James H. Edgar - Publications

Affiliations: 
Department of Chemical Engineering Kansas State University, Manhattan, KS, United States 
Area:
Materials Science Engineering, Chemical Engineering

200 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2022 Rousseau A, Valvin P, Desrat W, Xue L, Li J, Edgar JH, Cassabois G, Gil B. Bernal Boron Nitride Crystals Identified by Deep-Ultraviolet Cryomicroscopy. Acs Nano. PMID 35099926 DOI: 10.1021/acsnano.1c09717  0.3
2021 Li J, Wang J, Zhang X, Elias C, Ye G, Evans D, Eda G, Redwing JM, Cassabois G, Gil B, Valvin P, He R, Liu B, Edgar JH. Hexagonal Boron Nitride Crystal Growth from Iron, a Single Component Flux. Acs Nano. PMID 33818058 DOI: 10.1021/acsnano.1c00115  0.385
2020 Cai Q, Scullion D, Gan W, Falin A, Cizek P, Liu S, Edgar JH, Liu R, Cowie BCC, Santos EJG, Li LH. Outstanding Thermal Conductivity of Single Atomic Layer Isotope-Modified Boron Nitride. Physical Review Letters. 125: 085902. PMID 32909783 DOI: 10.1103/Physrevlett.125.085902  0.32
2020 Cuscó R, Edgar JH, Liu S, Li J, Artús L. Isotopic Disorder: The Prevailing Mechanism in Limiting the Phonon Lifetime in Hexagonal BN. Physical Review Letters. 124: 167402. PMID 32383900 DOI: 10.1103/Physrevlett.124.167402  0.302
2020 Sonntag J, Li J, Plaud A, Loiseau A, Barjon J, Edgar JH, Stampfer C. Excellent electronic transport in heterostructures of graphene and monoisotopic boron-nitride grown at atmospheric pressure Arxiv: Mesoscale and Nanoscale Physics. 7: 31009. DOI: 10.1088/2053-1583/Ab89E5  0.352
2020 Haseman MS, Noesges BA, Shields S, Cetnar JS, Reed AN, Al-Atabi HA, Edgar JH, Brillson LJ. Cathodoluminescence and x-ray photoelectron spectroscopy of ScN: Dopant, defects, and band structure Apl Materials. 8: 081103. DOI: 10.1063/5.0019533  0.344
2020 Valvin P, Pelini T, Cassabois G, Zobelli A, Li J, Edgar JH, Gil B. Deep ultraviolet hyperspectral cryomicroscopy in boron nitride: Photoluminescence in crystals with an ultra-low defect density Aip Advances. 10: 075025. DOI: 10.1063/5.0013121  0.41
2020 McKay MA, Wang QW, Al-Atabi HA, Yan YQ, Li J, Edgar JH, Lin JY, Jiang HX. Band structure and infrared optical transitions in ErN Applied Physics Letters. 116: 171104. DOI: 10.1063/5.0006312  0.343
2020 Al-Atabi H, Zheng Q, Cetnar JS, Look D, Cahill DG, Edgar JH. Properties of bulk scandium nitride crystals grown by physical vapor transport Applied Physics Letters. 116: 132103. DOI: 10.1063/1.5141808  0.509
2020 Li J, Elias C, Ye G, Evans D, Liu S, He R, Cassabois G, Gil B, Valvin P, Liu B, Edgar JH. Single crystal growth of monoisotopic hexagonal boron nitride from a Fe–Cr flux Journal of Materials Chemistry C. 8: 9931-9935. DOI: 10.1039/D0Tc02143A  0.442
2020 Li J, Yuan C, Elias C, Wang J, Zhang X, Ye G, Huang C, Kuball M, Eda G, Redwing JM, He R, Cassabois G, Gil B, Valvin P, Pelini T, ... ... Edgar JH, et al. Hexagonal Boron Nitride Single Crystal Growth from Solution with a Temperature Gradient Chemistry of Materials. 32: 5066-5072. DOI: 10.1021/Acs.Chemmater.0C00830  0.415
2019 Fali A, White ST, Folland T, He M, Aghamiri NA, Liu S, Edgar JH, Caldwell JD, Haglund RF, Abate Y. Refractive Index-Based Control of Hyperbolic Phonon-Polariton Propagation. Nano Letters. PMID 31650843 DOI: 10.1021/Acs.Nanolett.9B02651  0.311
2019 Xiong L, Forsythe C, Jung M, McLeod AS, Sunku SS, Shao YM, Ni GX, Sternbach AJ, Liu S, Edgar JH, Mele EJ, Fogler MM, Shvets G, Dean CR, Basov DN. Photonic crystal for graphene plasmons. Nature Communications. 10: 4780. PMID 31636265 DOI: 10.1038/S41467-019-12778-2  0.393
2019 Liu S, Comer J, van Duin ACT, van Duin DM, Liu B, Edgar JH. Predicting the preferred morphology of hexagonal boron nitride domain structure on nickel from ReaxFF-based molecular dynamics simulations. Nanoscale. PMID 30860524 DOI: 10.1039/C8Nr10291K  0.316
2019 Khan N, Nour E, Mondoux J, Liu S, Edgar JH, Berta Y. Hexagonal Boron Nitride Single Crystal Thermal Oxidation and Etching in Air: An Atomic Force Microscopy Study Mrs Advances. 4: 601-608. DOI: 10.1557/Adv.2018.667  0.376
2019 Pelini T, Elias C, Page R, Xue L, Liu S, Li J, Edgar JH, Dréau A, Jacques V, Valvin P, Gil B, Cassabois G. Shallow and deep levels in carbon-doped hexagonal boron nitride crystals Physical Review Materials. 3. DOI: 10.1103/Physrevmaterials.3.094001  0.404
2019 Cuscó R, Edgar JH, Liu S, Cassabois G, Gil B, Artús L. Influence of isotopic substitution on the anharmonicity of the interlayer shear mode of h -BN Physical Review B. 99: 85428. DOI: 10.1103/Physrevb.99.085428  0.322
2019 Cuscó R, Edgar JH, Liu S, Cassabois G, Gil B, Artús L. Effects of isotopic substitution on the phonons of van der Waals crystals: the case of hexagonal boron nitride Journal of Physics D. 52: 303001. DOI: 10.1088/1361-6463/Ab1Cab  0.421
2019 Yuan C, Li J, Lindsay L, Cherns D, Pomeroy JW, Liu S, Edgar JH, Kuball M. Modulating the thermal conductivity in hexagonal boron nitride via controlled boron isotope concentration Communications Physics. 2. DOI: 10.1038/S42005-019-0145-5  0.325
2019 Caldwell JD, Aharonovich I, Cassabois G, Edgar JH, Gil B, Basov DN. Photonics with hexagonal boron nitride Nature Reviews Materials. 4: 552-567. DOI: 10.1038/S41578-019-0124-1  0.352
2019 Chatzakis I, Davidson RB, Dunkelberger AD, Liu S, Freitas J, Culbertson J, Edgar JH, Ratchford DC, Ellis CT, Grafton AB, Giles AJ, Tischler JG, Caldwell JD, Owrutsky JC. Rapid Bimolecular and Defect-Assisted Carrier Recombination in Hexagonal Boron Nitride The Journal of Physical Chemistry C. 123: 14689-14695. DOI: 10.1021/Acs.Jpcc.9B04118  0.326
2019 Al-Atabi HA, Cheikh MI, Hosni MH, Edgar JH. A cooling fin to enhance the efficiency of crystal growth by physical vapor transport Materials Science and Engineering B-Advanced Functional Solid-State Materials. 251: 114443. DOI: 10.1016/J.Mseb.2019.114443  0.442
2018 Folland TG, Fali A, White ST, Matson JR, Liu S, Aghamiri NA, Edgar JH, Haglund RF, Abate Y, Caldwell JD. Reconfigurable infrared hyperbolic metasurfaces using phase change materials. Nature Communications. 9: 4371. PMID 30349033 DOI: 10.1038/S41467-018-06858-Y  0.306
