Daniel P. Sanders, Ph.D.
Affiliations: | 2005 | California Institute of Technology, Pasadena, CA |
Area:
Organic chemistryGoogle:
"Daniel Sanders"Mean distance: 6.89 | S | N | B | C | P |
Parents
Sign in to add mentor| Robert Howard Grubbs | grad student | 2005 | Caltech | |
| (Development of fluorinated monomers and polymers for advanced photolithographic applications.) | ||||
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Publications
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| Kim JY, Liu P, Maher MJ, et al. (2020) Spatial Control of Self-Assembled Block Copolymer Domain Orientation and Alignment on Photo-Patterned Surfaces. Acs Applied Materials & Interfaces |
| Lai K, Liu C, Tsai H, et al. (2017) Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design? Journal of Micro/Nanolithography, Mems, and Moems. 16: 013502 |
| Vora A, Schmidt K, Alva G, et al. (2016) Orientation Control of Block Copolymers using Surface Active, Phase-preferential Additives. Acs Applied Materials & Interfaces |
| Xie T, Vora A, Mulcahey PJ, et al. (2016) Surface Assembly Configurations and Packing Preferences of Fibrinogen Mediated by the Periodicity and Alignment Control of Block Copolymer Nanodomains. Acs Nano |
| Nowak D, Morrison W, Wickramasinghe HK, et al. (2016) Nanoscale chemical imaging by photoinduced force microscopy. Science Advances. 2: e1501571 |
| Vora A, Alva G, Chunder A, et al. (2016) Synthesis and Thin-film Self-assembly of Cylinder-Forming High-χ Block Copolymers Journal of Photopolymer Science and Technology. 29: 685-688 |
| Liu C, Franke E, Lie FL, et al. (2016) Directed self-assembly patterning for forming fin field effect transistors Spie Newsroom |
| Chi C, Liu CC, Meli L, et al. (2016) DSA via hole shrink for advanced node applications Proceedings of Spie - the International Society For Optical Engineering. 9777 |
| Liu CCC, Franke E, Lie FL, et al. (2016) DSA patterning options for FinFET formation at 7nm node Proceedings of Spie - the International Society For Optical Engineering. 9777 |
| Tsai H, Miyazoe H, Vora A, et al. (2016) High chi block copolymer DSA to improve pattern quality for FinFET device fabrication Proceedings of Spie - the International Society For Optical Engineering. 9779 |