics, and forefront applications of nanofabrication.

The conference will enable students to present their research to a high-level international scientific community. Students will observe how scientists and engineers exchange ideas and information at conferences, and they will hear first hand presentations of up-to-date research results in nanotechnology. Students will make personal contacts and learn of employment opportunities. In a special student breakfast, the conference organizers will describe to the attendees how the conference program is put together.

This project will develop a class of methods known as 'templated self-assembly' that control the growth and self-assembly of nanostructures on surfaces. This will enable formation of monodisperse nanoscale features in precise positions on a substrate. This work will be an enabling technology in the design of new devices that utilize the properties of quantum dots and other nanoscale objects, in which the control of the sizes and spatial positions of the features is paramount in optimizing performance. The objective is to use lithography to modulate substrate surfaces with features of periodicity of order 100 nm, to form templates for the growth and self-assembly of nanostructures. In this process, lithography is not used to form the nanostructures themselves, but instead is used to form a template that will 'seed' the formation of nanostructures in particular locations. The nanostructures will be considerably smaller in size than the period of the template. The goal of the project is to develop the templated self-assembly of arrays of nanoscale semiconductor and metal islands controlled by epitaxial strain, surface chemistry or topography. The island formation will be achieved using both the deposition from the vapor phase and by the spontaneous agglomeration of metastable coninuous sold films. This work will be carried out by an interdisciplinary team of researchers from MIT in collaboration with IBM and Sandia National Laboratories working with a group of students and a postdoctoral researcher. The outreach involves a communication effort designed to inform the general public about nanotechnology through development of a web site and other scientific communication avenues, including the involvement of undergraduate students as well as other activities such as school visits.
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The research will be focussed on the templated self-assembly of arrays of nanoscale semiconductor and metal islands controlled by epitaxial strain, surface chemistry or topography. The resulting well-ordered nanoscale island arrays will have technological relevance in devices that include optically active structures involving plasmon wires, and patterned magnetic recording media. A range of other applications will also benefit from the methods developed in this proposal; for instance optical devices based on arrays of semiconductor quantum dots. The educational goals of this work are to contribute to the public understanding of nanotechnology and to the training of skilled researchers.
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This funded activity enables graduate students to attend and present their research at the 47th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2003, to be held in Tampa, Florida, from May 27th-May 30st, 2003. In the fields of nanofabrication, microfabrication, electron and ion lithographies, x-ray lithography, particle-beam optics, and forefront applications of nanofabrication, this conference is preeminent. The requested travel aid will enable students to present their research to a high-level international scientific community. They will observe how scientists and engineers exchange ideas and information at conferences, and they will hear first hand presentations of up-to-date research results in nanotechnology. They will make personal contacts and learn of employment opportunities. In a special student breakfast, conference organizers will describe to the attendees how a conference program is put together.

This funded activity enables graduate students to attend and present their research at the 48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2004, to be held in San Diego, California, from June 1st - June 4th, 2004. In the fields of nanofabrication, microfabrication, electron and ion lithographies, x-ray lithography, particle-beam optics, and forefront applications of nanofabrication, this conference is preeminent. The requested travel aid will enable students to present their research to a high-level international scientific community. They will observe how scientists and engineers exchange ideas and information at conferences, and they will hear first hand presentations of up-to-date research results in nanotechnology. They will make personal contacts and learn of employment opportunities. In a special student breakfast, conference organizers will describe to the attendees how a conference program is put together.

Proposal Title: Visit Nanoscale Competence Centers in Germany by Young US Scientists and Engineers
Proposal Number: CTS-0517916
Principal Investigator: Henry I. Smith
Institution: Massachusetts Institute of Technology


