| Year |
Citation |
Score |
| 2003 |
Feng Z, Lovell EG, Engelstad RL, Mikkelson AR, Reu PL, Sohn J, Blaedel KL, Claudet AA. EUV mask stress mapping by an experimental and hybrid finite element technique Proceedings of Spie - the International Society For Optical Engineering. 5037: 879-889. DOI: 10.1117/12.490139 |
0.601 |
|
| 2003 |
Wood OR, Reu PL, Engelstad RL, Lovell EG, Lercel MJ, Thiel CW, Lawliss MS, Mackay RS. Reduction of image placement errors in EPL masks Proceedings of Spie - the International Society For Optical Engineering. 5037: 521-530. DOI: 10.1117/12.490136 |
0.669 |
|
| 2003 |
Reu PL, Chen CF, Engelstad RL, Lovell EG, Lercel MJ, Wood OR, Mackay RS. Predicting overlay performance for electron-projection-lithography masks Journal of Microlithography, Microfabrication and Microsystems. 2: 148-156. DOI: 10.1117/1.1563646 |
0.755 |
|
| 2003 |
Cotte EP, Mikkelson AR, Matesanz O, Engelstad RL, Lovell EG, Reu PL. Predicting critical dimension uniformity in advanced electron-beam projection lithography masks Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 3027-3031. DOI: 10.1116/1.1614251 |
0.65 |
|
| 2003 |
Reu PL, Engelstad RL, Lovell EG. Mask distortion issues for next-generation lithography Microelectronic Engineering. 69: 420-428. DOI: 10.1016/S0167-9317(03)00330-7 |
0.735 |
|
| 2002 |
Feng Z, Lovell EG, Engelstad RL, Mikkelson AR, Reu PL, Sohn J. Film stress characterization using substrate shape data and numerical techniques Materials Research Society Symposium - Proceedings. 750: 249-254. DOI: 10.1557/Proc-750-Y3.4 |
0.71 |
|
| 2002 |
Reu PL, Chen CF, Engelstad RL, Lovell EG, Lercel MJ, Wood OR, Mackay RS. Predicting overlay performance for electron projection lithography masks Proceedings of Spie - the International Society For Optical Engineering. 4688: 547-558. DOI: 10.1117/12.472280 |
0.554 |
|
| 2002 |
Cotte EP, Reu PL, Engelstad RL, Lovell EG, Grenville A, Van Peski CK. Experimental and numerical studies of the response of photomask hard pellicles to acoustic excitation Proceedings of Spie - the International Society For Optical Engineering. 4889: 1121-1132. DOI: 10.1117/12.468606 |
0.56 |
|
| 2002 |
Reu PL, Chen CF, Engelstad RL, Lovell EG, Bayer T, Greschner J, Kalt S, Weiss H, Wood OR, Mackay RS. Electron projection lithography mask format layer stress measurement and simulation of pattern transfer distortion Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 3053-3057. DOI: 10.1116/1.1521732 |
0.732 |
|
| 2001 |
Abdo AY, Reu PL, Schlax MP, Engelstad RL, Beckman WA, Mitchell JW, Lovell EG. Experimental model verification of the thermal response of optical reticles Proceedings of Spie - the International Society For Optical Engineering. 4346: 1478-1483. DOI: 10.1117/12.435687 |
0.576 |
|
| 2001 |
Reu PL, Mikkelson AR, Schlax MP, Cotte EP, Siewert LK, Engelstad RL, Lovell EG, Dao G, Zheng JF. Mechanical analysis of hard pellicles for 157 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 4346: 1166-1174. DOI: 10.1117/12.435651 |
0.5 |
|
| 2001 |
Reu PL, Engelstad RL, Lovell EG, Magg CK, Lercel MJ, Mackay RS. Simulating the effects of pattern density gradients on electron-beam projection lithography pattern transfer distortions Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2652-2658. DOI: 10.1116/1.1409387 |
0.74 |
|
| 2001 |
Lercel M, Magg C, Lawliss M, Williams C, Caldwell N, Ackel R, Kindt L, Racette K, Reu P, Engelstad R, Mackay RS. Patterning-induced image placement distortions on electron beam projection lithography membrane masks Journal of Vacuum Science & Technology B. 19: 2671-2677. DOI: 10.1116/1.1409381 |
0.692 |
|
| 2001 |
Reu P, Engelstad R, Lovell E, Magg C, Lercel M. Modeling mask fabrication and pattern transfer distortions for EPL stencil masks Microelectronic Engineering. 57: 467-473. DOI: 10.1016/S0167-9317(01)00470-1 |
0.74 |
|
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