Llewellyn Rabenberg

Affiliations: 
University of Texas at Austin, Austin, Texas, U.S.A. 
Area:
Materials Science Engineering, Electronics and Electrical Engineering
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"Llewellyn Rabenberg"

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Rand D. Cottle grad student 2000 UT Austin
Kil-Soo Ko grad student 2003 UT Austin
Jayhoon Chung grad student 2006 UT Austin
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Publications

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Rabenberg L. (2011) Aberration-Corrected Imaging in Transmission Electron Microscopy: An IntroductionAberration-Corrected Imaging in Transmission Electron Microscopy: An Introduction, Rolf ErniImperial College Press, London, 2010. $88.00 (354 pp.). ISBN 978-1-84816-536-6 Physics Today. 64: 55-56
Chung J, Lian G, Rabenberg L. (2010) Local Lattice Strain Measurement using Geometric Phase Analysis of Annular Dark Field Images from Scanning Transmission Electron Microscopy Microscopy and Microanalysis. 16: 1476-1477
Chung J, Rabenberg L. (2008) Effects of strain gradients on strain measurements using geometrical phase analysis in the transmission electron microscope. Ultramicroscopy. 108: 1595-602
Chung J, Lian G, Rabenberg L. (2008) Local strain measurement in a strain-engineered complementary metal-oxide-semiconductor device by geometrical phase analysis in the transmission electron microscope Applied Physics Letters. 93: 081909
Chung J, Rabenberg L. (2007) Measurement of incomplete strain relaxation in a silicon heteroepitaxial film by geometrical phase analysis in the transmission electron microscope Applied Physics Letters. 91: 231902
Chung J, Rabenberg L. (2006) Two-dimensional imaging of the potential distribution within a core/shell nanowire by electron holography Journal of Materials Research. 21: 1215-1220
Chung J, Rabenberg L. (2006) Mapping of electrostatic potentials within core-shell nanowires by electron holography Applied Physics Letters. 88: 013106
Chung J, Zhou J, Rabenberg L. (2005) Mean Inner Potentials in Oxidized Germanium Nanowires by Electron Holography Microscopy and Microanalysis. 11: 588-589
Chen X, Banerjee S, Zhou J, et al. (2003) TEM Study Of Silicide Formation And Microstructural Development Of Ni/ Si1-xGex Microscopy and Microanalysis. 9: 508-509
Qian R, Kinosky D, Hsu T, et al. (1992) Growth of GexSi1−x/Si heteroepitaxial films by remote plasma chemical vapor deposition Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 10: 1920-1926
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