| Year |
Citation |
Score |
| 2014 |
Aita CR. Sputter deposited nanolaminates containing group IVB (Ti, Zr, Hf)-Oxides: Phase structure and near band gap optical absorption behavior Oxide Electronics and Functional Properties of Transition Metal Oxides. 169-209. |
0.381 |
|
| 2013 |
Hoppe EE, Cisneros-Morales MC, Aita CR. Ti-catalyzed HfSiO4 formation in HfTiO4 films on SiO2 studied by Z-contrast scanning electron microscopy Apl Materials. 1. DOI: 10.1063/1.4818171 |
0.519 |
|
| 2012 |
Cisneros-Morales MC, Aita CR. Addendum to “Phase selection and transition in Hf-rich hafnia-titania nanolaminates” (on SiO2) [J. Appl. Phys. 109, 123523 (2011)]: Hafnon formation Journal of Applied Physics. 111: 109904. DOI: 10.1063/1.4719968 |
0.452 |
|
| 2012 |
Aita CR, Cisneros-Morales MC, Hoppe EE. Comment on "growth behavior, lattice expansion, strain, and surface morphology of nanocrystalline, monoclinic HfO2 thin films": Implications for undesirable polaron formation Journal of Physical Chemistry C. 116: 26679-26680. DOI: 10.1021/Jp3088868 |
0.418 |
|
| 2011 |
Aita CR, Hoppe EE, Sorbello RS. Comment on "size-effects on the optical properties of zirconium oxide thin films" [Appl. Phys. Lett. 95, 231905 (2009)] Applied Physics Letters. 98. DOI: 10.1063/1.3602920 |
0.356 |
|
| 2011 |
Cisneros-Morales MC, Aita CR. Phase selection and transition in Hf-rich hafnia-titania nanolaminates Journal of Applied Physics. 109: 123523. DOI: 10.1063/1.3597321 |
0.444 |
|
| 2011 |
Cisneros-Morales MC, Aita CR. Intrinsic metastability of orthorhombic HfTiO4 in thin film hafnia-titania Applied Physics Letters. 98. DOI: 10.1063/1.3551543 |
0.461 |
|
| 2010 |
Cisneros-Morales MC, Aita CR. Crystallization, metastable phases, and demixing in a hafnia-titania nanolaminate annealed at high temperature Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 28: 1161-1168. DOI: 10.1116/1.3474973 |
0.538 |
|
| 2010 |
Hoppe EE, Aita CR. Erratum: “Suppression of near-edge optical absorption band in sputter deposited HfO2–Al2O3 nanolaminates containing nonmonoclinic HfO2” [Appl. Phys. Lett. 92, 141912 (2008)] Applied Physics Letters. 97: 269904. DOI: 10.1063/1.3533378 |
0.32 |
|
| 2010 |
Cisneros-Morales MC, Aita CR. Optical absorption at its onset in sputter deposited hafnia-titania nanolaminates Journal of Applied Physics. 108. DOI: 10.1063/1.3520678 |
0.52 |
|
| 2010 |
Cisneros-Morales MC, Aita CR. The effect of nanocrystallite size in monoclinic HfO2 films on lattice expansion and near-edge optical absorption Applied Physics Letters. 96. DOI: 10.1063/1.3428965 |
0.413 |
|
| 2009 |
Aita CR. Thermal stability of sputter deposited nanomosaic rutile Ti O 2 Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 27: 648-652. DOI: 10.1116/1.3139900 |
0.423 |
|
| 2009 |
Almomani MA, Aita CR. Pitting corrosion protection of stainless steel by sputter deposited hafnia, alumina, and hafnia-alumina nanolaminate films Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 27: 449-455. DOI: 10.1116/1.3100216 |
0.333 |
|
| 2008 |
Aita CR. Reactive sputter deposition of metal oxide nanolaminates. Journal of Physics. Condensed Matter : An Institute of Physics Journal. 20: 264006. PMID 21694340 DOI: 10.1088/0953-8984/20/26/264006 |
0.395 |
|
| 2008 |
Hoppe EE, Aita CR. Suppression of near-edge optical absorption band in sputter deposited Hf O2 - Al2 O3 nanolaminates containing nonmonoclinic Hf O2 Applied Physics Letters. 92. DOI: 10.1063/1.2907331 |