This research will focus on using atomically-detailed simulations of diffusion in
zeolites in close connection with experimental studies to advance the understanding of macroscopic diffusion in nanoporous materials. Three closely linked topics will be examined: single-component diffusion of n-alkanes in silicalite, mixture diffusion of n-alkanes in silicalite, and effects of pore size and shape on mixture diffusion. Extensive atomistic simulations will be combined with membrane permeation experiments and neutron scattering experiments to self-consistently describe self and transport diffusion of n-alkanes in silicalite. Atomistic simulations will be combined with membrane permeation and neutron scattering experiments to assess the diffusion of multiple binary mixtures in silicalite. An extensive set of atomistic simulations will be performed to examine binary diffusion in a set of silica zeolites chosen to systematically vary pore size and connectivities. Similar simulations will be performed for carbon nanotubes, which are known to have very smooth pore walls, to probe the influence of pore wall corrugation. These simulations will greatly expand the variety of binary adsorbed mixtures for which data are available and provide stringent tests for the predictive models of mixture diffusion. In terms of the broader impacts, the proposed research will engage graduate students in an environment where they will develop strong communication skills and where close collaboration between theoretical and experimental participants is required. This work may lead to industrial applications in zeolite-based membrane separations.

This award provides support to graduate students to attend the 49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2005, to be held in Orlando, Florida, May 31 to June 3, 2005. In the fields of nanofabrication, microfabrication, electron and ion lithographies, x-ray and imprint lithographies, particle-beam optics, and forefront applications of nanofabrication, this conference is preeminent.

The requested travel aid will enable students to present their research to a high-level international scientific community. They will observe how scientists and engineers exchange ideas and information at conferences, and they'll hear first-hand presentations of up-to-date research results in nanotechnology. They will make personal contacts and learn of employment opportunities. In a special student breakfast, conference organizers will describe to the students how the conference program is put together.

This grant is to enable graduate students to attend the 50th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2006, to be held in Baltimore, MD, May 30 to June 2, 2006. In the fields of nanofabrication, microfabrication, electron and ion lithographies, x-ray and imprint lithographies, particle-beam optics, and forefront applications of nanofabrication, this conference is preeminent.

Requested travel aid will enable students to present their research to a high level international scientific community. Students will observe how scientists and engineers exchange ideas and information at conferences, and they will hear first-hand presentations of up-to-date research results in nanotechnology. They will make personal contacts and learn of employment opportunities. In a special student breakfast, conference organizers will describe to the students how the conference program is put together.

This grant supports the attendance of graduate students to the 51st International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2007, to be held in Denver, Colorado, May 29 to June 1, 2007. In the fields of nanofabrication, electron and ion lithographies, photon and imprint lithographies, particle-beam optics, and forefront applications of nanofabrication, this conference is preeminent.
The intellectual merit of the proposal includes the sharing of research findings and the broader impacts are in the impact on the students involved in the conference. The students will present their research, which will allow them to practice their presentation and communication skills. The students will also be involved in a presentation by the conference organizers that will let them learn more about how to organize a conference. They will learn about putting the conference program together and the organization of the conference venue and other logistics. This research will have a good impact on the students involved and will help them prepare for future leadership opportunities in professional societies.

This is to request support in the amount $5000 to enable students to attend the 52nd International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2008, to be held in Portland, Oregon, May 27 to May 30, 2008. In the fields of nanofabrication, electron and ion-beam lithographies, photon and imprint lithographies, particle-beam optics, and forefront applications of nanofabrication, this conference is preeminent. The requested travel aid will enable students to present their research to a high level international scientific community. They will observe how scientists and engineers exchange innovative ideas and other information at conferences, and they?ll hear first-hand presentations of up-to-date research results in nanotechnology.

Learning how a technical conference serves as a venue for conveying information to other is an important element of a student?s education.
Also important is leaning how to present, in a cogent and understandable way, the results of one?s research. The requested support will help to accomplish these ends. At the conference students will make important personal contacts and learn of employment opportunities. In a special student breakfast, to be held on Friday, the conference organizers will describe to the students how the conference program is put together and how papers are selected for oral or poster presentation.

This is to request support in the amount $10,000 to enable students to attend the 53rd International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2009, to be held in Marco Island Beach, May 26 to May 29, 2009. In the fields of nanofabrication, electron and ion-beam lithographies, photon and imprint lithographies, particle-beam optics, and forefront applications of nanofabrication, this conference is preeminent. The requested travel aid will enable students to present their research to a high level international scientific community. They will observe how scientists and engineers exchange innovative ideas and other information at conferences, and they will hear first-hand presentations of up-to-date research results in nanotechnology.