2018 Ngoc My Duong H, Nguyen MAP, Kianinia M, Ohshima T, Abe H, Watanabe K, Taniguchi T, Edgar JH, Aharonovich I, Toth M. Effects of high energy electron irradiation on quantum emitters in hexagonal boron nitride. Acs Applied Materials & Interfaces. PMID 29882642 DOI: 10.1021/Acsami.8B07506  0.333
2018 Xu ZQ, Elbadawi C, Tran TT, Kianinia M, Li X, Liu D, Hoffman TB, Nguyen M, Kim S, Edgar JH, Wu X, Song L, Ali S, Ford M, Toth M, et al. Single photon emission from plasma treated 2D hexagonal boron nitride. Nanoscale. PMID 29682653 DOI: 10.1039/C7Nr08222C  0.321
2018 Cuscó R, Artús L, Edgar JH, Liu S, Cassabois G, Gil B. Isotopic effects on phonon anharmonicity in layered van der Waals crystals: Isotopically pure hexagonal boron nitride Physical Review B. 97: 155435. DOI: 10.1103/Physrevb.97.155435  0.465
2018 Al-Atabi HA, Khan N, Nour E, Mondoux J, Zhang Y, Edgar JH. Bulk (100) scandium nitride crystal growth by sublimation on tungsten single crystal seeds Applied Physics Letters. 113: 122106. DOI: 10.1063/1.5051457  0.461
2018 Liu S, He R, Xue L, Li J, Liu B, Edgar JH. Single Crystal Growth of Millimeter-Sized Monoisotopic Hexagonal Boron Nitride Chemistry of Materials. 30: 6222-6225. DOI: 10.1021/Acs.Chemmater.8B02589  0.507
2018 Al Atabi HA, Al Auda ZF, Padavala B, Craig M, Hohn K, Edgar JH. Sublimation Growth and Characterization of Erbium Nitride Crystals Crystal Growth & Design. 18: 3762-3766. DOI: 10.1021/Acs.Cgd.7B01543  0.518
2018 Padavala B, Atabi HA, Tengdelius L, Lu J, Högberg H, Edgar JH. Cubic boron phosphide epitaxy on zirconium diboride Journal of Crystal Growth. 483: 115-120. DOI: 10.1016/J.Jcrysgro.2017.11.014  0.401
2017 Vuong TQP, Liu S, Van der Lee A, Cuscó R, Artús L, Michel T, Valvin P, Edgar JH, Cassabois G, Gil B. Isotope engineering of van der Waals interactions in hexagonal boron nitride. Nature Materials. PMID 29251722 DOI: 10.1038/Nmat5048  0.366
2017 Liu S, van Duin AC, van Duin DM, Liu B, Edgar JH. Atomistic Insights into Nucleation and Formation of Hexagonal Boron Nitride on Ni from First-Principles-Based Reactive Molecular Dynamics Simulations. Acs Nano. PMID 28319661 DOI: 10.1021/Acsnano.6B06736  0.367
2017 Huber SP, Medvedev VV, Gullikson E, Padavala B, Edgar JH, van de Kruijs RW, Bijkerk F, Prendergast D. Determining crystal phase purity in c-BP through X-ray absorption spectroscopy. Physical Chemistry Chemical Physics : Pccp. PMID 28149999 DOI: 10.1039/C6Cp06967C  0.4
2017 Vuong TQP, Cassabois G, Valvin P, Liu S, Edgar JH, Gil B. Exciton-phonon interaction in the strong-coupling regime in hexagonal boron nitride Physical Review B. 95: 201202. DOI: 10.1103/Physrevb.95.201202  0.32
2017 Edgar JH, Liu S, Hoffman T, Zhang Y, Twigg ME, Bassim ND, Liang S, Khan N. Defect sensitive etching of hexagonal boron nitride single crystals Journal of Applied Physics. 122: 225110. DOI: 10.1063/1.4997864  0.473
2017 Huber SP, Gullikson E, Meyer-Ilse J, Frye CD, Edgar JH, Kruijs RWEvd, Bijkerk F, Prendergast D. Detection of defect populations in superhard semiconductor boron subphosphide B12P2 through X-ray absorption spectroscopy Journal of Materials Chemistry. 5: 5737-5749. DOI: 10.1039/C6Ta10935G  0.344
2017 Liu S, He R, Ye Z, Du X, Lin J, Jiang H, Liu B, Edgar JH. Large-Scale Growth of High-Quality Hexagonal Boron Nitride Crystals at Atmospheric Pressure from an Fe–Cr Flux Crystal Growth & Design. 17: 4932-4935. DOI: 10.1021/Acs.Cgd.7B00871  0.455
2017 Frye CD, Saw CK, Padavala B, Khan N, Nikolic RJ, Edgar JH. Suppression of Rotational Twins in Epitaxial B12P2 on 4H-SiC Crystal Growth & Design. DOI: 10.1021/Acs.Cgd.7B00867  0.395
2017 Hoffman T, Zhang Y, Liu S, Khan N, Twigg M, Bassim N, Edgar J. Assessing Hexagonal Boron Nitride Crystal Quality by Defect Sensitive Etching Microscopy and Microanalysis. 23: 1518-1519. DOI: 10.1017/S143192761700825X  0.406
2017 Reshetniak VV, Mavrin BN, Edgar JH, Whiteley CE, Medvedev VV. Phonon states of B12P2 crystals: Ab initio calculation and experiment Journal of Physics and Chemistry of Solids. 110: 248-253. DOI: 10.1016/J.Jpcs.2017.06.003  0.78
2017 Gao Y, Zhou M, Wang H, Ji C, Whiteley C, Edgar J, Liu H, Ma Y. The high-pressure compressibility of B12P2 Journal of Physics and Chemistry of Solids. 102: 21-26. DOI: 10.1016/J.Jpcs.2016.11.002  0.762
2017 Frye CD, Saw CK, Padavala B, Nikolić RJ, Edgar JH. Hydride CVD Hetero-epitaxy of B 12 P 2 on 4H-SiC Journal of Crystal Growth. 459: 112-117. DOI: 10.1016/J.Jcrysgro.2016.11.101  0.405
2016 Huber SP, Medvedev VV, Meyer-Ilse J, Gullikson E, Padavala B, Edgar JH, Sturm JM, van de Kruijs RWE, Prendergast D, Bijkerk F. Exploiting the P L_2,3 absorption edge for optics: spectroscopic and structural characterization of cubic boron phosphide thin films Optical Materials Express. 6: 3946. DOI: 10.1364/Ome.6.003946  0.403
2016 Edgar JH, Hoffman T. Synthesis of large single crystals of boron nitride for electronic and photonic applications Spie Newsroom. DOI: 10.1117/2.1201602.006302  0.398
2016 Li J, Cao XK, Hoffman TB, Edgar JH, Lin JY, Jiang HX. Nature of exciton transitions in hexagonal boron nitride Applied Physics Letters. 108. DOI: 10.1063/1.4944696  0.332
2016 Gul R, Cui Y, Bolotnikov AE, Camarda GS, Egarievwe SU, Hossain A, Roy UN, Yang G, Edgar JH, Nwagwu U, James RB. Photocurrent response of B12As2 crystals to blue light, and its temperature- dependent electrical characterizations Aip Advances. 6. DOI: 10.1063/1.4941937  0.373
2016 Huber SP, Gullikson E, Frye CD, Edgar JH, Kruijs RWEvd, Bijkerk F, Prendergast D. Self-healing in B12P2 through Mediated Defect Recombination Chemistry of Materials. 28: 8415-8428. DOI: 10.1021/Acs.Chemmater.6B04075  0.313
2016 Padavala B, Frye CD, Wang X, Ding Z, Chen R, Dudley M, Raghothamachar B, Lu P, Flanders BN, Edgar JH. Epitaxy of Boron Phosphide on Aluminum Nitride(0001)/Sapphire Substrate Crystal Growth and Design. 16: 981-987. DOI: 10.1021/Acs.Cgd.5B01525  0.413
