| Year |
Citation |
Score |
| 2016 |
Marrs MA, Raupp GB. Substrate and Passivation Techniques for Flexible Amorphous Silicon-Based X-ray Detectors. Sensors (Basel, Switzerland). 16. PMID 27472329 DOI: 10.3390/S16081162 |
0.317 |
|
| 2013 |
Marrs M, Bawolek E, Smith JT, Raupp GB, Morton D. Flexible amorphous silicon PIN diode x-ray detectors Proceedings of Spie - the International Society For Optical Engineering. 8730. DOI: 10.1117/12.2015917 |
0.347 |
|
| 2012 |
Marrs MA, Vogt BD, Raupp GB. Comparison of wet and dry etching of zinc indium oxide for thin film transistors with an inverted gate structure Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 30. DOI: 10.1116/1.3668090 |
0.377 |
|
| 2011 |
Marrs MA, Venugopal SM, Moyer CD, Bawolek EJ, Bottesch D, O'Brien BP, Cordova RJ, Trujillo J, Bell CS, Loy DE, Raupp GB, Allee DR. Low temperature zinc indium oxide backplane development for flexible OLED displays in a manufacturing pilot line environment Materials Research Society Symposium Proceedings. 1287: 19-24. DOI: 10.1557/Opl.2011.1145 |
0.344 |
|
| 2011 |
Marrs MA, Moyer CD, Bawolek EJ, Cordova RJ, Trujillo J, Raupp GB, Vogt BD. Control of threshold voltage and saturation mobility using dual-active-layer device based on amorphous mixed metal-oxide-semiconductor on flexible plastic substrates Ieee Transactions On Electron Devices. 58: 3428-3434. DOI: 10.1109/Ted.2011.2161764 |
0.326 |
|
| 2008 |
O'Rourke SM, Loy DE, Moyer C, Ageno SK, O'Brien BP, Bawolek EJ, Bottesch D, Marrs M, Dailey J, Cordova R, Trujillo J, Kaminski J, Allee DR, Venugopal S, Raupp GB. Principal pilot line manufacturing challenges and solutions in direct fabrication of a-Si:H TFT arrays on flexible substrates Materials Research Society Symposium Proceedings. 1030: 73-81. DOI: 10.1557/Proc-1030-G07-05 |
0.309 |
|
| 2007 |
Raupp GB, O'Rourke SM, Moyer C, O'Brien BP, Ageno SK, Loy DE, Bawolek EJ, Allee DR, Venugopal SM, Kaminski J, Bottesch D, Dailey J, Long K, Marrs M, Munizza NR, et al. Low-temperature amorphous-silicon backplane technology development for flexible displays in a manufacturing pilot-line environment Journal of the Society For Information Display. 15: 445-454. DOI: 10.1889/1.2759549 |
0.322 |
|
| 2005 |
Wang L, Raupp G. Investigation of Dow Cyclotene 4026 surface amination by downstream plasma treatment Journal of Applied Polymer Science. 97: 2418-2427. DOI: 10.1002/App.21948 |
0.509 |
|
| 2003 |
Ehteshami G, Singh A, Coryell G, Massia S, He J, Raupp G. Glial cell and fibroblast cytotoxicity study on 4026-cyclotene photosensitive benzocyclobutene (BCB) polymer films. Journal of Biomaterials Science. Polymer Edition. 14: 1105-16. PMID 14661882 DOI: 10.1163/156856203769231592 |
0.315 |
|
| 2003 |
Callahan RRA, Pruden KG, Raupp GB, Beaudoin SP. Downstream oxygen etching characteristics of polymers from the parylene family Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21: 1496. DOI: 10.1116/1.1591744 |
0.337 |
|
| 2002 |
Callahan R, Raupp G, Beaudoin S. Etching parylene-N using a remote oxygen microwave plasma Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 1870-1877. DOI: 10.1116/1.1501584 |