Learning how a technical conference serves as a venue for conveying information to other is an important element of a students education.
Also important is leaning how to present, in a cogent and understandable way, the results of ones research. The requested support will help to accomplish these ends. At the conference students will make important personal contacts and learn of employment opportunities. In a special student breakfast, to be held on Friday, the conference organizers will describe to the students how the conference program is put together and how papers are selected for oral or poster presentation.

This award provides funding to support 20 graduate students to attend the 54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabricaton 2010 to be held in Anchorage, Alaska, June 1-4, 2010. The conference is organized by the American Vacuum Society, the Electron Devices Society of the IEEE, and the Optical Society of America.

The opportunity provided by this funding will blend research and educational activities for the graduate students who attend. By participating in the conference, the graduate students will be exposed to state-of-the-art research topics and will interact with global academic and industrial leaders.

Support for student travel to 55th International Conference on Electron Ion
and Photon Beam Technology and Nanofabrication, Proposal 1137067

This project, funded at $10,000, will help support the travel of 20 graduate students, from
universities around the USA, to attend the 55 th International Conference on Electron, Ion
and Photon Beam Technology and Nanofabrication, 2011, to be held at the J. W. Marriott
Resort, Las Vegas, Nevada, May 31 to June 3, 2011. In the fields of nanofabrication,
electron and ion-beam lithographies, photon and imprint lithographies, particle-beam
optics, and forefront applications of nanofabrication, this conference is preeminent. The
requested travel aid will enable students to present their research to a high level
international scientific community. They will observe how scientists and engineers
exchange innovative ideas and other information at conferences, and they?ll hear firsthand
presentations of up-to-date research results in nanotechnology.

Learning how a technical conference serves as a venue for conveying information to
other is an important element of a student?s education. Also important is leaning how to
present, in a cogent and understandable way, the results of one?s research. The requested
support will help to accomplish these ends. At the conference, students will make
important personal contacts and learn of employment opportunities. At a special breakfast
for the funded students, the conference organizers will discuss optimal techniques for
presenting scientific information and how the conference program is put together.

This award, in the amount $10,000, is to enable students to attend The 56th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2012, to be held at the Hilton Waikoloa Village, Waikoloa, Hawaii, May 29 to June 1, 2012. In the fields of nanofabrication, electron and ion-beam lithographies, photon and imprint lithographies, particle-beam optics, and forefront applications of nanofabrication, this conference is preeminent. The requested travel aid will enable students to present their research to a high level international scientific community. They will observe how scientists and engineers exchange innovative ideas and other information at conferences, and they?ll hear first-hand presentations of up-todate research results in nanotechnology.

Learning how a technical conference serves as a venue for conveying information to other is an important element of a student?s education. Also important is leaning how to present, in a cogent and understandable way, the results of one?s research. The requested
support will help to accomplish these ends. At the conference, students will make important personal contacts and learn of employment opportunities. At a special student breakfast, the conference organizers will describe to the students optimal techniques for presenting scientific information and how the conference program is put together.

ECCS-1321752
Hank Smith, MIT
Support of student travel to the EIPBN conference


This award will provide travel support to enable students to attend The 57th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2013, to be held at the Gaylord Opryland Resort, Nashville, Tennessee, May 28 to May 31, 2013.

Intellectual Merit: This is a major conference in the fields of nanofabrication, electron and ion-beam lithographies, photon and imprint lithographies, particle-beam optics, and forefront applications of nanofabrication. This travel aid will enable students to present their research to a high-level international scientific community. They will observe how scientists and engineers exchange innovative ideas and other information, and they will hear first-hand presentations of up-to-date research results in nanoscale science and technology.

Broader Impacts: Learning how a technical conference serves as a venue for conveying information to others is an important element of a graduate student?s education. Also important is leaning how to present, in a cogent and understandable way, the results of one?s research. The requested support will help to accomplish these ends. At the conference, students will make important personal contacts and learn of employment opportunities. At a special student breakfast, the conference organizers will describe to the students optimal techniques for presenting scientific information and how the conference program is put together. The provision of support will greatly ease the burden on students in finding funds needed to attend a conference, especially early in their academic careers, when this lesson can be most formative.