2016 Padavala B, Frye C, Ding Z, Chen R, Dudley M, Raghothamachar B, Khan N, Edgar J. Corrigendum to “Preparation, properties, and characterization of boron phosphide films on 4H- and 6H-silicon carbide” [Solid State Sci. 47 (2015) 55–60] Solid State Sciences. 53: 83. DOI: 10.1016/J.Solidstatesciences.2016.02.007  0.314
2016 Padavala B, Frye CD, Wang X, Raghothamachar B, Edgar JH. CVD growth and properties of boron phosphide on 3C-SiC Journal of Crystal Growth. 449: 15-21. DOI: 10.1016/J.Jcrysgro.2016.05.031  0.437
2015 Hossain T, Wei D, Edgar JH, Garces NY, Nepal N, Hite JK, Mastro MA, Eddy CR, Meyer HM. Effect of GaN surface treatment on Al2O3/ n -GaN MOS capacitors Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics. 33. DOI: 10.1116/1.4931793  0.338
2015 Frye CD, Kucheyev SO, Edgar JH, Voss LF, Conway AM, Shao Q, Nikoli? RJ. Sintered Cr/Pt and Ni/Au ohmic contacts to B12P2 Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 33. DOI: 10.1116/1.4917010  0.312
2015 Baranov DG, Edgar JH, Hoffman T, Bassim N, Caldwell JD. Perfect interferenceless absorption at infrared frequencies by a van der Waals crystal Physical Review B - Condensed Matter and Materials Physics. 92. DOI: 10.1103/Physrevb.92.201405  0.387
2015 Padavala B, Frye CD, Ding Z, Chen R, Dudley M, Raghothamachar B, Khan N, Edgar JH. Preparation, properties, and characterization of boron phosphide films on 4H- and 6H-silicon carbide Solid State Sciences. 47: 55-60. DOI: 10.1016/J.Solidstatesciences.2015.03.002  0.4
2014 Le Godec Y, Mezouar M, Kurakevych OO, Munsch P, Nwagwu U, Edgar JH, Solozhenko VL. Equation of state of single-crystal cubic boron phosphide Journal of Superhard Materials. 36: 61-64. DOI: 10.3103/S1063457614010092  0.378
2014 Hoffman TB, Zhang Y, Edgar JH, Gaskill DK. Growth of hBN using metallic boron: Isotopically Enriched h10BN and h11BN Prehospital and Disaster Medicine. 1635. DOI: 10.1557/Opl.2014.48  0.413
2014 Wei D, Hossain T, Briggs DP, Edgar JH. A comparison of N-polar (0001) GaN surface preparations for the atomic layer deposition of Al2O3 Ecs Journal of Solid State Science and Technology. 3: N127-N131. DOI: 10.1149/2.0201410Jss  0.336
2014 Wei D, Edgar JH, Briggs DP, Retterer ST, Srijanto B, Hensley DK, Meyer HM. Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics. 32. DOI: 10.1116/1.4897919  0.372
2014 Du XZ, Fyre CD, Edgar JH, Lin JY, Jiang HX. Temperature dependence of the energy bandgap of two-dimensional hexagonal boron nitride probed by excitonic photoluminescence Journal of Applied Physics. 115. DOI: 10.1063/1.4863823  0.373
2014 Edgar JH, Hoffman TB, Clubine B, Currie M, Du XZ, Lin JY, Jiang HX. Characterization of bulk hexagonal boron nitride single crystals grown by the metal flux technique Journal of Crystal Growth. 403: 110-113. DOI: 10.1016/J.Jcrysgro.2014.06.006  0.51
2014 Hoffman TB, Clubine B, Zhang Y, Snow K, Edgar JH. Optimization of Ni-Cr flux growth for hexagonal boron nitride single crystals Journal of Crystal Growth. 393: 114-118. DOI: 10.1016/J.Jcrysgro.2013.09.030  0.505
2014 Hossain T, Wei D, Nepal N, Garces NY, Hite JK, Meyer HM, Eddy CR, Baker T, Mayo A, Schmitt J, Edgar JH. Insulating gallium oxide layer produced by thermal oxidation of gallium-polar GaN Physica Status Solidi (C) Current Topics in Solid State Physics. 11: 565-568. DOI: 10.1002/Pssc.201300659  0.315
2014 Padavala B, Frye C, Edgar JH, Ding Z, Chen R, Dudley M, Raghothamachar B. Crystal growth and characterization of cubic boron phosphide on silicon carbide Materials Science and Technology Conference and Exhibition 2014, Ms and T 2014. 3: 1575-1581.  0.366
2014 Padavala B, Frye C, Edgar JH, Ding Z, Chen R, Dudley M, Raghothamachar B, Schmitt J. Heteroepitaxial growth of boron phosphide on 3C-SiC/Si(100) and AlN/sapphire(0001) substrates Materials Science and Technology Conference and Exhibition 2014, Ms and T 2014. 3: 1583-1590.  0.327
2013 Frye CD, Edgar JH, Ohkubo I, Mori T. Seebeck coefficient and electrical resistivity of single crystal B 12As2 at high temperatures Journal of the Physical Society of Japan. 82. DOI: 10.7566/Jpsj.82.095001  0.468
2013 Wei D, Hossain T, Garces NY, Nepal N, Meyer HM, Kirkham MJ, Eddy CR, Edgar JH. Influence of atomic layer deposition temperatures on TiO2/n-Si MOS capacitor Ecs Journal of Solid State Science and Technology. 2: N110-N114. DOI: 10.1149/2.010305Jss  0.341
2013 Whiteley CE, Kirkham MJ, Edgar JH. The coefficients of thermal expansion of boron arsenide (B 12As2) between 25 °c and 850 °c Journal of Physics and Chemistry of Solids. 74: 673-676. DOI: 10.1016/J.Jpcs.2012.12.026  0.784
2012 Klein PB, Nwagwu U, Edgar JH, Freitas JA. Photoluminescence investigation of the indirect band gap and shallow impurities in icosahedral B 12As 2 Journal of Applied Physics. 112. DOI: 10.1063/1.4729920  0.308
2012 Zhang Y, Chen H, Dudley M, Edgar JH, Gong Y, Bakalova S, Kuball M, Zhang L, Su D, Zhu Y. Growth mechanisms and defect structures of B 12As 2 epilayers grown on 4 H-SiC substrates Journal of Crystal Growth. 352: 3-8. DOI: 10.1016/J.Jcrysgro.2011.12.065  0.438
2012 Nyakiti LO, Lee RG, Gu Z, Edgar JH, Chaudhuri J. Polarity determination of rough and smooth surface grains in AlN crystals Crystal Research and Technology. 47: 1134-1139. DOI: 10.1002/Crat.201200005  0.358
2011 Whiteley CE, Mayo A, Edgar JH, Dudley M, Zhang Y. Defect-selective etching of icosahedral boron arsenide (B 12As 2) crystals in molten potassium hydroxide Materials Research Society Symposium Proceedings. 1307: 79-85. DOI: 10.1557/Opl.2011.504  0.811
2011 Whiteley CE, Zhang Y, Mayo A, Edgar JH, Gong Y, Kuball M, Dudley M. Solution growth and characterization of icosahedral boron arsenide (B 12As 2) Materials Research Society Symposium Proceedings. 1307: 66-72. DOI: 10.1557/Opl.2011.502  0.812
