| Year |
Citation |
Score |
| 2014 |
Satyanarayana VS, Kessler F, Singh V, Scheffer FR, Weibel DE, Ghosh S, Gonsalves KE. Radiation-sensitive novel polymeric resist materials: iterative synthesis and their EUV fragmentation studies. Acs Applied Materials & Interfaces. 6: 4223-32. PMID 24576018 DOI: 10.1021/Am405905P |
0.324 |
|
| 2014 |
Satyanarayana VSV, Singh V, Kalyani V, Pradeep CP, Sharma S, Ghosh S, Gonsalves KE. A hybrid polymeric material bearing a ferrocene-based pendant organometallic functionality: Synthesis and applications in nanopatterning using EUV lithography Rsc Advances. 4: 59817-59820. DOI: 10.1039/C4Ra10648B |
0.335 |
|
| 2009 |
Gonsalves KE, Wang M, Lee CT, Yueh W, Tapia-Tapia M, Batina N, Henderson CL. Novel chemically amplified resists incorporating anionic photoacid generator functional groups for sub-50-nm half-pitch lithography Journal of Materials Chemistry. 19: 2797-2802. DOI: 10.1039/B818612J |
0.322 |
|
| 2008 |
Wang M, Lee CT, Henderson CL, Gonsalves KE. Fullerene grafted photoacid generator(PAG) bound polymer resists Journal of Photopolymer Science and Technology. 21: 747-751. DOI: 10.2494/Photopolymer.21.747 |
0.329 |
|
| 2008 |
Gonsalves KE, Wang M, Pujari NS. High refractive-index resists composed of anionic photoacid generator (PAG) bound polymers for 193 nm immersion lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.770458 |
0.308 |
|
| 2008 |
Wang M, Lee CT, Henderson CL, Yueh W, Roberts JM, Gonsalves KE. Synthesis and properties of new anionic photoacid generators bound polymer resists for e-beam and EUV lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.769004 |
0.315 |
|
| 2008 |
Wang M, Lee CT, Henderson CL, Yueh W, Roberts JM, Gonsalves KE. Incorporation of ionic photoacid generator (PAG) and base quencher into the resist polymer main chain for sub-50 nm resolution patterning Journal of Materials Chemistry. 18: 2704-2708. DOI: 10.1039/B801517A |
0.317 |
|
| 2008 |
Lee CT, Henderson CL, Wang M, Gonsalves KE, Yueh W, Roberts JM. The effect of direct PAG incorporation into the polymer main chain on reactive ion etch resistance of 193 nm and EUV chemically amplified resists Microelectronic Engineering. 85: 963-965. DOI: 10.1016/J.Mee.2008.01.009 |
0.318 |
|
| 2008 |
Wang M, Yueh W, Gonsalves KE. Fluorine-contained photoacid generators (PAGs) and corresponding polymer resists Journal of Fluorine Chemistry. 129: 607-612. DOI: 10.1016/j.jfluchem.2008.04.014 |
0.315 |
|
| 2007 |
Wang M, Tang M, Her TH, Yueh W, Gonsalves KE. Synthesis, characterization and lithography performance of novel anionic photoacid generator (PAG) bound polymers Journal of Photopolymer Science and Technology. 20: 793-797. DOI: 10.2494/Photopolymer.20.793 |
0.345 |
|
| 2007 |
Wang M, Yueh W, Gonsalves KE. Novel ionic photoacid generators (PAGs) and corresponding PAG bound polymers Journal of Photopolymer Science and Technology. 20: 751-755. DOI: 10.2494/photopolymer.20.751 |
0.345 |
|
| 2007 |
Wang M, Lee CT, Henderson CL, Yueh W, Roberts JM, Gonsalves KE. Novel anionic photoacid generator (PAGs) and photoresist for sub-50 nm patterning by EUVL and EBL Proceedings of Spie - the International Society For Optical Engineering. 6519. DOI: 10.1557/Proc-0961-O11-04 |
0.342 |
|
| 2007 |
Lee CT, Wang M, Jarnagin ND, Gonsalves KE, Roberts JM, Yueh W, Henderson CL. Photosensitivity and line-edge roughness of novel polymer-bound PAG photoresists Proceedings of Spie - the International Society For Optical Engineering. 6519. DOI: 10.1117/12.713369 |
0.314 |
|
| 2007 |
Wang M, Gonsalves KE, Rabinovich M, Yueh W, Roberts JM. Novel anionic photoacid generators (PAGs) and corresponding PAG bound polymers for sub-50 nm EUV lithography Journal of Materials Chemistry. 17: 1699-1706. DOI: 10.1039/b617133h |
0.309 |
|
| 2007 |
