Rik Blumenthal - Publications

Affiliations: 
Auburn University, Auburn, AL, United States 
Area:
Physical Chemistry, Fluid and Plasma Physics

9 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2006 Blumenthal R, Webb SF. Role of neutral molecule chemistry in electron cyclotron resonance microwave plasmas capable of diamond deposition Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 643-650. DOI: 10.1116/1.2174028  0.591
2006 Valliere R, Blumenthal R. Strong synergistic effects in the combustion of propellants in H2 Plasmas Journal of Applied Physics. 100: 84904. DOI: 10.1063/1.2353791  0.46
2005 Orland A, Blumenthal R. Nebulizing Spray Technique for Deposition of Propellant Thin Films Journal of Propulsion and Power. 21: 571-573. DOI: 10.2514/1.11851  0.426
1999 Webb SF, Gaddy GA, Blumenthal R. Investigation Of 4% Carbon In Hydrogen Electron Cyclotron Resonance Microwave Plasmas Using Ethane As The Source Gas Journal of Vacuum Science and Technology. 17: 2456-2462. DOI: 10.1116/1.581982  0.303
1999 Gaddy GA, Webb SF, Blumenthal R. Supersonic Pulse, Plasma Sampling Mass Spectrometry: Theory and Practice Plasma Chemistry and Plasma Processing. 19: 513-544. DOI: 10.1023/A:1021834527218  0.345
1998 Webb SF, Gaddy GA, Blumenthal R. Distribution of species within an ethylene electron cyclotron resonance-microwave plasma Journal of Vacuum Science and Technology. 16: 2148-2152. DOI: 10.1116/1.581322  0.321
1997 Webb SF, Gaddy GA, Blumenthal R. Determining the number of chemical steps responsible, for the distribution of molecular species within an electron cyclotron resonance-microwave plasma Journal of Vacuum Science and Technology. 15: 647-653. DOI: 10.1116/1.580699  0.326
1997 Gaddy GA, Webb SF, Blumenthal R. Mass spectrometric determination of the percent dissociation of a high-density chlorine plasma Applied Physics Letters. 71: 3206-3208. DOI: 10.1063/1.120291  0.336
1996 Zhu H, Webb SF, Blumenthal R. The Chemical Composition Of Diamond Plasmas Journal of Vacuum Science and Technology. 14: 952-959. DOI: 10.1116/1.580421  0.414
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