Year |
Citation |
Score |
2023 |
Zhang Y, Yang Q, Liu Y, Hu A, Zhang D, Li H, Yu J, Huang J, Lu Y, Zhang L, Xue Q, Li Y, Jin L, Wen Q, Zhang H. Structural and magnetic properties of Y(GaAlFe)O liquid-phase epitaxy films with low ferromagnetic resonance losses. Acta Crystallographica Section B, Structural Science, Crystal Engineering and Materials. PMID 36920874 DOI: 10.1107/S2052520623000483 |
0.301 |
|
2020 |
Cuddalorepatta GK, Li H, Pantuso D, Vlassak JJ. Measurement of the stress-strain behavior of freestanding ultra-thin films Materialia. 9: 100502. DOI: 10.1016/J.Mtla.2019.100502 |
0.588 |
|
2019 |
Nordell BJ, Nguyen TD, Caruso AN, Lanford WA, Henry P, Li H, Ross LL, King SW, Paquette MM. Topological Constraint Theory Analysis of Rigidity Transition in Highly Coordinate Amorphous Hydrogenated Boron Carbide Frontiers in Materials. 6. DOI: 10.3389/Fmats.2019.00264 |
0.309 |
|
2019 |
Cuddalorepatta GK, Sim G, Li H, Pantuso D, Vlassak JJ. Residual stress–driven test technique for freestanding ultrathin films: Elastic behavior and residual strain Journal of Materials Research. 34: 3474-3482. DOI: 10.1557/Jmr.2019.278 |
0.664 |
|
2015 |
Klepper KB, Miikkulainen V, Nilsen O, Fjellvåg H, Liu M, Dutta D, Gidley D, Lanford W, Ross L, Li H, King SW. Atomic Layer Deposited Hybrid Organic-Inorganic Aluminates as Potential Low-k Dielectric Materials Mrs Proceedings. 1791: 15-20. DOI: 10.1557/Opl.2015.519 |
0.361 |
|
2015 |
Li H, Iqbal A, Brooks JD. Modulating crack propagation in a multilayer stack with a super-layer Journal of Materials Research. 30: 3065-3070. DOI: 10.1557/Jmr.2015.252 |
0.334 |
|
2015 |
Miikkulainen V, Nilsen O, Li H, King SW, Laitinen M, Sajavaara T, Fjellvåg H. Atomic layer deposited lithium aluminum oxide: (In)dependency of film properties from pulsing sequence Journal of Vacuum Science and Technology. 33. DOI: 10.1116/1.4890006 |
0.38 |
|
2015 |
Nordell BJ, Karki S, Nguyen TD, Rulis P, Caruso AN, Purohit SS, Li H, King SW, Dutta D, Gidley D, Lanford WA, Paquette MM. The influence of hydrogen on the chemical, mechanical, optical/electronic, and electrical transport properties of amorphous hydrogenated boron carbide Journal of Applied Physics. 118. DOI: 10.1063/1.4927037 |
0.339 |
|
2015 |
Li H, Lin K, Ege C. Buffer layer structure for measuring the elastic properties of brittle thin films by nanoindentation with application on nanoporous low-k dielectrics Journal of Applied Physics. 117. DOI: 10.1063/1.4915945 |
0.405 |
|
2014 |
Koh D, Yum JH, Banerjee SK, Hudnall TW, Bielawski C, Lanford WA, French BL, French M, Henry P, Li H, Kuhn M, King SW. Investigation of atomic layer deposited Beryllium oxide material properties for high-k dielectric applications Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 32. DOI: 10.1116/1.4867436 |
0.352 |
|
2014 |
Trueba M, Gonzalez D, Martínez-Esnaola JM, Hernandez MT, Pantuso D, Li H, Ocaña I, Elizalde MR. Fracture characterization of brittle thin-films by membrane testing Thin Solid Films. 564: 314-320. DOI: 10.1016/J.Tsf.2014.05.014 |
0.377 |
|
2014 |
Trueba M, Gonzalez D, Elizalde MR, Martínez-Esnaola JM, Hernandez MT, Li H, Pantuso D, Ocaña I. Assessment of mechanical properties of metallic thin-films through micro-beam testing Thin Solid Films. 571: 296-301. DOI: 10.1016/J.Tsf.2014.02.094 |
0.384 |
|
2014 |
