☰

Konstantinos Adam, Ph.D. - Publications

Affiliations: 
2001 University of California, Berkeley, Berkeley, CA, United States 
Area:
Integrated Circuits (INC); Solid-State Devices
Tree Info Similar researchers PubMed Report error

9 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2016 Lam MC, Clifford C, Oliver M, Fryer D, Tejnil E, Adam K. Accurate, full-chip, three-dimensional electromagnetic field model for non-Manhattan mask corners Journal of Micro/ Nanolithography, Mems, and Moems. 15. DOI: 10.1117/1.Jmm.15.2.021204  0.697
2015 Lam M, Clifford C, Oliver M, Fryer D, Tejnil E, Adam K. Accurate, full chip 3D electromagnetic field model for non-Manhattan mask corners Proceedings of Spie - the International Society For Optical Engineering. 9426. DOI: 10.1117/12.2085671  0.697
2014 Sturtevant J, Buck P, Schulze S, Fryer D, Tejnil E, Adam K, Lam M, Clifford C, Oliver M, Armeanu A, Kalk F, Nakagawa K, Ning G, Ackmann P, Gans F, et al. 14-nm photomask simulation sensitivity Proceedings of Spie - the International Society For Optical Engineering. 9231. DOI: 10.1117/12.2066483  0.606
2014 Fryer D, Lam M, Adam K, Clifford C, Oliver M, Zuniga C, Sturtevant J, Wang C, Mansfield S. Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk Proceedings of Spie - the International Society For Optical Engineering. 9052. DOI: 10.1117/12.2046489  0.667
2013 Lam MC, Adam K, Fryer D, Zuniga C, Wei H, Oliver M, Clifford CH. Accurate 3DEMF mask model for full-chip simulation Proceedings of Spie - the International Society For Optical Engineering. 8683. DOI: 10.1117/12.2013167  0.681
2012 Mailfert J, Zuniga C, Philipsen V, Adam K, Lam M, Word J, Hendrickx E, Vandenberghe G, Smith B. 3D mask modeling for EUV lithography Proceedings of Spie - the International Society For Optical Engineering. 8322. DOI: 10.1117/12.918267  0.391
2011 Word J, Zuniga C, Lam M, Habib M, Adam K, Oliver M. OPC modeling and correction solutions for EUV lithography Proceedings of Spie - the International Society For Optical Engineering. 8166. DOI: 10.1117/12.899591  0.377
2002 Adam K, Neureuther AR. Domain decomposition methods for the rapid electromagnetic simulation of photomask scattering Journal of Microlithography, Microfabrication and Microsystems. 1: 253-269. DOI: 10.1117/1.1506178  0.614
1998 Adam K, Neureuther AR, Socha R, Pistor T. Analysis of sub-wavelength sized OPC features Microelectronic Engineering. 41: 137-140. DOI: 10.1016/S0167-9317(98)00030-6  0.651
Show low-probability matches.