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Runshen Xu, Ph.D. - Publications

Affiliations: 
2013 University of Illinois at Chicago, Chicago, IL, United States 
Area:
Chemical Engineering, Materials Science Engineering
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6 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2013 Walter A, Xu R, Jursich G, Takoudis C. Tunability of Atomic Layer Deposition of Yttria-Stabilized Zirconium Oxide for use in Solid Oxide Fuel Cells The Journal of Undergraduate Research At the University of Illinois At Chicago. 6. DOI: 10.5210/Jur.V6I1.7519  0.549
2013 Xu R, Selvaraj SK, Jursich G, Feinerman A, Takoudisa C. Nucleation behavior-morphology-resistivity of atomic layer deposited pt on atomic layer deposited yttria-stabilized zirconia films Ecs Journal of Solid State Science and Technology. 2. DOI: 10.1149/2.017311Jss  0.386
2012 James C, Xu R, Jursich G, Takoudis C. Atomic Layer Deposition of Zirconium Oxide for Fuel Cell Applications The Journal of Undergraduate Research At the University of Illinois At Chicago. 5. DOI: 10.5210/Jur.V5I1.7505  0.538
2012 Xu R, Takoudis CG. Chemical passivation of GaSb-based surfaces by atomic layer deposited ZnS using diethylzinc and hydrogen sulfide Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 30. DOI: 10.1116/1.3669519  0.562
2012 Xu R, Tao Q, Yang Y, Takoudis CG. Atomic layer deposition and characterization of stoichiometric erbium oxide thin dielectrics on Si(1 0 0) using (CpMe) 3Er precursor and ozone Applied Surface Science. 258: 8514-8520. DOI: 10.1016/J.Apsusc.2012.05.019  0.55
2011 Banerjee K, Huang J, Ghosh S, Xu R, Takoudis CG, Plis E, Krishna S, Ketharanathan S, Chriss M. Surface study of thioacetamide and zinc sulfide passivated long wavelength infrared type-II strained layer superlattice Proceedings of Spie - the International Society For Optical Engineering. 8012. DOI: 10.1117/12.900198  0.527
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