2011 Zhang Y, Chen H, Dudley M, Edgar JH, Gong Y, Bakalova S, Kuball M, Zhang L, Su D, Zhu Y. Elimination of degenerate epitaxy in the growth of high quality B 12As 2 single crystalline epitaxial films Materials Research Society Symposium Proceedings. 1307: 15-20. DOI: 10.1557/Opl.2011.316  0.438
2011 Wu J, Zhu H, Hou D, Ji C, Whiteley CE, Edgar JH, Ma Y. High pressure X-ray diffraction study on icosahedral boron arsenide (B 12As2) Journal of Physics and Chemistry of Solids. 72: 144-146. DOI: 10.1016/J.Jpcs.2010.12.005  0.771
2011 Whiteley CE, Zhang Y, Gong Y, Bakalova S, Mayo A, Edgar JH, Kuball M. Semiconducting icosahedral boron arsenide crystal growth for neutron detection Journal of Crystal Growth. 318: 553-557. DOI: 10.1016/J.Jcrysgro.2010.10.057  0.819
2011 Bohnen T, Van Dreumel GWG, Hageman PR, Yazdi GR, Yakimova R, Vlieg E, Algra RE, Verheijen MA, Edgar JH. Scandium aluminum nitride nanowires Scandium: Compounds, Productions and Applications. 135-152.  0.305
2010 Bakalova S, Gong Y, Cobet C, Esser N, Zhang Y, Edgar JH, Zhang Y, Dudley M, Kuball M. Electronic excitations in B12As2 and their temperature dependence by vacuum ultraviolet ellipsometry. Journal of Physics. Condensed Matter : An Institute of Physics Journal. 22: 395801. PMID 21403232 DOI: 10.1088/0953-8984/22/39/395801  0.35
2010 Zhang Y, Chen H, Dudley M, Zhang Y, Edgar J, Gong Y, Bakalova S, Kuball M, Zhang L, Su D, Kisslinger K, Zhu Y. Mechanism for Improved Quality B12As2 Epitaxial Films on (0001) 4H-SiC Substrates by Tilting toward [1-100] Direction Mrs Proceedings. 1246. DOI: 10.1557/Proc-1246-B04-02  0.415
2010 Du L, Edgar JH. Thermodynamic analysis and purification for source materials in sublimation crystal growth of aluminum nitride Materials Research Society Symposium Proceedings. 1202: 221-227. DOI: 10.1557/Proc-1202-I05-08  0.497
2010 Zhang Y, Chen H, Zhang N, Dudley M, Gong Y, Kuball M, Xu Z, Edgar JH, Zhang L, Zhu Y. Origins of twinned microstructures in B12As2 epilayers grown on (0001) 6H-SiC and their influence on physical properties Materials Research Society Symposium Proceedings. 1164: 121-127. DOI: 10.1557/Proc-1164-L09-10  0.43
2010 Gao W, Whiteley C, Zhang Y, Plummer J, Edgar JH, Gong YY, Kuball M. Attempt to grow α-rhombohedral boron crystals in copper solvent Materials Research Society Symposium Proceedings. 1164: 73-78. DOI: 10.1557/Proc-1164-L06-03  0.792
2010 Zhang Y, Edgar JH, Plummer J, Whiteley C, Chen H, Dudley M, Gong Y, Gray J, Kuball M. Growth of boron carbide crystals from a copper flux Materials Research Society Symposium Proceedings. 1164: 67-72. DOI: 10.1557/Proc-1164-L06-02  0.827
2010 Gong Y, Zhang Y, Dudley M, Edgar JH, Heard PJ, Kuball M. Thermal conductivity and Seebeck coefficients of icosahedral boron arsenide films on silicon carbide Journal of Applied Physics. 108. DOI: 10.1063/1.3486518  0.403
2010 Gong Y, Tapajna M, Bakalova S, Zhang Y, Edgar JH, Dudley M, Hopkins M, Kuball M. Demonstration of boron arsenide heterojunctions: A radiation hard wide band gap semiconductor device Applied Physics Letters. 96. DOI: 10.1063/1.3443712  0.345
2010 Nyakiti LO, Chaudhuri J, Gu Z, Edgar JH. Transmission electron microscopy study of defects in AlN crystals with rough and smooth surface grains Journal of Crystal Growth. 312: 3479-3484. DOI: 10.1016/J.Jcrysgro.2010.09.014  0.336
2010 Du L, Edgar JH, Peascoe-Meisner RA, Gong Y, Bakalova S, Kuball M. Sublimation crystal growth of yttrium nitride Journal of Crystal Growth. 312: 2896-2903. DOI: 10.1016/J.Jcrysgro.2010.06.011  0.634
2010 Zhang Y, Chen H, Choi G, Raghothamachar B, Dudley M, Edgar JH, Grasza K, Tymicki E, Zhang L, Su D, Zhu Y. Nucleation mechanism of 6H-SiC polytype inclusions inside 15R-SiC crystals Journal of Electronic Materials. 39: 799-804. DOI: 10.1007/S11664-010-1105-8  0.386
2010 Du L, Edgar JH, Kenik EA, Meyer H. Sublimation growth of titanium nitride crystals Journal of Materials Science: Materials in Electronics. 21: 78-87. DOI: 10.1007/S10854-009-9873-8  0.604
2010 Yu Z, Hui C, Dudley M, Yi Z, Edgar JH, Gong Y, Bakalova S, Kuball M, Zhang L, Su D, Kisslinger K, Zhu Y. Mechanism for improved quality B12As2 epitaxial films on (0001) 4H-SiC substrates offcut towards [1-100] Materials Research Society Symposium Proceedings. 1246: 71-76.  0.312
2009 Sedhain A, Du L, Edgar JH, Lin JY, Jiang HX. The origin of 2.78 eV emission and yellow coloration in bulk AlN substrates Applied Physics Letters. 95. DOI: 10.1063/1.3276567  0.525
2009 Bohnen T, Yazdi GR, Yakimova R, van Dreumel GWG, Hageman PR, Vlieg E, Algra RE, Verheijen MA, Edgar JH. ScAlN nanowires: A cathodoluminescence study Journal of Crystal Growth. 311: 3147-3151. DOI: 10.1016/J.Jcrysgro.2009.03.023  0.387
2009 Bohnen T, Van Dreumel GWG, Hageman PR, Algra RE, Van Enckevort WJP, Vlieg E, Verheijen MA, Edgar JH. Growth of scandium aluminum nitride nanowires on ScN(111) films on 6H-SiC substrates by HVPE Physica Status Solidi (a) Applications and Materials Science. 206: 2809-2815. DOI: 10.1002/Pssa.200925060  0.404
2008 Ito T, Forman SM, Cao C, Li F, Eddy CR, Mastro MA, Holm RT, Henry RL, Hohn KL, Edgar JH. Self-assembled monolayers of alkylphosphonic acid on GaN substrates. Langmuir : the Acs Journal of Surfaces and Colloids. 24: 6630-5. PMID 18522438 DOI: 10.1021/La800716R  0.325
2008 Chen H, Wang G, Dudley M, Xu Z, Edgar JH, Batten T, Kuball M, Zhang L, Zhu Y. Characterization and Growth Mechanism of B 12 As 2 Epitaxial Layers Grown on (1-100) 15R-SiC Mrs Proceedings. 1069. DOI: 10.1557/Proc-1069-D08-03  0.36
2008 Nyakiti LO, Chaudhuri J, Kenik EA, Lu P, Edgar JH. Defect selective etching of thick ALN layers grown on 6H-SiC seeds - A transmission electron microscopy study Materials Research Society Symposium Proceedings. 1040: 7-12. DOI: 10.1557/Proc-1040-Q11-03  0.406
2008 Chaudhuri J, Nyakiti LO, Peng L, Edgar JH. Transmission electron microscopy study of interface region of AlN/6H-SiC Materials Research Society Symposium Proceedings. 1040: 190-195. DOI: 10.1557/Proc-1040-Q10-05  0.401