King SW, Ross L, Li H, Xu G, Bielefeld J, Atkins RE, Henneghan PD, Davis K, Johnson DC, Lanford WA. Influence of hydrogen content and network connectivity on the coefficient of thermal expansion and thermal stability for a-SiC:H thin films Journal of Non-Crystalline Solids. 389: 78-85. DOI: 10.1016/J.Jnoncrysol.2014.02.007 |
0.335 |
|
2014 |
Trueba M, Gonzalez D, Martínez-Esnaola JM, Hernandez MT, Pantuso D, Li H, Elizalde MR, Ocaña I. Fracture characterization of thin-films by dual tip indentation Acta Materialia. 71: 44-55. DOI: 10.1016/J.Actamat.2014.03.011 |
0.393 |
|
2013 |
King SW, Mays E, Ege C, Hellgren N, Xu J, Li H, Boyanov B. Transmission fourier transform infra-red spectroscopy investigation of structure property relationships in low-k SiOxCy:H Dielectric thin films Materials Research Society Symposium Proceedings. 1520: 13-18. DOI: 10.1557/Opl.2012.1691 |
0.323 |
|
2013 |
Li H, Kobrinsky MJ, Shariq A, Richards J, Liu J, Kuhn M. Controlled fracture of Cu/ultralow-k interconnects Applied Physics Letters. 103: 231901. DOI: 10.1063/1.4837676 |
0.303 |
|
2011 |
Knaup JM, Li H, Vlassak JJ, Kaxiras E. Bottom-up modeling of the elastic properties of organosilicate glasses and their relation to composition and network defects Materials Research Society Symposium Proceedings. 1297: 17-22. DOI: 10.1557/Opl.2011.652 |
0.532 |
|
2011 |
Knaup JM, Li H, Vlassak JJ, Kaxiras E. Influence of CH2 content and network defects on the elastic properties of organosilicate glasses Physical Review B - Condensed Matter and Materials Physics. 83. DOI: 10.1103/Physrevb.83.054204 |
0.564 |
|
2011 |
Li H, Knaup JM, Kaxiras E, Vlassak JJ. Stiffening of organosilicate glasses by organic cross-linking Acta Materialia. 59: 44-52. DOI: 10.1016/J.Actamat.2010.08.015 |
0.537 |
|
2010 |
Knaup JM, Li H, Vlassak JJ, Kaxiras E. Elastic properties of dense organosilicate glasses dependent on the C/Si ratio Materials Science Forum. 645: 267-270. DOI: 10.4028/Www.Scientific.Net/Msf.645-648.267 |
0.543 |
|
2010 |
Li H, Randall NX, Vlassak JJ. New methods of analyzing indentation experiments on very thin films Journal of Materials Research. 25: 728-734. DOI: 10.1557/Jmr.2010.0095 |
0.621 |
|
2010 |
Karanikas CF, Li H, Vlassak JJ, Watkins JJ. Quantitative interfacial energy measurements of adhesion-promoted thin copper films by supercritical fluid deposition on barrier layers Journal of Engineering Materials and Technology, Transactions of the Asme. 132: 0210141-0210147. DOI: 10.1115/1.4000283 |
0.562 |
|
2009 |
Li H, Vlassak JJ. Determining the elastic modulus and hardness of an ultra-thin film on a substrate using nanoindentation Journal of Materials Research. 24: 1114-1126. DOI: 10.1557/Jmr.2009.0144 |
0.618 |
|
2009 |
Li H, Lin Y, Tsui TY, Vlassak JJ. The effect of porogen loading on the stiffness and fracture energy of brittle organosilicates Journal of Materials Research. 24: 107-116. DOI: 10.1557/Jmr.2009.0005 |
0.639 |
|
2009 |
Li H, Tsui TY, Vlassak JJ. Water diffusion and fracture behavior in nanoporous low- k dielectric film stacks Journal of Applied Physics. 106. DOI: 10.1063/1.3187931 |
0.585 |
|
2005 |
Li H, Ngan AHW. Indentation size effects on the strain rate sensitivity of nanocrystalline Ni–25at.%Al thin films Scripta Materialia. 52: 827-831. DOI: 10.1016/J.Scriptamat.2005.01.018 |
0.304 |
|
2004 |
Li H, Ngan AHW. Initial contact behavior of nanograined Ni-25at. % Al film during nanoindentation Mrs Proceedings. 841. DOI: 10.1557/Proc-841-R8.7 |
0.331 |
|
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