Wang M, Yueh W, Gonsalves KE. New anionic photoacid generator bound polymer resists for EUV lithography Macromolecules. 40: 8220-8224. DOI: 10.1021/ma0715066 |
0.308 |
|
| 2006 |
Lee CT, Jamagin ND, Wang M, Gonsalves KE, Roberts JM, Yueh W, Henderson CL. Fundamental studies of the properties of photoresists based on resins containing polymer-bound photoacid generators Proceedings of Spie - the International Society For Optical Engineering. 6153. DOI: 10.1117/12.663410 |
0.327 |
|
| 2003 |
Delmar-Greenberg D, Azam Ali M, Gonsalves KE. Non cell adhesive photopolymerized cross-linked layers (I): synthesis and characterization. Journal of Materials Science. Materials in Medicine. 14: 833-41. PMID 15348519 DOI: 10.1023/A:1025670323657 |
0.303 |
|
| 2002 |
Hyun J, Ma H, Banerjee P, Cole J, Gonsalves K, Chilkoti A. Micropatterns of a cell-adhesive peptide on an amphiphilic comb polymer film Langmuir. 18: 2975-2979. DOI: 10.1021/La015712X |
0.315 |
|
| 1999 |
Wang J, Gonsalves KE. A combinatorial approach for the synthesis and characterization of polymer/vanadium oxide nanocomposites Journal of Combinatorial Chemistry. 1: 216-222. |
0.342 |
|
| 1998 |
Jin S, Gonsalves KE. Synthesis and characterization of functionalized poly(∈-caprolactone) copolymers by free-radical polymerization Macromolecules. 31: 1010-1015. |
0.325 |
|
| 1997 |
Gonsalves KE, Chen X, Baraton MI. Mechanistic investigation of the preparation of polymer/ceramic nanocomposites Nanostructured Materials. 9: 181-184. |
0.368 |
|
| 1993 |
Chen X, Gonsalves KE, Cameron JA. Further studies on biodegradation of aliphatic poly(ester-amides) Journal of Applied Polymer Science. 50: 1999-2006. DOI: 10.1002/app.1993.070501118 |
0.335 |
|
| 1992 |
Gonsalves KE, Mungara P, Chen X, Cameron JA. Synthesis of biodegradable polymers containing amide linkages Polymeric Materials Science and Engineering, Proceedings of the Acs Division of Polymeric Materials Science and Engineering. 67: 177-178. |
0.366 |
|
| 1991 |
Gonsalves KE, Rausch MD. Low-temperature deposition of Ti(C, O) on polyimides via organometallic precursors Journal of Inorganic and Organometallic Polymers. 1: 131-134. DOI: 10.1007/Bf00701034 |
0.36 |
|
| 1990 |
Gonsalves KE, Shankar V. Synthesis of poly(diethyl 2-acetamido-2-vinylbenzyl-malonate). Potential precursor for poly(vinylphenylalanine) American Chemical Society, Polymer Preprints, Division of Polymer Chemistry. 31: 470-471. |
0.31 |
|
| 1987 |
Gonsalves KE, Lenz RW, Rausch MD. Interfacial polycondensation reactions of the new monomer 1,1?-bis(? -aminoethyl)ferrocene Applied Organometallic Chemistry. 1: 81-93. DOI: 10.1002/Aoc.590010111 |
0.558 |
|
| 1987 |
Gonsalves KE, Rausch MD. CATIONIC & CONDENSATION POLYMERIZATION OF ORGANOMETALLIC POLYMERS Polymeric Materials Science and Engineering, Proceedings of the Acs Division of Polymeric Material. 56: 864. |
0.517 |
|
| 1986 |
Gonsalves KE, Rausch MD. Segmented poly(ether urethane) films containing ferrocene units in the hard segments Journal of Polymer Science Part a: Polymer Chemistry. 24: 1599-1607. DOI: 10.1002/Pola.1986.080240717 |
0.548 |
|
| 1986 |
Gonsalves K, Rausch MD. Anionic polymerization of ethylene oxide by organolithium·TMEDA reagents Journal of Polymer Science Part a: Polymer Chemistry. 24: 1419-1421. DOI: 10.1002/Pola.1986.080240623 |
0.474 |
|
| 1986 |
Zhan-Ru L, Gonsalves K, Lenz RW, Rausch MD. Step-growth cationic polymerization of α-hydroxyisopropylferrocene Journal of Polymer Science Part a: Polymer Chemistry. 24: 347-357. DOI: 10.1002/Pola.1986.080240212 |
0.517 |
|
| 1985 |
Gonsalves K, Zhan-Ru L, Lenz RW, Rausch MD. The cationic polymerization and copolymerization of isopropenylmetallocene monomers Journal of Polymer Science: Polymer Chemistry Edition. 23: 1707-1722. DOI: 10.1002/Pol.1985.170230612 |
0.548 |
|
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