Year |
Citation |
Score |
2016 |
Choi SS, Park MJ, Yamaguchi T, Han CH, Oh SJ, In Kim S, Yoo JH, Park KJ, Kim YS, Park NK. Nanopore formation on Au coated pyramid under electron beam irradiations (plasmonic nanopore on pyramid) Sensing and Bio-Sensing Research. 7: 153-161. DOI: 10.1016/j.sbsr.2016.01.009 |
0.46 |
|
2016 |
Han SW, Kim DH, Jeong MG, Park KJ, Kim YD. CO oxidation catalyzed by NiO supported on mesoporous Al2O3 at room temperature Chemical Engineering Journal. 283: 992-998. DOI: 10.1016/J.Cej.2015.08.021 |
0.415 |
|
2012 |
Park KJ, Parsons GN. Atomic layer deposition of Ru onto organic monolayers: Shifting metal effective work function using monolayer structure Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 30. DOI: 10.1116/1.3671938 |
0.651 |
|
2008 |
Peng Q, Spagnola JC, Daisuke H, Park KJ, Parsons GN. Conformal metal oxide coatings on nanotubes by direct low temperature metal-organic pyrolysis in supercritical carbon dioxide Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 26: 978-982. DOI: 10.1116/1.2917072 |
0.688 |
|
2008 |
Peng Q, Hojo D, Park KJ, Parsons GN. Low temperature metal oxide film deposition and reaction kinetics in supercritical carbon dioxide Thin Solid Films. 516: 4997-5003. DOI: 10.1016/J.Tsf.2007.10.057 |
0.712 |
|
2007 |
Hyde GK, Park KJ, Stewart SM, Hinestroza JP, Parsons GN. Atomic layer deposition of conformal inorganic nanoscale coatings on three-dimensional natural fiber systems: Effect of surface topology on film growth characteristics Langmuir. 23: 9844-9849. PMID 17691748 DOI: 10.1021/La701449T |
0.693 |
|
2007 |
Park KJ, Terry DB, Stewart SM, Parsons GN. In situ auger electron spectroscopy study of atomic layer deposition: growth initiation and interface formation reactions during ruthenium ALD on Si-H, SiO2, and HfO2 surfaces. Langmuir : the Acs Journal of Surfaces and Colloids. 23: 6106-12. PMID 17461600 DOI: 10.1021/La061898U |
0.718 |
|
2007 |
Park KJ, Terry DB, Stewart SM, Parsons GN. In situ auger electron spectroscopy study of atomic layer deposition: Growth initiation and interface formation reactions during ruthenium ALD on Si-H, SiO2, and HfO2 surfaces Langmuir. 23: 6106-6112. DOI: 10.1021/la061898u |
0.694 |
|
2006 |
Park KJ, Parsons GN. Selective area atomic layer deposition of rhodium and effective work function characterization in capacitor structures Applied Physics Letters. 89. DOI: 10.1063/1.2234846 |
0.586 |
|
2005 |
Park KJ, Doub JM, Gougousi T, Parsons GN. Microcontact patterning of ruthenium gate electrodes by selective area atomic layer deposition Applied Physics Letters. 86: 1-3. DOI: 10.1063/1.1852079 |
0.726 |
|
2004 |
Park KJ, Parsons GN. Bulk and interface charge in low temperature silicon nitride for thin film transistors on plastic substrates Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 22: 2256-2260. DOI: 10.1116/1.1795822 |
0.552 |
|
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