0.39 |
|
| 2008 |
Hoppe EE, Aita CR, Gajdardziska-Josifovska M. Erratum: “Initial phases in sputter deposited HfO2-Al2O3 nanolaminate films” [Appl. Phys. Lett. 91, 203105 (2007)] Applied Physics Letters. 92: 109903. DOI: 10.1063/1.2839289 |
0.415 |
|
| 2007 |
Hoppe EE, Aita CR, Gajdardziska-Josifovska M. Initial phases in sputter deposited HfO 2 - Al 2O 3 nanolaminate films Applied Physics Letters. 91. DOI: 10.1063/1.2813624 |
0.456 |
|
| 2007 |
Hoppe EE, Sorbello RS, Aita CR. Near-edge optical absorption behavior of sputter deposited hafnium dioxide Journal of Applied Physics. 101. DOI: 10.1063/1.2750406 |
0.445 |
|
| 2007 |
Aita CR. Raman scattering by thin film nanomosaic rutile Ti O2 Applied Physics Letters. 90. DOI: 10.1063/1.2742914 |
0.308 |
|
| 2006 |
Omari MA, Sorbello RS, Aita CR. Near-ultraviolet optical absorption behavior of TiO 2-Al 2O 3 multilayer films Journal of Applied Physics. 99. DOI: 10.1063/1.2207723 |
0.384 |
|
| 2005 |
Omari MA, Sorbello RS, Aita CR. Crystallization and segregation in vitreous rutile films annealed at high temperature Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 23: 1568-1574. DOI: 10.1116/1.2091094 |
0.429 |
|
| 2004 |
Sorbello RS, Deloach JD, Aita CR, Fejes P. Dielectric function of thin-film titanium oxide with a granular nanostructure Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 2658-2662. DOI: 10.1116/1.1808743 |
0.485 |
|
| 2004 |
Aita CR. Zirconia-metal (Al, Y, Ti) oxide nanolaminate films Surface and Coatings Technology. 188: 179-185. DOI: 10.1016/j.surfcoat.2004.08.019 |
0.422 |
|
| 2003 |
Aita CR, DeLoach JD, Sorbello RS. Optical absorption behavior of ZrO2-TiO2 nanolaminate films Journal of Applied Physics. 94: 654-663. DOI: 10.1063/1.1581346 |
0.465 |
|
| 2003 |
Aita CR, Hoppe EE, Sorbello RS. Fundamental optical absorption edge of undoped tetragonal zirconium dioxide Applied Physics Letters. 82: 677-679. DOI: 10.1063/1.1543234 |
0.377 |
|
| 2003 |
Scarel G, Aita CR, Sklyarov AV. Effect of substrate conductivity on infrared reflection spectra of thin TiO2 films Journal of Non-Crystalline Solids. 318: 168-174. DOI: 10.1016/S0022-3093(02)01875-6 |
0.661 |
|
| 2003 |
Magyar J, Aita C, Gajdardziska-Josifovska M, Sklyarov A, Mikhaylichenko K, Yakovlev V. High-power laser interactions with nanostructured materials Applied Physics A. 77: 285-291. DOI: 10.1007/S00339-003-2114-8 |
0.321 |
|
| 2002 |
Deloach JD, Aita CR, Loong CK. Growth-controlled cubic zirconia microstructure in zirconia-titania nanolaminates Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 20: 1517-1524. DOI: 10.1116/1.1491266 |
0.402 |
|
| 2002 |
Aita CR, Deloach JD, Yakovlev VV. (Zr,Ti)O2 interface structure in ZrO2-TiO2 nanolaminates with ultrathin periodicity Applied Physics Letters. 81: 238-240. DOI: 10.1063/1.1492013 |
0.36 |
|
| 2002 |
Scarel G, Hirschmugl CJ, Yakovlev VV, Sorbello RS, Aita CR, Tanaka H, Hisano K. Infrared response of vitreous titanium dioxide films with anatase short-range order Journal of Applied Physics. 91: 1118-1128. DOI: 10.1063/1.1427430 |
0.669 |
|
| 2002 |
Scarel G, Aita CR, Tanaka H, Hisano K. Far-infrared spectra of amorphous titanium dioxide films Journal of Non-Crystalline Solids. 303: 50-53. DOI: 10.1016/S0022-3093(02)00963-8 |
0.674 |
|
| 2000 |
DeLoach JD, Shibilski JJ, Crape CR, Aita CR. Phase development in annealed zirconia-titania nanolaminates Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 18: 2922-2927. DOI: 10.1116/1.1319681 |