0.35 |
|
| 2001 |
Callahan RRA, Raupp GB, Beaudoin SP. Effects of gas pressure and substrate temperature on the etching of parylene-N using a remote microwave oxygen plasma Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 725-731. DOI: 10.1116/1.1366707 |
0.395 |
|
| 2000 |
Changrani RG, Raupp GB. Two-dimensional heterogeneous model for a reticulated-foam photocatalytic reactor Aiche Journal. 46: 829-842. DOI: 10.1002/Aic.690460416 |
0.342 |
|
| 1999 |
Erjavec J, Sikita J, Beaudoin SP, Raupp GB. Wave Polymerization During Vapor Deposition of Porous Parylene-N Dielectric Films Mrs Proceedings. 565. DOI: 10.1557/Proc-565-23 |
0.383 |
|
| 1999 |
Erjavec J, Sikita J, Beaudoin SP, Raupp GB. Novel Parylene-N films deposited at liquid nitrogen temperatures Materials Letters. 39: 339-342. DOI: 10.1016/S0167-577X(99)00031-2 |
0.378 |
|
| 1999 |
Ameen MM, Raupp GB. Reversible catalyst deactivation in the photocatalytic oxidation of dilute o-xylene in air Journal of Catalysis. 184: 112-122. DOI: 10.1006/Jcat.1999.2442 |
0.304 |
|
| 1999 |
Hossain MM, Raupp GB, Hay SO, Obee TN. Three-dimensional developing flow model for photocatalytic monolith reactors Aiche Journal. 45: 1309-1321. DOI: 10.1002/Aic.690450615 |
0.337 |
|
| 1997 |
Annapragada R, Leet R, Changrani R, Raupp GB. Vacuum photocatalytic oxidation of trichloroethylene Environmental Science and Technology. 31: 1898-1901. DOI: 10.1021/Es960541H |
0.357 |
|
| 1996 |
Virmani M, Levedakis DA, Raupp GB, Cale TS. Feature scale simulation studies of TEOS-sourced remote microwave plasma-enhanced chemical vapor deposition of silicon dioxide: Role of oxygen atom recombination Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 14: 977-983. DOI: 10.1116/1.580066 |
0.377 |
|
| 1995 |
Raupp GB. Photocatalytic oxidation for point‐of‐use abatement of volatile organic compounds in microelectronics manufacturing Journal of Vacuum Science & Technology B. 13: 1883-1887. DOI: 10.1116/1.587829 |
0.307 |
|
| 1995 |
Raupp GB, Levedakis DA, Cale TS. Conformality of SiO2 films from tetraethoxysilane-sourced remote microwave plasma-enhanced chemical vapor deposition Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 13: 676-680. DOI: 10.1116/1.579806 |
0.405 |
|
| 1993 |
Zirkle TE, Wilson SR, Sundaram SL, Cale TS, Raupp GB. In Situ Investigation of Temperature and Bias Dependent Effects on the Oxide Growth of Si and Ge in an Electron Cyclotron Resonance Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 11: 905-910. DOI: 10.1116/1.578325 |
0.379 |
|
| 1993 |
Raupp GB, Levedakis DA, Cale TS. Predicting intrawafer film thickness uniformity in an ultralow pressure chemical vapor deposition reactor Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 11: 3053-3061. DOI: 10.1116/1.578296 |
0.414 |
|
| 1993 |
Cale TS, Park JH, Gandy TH, Raupp GB, Jain MK. Step coverage predictions using combined reactor scale and feature scale models for blanket tungsten LPCVD Chemical Engineering Communications. 119: 197-220. DOI: 10.1080/00986449308936116 |
0.382 |
|
| 1993 |
Raupp GB, Junio CT. Photocatalytic oxidation of oxygenated air toxics Applied Surface Science. 72: 321-327. DOI: 10.1016/0169-4332(93)90369-M |
