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Justin Wilks, Ph.D. - Publications

Affiliations: 
2010 University of North Texas, Denton, TX, United States 
Area:
Inorganic Chemistry, Analytical Chemistry, Materials Science Engineering
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6 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2010 Rühl E, Riehs NF, Behera S, Wilks J, Liu J, Jochims HW, Caruso AN, Boag NM, Kelber JA, Dowben PA. Photofragmentation of the closo-carboranes part II: VUV assisted dehydrogenation in the closo-carboranes and semiconducting B10C2H(x) films. The Journal of Physical Chemistry. A. 114: 7284-91. PMID 20568797 DOI: 10.1021/Jp103805R  0.661
2010 Behera S, Lee J, Gaddam S, Pokharel S, Wilks J, Pasquale F, Graves D, Kelber JA. Interaction of vacuum ultraviolet light with a low-k organosilicate glass film in the presence of NH3 Applied Physics Letters. 97. DOI: 10.1063/1.3466905  0.55
2010 Behera S, Wilks J, Dowben PA, Driver MS, Caruso AN, Kelber JA. Photo-induced site-specific nitridation of plasma-deposited B 10C2Hx films: A new pathway toward post-deposition doping of semiconducting boron carbides Surface Science. 604: L51-L54. DOI: 10.1016/J.Susc.2010.07.023  0.687
2010 Wilks JA, Tavakoli CM, Kelber JA. Effect of hydrogen free radicals on Hg 1-xCd xTe Journal of Electronic Materials. 39: 857-862. DOI: 10.1007/s11664-010-1222-4  0.478
2009 Wilks JA, Kelber JA. Nitridation of organo-silicate glass: A self-limiting process for PVD Ta1+xN/Ta barrier formation Applied Surface Science. 255: 9543-9547. DOI: 10.1016/J.Apsusc.2009.07.095  0.604
2007 Wilks JA, Magtoto NP, Kelber JA, Arunachalam V. Interfacial reactions during sputter deposition of Ta and TaN films on organosilicate glass: XPS and TEM results Applied Surface Science. 253: 6176-6184. DOI: 10.1016/J.Apsusc.2007.01.020  0.601
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