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Swayambhu P. Behera, Ph.D. - Publications

Affiliations: 
2011 University of North Texas, Denton, TX, United States 
Area:
Fluid and Plasma Physics, Materials Science Engineering, Analytical Chemistry
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6 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2011 Behera SP, Wang Q, Kelber JA. He plasma pretreatment effects on oxygen plasma-induced carbon loss and surface roughening in an ultralow-k organosilicate glass film Journal of Physics D: Applied Physics. 44. DOI: 10.1088/0022-3727/44/15/155204  0.665
2010 Rühl E, Riehs NF, Behera S, Wilks J, Liu J, Jochims HW, Caruso AN, Boag NM, Kelber JA, Dowben PA. Photofragmentation of the closo-carboranes part II: VUV assisted dehydrogenation in the closo-carboranes and semiconducting B10C2H(x) films. The Journal of Physical Chemistry. A. 114: 7284-91. PMID 20568797 DOI: 10.1021/Jp103805R  0.638
2010 Behera S, Lee J, Gaddam S, Pokharel S, Wilks J, Pasquale F, Graves D, Kelber JA. Interaction of vacuum ultraviolet light with a low-k organosilicate glass film in the presence of NH3 Applied Physics Letters. 97. DOI: 10.1063/1.3466905  0.569
2010 Behera S, Wilks J, Dowben PA, Driver MS, Caruso AN, Kelber JA. Photo-induced site-specific nitridation of plasma-deposited B 10C2Hx films: A new pathway toward post-deposition doping of semiconducting boron carbides Surface Science. 604: L51-L54. DOI: 10.1016/J.Susc.2010.07.023  0.683
2009 Goldman MA, Graves DB, Antonelli GA, Behera SP, Kelber JA. Oxygen radical and plasma damage of low- k organosilicate glass materials: Diffusion-controlled mechanism for carbon depletion Journal of Applied Physics. 106. DOI: 10.1063/1.3168428  0.582
2009 Chaudhari M, Du J, Behera S, Manandhar S, Gaddam S, Kelber J. Fundamental mechanisms of oxygen plasma-induced damage of ultralow- k organosilicate materials: The role of thermal 3P atomic oxygen Applied Physics Letters. 94. DOI: 10.1063/1.3134487  0.668
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