2008 Sedhain A, Nepal N, Nakarmi ML, Al Tahtamouni TM, Lin JY, Jiang HX, Gu Z, Edgar JH. Photoluminescence properties of AlN homoepilayers with different orientations Applied Physics Letters. 93. DOI: 10.1063/1.2965613  0.35
2008 Chaudhuri J, Lee RG, Nyakiti LO, Gu Z, Edgar JH, Li P. Thermal oxidation of single crystal aluminum nitride - A high resolution transmission electron microscopy study Materials Letters. 62: 2465-2468. DOI: 10.1016/J.Matlet.2007.12.023  0.351
2008 Chaudhuri J, Lee RG, Nyakiti L, Armstrong J, Gu Z, Edgar JH, Wen JG. Transmission electron microscopy study of defect-selective etched (010) ScN crystals Materials Letters. 62: 27-29. DOI: 10.1016/J.Matlet.2007.04.104  0.404
2008 Edgar JH, Du L, Nyakiti L, Chaudhuri J. Native oxide and hydroxides and their implications for bulk AlN crystal growth Journal of Crystal Growth. 310: 4002-4006. DOI: 10.1016/J.Jcrysgro.2008.06.014  0.525
2008 Lu P, Edgar JH, Cao C, Hohn K, Dalmau R, Schlesser R, Sitar Z. Seeded growth of AlN on SiC substrates and defect characterization Journal of Crystal Growth. 310: 2464-2470. DOI: 10.1016/J.Jcrysgro.2008.01.010  0.482
2007 Chen H, Wang G, Dudley M, Zhang L, Zhu Y, Zhang Y, Edgar JH, Kuball M. Defect structures of B12As2 epilayers grown on c-plane and a-plane 6H-SiC substrates Materials Research Society Symposium Proceedings. 994: 29-34. DOI: 10.1557/Proc-0994-F03-01  0.452
2007 Gu Z, Edgar JH, Raghothamachar B, Dudley M, Zhuang D, Sitar Z, Coffey DW. Sublimation growth of aluminum nitride on silicon carbide substrate with aluminum nitride-silicon carbide alloy transition layer Journal of Materials Research. 22: 675-680. DOI: 10.1557/Jmr.2007.0077  0.481
2007 Xu Z, Edgar JH, Look DC, Baumann S, Bleiler RJ, Wang SH, Mohney SE. The effect of Si doping on the electrical properties of B12 As2 thin films on (0001) 6H-SiC substrates Journal of Applied Physics. 101. DOI: 10.1063/1.2437687  0.356
2007 Chaudhuri J, Nyakiti L, Lee RG, Gu Z, Edgar JH, Wen JG. Thermal oxidation of single crystalline aluminum nitride Materials Characterization. 58: 672-679. DOI: 10.1016/J.Matchar.2006.11.013  0.379
2007 Lu P, Edgar JH, Lee RG, Chaudhuri J. Nucleation of AlN on SiC substrates by seeded sublimation growth Journal of Crystal Growth. 300: 336-342. DOI: 10.1016/J.Jcrysgro.2006.11.324  0.463
2006 Gu Z, Edgar JH, Raghothamachar B, Dudley M, Zhuang D, Sitar Z. The effect of aluminum nitride-silicon carbide alloy buffer layers on the sublimation growth of aluminum nitride on SiC (0001) substrates Materials Science Forum. 527: 1497-1500. DOI: 10.4028/Www.Scientific.Net/Msf.527-529.1497  0.473
2006 Li D, Edgar JH. Thermodynamic analysis of impurities in the sublimation growth of AlN single crystals Materials Research Society Symposium Proceedings. 955: 342-347. DOI: 10.1557/Proc-0955-I11-05  0.391
2006 Chaudhuri J, Lee RG, Nyakiti LO, Gu Z, Edgar JH, Li P. High resolution transmission electron microscopy study of thermal oxidation of single crystalline aluminum nitride Materials Research Society Symposium Proceedings. 955: 300-302. DOI: 10.1557/Proc-0955-I09-01  0.351
2006 Mercurio L, Edgar JH, Du L, Kenik EA. Titanium nitride epitaxy on tungsten (100) by sublimation crystal growth Materials Research Society Symposium Proceedings. 955: 378-384. DOI: 10.1557/Proc-0955-I07-11  0.63
2006 Lu P, Edgar JH, Cao C, Hohn K, Dalmau R, Schlesser R, Sitar Z. Bulk AlN Crystal Growth on SiC Seeds and Defects Study Mrs Proceedings. 955. DOI: 10.1557/Proc-0955-I03-07  0.453
2006 Edgar JH, Gu Z, Taggart K, Chaudhuri J, Nyakiti L, Lee RG, Witt R. Oxidation of aluminum nitride for defect characterization Materials Research Society Symposium Proceedings. 892: 505-510. DOI: 10.1557/Proc-0892-Ff21-02  0.377
2006 Gu Z, Edgar JH, Wang C, Coffey DW. Thermal oxidation of aluminum nitride powder Journal of the American Ceramic Society. 89: 2167-2171. DOI: 10.1111/J.1551-2916.2006.01065.X  0.328
2006 Xu Z, Edgar JH, Speakman S. Heteroepitaxial B12As2 on silicon substrates Journal of Crystal Growth. 293: 162-168. DOI: 10.1016/J.Jcrysgro.2006.04.092  0.351
2006 Gu Z, Edgar JH, Coffey DW, Chaudhuri J, Nyakiti L, Lee RG, Wen JG. Defect-selective etching of scandium nitride crystals Journal of Crystal Growth. 293: 242-246. DOI: 10.1016/J.Jcrysgro.2006.03.065  0.489
2006 Edgar JH, Gu Z, Gu L, Smith DJ. Interface properties of an AIN/(AIN) x(SiC) 1-x/4H-SiC heterostructure Physica Status Solidi (a) Applications and Materials Science. 203: 3720-3725. DOI: 10.1002/Pssa.200622279  0.412
2006 Lu P, Edgar JH, Cao C, Hohn K, Dalmau R, Schlesser R, Sitar Z. Bulk AlN crystal growth on SiC seeds and defects study Materials Research Society Symposium Proceedings. 955: 411-416.  0.346
2005 Gu Z, Du L, Edgar JH, Payzant EA, Walker L, Liu R, Engelhard MH. Aluminum nitride-silicon carbide alloy crystals grown on SiC substrates by sublimation Mrs Internet Journal of Nitride Semiconductor Research. 10: 1-8. DOI: 10.1557/S1092578300000569  0.61
2005 Gu Z, Edgar JH, Payzant EA, Meyer HM, Walker LR, Sarua A, Kuball M. Sublimation growth of aluminum nitride-silicon carbide alloy crystals on SiC (0001) substrates Materials Research Society Symposium Proceedings. 831: 95-100. DOI: 10.1557/Proc-831-E3.1  0.501
2005 Wang SH, Lysczek EM, Liu B, Mohney SE, Xu Z, Nagarajan R, Edgar JH. CrPt Ohmic contacts to B 12 As 2 Applied Physics Letters. 87. DOI: 10.1063/1.2001760  0.317
2005 Zhuang D, Edgar JH. Wet etching of GaN, AlN, and SiC: A review Materials Science and Engineering R: Reports. 48: 1-46. DOI: 10.1016/J.Mser.2004.11.002  0.572
2005 Liu B, Edgar JH, Raghothamachar B, Dudley M, Lin JY, Jiang HX, Sarua A, Kuball M. Free nucleation of aluminum nitride single crystals in HPBN crucible by sublimation Materials Science and Engineering B: Solid-State Materials For Advanced Technology. 117: 99-104. DOI: 10.1016/J.Mseb.2004.10.009  0.516
2005 Lu P, Edgar JH, Glembocki OJ, Klein PB, Glaser ER, Perrin J, Chaudhuri J. High-speed homoepitaxy of SiC from methyltrichlorosilane by chemical vapor deposition Journal of Crystal Growth. 285: 506-513. DOI: 10.1016/J.Jcrysgro.2005.08.053  0.439
