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Xiaohua Du, Ph.D. - Publications

Affiliations: 
2007 Chemical Engineering University of Colorado, Boulder, Boulder, CO, United States 
Area:
Chemical Engineering, Physical Chemistry
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9 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2009 Du X, Zhang K, Holland K, Tombler T, Moskovits M. Chemical corrosion protection of optical components using atomic layer deposition. Applied Optics. 48: 6470-4. PMID 19935967 DOI: 10.1364/Ao.48.006470  0.562
2009 King DM, Johnson SI, Li J, Du X, Liang X, Weimer AW. Atomic layer deposition of quantum-confined ZnO nanostructures. Nanotechnology. 20: 195401. PMID 19420639 DOI: 10.1088/0957-4484/20/19/195401  0.624
2008 King DM, Du X, Cavanagh AS, Weimer AW. Quantum confinement in amorphous TiO(2) films studied via atomic layer deposition. Nanotechnology. 19: 445401. PMID 21832729 DOI: 10.1088/0957-4484/19/44/445401  0.63
2008 Du X, Du Y, George SM. CO gas sensing by ultrathin tin oxide films grown by atomic layer deposition using transmission FTIR spectroscopy. Journal of Physical Chemistry A. 112: 9211-9219. PMID 18710189 DOI: 10.1021/Jp800518V  0.62
2008 Zhan GD, Du X, King DM, Hakim LF, Liang X, McCormick JA, Weimer AW. Atomic layer deposition on bulk quantities of surfactant-modified single-walled carbon nanotubes Journal of the American Ceramic Society. 91: 831-835. DOI: 10.1111/J.1551-2916.2007.02210.X  0.611
2008 Cooper R, Upadhyaya HP, Minton TK, Berman MR, Du X, George SM. Protection of polymer from atomic-oxygen erosion using Al2O3 atomic layer deposition coatings Thin Solid Films. 516: 4036-4039. DOI: 10.1016/J.Tsf.2007.07.150  0.598
2008 Du X, George SM. Thickness dependence of sensor response for CO gas sensing by tin oxide films grown using atomic layer deposition Sensors and Actuators B-Chemical. 135: 152-160. DOI: 10.1016/J.Snb.2008.08.015  0.628
2005 Du X, Du Y, George SM. In situ examination of tin oxide atomic layer deposition using quartz crystal microbalance and Fourier transform infrared techniques Journal of Vacuum Science and Technology. 23: 581-588. DOI: 10.1116/1.1914810  0.61
2005 Du Y, Du X, George SM. SiO2 film growth at low temperatures by catalyzed atomic layer deposition in a viscous flow reactor Thin Solid Films. 491: 43-53. DOI: 10.1016/J.Tsf.2005.05.051  0.651
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