0.339 |
|
| 2000 |
Yakovlev VV, Scarel G, Aita CR, Mochizuki S. Short-range order in ultrathin film titanium dioxide studied by Raman spectroscopy Applied Physics Letters. 76: 1107-1109. DOI: 10.1063/1.125953 |
0.69 |
|
| 2000 |
Deloach JD, Aita CR. High refractive index 〈100〉-textured cubic zirconia formed in nanolaminates using titania interruption layers Journal of Materials Science Letters. 19: 1123-1125. DOI: 10.1023/A:1006790622162 |
0.434 |
|
| 2000 |
Yakovlev VV, Scarel G, Aita CR, Mochizuki S. Short-range order in ultrathin film titanium dioxide studied by Raman spectroscopy Applied Physics Letters. 76: 1107-1109. |
0.488 |
|
| 1999 |
DeLoach JD, Scarel G, Aita CR. Correlation between titania film structure and near ultraviolet optical absorption Journal of Applied Physics. 85: 2377-2384. DOI: 10.1063/1.369553 |
0.701 |
|
| 1999 |
DeLoach JD, Scarel G, Aita CR. Correlation between titania film structure and near ultraviolet optical absorption Journal of Applied Physics. 85: 2377-2384. |
0.476 |
|
| 1998 |
Deloach JD, Aita CR. Thickness-dependent crystallinity of sputter-deposited titania Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 16: 1963-1968. DOI: 10.1116/1.581204 |
0.489 |
|
| 1998 |
Schofield MA, Aita CR, Rice PM, Gajdardziska-Josifovska M. Transmission electron microscopy study of zirconia-alumina nanolaminates grown by reactive sputter deposition. Part I: Zirconia nanocrystallite growth morphology Thin Solid Films. 326: 106-116. DOI: 10.1016/S0040-6090(98)00542-2 |
0.496 |
|
| 1998 |
Schofield M, Aita C, Rice P, Gajdardziska-Josifovska M. Transmission electron microscopy study of zirconia–alumina nanolaminates grown by reactive sputter deposition. Part II: transformation behavior of tetragonal zirconia nanocrystallites Thin Solid Films. 326: 117-125. DOI: 10.1016/S0040-6090(98)00519-7 |
0.365 |
|
| 1998 |
Aita CR. Tailored Ceramic Film Growth at Low Temperature by Reactive Sputter Deposition Critical Reviews in Solid State and Materials Sciences. 23: 205-274. |
0.398 |
|
| 1998 |
Aita CR. Reactive sputter deposition of ceramic oxide nanolaminates: ZrO2-Al2O3 and ZrO2-Y2O3 model systems Surface Engineering. 14: 421-426. |
0.374 |
|
| 1998 |
Schofield MA, Aita CR, Rice PM, Gajdardziska-Josifovska M. Transmission electron microscopy study of zirconia-alumina nanolaminates grown by reactive sputter deposition. Part II: Transformation behavior of tetragonal zirconia nanocrystallites Thin Solid Films. 326: 117-125. |
0.368 |
|
| 1998 |
Aita CR. In situ sputter deposition discharge diagnostics for tailoring ceramic film growth Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 16: 1303-1310. |
0.397 |
|
| 1996 |
Schofield MA, Whig R, Aita CR, Gajdardziska-Josifovska M. High resolution electron microscopy of sputter-deposited zirconia-alumina nanolaminates Materials Research Society Symposium - Proceedings. 403: 297-301. DOI: 10.1557/Proc-403-297 |
0.398 |
|
| 1996 |
Gajdardziska-Josifovska M, Aita CR. The transformation structure of zirconia-alumina nanolaminates studied by high resolution electron microscopy Journal of Applied Physics. 79: 1315-1319. DOI: 10.1063/1.361027 |
0.338 |
|
| 1996 |
Aita CR, Wiggins MD, Whig R, Scanlan CM, Gajdardziska-Josifovska M. Thermodynamics of tetragonal zirconia formation in a nanolaminate film Journal of Applied Physics. 79: 1176-1178. DOI: 10.1063/1.360902 |