2005 Nagarajan R, Xu Z, Edgar JH, Baig F, Chaudhuri J, Rek Z, Payzant EA, Meyer HM, Pomeroy J, Kuball M. Crystal growth of B12As2 on SiC substrate by CVD method Journal of Crystal Growth. 273: 431-438. DOI: 10.1016/J.Jcrysgro.2004.07.068  0.459
2005 Gu Z, Edgar JH, Speakman SA, Blom D, Perrin J, Chaudhuri J. Thermal oxidation of polycrystalline and single crystalline aluminum nitride wafers Journal of Electronic Materials. 34: 1271-1279. DOI: 10.1007/S11664-005-0250-Y  0.349
2005 Edgar JH, Gu Z, Lu P, Du L. Impurity incoporation during the sublimation growth of aluminum nitride crystals Aiche Annual Meeting, Conference Proceedings. 5387.  0.364
2004 Liu B, Edgar JH, Gu Z, Zhuang D, Raghothamachar B, Dudley M, Sarua A, Kuball M, Meyer HM. The durability of various crucible materials for aluminum nitride crystal growth by sublimation Mrs Internet Journal of Nitride Semiconductor Research. 9. DOI: 10.1557/S1092578300000417  0.482
2004 Gu Z, Edgar JH, Pomeroy J, Kuball M, Coffey DW. Crystal growth and properties of scandium nitride Journal of Materials Science: Materials in Electronics. 15: 555-559. DOI: 10.1023/B:Jmse.0000032591.54107.2C  0.488
2004 Vetter WM, Nagarajan R, Edgar JH, Dudley M. Double-positioning twinning in icosahedral B12As2 thin films grown by chemical vapor deposition Materials Letters. 58: 1331-1335. DOI: 10.1016/J.Matlet.2003.09.042  0.41
2004 Zhuang D, Edgar JH, Liu B, Huey HE, Jiang HX, Lin JY, Kuball M, Mogal F, Chaudhuri J, Rek Z. Bulk AlN crystal growth by direct heating of the source using microwaves Journal of Crystal Growth. 262: 168-174. DOI: 10.1016/J.Jcrysgro.2003.10.080  0.503
2004 Zhuang D, Edgar JH, Strojek B, Chaudhuri J, Rek Z. Defect-selective etching of bulk AlN single crystals in molten KOH/NaOH eutectic alloy Journal of Crystal Growth. 262: 89-94. DOI: 10.1016/J.Jcrysgro.2003.10.051  0.465
2003 Lu P, Edgar JH, Pomeroy J, Kuball M, Meyer HM, Aselage T. Growth of rhombohedral B12P2 thin films on 6H-SiC (0001) by chemical vapor deposition Materials Research Society Symposium - Proceedings. 799: 121-125. DOI: 10.1557/Proc-799-Z2.10  0.397
2003 Sarua A, Rajasingam S, Kuball M, Garro N, Sancho O, Cros A, Cantarero A, Olguin D, Liu B, Zhuang D, Edgar JH. Effect of impurities on Raman and photoluminescence spectra of AlN bulk crystals Materials Research Society Symposium - Proceedings. 798: 297-302. DOI: 10.1557/Proc-798-Y5.17  0.362
2003 Nagarajan R, Edgar JH, Pomeroy J, Kuball M, Aselage T. Investigation of Thin Film Growth of B12As2 by Chemical Vapor Deposition Materials Research Society Symposium - Proceedings. 764: 283-287.  0.338
2002 Zhuang D, Edgar JH, Liu L, Liu B, Walker L. Wet chemical etching of AlN single crystals Mrs Internet Journal of Nitride Semiconductor Research. 7. DOI: 10.1557/S1092578300000302  0.618
2002 Burkland B, Xie ZY, Edgar JH, Ervin M, Chaudhuri J, Farsinivas S. Effects of the addition of silane during carbonization on the epitaxy of 3C-SiC on Si Journal of the Electrochemical Society. 149. DOI: 10.1149/1.1500349  0.329
2002 Liu L, Edgar JH. A global growth rate model for aluminum nitride sublimation Journal of the Electrochemical Society. 149. DOI: 10.1149/1.1421349  0.526
2002 Van Uden NWA, Hubel H, Hayes JM, Prins AD, Kuball M, Dunstan DJ, Downes JR, Shi Y, Edgar JH. Determination of the mode grüneisen parameter of A1N using different fits on experimental high pressure data High Pressure Research. 22: 37-41. DOI: 10.1080/08957950211363  0.301
2002 Liu L, Liu B, Edgar JH, Rajasingam S, Kuball M. Raman characterization and stress analysis of AlN grown on SiC by sublimation Journal of Applied Physics. 92: 5183-5188. DOI: 10.1063/1.1506195  0.593
2002 Liu L, Edgar JH. Substrates for gallium nitride epitaxy Materials Science and Engineering: R: Reports. 37: 61-128. DOI: 10.1016/S0927-796X(02)00008-6  0.43
2002 Edgar JH, Liu L, Liu B, Zhuang D, Chaudhuri J, Kuball M, Rajasingam S. Bulk AlN crystal growth: Self-seeding and seeding on 6H-SiC substrates Journal of Crystal Growth. 246: 187-193. DOI: 10.1016/S0022-0248(02)01741-4  0.657
2002 Hageman W, Rys A, Schmitt J, Edgar JH, Liu B, Koleske DD. Capacitance-voltage characterization of AlN MIS structures grown on 6H-SiC(0001) substrates by MOCVD Physica Status Solidi C: Conferences. 129-132. DOI: 10.1002/Pssc.200390006  0.381
2001 Liu L, Liu B, Shi Y, Edgar JH. Growth mode and defects in aluminum nitride sublimated on (0001) 6H-SiC substrates Materials Research Society Symposium - Proceedings. 639. DOI: 10.1557/S1092578300000193  0.6
2001 Shi Y, Liu B, Liu L, Edgar JH, Payzant EA, Hayes JM, Kuball M. New technique for sublimation growth of AlN single crystals Mrs Internet Journal of Nitride Semiconductor Research. 6. DOI: 10.1557/S109257830000017X  0.635
2001 Kuball M, Hayes JM, Shi Y, Edgar JH. Phonon lifetimes and phonon decay channels in single crystalline bulk aluminum nitride Materials Research Society Symposium - Proceedings. 639. DOI: 10.1557/Proc-639-G7.7  0.316
2001 Hayes JM, Kuball M, Shi Y, Edgar JH. Raman analysis of single crystalline bulk aluminum nitride: Temperature dependence of the phonon frequencies Materials Research Society Symposium - Proceedings. 639. DOI: 10.1557/Proc-639-G6.38  0.347
2001 Liu B, Shi Y, Liu L, Edgar JH, Braski DN. Surface morphology and composition characterization at the initial stages of AlN crystal growth Materials Research Society Symposium - Proceedings. 639. DOI: 10.1557/Proc-639-G3.13  0.647
2001 Kuball M, Hayes JM, Prins AD, Van Uden NWA, Dunstan DJ, Shi Y, Edgar JH. Raman scattering studies on single-crystalline bulk AIN under high pressures Applied Physics Letters. 78: 724-726. DOI: 10.1063/1.1344567  0.332
2001 Shi Y, Xie ZY, Liu LH, Liu B, Edgar JH, Kuball M. Influence of buffer layer and 6H-SiC substrate polarity on the nucleation of AlN grown by the sublimation sandwich technique Journal of Crystal Growth. 233: 177-186. DOI: 10.1016/S0022-0248(01)01560-3  0.623
