Jeffrey R. Lancaster - Publications

Affiliations: 
2011 Chemistry Columbia University, New York, NY 

7 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2016 Carroll GT, Lancaster JR, Turro NJ, Koberstein JT, Mammana A. Electroless Deposition of Nickel on Photografted Polymeric Microscale Patterns. Macromolecular Rapid Communications. PMID 27873447 DOI: 10.1002/Marc.201600564  0.557
2014 Lancaster JR, Smilowitz R, Turro NJ, Koberstein JT. 1H NMR study of hydrogen abstraction in model compound mimics of polymers. Photochemistry and Photobiology. 90: 394-401. PMID 24256104 DOI: 10.1111/Php.12214  0.42
2010 Sundaresan AK, Jockusch S, Li Y, Lancaster JR, Banik S, Zimmerman P, Blackwell JM, Bristol R, Turro NJ. Adiabatic ring opening in tethered naphthalene and anthracene cycloadducts. Photochemical & Photobiological Sciences : Official Journal of the European Photochemistry Association and the European Society For Photobiology. 9: 1082-4. PMID 20526506 DOI: 10.1039/C0Pp00096E  0.333
2009 Gu X, Berro AJ, Cho Y, Jen K, Lee S, Nagai T, Ogata T, Durand WJ, Sundaresan A, Lancaster JR, Jockusch S, Zimmerman P, Turro NJ, Grant Willson C. Fundamental study of optical threshold layer approach towards double exposure lithography Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814298  0.385
2008 Lancaster JR, Martí AA, López-Gejo J, Jockusch S, O'Connor N, Turro NJ. Nonradiative deactivation of singlet oxygen ((1)O2) by cubane and its derivatives. Organic Letters. 10: 5509-12. PMID 19053738 DOI: 10.1021/Ol802113J  0.492
2008 O'Connor NA, Berro AJ, Lancaster JR, Xinyu G, Jockusch S, Nagai T, Ogata T, Lee S, Zimmerman P, Willson CG, Turro NJ. Toward the design of a sequential two photon photoacid generator for double exposure photolithography Chemistry of Materials. 20: 7374-7376. DOI: 10.1021/Cm802343U  0.362
2008 Lancaster JR, Jehani J, Carroll GT, Chen Y, Turro NJ, Koberstein JT. Toward a universal method to pattern metals on a polymer Chemistry of Materials. 20: 6583-6585. DOI: 10.1021/Cm801639N  0.565
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