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Jeongwon Park, Ph.D. - Publications

Affiliations: 
2008 Materials Sci and Engineering University of California, San Diego, La Jolla, CA 
Area:
STM/STS of gate oxides on compound semiconductors and adsorbates on organic semiconductor
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24 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2020 Rautela R, Scarfe S, Guay JM, Lazar P, Pykal M, Azimi S, Grenapin C, Boddison-Chouinard J, Halpin A, Wang W, Andrzejewski L, Plumadore R, Park J, Menard JM, Otyepka M, et al. Mechanistic insight into the limiting factors of graphene-based environmental sensors. Acs Applied Materials & Interfaces. PMID 32658444 DOI: 10.1021/Acsami.0C09051  0.378
2020 Islam MS, Sadman S, Islam ASMJ, Park J. HfO2/TiO2/HfO2 tri-layer high-K gate oxide based MoS2 negative capacitance FET with steep subthreshold swing Aip Advances. 10: 35202. DOI: 10.1063/1.5143939  0.363
2019 Ferdous N, Islam MS, Park J, Hashimoto A. Tunable electronic properties in stanene and two dimensional silicon-carbide heterobilayer: A first principles investigation Aip Advances. 9: 25120. DOI: 10.1063/1.5066029  0.325
2016 Jho W, Park JW, Kim E, Song M, Seo DG, Yang DK, Shin SJ. Comparison of root canal filling quality by mineral trioxide aggregate and gutta percha cones/AH plus sealer. Dental Materials Journal. 35: 644-50. PMID 27477231 DOI: 10.4012/dmj.2015-262  0.474
2016 Kim DJ, Park J, Han JG. Patterning of graphene for flexible electronics with remote atmospheric-pressure plasma using dielectric barrier Japanese Journal of Applied Physics. 55: 85102. DOI: 10.7567/Jjap.55.085102  0.313
2015 Jin SW, Park J, Hong SY, Park H, Jeong YR, Park J, Lee SS, Ha JS. Stretchable Loudspeaker using Liquid Metal Microchannel. Scientific Reports. 5: 11695. PMID 26181209 DOI: 10.1038/Srep11695  0.323
2014 Wilhite P, Vyas AA, Tan J, Yamada T, Wang P, Park J, Yang CY. Metal-nanocarbon contacts Semiconductor Science and Technology. 29. DOI: 10.1088/0268-1242/29/5/054006  0.306
2010 Royer JE, Park J, Colesniuc C, Lee JS, Gredig T, Lee S, Jin S, Schuller IK, Trogler WC, Kummela AC. Mobility saturation in tapered edge bottom contact copper phthalocyanine thin film transistors Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: C5F22-C5F27. DOI: 10.1116/1.3464771  0.715
2009 Yang RD, Park J, Colesniuc CN, Schuller IK, Royer JE, Trogler WC, Kummel AC. Analyte chemisorption and sensing on n- and p-channel copper phthalocyanine thin-film transistors. The Journal of Chemical Physics. 130: 164703. PMID 19405612 DOI: 10.1063/1.3078036  0.718
2009 Bohrer FI, Colesniuc CN, Park J, Ruidiaz ME, Schuller IK, Kummel AC, Trogler WC. Comparative gas sensing in cobalt, nickel, copper, zinc, and metal-free phthalocyanine chemiresistors. Journal of the American Chemical Society. 131: 478-85. PMID 19093852 DOI: 10.1021/Ja803531R  0.554
2009 Park J, Royer JE, Colesniuc CN, Bohrer FI, Sharoni A, Jin S, Schuller IK, Trogler WC, Kummel AC. Ambient induced degradation and chemically activated recovery in copper phthalocyanine thin film transistors Journal of Applied Physics. 106. DOI: 10.1063/1.3159885  0.716