2001 Kuball M, Hayes JM, Shi Y, Edgar JH, Prins AD, Van Uden NWA, Dunstan DJ. Raman scattering studies on single-crystalline bulk AlN: Temperature and pressure dependence of the AlN phonon modes Journal of Crystal Growth. 231: 391-396. DOI: 10.1016/S0022-0248(01)01469-5  0.337
2001 Xie ZY, Edgar JH, Burkland BK, George JT, Chaudhuri J. DPBs-free and polytype controlled growth of SiC via surface etching on on-axis 6H-SiC(0 0 0 1) Journal of Crystal Growth. 224: 235-243. DOI: 10.1016/S0022-0248(01)01024-7  0.435
2001 Hageman W, Xie Z, Edgar J, Zhuang D, Jagganathan S, Barghout K, Chaudhuri J, Rys A, Schmitt J. Growth of AlN on Etched 6H-SiC(0001) Substrates via MOCVD Physica Status Solidi (a) Applied Research. 188: 783-787. DOI: 10.1002/1521-396X(200112)188:2<783::Aid-Pssa783>3.0.Co;2-W  0.43
2001 Liu L, Zhuang D, Liu B, Shi Y, Edgar J, Rajasingam S, Kuball M. Characterization of Aluminum Nitride Crystals Grown by Sublimation Physica Status Solidi (a). 188: 769-774. DOI: 10.1002/1521-396X(200112)188:2<769::Aid-Pssa769>3.0.Co;2-G  0.621
2001 Shi Y, Liu B, Liu L, Edgar JH, Meyer HM, Payzant EA, Walker LR, Evans ND, Swadener JG, Chaudhuri J. Initial Nucleation Study and New Technique for Sublimation Growth of AlN on SiC Substrate Physica Status Solidi (a) Applied Research. 188: 757-762. DOI: 10.1002/1521-396X(200112)188:2<757::Aid-Pssa757>3.0.Co;2-S  0.618
2001 Liu L, Liu B, Shi Y, Edgar JH. Growth mode and defects in aluminum nitride sublimed on (0001) 6H-SiC substrates Mrs Internet Journal of Nitride Semiconductor Research. 6.  0.311
2000 Edgar JH, Robins LH, Coatney SE, Liu L, Chaudhuri J, Ignatiev K, Rek Z. Comparison of aluminum nitride freely nucleated and seeded on 6H-silicon carbide Materials Science Forum. 338: II/-. DOI: 10.4028/Www.Scientific.Net/Msf.338-342.1599  0.652
2000 Edgar JH, Robins LH, Coatney SE, Liu L, Chaudhuri J, Ignatiev K, Rek Z. A comparison of aluminum nitride freely nucleated and seeded on 6H-Silicon carbide Materials Science Forum. 338: 1599-1602. DOI: 10.4028/www.scientific.net/MSF.338-342.1599  0.407
2000 Chaudhuri J, George JT, Edgar JH, Xie ZY, Rek Z. Effect of in situ surface treatment on the growth of 3C-SiC thin films on 6H-SiC substrate - an X-ray triple crystal diffractometry and synchrotron X-ray topography study Materials Science Forum. 338. DOI: 10.4028/Www.Scientific.Net/Msf.338-342.1045  0.429
2000 Hayes JM, Kuball M, Shi Y, Edgar JH. Temperature Dependence of the Phonons of Bulk AlN Japanese Journal of Applied Physics. 39: 710-712. DOI: 10.1143/Jjap.39.L710  0.355
2000 Kuball M, Hayes JM, Shi Y, Edgar JH. Phonon lifetimes in bulk AlN and their temperature dependence Applied Physics Letters. 77: 1958-1960. DOI: 10.1063/1.1311948  0.338
2000 Chaudhuri J, Ignatiev K, Edgar JH, Xie ZY, Gao Y, Rek Z. Low temperature chemical vapor deposition of 3C-SiC on 6H-SiC - high resolution X-ray diffractometry and synchrotron X-ray topography study Materials Science and Engineering B: Solid-State Materials For Advanced Technology. 76: 217-224. DOI: 10.1016/S0921-5107(00)00451-7  0.429
2000 Wei CH, Edgar JH, Ignatiev C, Chaudhuri J. Role of trimethylgallium flow during nucleation layer deposition in the optimization of epitaxial GaN films Thin Solid Films. 360: 34-38. DOI: 10.1016/S0040-6090(99)00875-5  0.341
2000 Wei CH, Edgar JH. Unstable composition region in the wurtzite B1-x-yGaxAlyN system Journal of Crystal Growth. 208: 179-182. DOI: 10.1016/S0022-0248(99)00397-8  0.354
2000 Liu L, Edgar JH. Transport effects in the sublimation growth of aluminum nitride Journal of Crystal Growth. 220: 243-253. DOI: 10.1016/S0022-0248(00)00841-1  0.561
2000 Wei CH, Edgar JH. Thermodynamic analysis of GaxB1-xN grown by MOVPE Journal of Crystal Growth. 217: 109-114. DOI: 10.1016/S0022-0248(00)00498-X  0.366
2000 Xie ZY, Wei CH, Li LY, Yu QM, Edgar JH. Gaseous etching of 6H-SiC at relatively low temperatures Journal of Crystal Growth. 217: 115-124. DOI: 10.1016/S0022-0248(00)00480-2  0.363
2000 Wei CH, Xie ZY, Edgar JH, Zeng KC, Lin JY, Jiang HX, Chaudhuri J, Ignatiev C, Braski DN. MOCVD growth of GaBN on 6H-SiC (0001) substrates Journal of Electronic Materials. 29: 452-456. DOI: 10.1007/S11664-000-0160-Y  0.402
2000 Xie ZY, Wei CH, Chen SF, Jiang SY, Edgar JH. Surface etching of 6H-SiC (0001) and surface morphology of the subsequently grown GaN via MOCVD Journal of Electronic Materials. 29: 411-417. DOI: 10.1007/S11664-000-0153-X  0.376
2000 Wei CH, Xie ZY, Li LY, Yu QM, Edgar JH. MOCVD growth of cubic GaN on 3C-SiC deposited on Si(100) substrates Journal of Electronic Materials. 29: 317-321. DOI: 10.1007/S11664-000-0070-Z  0.425
1999 Wei CH, Xie ZY, Edgar JH, Zeng KC, Lin JY, Jiang HX, Ignatiev C, Chaudhuri J, Braski DN. Growth and characterization of BxGa1-xN on 6H-SiC (0001) by MOVPE Materials Research Society Symposium - Proceedings. 537. DOI: 10.1557/S1092578300002842  0.411
1999 Xie ZY, Wei CH, Li LY, Edgar JH, Chaudhuri J, Ignatiev C. Effects of surface preparation on epitaxial GaN on 6H-SiC deposited via MOCVD Mrs Internet Journal of Nitride Semiconductor Research. 4. DOI: 10.1557/S1092578300002593  0.43
1998 Wei CH, Xie ZY, Edgar JH, Zeng KC, Lin JY, Jiang HX, Ignatiev C, Chaudhuri J, Braski DN. Growth and Characterization of B x Ga l-x N on 6H-SiC (0001) by MOVPE Mrs Proceedings. 537. DOI: 10.1557/Proc-537-G3.79  0.345
1998 Chaudhur J, Ignatiev K, Edgar JH, Xie ZY, Gao Y. Low Temperature Chemical Vapor Deposition Of 3C-SiC On 6H-SiC – An X-Ray Triple Crystal Diffractometry And X-Ray Topography Study Mrs Proceedings. 512. DOI: 10.1557/Proc-512-169  0.469
1998 Edgar JH, Gao Y, Chaudhuri J, Cheema S, Casalnuovo SA, Yip PW, Sidorov MV. Selective epitaxial growth of silicon carbide on SiO2 masked Si(100): The effects of temperature Journal of Applied Physics. 84: 201-204. DOI: 10.1063/1.368017  0.447
