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Lixin Zhao - Publications

Affiliations: 
The Institute of High Energy Physics (IHEP) Chinese Academy of Sciences (CAS) 
Website:
http://tushu.zzgx.cn/grid2008/DetailAuthor/DetailView.aspx?authorId=09583612&authorName=%E8%B5%B5%E6%A3%A3%E6%96%B0
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11 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2019 Tang Y, Liu J, Yang Y, Hu S, Zhao L, Si X. Large range nano alignment for proximity lithography using complex grating Optics and Laser Technology. 112: 101-106. DOI: 10.1016/J.Optlastec.2018.10.049  0.344
2017 Zhou Y, Tang Y, Zhu J, Deng Q, Yang Y, Zhao L, Hu S. Characterization of micro structure through hybrid interference and phase determination in broadband light interferometry. Applied Optics. 56: 2301-2306. PMID 28375269 DOI: 10.1364/Ao.56.002301  0.349
2017 Zhou Y, Tang Y, Deng Q, Zhao L, Hu S. Contrast enhancement of microsphere-assisted super-resolution imaging in dark-field microscopy Applied Physics Express. 10: 82501. DOI: 10.7567/Apex.10.082501  0.31
2017 Zhou Y, Tang Y, Deng Q, Liu J, Wang J, Zhao L. Dimensional metrology of smooth micro structures utilizing the spatial modulation of white-light interference fringes Optics and Laser Technology. 93: 187-193. DOI: 10.1016/J.Optlastec.2017.03.005  0.361
2017 Cheng Y, Zhu J, He Y, Tang Y, Hu S, Zhao L. Quadratic grating apodized photon sieves for simultaneous multiplane microscopy Optics and Lasers in Engineering. 97: 78-85. DOI: 10.1016/J.Optlaseng.2017.05.002  0.329
2015 Zhu X, Hu S, Zhao L. Wafer focusing measurement of optical lithography system based on Hartmann–Shack wavefront testing Optics and Lasers in Engineering. 66: 128-131. DOI: 10.1016/J.Optlaseng.2014.09.001  0.344
2014 Zhu X, Hu S, Zhao L. Focal length measurement of a microlens-array by grating shearing interferometry. Applied Optics. 53: 6663-9. PMID 25322367 DOI: 10.1364/Ao.53.006663  0.31
2014 He Y, Zhao L, Tang Y, Hu S. A hybrid doubled achromat based on a photon sieve Optik. 125: 958-961. DOI: 10.1016/J.Ijleo.2013.07.111  0.315
2013 Zhu J, Hu S, Yu J, Zhou S, Tang Y, Zhong M, Zhao L, Chen M, Li L, He Y, Jiang W. Four-quadrant gratings moiré fringe alignment measurement in proximity lithography. Optics Express. 21: 3463-73. PMID 23481804 DOI: 10.1364/Oe.21.003463  0.371
2010 Zhou S, Yang Y, Zhao L, Hu S. Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography. Optics Letters. 35: 3132-4. PMID 20847802 DOI: 10.1364/Ol.35.003132  0.365
2010 Jiang W, Hu S, Zhao L, Yan W, Yang Y. Design and application of phase photon sieve Optik. 121: 637-640. DOI: 10.1016/J.Ijleo.2008.10.007  0.329
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