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Alyssandrea H. Hamad, Ph.D. - Publications

Affiliations: 
2004 Cornell University, Ithaca, NY, United States 
Area:
polymers
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7 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2006 Dai J, Chang SW, Hamad A, Yang D, Felix N, Ober CK. Molecular glass resists for high-resolution patterning Chemistry of Materials. 18: 3404-3411. DOI: 10.1021/Cm052452M  0.508
2003 Hamad AH, Houlihan FM, Seger L, Chang C, Ober CK. Evaluation of fluorinated dissolution inhibitors for 157 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 5039: 558-568. DOI: 10.1117/12.485099  0.458
2003 Pham VQ, Ferris RJ, Hamad A, Ober CK. Positive-Tone Photoresist Process for Supercritical Carbon Dioxide Development Chemistry of Materials. 15: 4893-4895. DOI: 10.1021/Cm034343I  0.551
2002 Hamad AH, Bae YC, Liu XQ, Ober CK, Houlihan FM. Fluorinated dissolution inhibitors for 157 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 4690: 477-485. DOI: 10.1117/12.474245  0.469
2000 Schmaljohann D, Young CB, Dai J, Weibel GL, Hamad AH, Ober CK. Fundamental Studies of Fluoropolymer Photoresists for 157 nm Lithography. Journal of Photopolymer Science and Technology. 13: 451-458. DOI: 10.2494/Photopolymer.13.451  0.562
2000 Schmaljohann D, Bae YC, Dai J, Weibel GL, Hamad AH, Ober CK. Fundamental studies of fluoropolymer photoresists for 157 nm lithography Journal of Photopolymer Science and Technology. 13: 451-458.  0.338
2000 Schmaljohann D, Bae YC, Weibel GL, Hamad AH, Ober CK. Design strategies for 157 nm single-layer photoresists: Lithographic evaluation of a poly(α-trifluoromethyl vinyl alcohol) copolymer Proceedings of Spie - the International Society For Optical Engineering. 3999: I/-.  0.33
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