2008 Bohrer FI, Colesniuc CN, Park J, Schuller IK, Kummel AC, Trogler WC. Selective detection of vapor phase hydrogen peroxide with phthalocyanine chemiresistors. Journal of the American Chemical Society. 130: 3712-3. PMID 18321103 DOI: 10.1021/Ja710324F  0.52
2008 Park J, Yang RD, Colesniuc CN, Sharoni A, Jin S, Schuller IK, Trogler WC, Kummel AC. Bilayer processing for an enhanced organic-electrode contact in ultrathin bottom contact organic transistors Applied Physics Letters. 92. DOI: 10.1063/1.2918121  0.585
2007 Bohrer FI, Sharoni A, Colesniuc C, Park J, Schuller IK, Kummel AC, Trogler WC. Gas sensing mechanism in chemiresistive cobalt and metal-free phthalocyanine thin films. Journal of the American Chemical Society. 129: 5640-6. PMID 17411043 DOI: 10.1021/Ja0689379  0.604
2007 Yang RD, Park J, Colesniuc CN, Schuller IK, Trogler WC, Kummel AC. Ultralow drift in organic thin-film transistor chemical sensors by pulsed gating Journal of Applied Physics. 102. DOI: 10.1063/1.2767633  0.556
2007 Yang RD, Gredig T, Colesniuc CN, Park J, Schuller IK, Trogler WC, Kummel AC. Ultrathin organic transistors for chemical sensing Applied Physics Letters. 90. DOI: 10.1063/1.2749092  0.576
2006 Miller KA, Yang RD, Hale MJ, Park J, Fruhberger B, Colesniuc CN, Schuller IK, Kummel AC, Trogler WC. Electrode independent chemoresistive response for cobalt phthalocyanine in the space charge limited conductivity regime. The Journal of Physical Chemistry. B. 110: 361-6. PMID 16471543 DOI: 10.1021/Jp053104A  0.693
2006 Park J, Daraio C, Rao A, Bandaru P. Electrical Transport in Carbon Nanotube Y-junctions- a Paradigm for Novel Functionality at the Nanoscale Mrs Proceedings. 922. DOI: 10.1557/Proc-0922-U11-08  0.307
2006 Park J, Daraio C, Jin S, Bandaru PR, Gaillard J, Rao AM. Three-way electrical gating characteristics of metallic Y-junction carbon nanotubes Applied Physics Letters. 88. DOI: 10.1063/1.2213013  0.322
2006 Yang RD, Fruhberger B, Park J, Kummel AC. Chemical identification using an impedance sensor based on dispersive charge transport Applied Physics Letters. 88. DOI: 10.1063/1.2175491  0.55
2003 Park J, Kim D, Kim Y, Lee K, Lee K, Lee H, Ahn S. Improvement of the biocompatibility and mechanical properties of surgical tools with TiN coating by PACVD Thin Solid Films. 435: 102-107. DOI: 10.1016/S0040-6090(03)00412-7  0.324
1999 Lee S, Kim DJ, Yang S, Park J, Sohn S, Oh K, Kim Y, Kim J, Yeom G, Park J. Thermal stability enhancement of Cu/WN/SiOF/Si multilayers by post-plasma treatment of fluorine-doped silicon dioxide Journal of Applied Physics. 85: 473-477. DOI: 10.1063/1.369410  0.311
1999 Yang S, Park J, Kim J, Lee Y, Cho B, Park D, Lee W, Park J. Effects of Deposition Temperature on Low-Dielectric Fluorinated Amorphous Carbon Films for Ultralarge-Scale Integration Multilevel Interconnects Microchemical Journal. 63: 161-167. DOI: 10.1006/Mchj.1999.1778  0.354
1998 Lee S, Kim DJ, Yang S, Park J, Sohn S, Oh K, Kim Y, Park J. Reliability of Cu/WN thin Films Deposited on Low Dielectric Constant SiOF ILD Mrs Proceedings. 511. DOI: 10.1557/Proc-511-347  0.335
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