Year |
Citation |
Score |
2019 |
Padash F, Dorff B, Liu W, Ellwood K, Okerberg B, Zawacky SR, Harb JN. Characterization of initial film formation during cathodic electrodeposition of coatings Progress in Organic Coatings. 133: 395-405. DOI: 10.1016/J.Porgcoat.2019.04.061 |
0.369 |
|
2009 |
Alvine KJ, Ding Y, Douglas JF, Ro HW, Okerberg BC, Karim A, Soles CL. Capillary instability in nanoimprinted polymer films Soft Matter. 5: 2913-2918. DOI: 10.1039/B901409H |
0.383 |
|
2009 |
Okerberg BC, Berry BC, Garvey TR, Douglas JF, Karim A, Soles CL. Competition between crystallization and dewetting fronts in thin polymer films Soft Matter. 5: 562-567. DOI: 10.1039/B806074F |
0.564 |
|
2009 |
Alvine KJ, Ding Y, Douglas JF, Ro HW, Okerberg BC, Karim A, Lavery KA, Lin-Gibson S, Soles CL. Effect of fluorosurfactant on capillary instabilities in nanoimprinted polymer patterns Journal of Polymer Science, Part B: Polymer Physics. 47: 2591-2600. DOI: 10.1002/Polb.21884 |
0.431 |
|
2008 |
Okerberg BC, Marand H, Douglas JF. Dendritic crystallization in thin films of PEO/PMMA blends: A comparison to crystallization in small molecule liquids Polymer. 49: 579-587. DOI: 10.1016/J.Polymer.2007.11.034 |
0.557 |
|
2008 |
Ding Y, Ro HW, Alvine KJ, Okerberg BC, Zhou J, Douglas JF, Karim A, Soles CL. Nanoimprint lithography and the role of viscoelasticity in the generation of residual stress in model polystyrene patterns Advanced Functional Materials. 18: 1854-1862. DOI: 10.1002/Adfm.200701402 |
0.448 |
|
2007 |
Ding Y, Ro HW, Germer TA, Douglas JF, Okerberg BC, Karim A, Soles CL. Relaxation behavior of polymer structures fabricated by nanoimprint lithography. Acs Nano. 1: 84-92. PMID 19206524 DOI: 10.1021/Nn700014P |
0.388 |
|
2007 |
Okerberg BC, Soles CL, Douglas JF, Ro HW, Karim A, Hines DR. Crystallization of poly(ethylene oxide) patterned by nanoimprint lithography Macromolecules. 40: 2968-2970. DOI: 10.1021/Ma070293H |
0.441 |
|
2007 |
Okerberg BC, Marand H. Crystal morphologies in thin films of PEO/PMMA blends Journal of Materials Science. 42: 4521-4529. DOI: 10.1007/S10853-006-0471-3 |
0.563 |
|
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