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Shintaro Yamada, Ph.D. - Publications

Affiliations: 
2000 University of Texas at Austin, Austin, Texas, U.S.A. 
Area:
design and synthesis of functional organic materials
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8 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2004 Yamada S, Cho S, Lee JH, Zhang T, Zampini A. Design and Study of Silicone-based Materials for Bilayer Resist Application Journal of Photopolymer Science and Technology. 17: 511-518. DOI: 10.2494/Photopolymer.17.511  0.691
2004 Yamada S, Mrozek T, Rager T, Owens J, Rangel J, Willson CG, Byers J. Toward environmentally friendly photolithographic materials: A new class of water-soluble photoresists Macromolecules. 37: 377-384. DOI: 10.1021/Ma034461R  0.653
2002 Tran HV, Hung RJ, Chiba T, Yamada S, Mrozek T, Hsieh YT, Chambers CR, Osborn BP, Trinque BC, Pinnow MJ, MacDonald SA, Willson CG, Sanders DP, Connor EF, Grubbs RH, et al. Metal-catalyzed vinyl addition polymers for 157 nm resist applications. 2. Fluorinated norbornenes: Synthesis, polymerization, and initial imaging results Macromolecules. 35: 6539-6549. DOI: 10.1021/Ma0122371  0.74
2001 Tran HV, Hung RJ, Chiba T, Yamada S, Mrozek T, Hsieh Y, Chambers CR, Osborn BP, Trinque BC, Pinnow MJ, Sanders DP, Connor EF, Grubbs RH, Conley W, MacDonald SA, et al. Fluoropolymer Resist Materials for 157nm Microlithography. Journal of Photopolymer Science and Technology. 14: 669-674. DOI: 10.2494/Photopolymer.14.669  0.753
2000 Chiba T, Hung RJ, Yamada S, Trinque B, Yamachika M, Brodsky C, Patterson K, Heyden AV, Jamison A, Lin SH, Somervell M, Byers J, Conley W, Willson CG. 157 nm Resist Materials: A Progress Report. Journal of Photopolymer Science and Technology. 13: 657-664. DOI: 10.2494/Photopolymer.13.657  0.738
2000 Brodsky C, Byers J, Conley W, Hung R, Yamada S, Patterson K, Somervell M, Trinque B, Tran HV, Cho S, Chiba T, Lin SH, Jamieson A, Johnson H, Vander Heyden T, et al. 157 nm resist materials: Progress report Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3396-3401. DOI: 10.1116/1.1321762  0.657
1999 Yamachika M, Patterson K, Cho S, Rager T, Yamada S, Byers J, Paniez PJ, Mortini B, Gally S, Sassoulas PO, Willson CG. Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists Journal of Photopolymer Science and Technology. 12: 553-560. DOI: 10.2494/Photopolymer.12.553  0.791
1999 Havard JM, Vladimirov N, Fréchet JMJ, Yamada S, Willson CG, Byers JD. Photoresists with Reduced Environmental Impact:  Water-Soluble Resists Based on Photo-Cross-Linking of a Sugar-Containing Polymethacrylate Macromolecules. 32: 86-94. DOI: 10.1021/Ma981372J  0.456
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