Marcus Asmann, Ph.D.
Affiliations: | 2000 | University of Minnesota, Twin Cities, Minneapolis, MN |
Area:
Materials Science Engineering, Mechanical EngineeringGoogle:
"Marcus Asmann"Parents
Sign in to add mentor| Emil Pfender | grad student | 2000 | UMN | |
| (Aspects of DC arcjet thermal plasma chemical vapor deposition.) | ||||
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Publications
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| Asmann M, Cook RF, Heberlein JV, et al. (2001) Chemical vapor deposition of an aluminum nitride-diamond composite in a triple torch plasma reactor Journal of Materials Research. 16: 469-477 |
| Asmann M, Wank A, Kim H, et al. (2001) Characterization of the converging jet region in a triple torch plasma reactor Plasma Chemistry and Plasma Processing. 21: 37-63 |
| Asmann M, Borges CFM, Heberlein J, et al. (2001) The effects of substrate rotation on thermal plasma chemical vapor deposition of diamond Surface and Coatings Technology. 142: 724-732 |
| Wilden J, Wank A, Asmann M, et al. (2001) Synthesis of Si-C-N coatings by thermal plasmajet chemical vapour deposition applying liquid precursors Applied Organometallic Chemistry. 15: 841-857 |
| Asmann M, Heberlein J, Pfender E. (2000) Use of Liquid Precursors for Diamond Chemical Vapor Deposition--The Effects of Mass Transport and Oxygen Plasma Chemistry and Plasma Processing. 20: 209-224 |
| Asmann M, Kolman D, Heberlein J, et al. (2000) Experimental confirmation of thermal plasma CVD of diamond with liquid feedstock injection model Diamond and Related Materials. 9: 13-21 |
| Asmann M, Heberlein J, Pfender E. (1999) A review of diamond CVD utilizing halogenated precursors Diamond and Related Materials. 8: 1-16 |
| Borges CFM, Asmann M, Pfender E, et al. (1998) Diamond deposition on substrates with different geometries in a thermal plasma reactor Plasma Chemistry and Plasma Processing. 18: 305-324 |