Xiuju Zhou, Ph.D. - Publications
Affiliations: | 2012 | HKUST | Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong |
Area:
Electronics and Electrical Engineering, Condensed Matter Physics, Materials Science EngineeringYear | Citation | Score | |||
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2013 | Li Q, Zhou X, Tang CW, Lau KM. Material and device characteristics of metamorphic In0.53Ga 0.47As MOSHEMTs grown on GaAs and Si substrates by MOCVD Ieee Transactions On Electron Devices. 60: 4112-4118. DOI: 10.1109/Ted.2013.2283721 | 0.345 | |||
2012 | Zhou X, Li Q, Tang CW, Lau KM. Inverted-Type InGaAs Metal–Oxide–Semiconductor High-Electron-Mobility Transistor on Si Substrate with Maximum Drain Current Exceeding 2 A/mm Applied Physics Express. 5: 104201. DOI: 10.1143/Apex.5.104201 | 0.363 | |||
2012 | Zhou X, Li Q, Tang CW, Lau KM. 30-nm Inverted $\hbox{In}_{0.53}\hbox{Ga}_{0.47} \hbox{As}$ MOSHEMTs on Si Substrate Grown by MOCVD With Regrown Source/Drain Ieee Electron Device Letters. 33: 1384-1386. DOI: 10.1109/Led.2012.2210383 | 0.348 | |||
2012 | Li Q, Zhou X, Tang CW, Lau KM. High-Performance Inverted $\hbox{In}_{0.53} \hbox{Ga}_{0.47}\hbox{As}$ MOSHEMTs on a GaAs Substrate With Regrown Source/Drain by MOCVD Ieee Electron Device Letters. 33: 1246-1248. DOI: 10.1109/Led.2012.2204431 | 0.331 | |||
2012 | Zhou X, Tang CW, Li Q, Lau KM. In0.53Ga0.47As MOS-HEMTs on GaAs and Si substrates grown by MOCVD Physica Status Solidi (a). 209: 1380-1383. DOI: 10.1002/Pssa.201127707 | 0.352 | |||
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