0.427 |
|
| 1996 |
Wiggins MD, Nelson MC, Aita CR. Crystallization kinetics of rutile formation from amorphous titania films Materials Research Society Symposium - Proceedings. 398: 381-386. |
0.452 |
|
| 1994 |
Scanlan CM, Wiggins MD, Gajdardziska-Josifovska M, Aita CR. The Effect of Layer Thickness on Polycrystalline Zirconia Growth in Zirconia-Alumina Multilayer Nanolaminates Mrs Proceedings. 343. DOI: 10.1557/PROC-343-481 |
0.446 |
|
| 1994 |
Scanlan CM, Wiggins MD, Gajdardziska-Josifovska M, Aita CR. Effect of layer thickness on polycrystalline zirconia growth in zirconia-alumina multilayer nanolaminates Materials Research Society Symposium - Proceedings. 343: 481-486. DOI: 10.1557/Proc-343-481 |
0.525 |
|
| 1994 |
Scanlan CM, Gajdardziska-Josifovska M, Aita CR. Tetragonal zirconia growth by nanolaminate formation Applied Physics Letters. 64: 3548-3550. DOI: 10.1063/1.111220 |
0.465 |
|
| 1994 |
Aita CR. Modelling the growth kinetics of sputter-deposited nanocrystalline zirconia films Nanostructured Materials. 4: 257-263. DOI: 10.1016/0965-9773(94)90135-X |
0.322 |
|
| 1994 |
Aita CR, Scanlan CM, Gajdardziska-Josifovska M. Sputter deposited zirconia-alumina nanolaminate coatings Jom. 46: 40-42. DOI: 10.1007/Bf03222607 |
0.441 |
|
| 1993 |
Aita CR. Phase Formation in Sputter Deposited Metal (V, Nb, Zr, Y) Oxides: Relationship to Metal, Metal-Oxygen, and Oxygen Flux Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 11: 1540-1547. DOI: 10.1116/1.578502 |
0.378 |
|
| 1992 |
Aita CR, Lee RC, Kwok C-, Kolawa EA. Phase Mapping Sputter Deposited Wide Band-Gap Metal Oxides Mrs Proceedings. 242: 737. DOI: 10.1557/Proc-242-737 |
0.473 |
|
| 1992 |
Abuhadba NM, Aita CR. Electronic Transition-Related Optical Absorption in Vanadia Films Mrs Proceedings. 242: 731. DOI: 10.1557/Proc-242-731 |
0.492 |
|
| 1992 |
Mukheriee SN, Aita CR. High temperature air-annealing behavior of sputter deposited amorphous yttria films on fused silica Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 10: 2723-2728. DOI: 10.1116/1.577900 |
0.438 |
|
| 1992 |
Mukherjee SN, Aita CR. Cyclic annealing-induced microstructural and crystallographic changes in crystalline yttria films on silica Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 10: 3362-3364. DOI: 10.1116/1.577827 |
0.402 |
|
| 1992 |
Mukherjee SN, Aita CR. Kinetics of morphological change during annealing of amorphous yttria Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 10: 3356-3358. DOI: 10.1116/1.577825 |
0.306 |
|
| 1992 |
Lee RC, Aita CR. Growth conditions for sputter deposited niobium oxides Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 10: 1777-1783. DOI: 10.1116/1.577746 |
0.465 |
|
| 1992 |
Abuhadba NM, Aita CR. Sputter deposition and in situ discharge diagnostics of tetragonal and amorphous barium titanate grown on unheated substrates using ar/o2 and ne/o2 discharges Materials and Manufacturing Processes. 7: 383-394. DOI: 10.1080/10426919208947427 |
0.453 |
|
| 1991 |
Aita CR, Tran NC. Core level and valence band x‐ray photoelectron spectroscopy of gold oxide Journal of Vacuum Science and Technology. 9: 1498-1500. DOI: 10.1116/1.577652 |
0.451 |
|
| 1991 |
Lee RC, Aita CR, Tran NC. The air‐exposed surface of sputter deposited silicon carbide studied by x‐ray photoelectron spectroscopy Journal of Vacuum Science and Technology. 9: 1351-1354. DOI: 10.1116/1.577625 |
0.444 |
|
| 1991 |