1998 Xie ZY, Edgar JH, McCormick TL, Sidorov MV. The effects of the simultaneous addition of diborane and ammonia on the hot-filament-assisted chemical vapor deposition of diamond II. Characterization of diamond and BCN film Diamond and Related Materials. 7: 1357-1363. DOI: 10.1016/S0925-9635(98)00207-6  0.447
1998 Edgar JH, Xie ZY, Braski DN. The effects of the simultaneous addition of diborane and ammonia on the hot-filament assisted chemical vapor deposition of diamond Diamond and Related Materials. 7: 35-42. DOI: 10.1016/S0925-9635(97)00159-3  0.371
1998 Gao Y, Edgar JH, Chaudhuri J, Cheema SN, Sidorov MV, Braski DN. Low-temperature chemical-vapor deposition of 3C-SiC films on Si(100) using SiH4-C2H4-HCl-H2 Journal of Crystal Growth. 191: 439-445. DOI: 10.1016/S0022-0248(98)00212-7  0.377
1998 Edgar JH, Gao Y, Chaudhuri J, Cheema S, Casalnuovo SA, Yip PW, Sidorov MV. Selective epitaxial growth of silicon carbide on SiO2 masked Si(100): The effects of temperature Journal of Applied Physics. 84: 201-204.  0.343
1997 Gao Y, Edgar JH. Thermodynamic analysis of blanket and selective epitaxy of SiC on Si and SiO2 masked Si Materials Research Society Symposium - Proceedings. 441: 735-740. DOI: 10.1557/Proc-441-735  0.355
1997 Edgar JH, Gao Y. Influence of HCl and H2 on the heteroepitaxial growth of 3C-SiC films on Si(100) via low-temperature chemical vapor deposition Materials Research Society Symposium - Proceedings. 441: 699-704. DOI: 10.1557/Proc-441-699  0.422
1997 Gao Y, Edgar JH. Selective epitaxial growth of SiC: Thermodynamic analysis of the Si-C-Cl-H and Si-C-Cl-H-O systems Journal of the Electrochemical Society. 144: 1875-1880. DOI: 10.1149/1.1837694  0.352
1997 Edgar JH, Wei CH, Smith DT, Kistenmacher TJ, Bryden WA. Hardness, elastic modulus and structure of indium nitride thin films on AIN-nucleated sapphire substrates Journal of Materials Science: Materials in Electronics. 8: 307-312. DOI: 10.1023/A:1018587306451  0.429
1997 Edgar JH, Smith DT, Eddy CR, Carosella CA, Sartwell BD. c-Boron-aluminum nitride alloys prepared by ion-beam assisted deposition Thin Solid Films. 298: 33-38. DOI: 10.1016/S0040-6090(96)08884-0  0.34
1997 Edgar JH, Yu ZJ, Smith DJ, Chaudhuri J, Cheng X. X-ray diffraction and high resolution transmission electron microscopy of 3C-SiC/AlN/6H-SiC(0001) Journal of Electronic Materials. 26: 1389-1393. DOI: 10.1007/S11664-997-0056-1  0.438
1996 Chaudhuri J, Thokala R, Edgar JH, Sywe BS. X-ray double crystal and X-ray topographic characterization of silicon carbide thin films on silicon, titanium carbide, 6H-silicon carbide, and aluminum nitride/sapphire substrates Thin Solid Films. 274: 23-30. DOI: 10.1016/0040-6090(95)07087-7  0.438
1996 Edgar JH, Carosella CA, Eddy CR, Smith DT. Effect of beam voltage on the properties of aluminium nitride prepared by ion beam assisted deposition Journal of Materials Science: Materials in Electronics. 7: 247-253. DOI: 10.1007/Bf00188950  0.315
1995 Edgar JH, Eddy CR, Sprague JA, Sartwell BD. Ion beam deposition of boron-aluminum nitride thin films Materials Research Society Symposium - Proceedings. 388: 183-188. DOI: 10.1557/Proc-388-183  0.339
1995 Chaudhuri J, Thokala R, Edgar JH, Sywe BS. Characterization Of Single Crystal Epitaxial Aluminum Nitride Thin Films On Sapphire, Silicon Carbide And Silicon Substrates By X-Ray Double Crystal Diffractometry And Transmission Electron Microscopy Advances in X-Ray Analysis. 39: 645-651. DOI: 10.1154/S0376030800023077  0.435
1995 Chaudhuri J, Thokala R, Edgar JH, Sywe BS. X-ray double crystal characterization of single crystal epitaxial aluminum nitride thin films on sapphire, silicon carbide and silicon substrates Journal of Applied Physics. 77: 6263-6266. DOI: 10.1063/1.359158  0.456
1994 Sywe BS, Yu ZJ, Burckhard S, Edgar JH. Epitaxial growth of SiC on sapphire substrates with an AIN buffer layer Journal of the Electrochemical Society. 141: 510-513. DOI: 10.1149/1.2054756  0.447
1994 Dissanayake A, Lin JY, Jiang HX, Yu ZJ, Edgar JH. Low-temperature epitaxial growth and photoluminescence characterization of GaN Applied Physics Letters. 65: 2317-2319. DOI: 10.1063/1.112729  0.391
1992 Sywe BS, Yu ZJ, Edgar JH, Chaudhuri J. Growth and Characterization of Layered Structures of Silicon Carbide and Aluminum Nitride Mrs Proceedings. 281. DOI: 10.1557/Proc-281-787  0.397
1992 Sywe BS, Yu ZJ, Edgar JH. Epitaxial Growth of AlN on 3C-SiC and Al 2 O 3 Substrates Mrs Proceedings. 242. DOI: 10.1557/Proc-242-463  0.315
1992 Yu ZJ, Sywe BS, Edgar JH. Characterization of Al X Ga 1-x N Grown by MOCVD at Low Temperatures Mrs Proceedings. 242: 421. DOI: 10.1557/Proc-242-421  0.303
1992 Ahmed AU, Rys A, Singh N, Edgar JH, Yu ZJ. Electrical and compositional properties of AlN-Si interfaces Journal of the Electrochemical Society. 139: 1146-1151. DOI: 10.1149/1.2069355  0.334
1992 Yu ZJ, Sywe BS, Ahmed AU, Edgar JH. The growth and characterization of GaN on sapphire and silicon Journal of Electronic Materials. 21: 383-387. DOI: 10.1007/Bf02660470  0.404
1991 Yu ZJ, Edgar JH, Ahmed AU, Rys A. Metalorganic surface chemical adsorption deposition of AlN films by ammonia and trimethylaluminum Journal of the Electrochemical Society. 138: 196-199. DOI: 10.1149/1.2085536  0.397
1991 Powell JA, Petit JB, Edgar JH, Jenkins IG, Matus LG, Choyke WJ, Clemen L, Yoganathan M, Yang JW, Pirouz P. Application of oxidation to the structural characterization of SiC epitaxial films Applied Physics Letters. 59: 183-185. DOI: 10.1063/1.105960  0.304
1991 Powell JA, Petit JB, Edgar JH, Jenkins IG, Matus LG, Yang JW, Pirouz P, Choyke WJ, Clemen L, Yoganathan M. Controlled growth of 3C-SiC and 6H-SiC films on low-tilt-angle vicinal (0001) 6H-SiC wafers Applied Physics Letters. 59: 333-335. DOI: 10.1063/1.105587  0.414
1991 Edgar JH, Yu ZJ, Sywe BS. A comparison of NF3 and NH3 as the nitrogen sources for AIN crystal growth by metalorganic chemical vapor deposition Thin Solid Films. 204: 115-121. DOI: 10.1016/0040-6090(91)90497-L  0.373
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