| Year |
Citation |
Score |
| 2012 |
Tada Y, Yoshida H, Ishida Y, Hirai T, Bosworth JK, Dobisz E, Ruiz R, Takenaka M, Hayakawa T, Hasegawa H. Directed self-assembly of POSS containing block copolymer on lithographically defined chemical template with morphology control by solvent vapor Macromolecules. 45: 292-304. DOI: 10.1021/Ma201822A |
0.731 |
|
| 2012 |
Bosworth JK, Ober CK. Top-Down versus Bottom-Up Patterning of Polymers Polymer Science: a Comprehensive Reference, 10 Volume Set. 8: 9-35. DOI: 10.1016/B978-0-444-53349-4.00200-4 |
0.525 |
|
| 2011 |
Rose F, Bosworth JK, Dobisz EA, Ruiz R. Three-dimensional mesoporous structures fabricated by independent stacking of self-assembled films on suspended membranes. Nanotechnology. 22: 035603. PMID 21149954 DOI: 10.1088/0957-4484/22/3/035603 |
0.565 |
|
| 2011 |
Bosworth JK, Dobisz EA, Hellwig O, Ruiz R. Impact of out-of-plane translational order in block copolymer lithography Macromolecules. 44: 9196-9204. DOI: 10.1021/Ma201967A |
0.554 |
|
| 2010 |
Paik MY, Bosworth JK, Smilges DM, Schwartz EL, Andre X, Ober CK. Reversible Morphology Control in Block Copolymer Films via Solvent Vapor Processing: An In Situ GISAXS study. Macromolecules. 43: 4253-4260. PMID 21116459 DOI: 10.1021/Ma902646T |
0.703 |
|
| 2010 |
Bosworth JK, Dobisz E, Ruiz R. 20 nm pitch directed block copolymer assembly using solvent annealing for bit patterned media Journal of Photopolymer Science and Technology. 23: 145-148. DOI: 10.2494/Photopolymer.23.145 |
0.564 |
|
| 2010 |
Schwartz EL, Bosworth JK, Paik MY, Ober CK. New self-assembly strategies for next generation lithography Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848409 |
0.701 |
|
| 2010 |
Hellwig O, Bosworth JK, Dobisz E, Kercher D, Hauet T, Zeltzer G, Risner-Jamtgaard JD, Yaney D, Ruiz R. Bit patterned media based on block copolymer directed assembly with narrow magnetic switching field distribution Applied Physics Letters. 96. DOI: 10.1063/1.3293301 |
0.45 |
|
| 2009 |
Bosworth JK, Black CT, Ober CK. Selective area control of self-assembled pattern architecture using a lithographically patternable block copolymer. Acs Nano. 3: 1761-6. PMID 19534477 DOI: 10.1021/Nn900343U |
0.722 |
|
| 2008 |
Bosworth JK, Paik MY, Ruiz R, Schwartz EL, Huang JQ, Ko AW, Smilgies DM, Black CT, Ober CK. Control of self-assembly of lithographically patternable block copolymer films. Acs Nano. 2: 1396-402. PMID 19206307 DOI: 10.1021/Nn8001505 |
0.702 |
|
| 2008 |
Ruiz R, Bosworth JK, Black CT. Effect of structural anisotropy on the coarsening kinetics of diblock copolymer striped patterns Physical Review B - Condensed Matter and Materials Physics. 77. DOI: 10.1103/Physrevb.77.054204 |
0.318 |
|
| 2008 |
Nagarajan S, Bosworth JK, Ober CK, Russell TP, Watkins JJ. Simple fabrication of micropatterned mesoporous silica films using photoacid generators in block copolymers Chemistry of Materials. 20: 604-606. DOI: 10.1021/Cm702397B |
0.662 |
|
| 2008 |
Nagarajan S, Li M, Pai RA, Bosworth JK, Busch P, Smilgies DM, Ober CK, Russell TP, Watkins JJ. An efficient route to mesoporous silica films with perpendicular nanochannels Advanced Materials. 20: 246-251. DOI: 10.1002/Adma.200701766 |
0.642 |
|
| 2008 |
Nagarajan S, Bosworth JK, Ober CK, Russell TP, Watkins JJ. Directly patterned mesoporous dielectric films templated from chemically amplified block copolymers Advanced Metallization Conference (Amc). 495-499. |
0.632 |
|
| 2007 |
Bosworth JK, Andre X, Schwartz EL, Ruiz R, Black CT, Ober CK. Control of morphology orientation in lithographically patternable diblock copolymers Journal of Photopolymer Science and Technology. 20: 519-522. DOI: 10.2494/Photopolymer.20.519 |
0.593 |
|
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