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Paul Ruchhoeft - Publications

Affiliations: 
University of Houston, Houston, TX, United States 
Area:
Electronics and Electrical Engineering, Biomedical Engineering, Materials Science Engineering
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41 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2019 Chen Y, Sawadichai R, Tian S, Donnelly VM, Ruchhoeft P, Economou DJ. Nearly monoenergetic positive ion beam with self-neutralized space charge extracted from a pulsed plasma Journal of Physics D: Applied Physics. 52: 355205. DOI: 10.1088/1361-6463/Ab294E  0.316
2018 Ruiz A, Ruchhoeft P, Litvinov D. Fabrication and characterization of annular magnetic nanostructures Aip Advances. 8: 095220. DOI: 10.1063/1.5048796  0.435
2016 Raja B, Pascente C, Knoop J, Shakarisaz D, Sherlock T, Kemper S, Kourentzi K, Renzi RF, Hatch AV, Olano J, Peng BH, Ruchhoeft P, Willson R. An embedded microretroreflector-based microfluidic immunoassay platform. Lab On a Chip. PMID 27025227 DOI: 10.1039/C6Lc00038J  0.794
2015 Tian S, Donnelly VM, Ruchhoeft P, Economou DJ. Sub-10 nm nanopantography Applied Physics Letters. 107. DOI: 10.1063/1.4935552  0.422
2014 Wang Y, Kar A, Paterson A, Kourentzi K, Le H, Ruchhoeft P, Willson R, Bao J. Transmissive Nanohole Arrays for Massively-Parallel Optical Biosensing. Acs Photonics. 1: 241-245. PMID 25530982 DOI: 10.1021/Ph400111U  0.376
2014 Garvey G, Shakarisaz D, Ruiz-Ruiz F, Hagström AE, Raja B, Pascente C, Kar A, Kourentzi K, Rito-Palomares M, Ruchhoeft P, Willson RC. Microretroreflector-sedimentation immunoassays for pathogen detection. Analytical Chemistry. 86: 9029-35. PMID 25133758 DOI: 10.1021/Ac501491T  0.381
2014 Bergen MH, Nichols J, Collier CM, Jin X, Raja B, Roberts DJ, Ruchhoeft P, Willson RC, Holzman JF. Retroreflective imaging system for optical labeling and detection of microorganisms. Applied Optics. 53: 3647-55. PMID 24921128 DOI: 10.1364/Ao.53.003647  0.388
2013 Wang S, Sherlock T, Salazar B, Sudheendran N, Manapuram RK, Kourentzi K, Ruchhoeft P, Willson RC, Larin KV. Detection and Monitoring of Microparticles Under Skin by Optical Coherence Tomography as an Approach to Continuous Glucose Sensing Using Implanted Retroreflectors. Ieee Sensors Journal. 13: 4534-4541. PMID 26413034 DOI: 10.1109/Jsen.2013.2270008  0.774
2013 Cacao E, Sherlock T, Nasrullah A, Kemper S, Knoop J, Kourentzi K, Ruchhoeft P, Stein GE, Atmar RL, Willson RC. Helium beam shadowing for high spatial resolution patterning of antibodies on microstructured diagnostic surfaces. Biointerphases. 8: 9. PMID 24706125 DOI: 10.1186/1559-4106-8-9  0.74
2013 Zheng Z, Chang L, Nekrashevich I, Ruchhoeft P, Khizroev S, Litvinov D. Fabrication of dense non-circular nanomagnetic device arrays using self-limiting low-energy glow-discharge processing. Plos One. 8: e73083. PMID 23967340 DOI: 10.1371/Journal.Pone.0073083  0.392
2013 Cacao EE, Nasrullah A, Sherlock T, Kemper S, Kourentzi K, Ruchhoeft P, Stein GE, Willson RC. High-resolution, high-throughput, positive-tone patterning of poly(ethylene glycol) by helium beam exposure through stencil masks. Plos One. 8: e56835. PMID 23717382 DOI: 10.1371/Journal.Pone.0056835  0.732
2013 Wang S, Sherlock T, Salazar B, Sudheendran N, Manapuram RK, Kourentzi K, Ruchhoeft P, Willson RC, Larin KV. Detection and monitoring of microparticles under skin by optical coherence tomography as an approach to continuous glucose sensing Using Implanted Retroreflectors Ieee Sensors Journal. 13: 4534-4541. DOI: 10.1109/JSEN.2013.2270008  0.74