0.336 |
|
| 1993 |
Cale TS, Chaara MB, Raupp GB, Raaijmakers IJ. Kinetics and conformality of TiN films from TDEAT and ammonia Thin Solid Films. 236: 294-300. DOI: 10.1016/0040-6090(93)90685-I |
0.4 |
|
| 1993 |
Pillote CL, Shemansky FA, Cale TS, Raupp GB. Characterization of phosphosilicate glass films obtained using plasma-enhanced chemical vapor deposition from tetraethylorthosilicate and trimethylphosphite Thin Solid Films. 236: 287-293. DOI: 10.1016/0040-6090(93)90684-H |
0.377 |
|
| 1992 |
Levedakis DA, Raupp GB. Oxygen Atom Induced Deposition of Silicon Dioxide Mrs Proceedings. 282. DOI: 10.1557/Proc-282-537 |
0.315 |
|
| 1992 |
Raupp GB, Cale TS, Hey HPW. The role of oxygen excitation and loss in plasma‐enhanced deposition of silicon dioxide from tetraethylorthosilicate Journal of Vacuum Science & Technology B. 10: 37-45. DOI: 10.1116/1.586361 |
0.403 |
|
| 1992 |
Raupp GB, Shemansky FA, Cale TS. Kinetics and mechanism of silicon dioxide deposition through thermal pyrolysis of tetraethoxysilane Journal of Vacuum Science & Technology B. 10: 2422-2430. DOI: 10.1116/1.586034 |
0.421 |
|
| 1992 |
Cale TS, Raupp GB, Gandy TH. Ballistic transport-reaction prediction of film conformality in tetraethoxysilane 02 plasma enhanced deposition of silicon dioxide Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 10: 1128-1134. DOI: 10.1116/1.578214 |
0.425 |
|
| 1992 |
Dibble LA, Raupp GB. Fluidized-bed photocatalytic oxidation of trichloroethylene in contaminated airstreams Environmental Science and Technology. 26: 492-495. DOI: 10.1021/Es00027A006 |
0.314 |
|
| 1992 |
Phillips LA, Raupp GB. Infrared spectroscopic investigation of gas-solid heterogeneous photocatalytic oxidation of trichloroethylene Journal of Molecular Catalysis. 77: 297-311. DOI: 10.1016/0304-5102(92)80209-Y |
0.303 |
|
| 1992 |
Cale TS, Raupp GB, Chaara MB, Shemansky FA. Reaction mechanism discrimination using experimental film profiles in features Thin Solid Films. 220: 66-72. DOI: 10.1016/0040-6090(92)90550-U |
0.411 |
|
| 1991 |
Cale TS, Park J-, Raupp GB, Jain MK. Impacts of Temperature and Reactant Flow Rate Transients on LPCVD Tungsten Silicide Film Properties Mrs Proceedings. 224: 171. DOI: 10.1557/Proc-224-171 |
0.325 |
|
| 1991 |
Cale TS, Gandy TH, Raupp GB. A fundamental feature scale model for low pressure deposition processes Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 9: 524-529. DOI: 10.1116/1.577402 |
0.397 |
|
| 1991 |
Raupp GB, Cale TS. The Role of Step Coverage Modeling in Blanket Tungsten LPCVD Process Development Iete Journal of Research. 37: 206-212. DOI: 10.1080/03772063.1991.11436957 |
0.365 |
|
| 1991 |
Cale TS, Gandy TH, Raupp GB, Ramaswami M. Model predictions of feature-size-dependent step coverages by PVD aluminum: surface diffusion Thin Solid Films. 206: 54-58. DOI: 10.1016/0040-6090(91)90392-B |
0.379 |
|
| 1990 |
Raupp GB, Cale TS, Peter H, Hey W. Mechanism of Plasma-Enhanced Deposition of Silicon Dioxide from Teos/O 2 Mixtures Mrs Proceedings. 204. DOI: 10.1557/Proc-204-495 |
0.416 |
|
| 1990 |
