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Kisik Choi, Ph.D.

Affiliations: 
2004 Texas Tech University, Lubbock, TX 
Area:
Electronics and Electrical Engineering, Materials Science Engineering
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Henryk Temkin grad student 2004 Texas Tech
 (Interfacial layer engineering for advanced high -k gate dielectrics.)

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Publications

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Lanzillo NA, Choi K, Yang C-, et al. (2019) Exploring the Limits of Cobalt Liner Thickness in Advanced Copper Interconnects Ieee Electron Device Letters. 40: 1804-1807
Choi KK, Hosseini N, Kee J, et al. (2016) Wafer level package of Au-Ge system using a Ge chemical vapor deposition (CVD) thin film Applied Surface Science. 385: 122-129
Lee A, Fuchigami N, Pisharoty D, et al. (2014) Atomic layer deposition of HfxAlyCz as a work function material in metal gate MOS devices Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 32
Ando T, Cartier EA, Bruley J, et al. (2013) Origins of effective work function roll-off behavior for high-κ last replacement metal gate stacks Ieee Electron Device Letters. 34: 729-731
Lee T, Choi K, Ando T, et al. (2011) Mechanism of VFB / VTH shift in Dysprosium incorporated HfO2 gate dielectric n-Type Metal-Oxide-Semiconductor devices Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 29: 21209
Bersuker G, Park CS, Wen HC, et al. (2010) Origin of the flatband-voltage roll-off phenomenon in metal/high-k gate stacks Ieee Transactions On Electron Devices. 57: 2047-2056
Choi K, Wen HC, Bersuker G, et al. (2008) Mechanism of flatband voltage roll-off studied with Al2O 3 film deposited on terraced oxide Applied Physics Letters. 93
Wen HC, Majhi P, Choi K, et al. (2008) Decoupling the Fermi-level pinning effect and intrinsic limitations on p-type effective work function metal electrodes Microelectronic Engineering. 85: 2-8
Wen HC, Harris HR, Young CD, et al. (2006) On oxygen deficiency and fast transient charge-trapping effects in high-κ dielectrics Ieee Electron Device Letters. 27: 984-987
Wen HC, Choi R, Brown GA, et al. (2006) Comparison of effective work function extraction methods using capacitance and current measurement techniques Ieee Electron Device Letters. 27: 598-601
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