2012 Chang LV, Nasruallah A, Ruchhoeft P, Khizroev S, Litvinov D. Graded bit patterned magnetic arrays fabricated via angled low-energy He ion irradiation Nanotechnology. 23. PMID 22710657 DOI: 10.1088/0957-4484/23/27/275705  0.371
2012 Litvinov J, Nasrullah A, Sherlock T, Wang YJ, Ruchhoeft P, Willson RC. High-throughput top-down fabrication of uniform magnetic particles Plos One. 7. PMID 22693574 DOI: 10.1371/Journal.Pone.0037440  0.734
2012 Raja B, Shakarisaz D, Knoop J, Cacao E, Sherlock T, Kar A, Kourentzi K, Kemper S, Garvey G, Ruchhoeft P, Olano J, Atmar R, Renzi R, Hatch A, Willson R. Microfabricated Retroreflectors for Sensitive, Simple Diagnostics New Biotechnology. 29: S157-S158. DOI: 10.1016/J.Nbt.2012.08.437  0.732
2011 Sherlock T, Nasrullah A, Litvinov J, Cacao E, Knoop J, Kemper S, Kourentzi K, Kar A, Ruchhoeft P, Willson R. Suspended, micron-scale corner cube retroreflectors as ultra-bright optical labels. Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures : Processing, Measurement, and Phenomena : An Official Journal of the American Vacuum Society. 29. PMID 25530695 DOI: 10.1116/1.3656801  0.746
2010 Ivers SN, Baranov SA, Sherlock T, Kourentzi K, Ruchhoeft P, Willson R, Larin KV. Depth-resolved imaging and detection of micro-retroreflectors within biological tissue using Optical Coherence Tomography. Biomedical Optics Express. 1: 367-377. PMID 21258473 DOI: 10.1364/Boe.1.000367  0.777
2010 Ivers SN, Baranov SA, Sherlock T, Kourentzi K, Ruchhoeft P, Willson R, Larin KV. Depth-resolved imaging and detection of microretroreflectors within biological tissue using optical coherence tomography Biomedical Optics Express. 1: 367-377. DOI: 10.1364/BOE.1.000367  0.756
2009 Nasrullah A, Smith D, Sherlock T, Ruchhoeft P, Litvinov D. Near neighbor averaging: A technique for improving image uniformity in aperture array lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2674-2678. DOI: 10.1116/1.3265462  0.743
2009 Smith DT, Chang L, Rantschler JO, Kalatsky V, Ruchhoeft P, Khizroev S, Litvinov D. Size distribution and anisotropy effects on the switching field distribution of Co/Pd multilayered nanostructure arrays Ieee Transactions On Magnetics. 45: 3554-3557. DOI: 10.1109/Tmag.2009.2025186  0.305
2008 Litvinov D, Parekh V, E C, Smith D, Rantschler J, Ruchhoeft P, Weller D, Khizroev S. Nanoscale bit-patterned media for next generation data storage systems Journal of Nanoelectronics and Optoelectronics. 3: 93-112. DOI: 10.1166/Jno.2008.201  0.39
2008 Litvinov D, Parekh V, Chunsheng E, Smith D, Owen Rantschler J, Ruchhoeft P, Weller D, Khizroev S. Recording physics, design considerations, and fabrication of nanoscale bit-patterned media Ieee Transactions On Nanotechnology. 7: 463-476. DOI: 10.1109/Tnano.2008.920183  0.395
2008 Chunsheng E, Parekh V, Ruchhoeft P, Khizroev S, Litvinov D. Magnetization reversal in patterned (CoPd)n multilayers Journal of Applied Physics. 103. DOI: 10.1063/1.2885102  0.324
2008 Xu L, Nasrullah A, Chen Z, Jain M, Ruchhoeft P, Economou DJ, Donnelly VM. Etching of nanopatterns in silicon using nanopantography Applied Physics Letters. 92. DOI: 10.1063/1.2828208  0.771
2007 Parekh VA, Ruiz A, Ruchhoeft P, Brankovic S, Litvinov D. Close-packed noncircular nanodevice pattern generation by self-limiting ion-mill process Nano Letters. 7: 3246-3248. PMID 17725377 DOI: 10.1021/Nl071793R  0.42
2007 Parekh V, Ruiz A, Chunsheng E, Rantschler J, Ruchhoeft P, Khizroev S, Litvinov D, Weller D. Fabrication of patterned recording medium using ion beam proximity lithography 2007 7th Ieee International Conference On Nanotechnology - Ieee-Nano 2007, Proceedings. 632-636. DOI: 10.1109/NANO.2007.4601270  0.314
