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Rebecca J. Younkin, Ph.D. - Publications

Affiliations: 
2001 Harvard University, Cambridge, MA, United States 
Area:
Ultrafast Physics, Materials Science and Chemistry
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7 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2003 Shen MY, Crouch CH, Carey JE, Younkin R, Mazur E, Sheehy M, Friend CM. Formation of regular arrays of silicon microspikes by femtosecond laser irradiation through a mask Applied Physics Letters. 82: 1715-1717. DOI: 10.1063/1.1561162  0.512
2003 Younkin R, Carey JE, Mazur E, Levinson JA, Friend CM. Infrared absorption by conical silicon microstructures made in a variety of background gases using femtosecond-laser pulses Journal of Applied Physics. 93: 2626-2629. DOI: 10.1063/1.1545159  0.547
2001 Wu C, Crouch CH, Zhao L, Carey JE, Younkin R, Levinson JA, Mazur E, Farrell RM, Gothoskar P, Karger A. Near-unity below-band-gap absorption by microstructured silicon Applied Physics Letters. 78: 1850-1852. DOI: 10.1063/1.1358846  0.484
1998 Johnson KS, Thywissen JH, Dekker NH, Berggren KK, Chu AP, Younkin R, Prentiss M. Localization of metastable atom beams with optical standing waves: nanolithography at the heisenberg limit Science (New York, N.Y.). 280: 1583-6. PMID 9616117 DOI: 10.1126/Science.280.5369.1583  0.365
1997 Thywissen JH, Johnson KS, Younkin R, Dekker NH, Berggren KK, Chu AP, Prentiss M, Lee SA. Nanofabrication using neutral atomic beams Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 15: 2093-2100. DOI: 10.1116/1.589227  0.387
1997 Younkin R, Berggren KK, Johnson KS, Prentiss M, Ralph DC, Whitesides GM. Nanostructure fabrication in silicon using cesium to pattern a self-assembled monolayer Applied Physics Letters. 71: 1261-1263. DOI: 10.1063/1.119867  0.48
1997 Johnson KS, Berggren KK, Black AJ, Black CT, Chu AP, Dekker NH, Ralph DC, Thywissen JH, Younkin RJ, Prentiss MG, Tinkham M, Whitesides GM. Using neutral metastable argon atoms and contamination lithography to form nanostructures in silicon, silicon dioxide, and gold Proceedings of Spie - the International Society For Optical Engineering. 2995: 97-108. DOI: 10.1063/1.117671  0.482
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