| Year |
Citation |
Score |
| 2021 |
Kruszelnicki J, Ma R, Kushner MJ. Propagation of atmospheric pressure plasmas through interconnected pores in dielectric materials Journal of Applied Physics. 129: 143302. DOI: 10.1063/5.0045706 |
0.312 |
|
| 2020 |
Huang S, Shim S, Nam SK, Kushner MJ. Pattern dependent profile distortion during plasma etching of high aspect ratio features in SiO2 Journal of Vacuum Science & Technology A. 38: 023001. DOI: 10.1116/1.5132800 |
0.316 |
|
| 2020 |
Jung J, Barsukov Y, Volynets V, Kim G, Nam SK, Han K, Huang S, Kushner MJ. Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. II. Surface reaction mechanism Journal of Vacuum Science & Technology A. 38: 023008. DOI: 10.1116/1.5125569 |
0.432 |
|
| 2020 |
Volynets V, Barsukov Y, Kim G, Jung J, Nam SK, Han K, Huang S, Kushner MJ. Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. I. Plasma source and critical fluxes Journal of Vacuum Science & Technology A. 38: 023007. DOI: 10.1116/1.5125568 |
0.468 |
|
| 2020 |
Qu C, Nam SK, Kushner MJ. Transients using low-high pulsed power in inductively coupled plasmas Plasma Sources Science and Technology. 29: 85006. DOI: 10.1088/1361-6595/Aba113 |
0.413 |
|
| 2020 |
Qu C, Lanham SJ, Shannon SC, Nam SK, Kushner MJ. Erratum: Power Matching to Pulsed Inductively Coupled Plasmas [J. Appl. Phys. 127, 133302 (2020)] Journal of Applied Physics. 128: 89901. DOI: 10.1063/5.0023888 |
0.401 |
|
| 2020 |
Lietz AM, Barnat EV, Foster JE, Kushner MJ. Ionization wave propagation in a He plasma jet in a controlled gas environment Journal of Applied Physics. 128: 83301. DOI: 10.1063/5.0020264 |
0.435 |
|
| 2020 |
Qu C, Lanham SJ, Shannon SC, Nam SK, Kushner MJ. Power matching to pulsed inductively coupled plasmas Journal of Applied Physics. 127: 133302. DOI: 10.1063/5.0002522 |
0.472 |
|
| 2020 |
Mujahid Z, Kruszelnicki J, Hala A, Kushner MJ. Formation of surface ionization waves in a plasma enhanced packed bed reactor for catalysis applications Chemical Engineering Journal. 382: 123038. DOI: 10.1016/J.Cej.2019.123038 |
0.438 |
|
| 2020 |
Mohades S, Lietz AM, Kruszelnicki J, Kushner MJ. Helium plasma jet interactions with water in well plates Plasma Processes and Polymers. 17: 1900179. DOI: 10.1002/Ppap.201900179 |
0.381 |
|
| 2019 |
Huang S, Huard C, Shim S, Nam SK, Song I, Lu S, Kushner MJ. Plasma etching of high aspect ratio features in SiO2 using Ar/C4F8/O2 mixtures: A computational investigation Journal of Vacuum Science & Technology A. 37: 031304. DOI: 10.1116/1.5090606 |
0.441 |
|
| 2019 |
Lietz AM, Damany X, Robert E, Pouvesle J, Kushner MJ. Ionization wave propagation in an atmospheric pressure plasma multi-jet Plasma Sources Science and Technology. 28: 125009. DOI: 10.1088/1361-6595/Ab4Ab0 |
0.435 |
|
| 2019 |
Kruszelnicki JA, Lietz AM, Kushner MJ. Atmospheric pressure plasma activation of water droplets Journal of Physics D. 52: 355207. DOI: 10.1088/1361-6463/Ab25Dc |
0.401 |
|
| 2019 |
Luo Y, Lietz AM, Yatom S, Kushner MJ, Bruggeman PJ. Plasma kinetics in a nanosecond pulsed filamentary discharge sustained in Ar–H2O and H2O Journal of Physics D. 52: 44003. DOI: 10.1088/1361-6463/Aaeb14 |
0.448 |
|
| 2019 |
Han J, Pribyl P, Gekelman W, Paterson A, Lanham SJ, Qu C, Kushner MJ. Three-dimensional measurements of plasma parameters in an inductively coupled plasma processing chamber Physics of Plasmas. 26: 103503. DOI: 10.1063/1.5115415 |
0.48 |
|
| 2019 |
Menati M, Thomas E, Kushner MJ. Filamentation of capacitively coupled plasmas in large magnetic fields Physics of Plasmas. 26: 63515. DOI: 10.1063/1.5092600 |
0.394 |
|
| 2018 |
Schröter S, Wijaikhum A, Gibson AR, West A, Davies HL, Minesi N, Dedrick J, Wagenaars E, de Oliveira N, Nahon L, Kushner MJ, Booth JP, Niemi K, Gans T, O'Connell D. Chemical kinetics in an atmospheric pressure helium plasma containing humidity. Physical Chemistry Chemical Physics : Pccp. PMID 30211409 DOI: 10.1039/C8Cp02473A |
0.445 |
|
| 2018 |
Huard CM, Sriraman S, Paterson A, Kushner MJ. Transient behavior in quasi-atomic layer etching of silicon dioxide and silicon nitride in fluorocarbon plasmas Journal of Vacuum Science and Technology. 36. DOI: 10.1116/1.5049225 |
0.384 |
|
| 2018 |
Huang S, Volynets V, Hamilton JR, Nam SK, Song I, Lu S, Tennyson J, Kushner MJ. Downstream etching of silicon nitride using continuous-wave and pulsed remote plasma sources sustained in Ar/NF3/O2 mixtures Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 36: 021305. DOI: 10.1116/1.5019673 |