2006 Zomorrodian V, Craver B, Radhakrishnan G, Patel M, Charlson EJ, Ruchhoeft P, Wolfe JC. Threshold voltage adjustment on spherical, single-crystal silicon substrates by focused ion beam implantation Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 3221-3226. DOI: 10.1116/1.2387152  0.355
2006 Parekh V, Ruiz A, Ruchhoeft P, Nounu H, Litvinov D, Wolfe JC. Estimation of scattered particle exposure in ion beam aperture array lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 2915-2919. DOI: 10.1116/1.2366619  0.414
2006 Parekh V, Chunsheng E, Smith D, Ruiz A, Wolfe JC, Ruchhoeft P, Svedberg E, Khizroev S, Litvinov D. Fabrication of a high anisotropy nanoscale patterned magnetic recording medium for data storage applications Nanotechnology. 17: 2079-2082. DOI: 10.1088/0957-4484/17/9/001  0.364
2005 Xu L, Vemula SC, Jain M, Nam SK, Donnelly VM, Economou DJ, Ruchhoeft P. Nanopantography: a new method for massively parallel nanopatterning over large areas. Nano Letters. 5: 2563-8. PMID 16351216 DOI: 10.1021/Nl051976I  0.442
2005 Han K, Morgan M, Ruiz A, Vemula SC, Ruchhoeft P. Rapid prototyping of infrared bandpass filters using aperture array lithography Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 23: 3158. DOI: 10.1116/1.2062653  0.369
2005 Han K, Xu W, Ruiz A, Ruchhoeft P, Chellam S. Fabrication and characterization of polymeric microfiltration membranes using aperture array lithography Journal of Membrane Science. 249: 193-206. DOI: 10.1016/J.Memsci.2004.09.044  0.399
2003 Loeschner H, Buschbeck H, Ecker M, Horner C, Platzgummer E, Stengl G, Zeininger M, Ruchhoeft P, Wolfe JC. Masked ion beam lithography and direct-structuring on curved surfaces Proceedings of Spie - the International Society For Optical Engineering. 5037: 156-161. DOI: 10.1117/12.482716  0.315
2003 Loeschner H, Stengl G, Buschbeck H, Chalupka A, Lammer G, Platzgummer E, Vonach H, De Jager PWH, Kaesmaier R, Ehrmann A, Hirscher S, Wolter A, Dietzel A, Berger R, Grimm H, ... ... Ruchhoeft P, et al. Large-field particle beam optics for projection and proximity printing and for maskless lithography Journal of Microlithography, Microfabrication and Microsystems. 2: 34-48. DOI: 10.1117/1.1528946  0.398
2002 Ruchhoeft P, Wolfe JC, Torres JL, Bass R. Scattering mask concept for ion-beam nanolithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2705-2708. DOI: 10.1116/1.1520568  0.334
2002 Ruchhoeft P, Wolfe JC, Bass R. Ion beam proximity lithography on spherical substrates with continuously scanned, self-complementary masks Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 87-89. DOI: 10.1116/1.1428273  0.42
2001 Ruchhoeft P, Wolfe JC, Bass R. Ion beam aperture-array lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2529-2532. DOI: 10.1116/1.1420578  0.426
2000 Ruchhoeft P, Wolfe JC. Optimal strategy for controlling linewidth on spherical focal surface arrays Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3185-3189. DOI: 10.1116/1.1319842  0.319
1999 Ruchhoeft P, Colburn M, Choi B, Nounu H, Johnson S, Bailey T, Damle S, Stewart M, Ekerdt J, Sreenivasan SV, Wolfe JC, Willson CG. Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography Journal of Vacuum Science & Technology B. 17: 2965-2969. DOI: 10.1116/1.590935  0.425
1999 Ruchhoeft P, Colburn M, Choi B, Nounu H, Johnson S, Bailey T, Damle S, Stewart M, Ekerdt J, Sreenivasan SV, Wolfe JC, Willson CG. Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 17: 2965-2969.  0.314
1998 Ruchhoeft P. Fabrication of silicon stencil masks with vitreous carbon ion-absorbing coatings Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 16: 3599. DOI: 10.1116/1.590385  0.335
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