Luksich J, Aita CR. Annealing response of disordered sputter deposited vanadium pentoxide (V2O5) Journal of Vacuum Science and Technology. 9: 542-546. DOI: 10.1116/1.577405 |
0.512 |
|
| 1991 |
Lee RC, Aita CR. A phase map for sputter deposited niobium oxides Journal of Applied Physics. 70: 2094-2103. DOI: 10.1063/1.349445 |
0.545 |
|
| 1990 |
Kwok CK, Kolawa E, Aita CR. Process parameter-growth environment-film property relationships for the sputter deposited yttrium-oxygen system Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 8: 1330-1334. DOI: 10.1116/1.576876 |
0.524 |
|
| 1990 |
Kwok CK, Aita CR. Indirect band gap in a-Zr02 Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 8: 3345-3346. DOI: 10.1116/1.576548 |
0.347 |
|
| 1990 |
Aita CR, Kwok C‐. Fundamental Optical Absorption Edge of Sputter‐Deposited Zirconia and Yttria Journal of the American Ceramic Society. 73: 3209-3214. DOI: 10.1111/J.1151-2916.1990.Tb06439.X |
0.491 |
|
| 1990 |
Kwok CK, Aita CR, Kolawa E. Near-ultraviolet optical absorption in sputter-deposited cubic yttria Journal of Applied Physics. 68: 2945-2950. DOI: 10.1063/1.346428 |
0.52 |
|
| 1990 |
Aita CR. Erratum: ‘‘The interband absorption spectra of sputter‐deposited boron nitride analyzed using the coherent potential approximation’’ [J. Appl. Phys. 66, 3750 (1989)] Journal of Applied Physics. 67: 3906-3906. DOI: 10.1063/1.346114 |
0.307 |
|
| 1990 |
Aita CR, Liou LJ, Kwok CK, Lee RC, Kolawa E. Cathode voltage-gas composition-film crystallography relationships for sputter-deposited Vanadia (V2O5) Thin Solid Films. 193: 18-26. DOI: 10.1016/S0040-6090(05)80007-0 |
0.401 |
|
| 1990 |
Abuhadba N, Aita CR. Growth and near-ultraviolet optical absorption characteristics of sputter deposited nominal germania Journal of Non-Crystalline Solids. 122: 305-311. DOI: 10.1016/0022-3093(90)90996-Y |
0.456 |
|
| 1989 |
Kwok CK, Aita CR. The transition from αZr to αZrO2 growth in sputter-deposited films as a function of gas 02 content, rare-gas type, and cathode voltage Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 7: 1235-1239. DOI: 10.1116/1.576261 |
0.455 |
|
| 1989 |
Klumb AM, Aita CR, Tran NC. Sputter deposition of gold in rare-gas (Ar, Ne)-O2 discharges Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 7: 1697-1701. DOI: 10.1116/1.576073 |
0.448 |
|
| 1989 |
Kwok CK, Aita CR. Near-band gap optical behavior of sputter deposited α- and α+β-ZrO2 films Journal of Applied Physics. 66: 2756-2758. DOI: 10.1063/1.344484 |
0.41 |
|
| 1989 |
Aita CR. The interband absorption spectra of sputter-deposited boron nitride analyzed using the coherent potential approximation Journal of Applied Physics. 66: 3750-3752. DOI: 10.1063/1.344061 |
0.447 |
|
| 1988 |
Huber KJ, Aita CR. Resistivity changes and phase evolution in W-N films sputter deposited in Ne-N2and Ar-N2discharges Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 6: 1717-1721. DOI: 10.1116/1.575277 |
0.317 |
|
| 1987 |
Aita CR, Marhic ME, Sayers CN. Near Ultraviolet-Visible-Near Infrared Optical Behavior of Sputter Deposited GeOx Defect and Diffusion Forum. 55-60. DOI: 10.4028/Www.Scientific.Net/Ddf.53-54.55 |
0.407 |
|
| 1987 |
Aita CR, Kao ML. Low-temperature oxidation of nonstoichiometric sputter deposited vanadium pentoxide Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 5: 2714-2717. DOI: 10.1116/1.574726 |
0.457 |
|
| 1987 |
