Tat Ngai, Ph.D. - Publications
Affiliations: | 2002 | University of Texas at Austin, Austin, Texas, U.S.A. |
Area:
Electronics and Electrical EngineeringYear | Citation | Score | |||
---|---|---|---|---|---|
2004 | Chen X, Joshi S, Chen J, Ngai T, Banerjee SK. MOS capacitors on epitaxial Ge-Si |
0.353 | |||
2002 | Ngai T, Chen X, Chen J, Banerjee SK. Improving SiO |
0.372 | |||
1999 | Sharma R, Fretwell JL, Ngai T, Banerjee S. Remote plasma-assisted deposition of gate quality oxides without the use of a preoxidation step Journal of the Electrochemical Society. 146: 2229-2234. DOI: 10.1149/1.1391919 | 0.342 | |||
1999 | Sharma R, Fretwell JL, Ngai T, Banerjee S. Properties of gate quality silicon dioxide films deposited on Si-Ge using remote plasma-enhanced chemical vapor deposition with no preoxidation Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 17: 460-464. | 0.327 | |||
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