Cale TS, Raupp GB, Jain MK. Deposition of Tungsten Silicide Barrier Layers and Tungsten in Rectangular Vias Mrs Proceedings. 181: 517. DOI: 10.1557/Proc-181-517 |
0.395 |
|
| 1990 |
Cale TS, Raupp GB. Free molecular transport and deposition in cylindrical features Journal of Vacuum Science & Technology B. 8: 649-655. DOI: 10.1116/1.584990 |
0.381 |
|
| 1990 |
Cale TS, Raupp GB. A unified line‐of‐sight model of deposition in rectangular trenches Journal of Vacuum Science & Technology B. 8: 1242-1248. DOI: 10.1116/1.584901 |
0.39 |
|
| 1990 |
Cale TS, Raupp GB, Gandy TH. Free molecular transport and deposition in long rectangular trenches Journal of Applied Physics. 68: 3645-3652. DOI: 10.1063/1.346328 |
0.382 |
|
| 1990 |
Raupp GB, Cale TS, Jain MK, Rogers B, Srinivas D. Step coverage of tungsten silicide films deposited bylow pressure dichlorosilane reduction of tungsten hexafluoride Thin Solid Films. 193: 234-243. DOI: 10.1016/S0040-6090(05)80032-X |
0.418 |
|
| 1990 |
Cale TS, Jain MK, Raupp GB. Maximizing step coverage during blanket tungsten low pressure chemical vapor deposition Thin Solid Films. 193: 51-60. DOI: 10.1016/S0040-6090(05)80011-2 |
0.409 |
|
| 1990 |
Dibble LA, Raupp GB. Kinetics of the gas-solid heterogeneous photocatalytic oxidation of trichloroethylene by near UV illuminated titanium dioxide Catalysis Letters. 4: 345-354. DOI: 10.1007/Bf00765320 |
0.326 |
|
| 1989 |
Shemansky FA, Jain MK, Cale TS, Raupp GB. Implications of Rapid Thermal Processing for Step Coverage in Low Pressure Chemical Vapor Deposition Mrs Proceedings. 146. DOI: 10.1557/Proc-146-173 |
0.352 |
|
| 1989 |
Raupp GB, Cale TS. Step coverage prediction in low-pressure Chemical Vapor Deposition Chemistry of Materials. 1: 207-214. DOI: 10.1021/Cm00002A009 |
0.397 |
|
| 1986 |
Raupp GB, Dumesic JA. Effect of titania oxidation state on the chemisorptive properties of titania-supported nickel Journal of Catalysis. 97: 85-99. DOI: 10.1016/0021-9517(86)90040-0 |
0.345 |
|
| 1985 |
Raupp G, Dumesic JA. Adsorption of CO, CO2, H2, and H2O on titania surfaces with different oxidation states The Journal of Physical Chemistry. 89: 5240-5246. DOI: 10.1021/J100270A024 |
0.32 |
|
| 1985 |
Raupp GB, Dumesic JA. Effects of titania on the coadsorption of H2 and CO on nickel surfaces: Consequences for understanding methanation over titania-supported nickel catalysts Journal of Catalysis. 96: 597-612. DOI: 10.1016/0021-9517(85)90327-6 |
0.316 |
|
| 1985 |
Raupp GB, Dumesic JA. Effect of varying titania surface coverage on the chemisorptive behavior of nickel Journal of Catalysis. 95: 587-601. DOI: 10.1016/0021-9517(85)90137-X |
0.304 |
|
| 1984 |
Raupp GB, Dumesic JA. Effect of titania surface species on the chemisorption of CO and H2 on polycrystalline nickel The Journal of Physical Chemistry. 88: 660-663. DOI: 10.1021/J150648A007 |
0.326 |
|
| 1979 |
Raupp GB, Delgass WN. Mössbauer investigation of supported Fe catalysts. III. In situ kinetics and spectroscopy during Fischer-Tropsch synthesis Journal of Catalysis. 58: 361-369. DOI: 10.1016/0021-9517(79)90275-6 |
0.305 |
|
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