Aita CR. AuO+ and AuO+2 gaseous ions formed during the sputter deposition of Au films in Ar-O2 discharges Journal of Applied Physics. 61: 5182-5184. DOI: 10.1063/1.338295 |
0.349 |
|
| 1986 |
Aita CR, Kwok C, Kao ML. Interlayer Spacing of Sputter Deposited Vanadium Pentoxide Mrs Proceedings. 82: 435. DOI: 10.1557/Proc-82-435 |
0.354 |
|
| 1986 |
Aita CR, Liu YL, Kao ML, Hansen SD. Optical behavior of sputter-deposited vanadium pentoxide Journal of Applied Physics. 60: 749-753. DOI: 10.1063/1.337425 |
0.464 |
|
| 1985 |
Kubiak CJG, Aita CR, Tran NC, Barr TL. Characterization of Sputter Deposited Al-Nitride And Al-Oxide by X-Ray Photoelectron Loss Spectroscopy Mrs Proceedings. 60. DOI: 10.1557/Proc-60-379 |
0.392 |
|
| 1985 |
Kubiak CJG, Aita CR, Hickernell FS, Joseph SJ. OPTICAL BEHAVIOR OF SPUTTER-DEPOSITED ALUMINUM NITRIDE: RELATIONSHIP TO FILM CHEMISTRY Materials Research Society Symposia Proceedings. 47: 75-84. DOI: 10.1557/Proc-47-75 |
0.538 |
|
| 1985 |
Hansen SD, Aita CR. Low temperature reactive sputter deposition of vanadium oxide Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 3: 660-663. DOI: 10.1116/1.572974 |
0.467 |
|
| 1985 |
Aita CR. Optical behavior of sputter-deposited platinum-oxide films Journal of Applied Physics. 58: 3169-3173. DOI: 10.1063/1.335823 |
0.515 |
|
| 1984 |
Wiggins MD, Aita CR, Hickernell FS. Radio frequency sputter deposited boron nitride films Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 2: 322-325. DOI: 10.1116/1.572592 |
0.512 |
|
| 1984 |
Aita CR, Tran NC. Sputter deposition of platinum films in argon/oxygen and neon/oxygen discharges Journal of Applied Physics. 56: 958-963. DOI: 10.1063/1.334035 |
0.48 |
|
| 1984 |
Kovacich JA, Kasperkiewicz J, Lichtman D, Aita CR. Auger electron and x-ray photoelectron spectroscopy of sputter deposited aluminum nitride Journal of Applied Physics. 55: 2935-2939. DOI: 10.1063/1.333335 |
0.445 |
|
| 1983 |
Aita CR, Myers TA. Enhancement of Ta+ flux by substrate biasing during sputter deposition of tantalum-nitrogen films Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 1: 348-351. DOI: 10.1116/1.572132 |
0.466 |
|
| 1983 |
Gawlak CJ, Aita CR. Stress relief of basal orientation zinc oxide thin films by isothermal annealing Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 1: 415-418. DOI: 10.1116/1.571933 |
0.342 |
|
| 1983 |
Aita CR, Gawlak CJ. The dependence of aluminum nitride film crystallography on sputtering plasma composition Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 1: 403-406. DOI: 10.1116/1.571930 |
0.403 |
|
| 1983 |
Aita CR, Tran NC. Rare gas-oxygen effects on the rf sputter deposition of platinum Journal of Applied Physics. 54: 6051-6052. DOI: 10.1063/1.331752 |
0.442 |
|
| 1982 |
Aita CR. Basal orientation aluminum nitride grown at low temperature by rf diode sputtering Journal of Applied Physics. 53: 1807-1808. DOI: 10.1063/1.330682 |
0.455 |
|
| 1980 |
Lad RJ, Funkenbusch PD, Aita CR. POSTDEPOSITION ANNEALING BEHAVIOR OF rf SPUTTERED ZnO FILMS Journal of Vacuum Science &Amp; Technology. 17: 808-811. DOI: 10.1116/1.570565 |
0.416 |
|
| 1980 |
Aita CR, Lad RJ, Tisone TC. The effect of rf power on reactively sputtered zinc oxide Journal of Applied Physics. 51: 6405-6410. DOI: 10.1063/1.327585 |
0.438 |
|
| 1980 |
Aita CR, Purdes AJ, Lad KL, Funkenbusch PD. The effect of O2 on reactively sputtered zinc oxide Journal of Applied Physics. 51: 5533-5536. DOI: 10.1063/1.327472 |
0.319 |
|
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