Year |
Citation |
Score |
2006 |
Dai J, Chang SW, Hamad A, Yang D, Felix N, Ober CK. Molecular glass resists for high-resolution patterning Chemistry of Materials. 18: 3404-3411. DOI: 10.1021/Cm052452M |
0.508 |
|
2003 |
Hamad AH, Houlihan FM, Seger L, Chang C, Ober CK. Evaluation of fluorinated dissolution inhibitors for 157 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 5039: 558-568. DOI: 10.1117/12.485099 |
0.458 |
|
2003 |
Pham VQ, Ferris RJ, Hamad A, Ober CK. Positive-Tone Photoresist Process for Supercritical Carbon Dioxide Development Chemistry of Materials. 15: 4893-4895. DOI: 10.1021/Cm034343I |
0.551 |
|
2002 |
Hamad AH, Bae YC, Liu XQ, Ober CK, Houlihan FM. Fluorinated dissolution inhibitors for 157 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 4690: 477-485. DOI: 10.1117/12.474245 |
0.469 |
|
2000 |
Schmaljohann D, Young CB, Dai J, Weibel GL, Hamad AH, Ober CK. Fundamental Studies of Fluoropolymer Photoresists for 157 nm Lithography. Journal of Photopolymer Science and Technology. 13: 451-458. DOI: 10.2494/Photopolymer.13.451 |
0.562 |
|
2000 |
Schmaljohann D, Bae YC, Dai J, Weibel GL, Hamad AH, Ober CK. Fundamental studies of fluoropolymer photoresists for 157 nm lithography Journal of Photopolymer Science and Technology. 13: 451-458. |
0.338 |
|
2000 |
Schmaljohann D, Bae YC, Weibel GL, Hamad AH, Ober CK. Design strategies for 157 nm single-layer photoresists: Lithographic evaluation of a poly(α-trifluoromethyl vinyl alcohol) copolymer Proceedings of Spie - the International Society For Optical Engineering. 3999: I/-. |
0.33 |
|
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