Rik Blumenthal - Publications
Affiliations: | Auburn University, Auburn, AL, United States |
Area:
Physical Chemistry, Fluid and Plasma PhysicsYear | Citation | Score | |||
---|---|---|---|---|---|
2006 | Blumenthal R, Webb SF. Role of neutral molecule chemistry in electron cyclotron resonance microwave plasmas capable of diamond deposition Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 643-650. DOI: 10.1116/1.2174028 | 0.591 | |||
2006 | Valliere R, Blumenthal R. Strong synergistic effects in the combustion of propellants in H2 Plasmas Journal of Applied Physics. 100: 84904. DOI: 10.1063/1.2353791 | 0.46 | |||
2005 | Orland A, Blumenthal R. Nebulizing Spray Technique for Deposition of Propellant Thin Films Journal of Propulsion and Power. 21: 571-573. DOI: 10.2514/1.11851 | 0.426 | |||
1999 | Webb SF, Gaddy GA, Blumenthal R. Investigation Of 4% Carbon In Hydrogen Electron Cyclotron Resonance Microwave Plasmas Using Ethane As The Source Gas Journal of Vacuum Science and Technology. 17: 2456-2462. DOI: 10.1116/1.581982 | 0.303 | |||
1999 | Gaddy GA, Webb SF, Blumenthal R. Supersonic Pulse, Plasma Sampling Mass Spectrometry: Theory and Practice Plasma Chemistry and Plasma Processing. 19: 513-544. DOI: 10.1023/A:1021834527218 | 0.345 | |||
1998 | Webb SF, Gaddy GA, Blumenthal R. Distribution of species within an ethylene electron cyclotron resonance-microwave plasma Journal of Vacuum Science and Technology. 16: 2148-2152. DOI: 10.1116/1.581322 | 0.321 | |||
1997 | Webb SF, Gaddy GA, Blumenthal R. Determining the number of chemical steps responsible, for the distribution of molecular species within an electron cyclotron resonance-microwave plasma Journal of Vacuum Science and Technology. 15: 647-653. DOI: 10.1116/1.580699 | 0.326 | |||
1997 | Gaddy GA, Webb SF, Blumenthal R. Mass spectrometric determination of the percent dissociation of a high-density chlorine plasma Applied Physics Letters. 71: 3206-3208. DOI: 10.1063/1.120291 | 0.336 | |||
1996 | Zhu H, Webb SF, Blumenthal R. The Chemical Composition Of Diamond Plasmas Journal of Vacuum Science and Technology. 14: 952-959. DOI: 10.1116/1.580421 | 0.414 | |||
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