Year |
Citation |
Score |
2018 |
Chiaranairungroj M, Pimpin A, Srituravanich W. Fabrication of high-density microneedle masters towards the commercialisation of dissolving microneedles Micro & Nano Letters. 13: 284-288. DOI: 10.1049/Mnl.2017.0596 |
0.307 |
|
2014 |
Phetdee K, Pimpin A, Srituravanich W. Improvement of measurement sensitivity near contact in intensity-interferometry flying height testers Microsystem Technologies. 21: 49-53. DOI: 10.1007/S00542-014-2146-3 |
0.333 |
|
2009 |
Liu Z, Wang Y, Yao J, Lee H, Srituravanich W, Zhang X. Broad band two-dimensional manipulation of surface plasmons. Nano Letters. 9: 462-6. PMID 19099461 DOI: 10.1021/Nl803460G |
0.328 |
|
2008 |
Srituravanich W, Pan L, Wang Y, Sun C, Bogy DB, Zhang X. Flying plasmonic lens in the near field for high-speed nanolithography. Nature Nanotechnology. 3: 733-7. PMID 19057593 DOI: 10.1038/Nnano.2008.303 |
0.375 |
|
2008 |
Wang Y, Srituravanich W, Sun C, Zhang X. Plasmonic nearfield scanning probe with high transmission. Nano Letters. 8: 3041-5. PMID 18720976 DOI: 10.1021/Nl8023824 |
0.359 |
|
2006 |
Lee H, Xiong Y, Fang N, Srituravanich W, Durant S, Ambati M, Sun C, Zhang X. Optical Silver Superlens Imaging Below the Diffraction Limit Mrs Proceedings. 919. DOI: 10.1557/Proc-0919-J04-01 |
0.332 |
|
2006 |
Wang Y, Srituravanich W, Sun C, Zhang X. Plasmonic nearfield scanning optical microscopy Proceedings of Spie. 6324: 632407. DOI: 10.1117/12.681482 |
0.355 |
|
2005 |
Liu Z, Steele JM, Srituravanich W, Pikus Y, Sun C, Zhang X. Focusing surface plasmons with a plasmonic lens. Nano Letters. 5: 1726-9. PMID 16159213 DOI: 10.1021/Nl051013J |
0.321 |
|
2005 |
Srituravanich W, Durant S, Lee H, Sun C, Zhang X. Deep subwavelength nanolithography using localized surface plasmon modes on planar silver mask Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 23: 2636. DOI: 10.1116/1.2091088 |
0.39 |
|
2005 |
Lee H, Xiong Y, Fang N, Srituravanich W, Durant S, Ambati M, Sun C, Zhang X. Realization of optical superlens imaging below the diffraction limit New Journal of Physics. 7: 255-255. DOI: 10.1088/1367-2630/7/1/255 |
0.307 |
|
2004 |
Srituravanich W, Fang N, Durant S, Ambati M, Sun C, Zhang X. Sub-100 nm lithography using ultrashort wavelength of surface plasmons Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 22: 3475. DOI: 10.1116/1.1823437 |
0.367 |
|
Show low-probability matches. |