Alain C. Diebold
Affiliations: | Nanoscale Science and Engineering-Nanoscale Science | State University of New York, Albany, Albany, NY, United States |
Area:
Nanoscience, General Physics, Materials Science EngineeringGoogle:
"Alain Diebold"Children
Sign in to add traineeMing Di | grad student | 2010 | SUNY Albany |
Vimal K. Kamineni | grad student | 2011 | SUNY Albany |
Lay W. Kong | grad student | 2011 | SUNY Albany |
Florence Nelson | grad student | 2012 | SUNY Albany |
Gangadhara R. Muthinti | grad student | 2013 | SUNY Albany |
Manasa Medikonda | grad student | 2014 | SUNY Albany |
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Publications
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Korde M, Kal S, Alix C, et al. (2020) Nondestructive characterization of nanoscale subsurface features fabricated by selective etching of multilayered nanowire test structures using Mueller matrix spectroscopic ellipsometry based scatterometry Journal of Vacuum Science & Technology B. 38: 024007 |
Mukundan V, Beckmann K, Tapily K, et al. (2019) Structural Correlation of Ferroelectric Behavior in Mixed Hafnia-Zirconia High-k Dielectrics for FeRAM and NCFET Applications Mrs Advances. 4: 545-551 |
Walsh LA, Green AJ, Addou R, et al. (2018) Fermi Level Manipulation Through Native Doping in the Topological Insulator BiSe. Acs Nano |
Diebold AC, Antonelli A, Keller N. (2018) Perspective: Optical measurement of feature dimensions and shapes by scatterometry Apl Materials. 6: 058201 |
Dey S, Yu K, Consiglio S, et al. (2017) Atomic layer deposited ultrathin metal nitride barrier layers for ruthenium interconnect applications Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 35: 03E109 |
Yang F, Sendova M, Jacobs-Gedrim RB, et al. (2017) Rapid optical determination of topological insulator nanoplate thickness and oxidation Aip Advances. 7: 015114 |
Funke S, Wurstbauer U, Miller B, et al. (2017) Spectroscopic imaging ellipsometry for automated search of flakes of mono- and n-layers of 2D-materials Applied Surface Science. 421: 435-439 |
Dey S, Tapily K, Consiglio S, et al. (2016) Higher-k Tetragonal Phase Stabilization in Atomic Layer Deposited
Hf1-xZrxO2 (0 |
Consiglio S, Dey S, Yu K, et al. (2016) In Situ Ramp Anneal X-ray Diffraction Study of Atomic Layer Deposited Ultrathin TaN and Ta1-xAlxNyFilms for Cu Diffusion Barrier Applications Ecs Journal of Solid State Science and Technology. 5: P509-P513 |
Dixit D, Green A, Hosler ER, et al. (2016) Optical critical dimension metrology for directed self-assembly assisted contact hole shrink Journal of Micro/ Nanolithography, Mems, and Moems. 15 |