0.496 |
|
| 2018 |
Lietz AM, Kushner MJ. Electrode configurations in atmospheric pressure plasma jets: production of reactive species Plasma Sources Science and Technology. 27: 105020. DOI: 10.1088/1361-6595/Aadf5B |
0.388 |
|
| 2018 |
Doyle SJ, Gibson AR, Flatt J, Ho TS, Boswell R, Charles C, Tian P, Kushner MJ, Dedrick JP. Spatio-temporal plasma heating mechanisms in a radio frequency electrothermal microthruster Plasma Sources Science and Technology. 27: 85011. DOI: 10.1088/1361-6595/Aad79A |
0.412 |
|
| 2018 |
Engeling KW, Kruszelnicki J, Kushner MJ, Foster JE. Time-resolved evolution of micro-discharges, surface ionization waves and plasma propagation in a two-dimensional packed bed reactor Plasma Sources Science and Technology. 27: 85002. DOI: 10.1088/1361-6595/Aad2C5 |
0.5 |
|
| 2018 |
Schröter S, Gibson AR, Kushner MJ, Gans T, O’Connell D. Erratum: Numerical study of the influence of surface reaction probabilities on reactive species in an rf atmospheric pressure plasma containing humidity (2017 Plasma Phys. Control. Fusion 60 014035) Plasma Physics and Controlled Fusion. 60: 19601. DOI: 10.1088/1361-6587/Aa9A6B |
0.451 |
|
| 2018 |
Schröter S, Gibson AR, Kushner MJ, Gans T, O'Connell D. Numerical study of the influence of surface reaction probabilities on reactive species in an rf atmospheric pressure plasma containing humidity Plasma Physics and Controlled Fusion. 60: 14035. DOI: 10.1088/1361-6587/Aa8Fe9 |
0.392 |
|
| 2018 |
Norberg SA, Parsey GM, Lietz AM, Johnsen E, Kushner MJ. Atmospheric pressure plasma jets onto a reactive water layer over tissue: pulse repetition rate as a control mechanism Journal of Physics D: Applied Physics. 52: 015201. DOI: 10.1088/1361-6463/Aae41E |
0.428 |
|
| 2018 |
Huard CM, Lanham SJ, Kushner MJ. Consequences of atomic layer etching on wafer scale uniformity in inductively coupled plasmas Journal of Physics D. 51: 155201. DOI: 10.1088/1361-6463/Aab322 |
0.367 |
|
| 2018 |
Lietz AM, Kushner MJ. Molecular admixtures and impurities in atmospheric pressure plasma jets Journal of Applied Physics. 124: 153303. DOI: 10.1063/1.5049430 |
0.383 |
|
| 2018 |
Kruszelnicki J, Lietz AM, Parsey G, Mohades S, Kushner MJ. Consequences Of Environmental Factors In Plasma Treatment Of Liquids, Tissues And Materials Clinical Plasma Medicine. 9: 2. DOI: 10.1016/J.Cpme.2017.12.003 |
0.461 |
|
| 2017 |
Deng S, Green SR, Markosyan AH, Kushner MJ, Gianchandani YB. Miniaturized magnet-less RF electron trap. II. Experimental verification Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 35: 042002. DOI: 10.1116/1.4984752 |
0.34 |
|
| 2017 |
Markosyan AH, Green SR, Deng S, Gianchandani YB, Kushner MJ. Miniaturized magnet-less RF electron trap. I. Modeling and analysis Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 35: 042001. DOI: 10.1116/1.4984751 |
0.333 |
|
| 2017 |
Huard CM, Zhang Y, Sriraman S, Paterson A, Kanarik KJ, Kushner MJ. Atomic layer etching of 3D structures in silicon: Self-limiting and nonideal reactions Journal of Vacuum Science and Technology. 35: 31306. DOI: 10.1116/1.4979661 |
0.398 |
|
| 2017 |
Huang S, Volynets V, Hamilton JR, Lee S, Song IC, Lu S, Tennyson J, Kushner MJ. Insights to scaling remote plasma sources sustained in NF3 mixtures Journal of Vacuum Science and Technology. 35: 31302. DOI: 10.1116/1.4978551 |
0.437 |
|
| 2017 |
Huard CM, Zhang Y, Sriraman S, Paterson A, Kushner MJ. Role of neutral transport in aspect ratio dependent plasma etching of three-dimensional features Journal of Vacuum Science and Technology. 35. DOI: 10.1116/1.4973953 |
0.446 |
|
| 2017 |
Zhang Y, Huard C, Sriraman S, Belen J, Paterson A, Kushner MJ. Investigation of feature orientation and consequences of ion tilting during plasma etching with a three-dimensional feature profile simulator Journal of Vacuum Science and Technology. 35: 21303. DOI: 10.1116/1.4968392 |
0.438 |
|
| 2017 |
Doyle SJ, Lafleur T, Gibson AR, Tian P, Kushner MJ, Dedrick JP. Enhanced control of the ionization rate in radio-frequency plasmas with structured electrodes via tailored voltage waveforms Plasma Sources Science and Technology. 26: 125005. DOI: 10.1088/1361-6595/Aa96E5 |
0.427 |
|
| 2017 |
Qu C, Tian P, Semnani A, Kushner MJ. Properties of arrays of microplasmas: application to control of electromagnetic waves Plasma Sources Science and Technology. 26: 105006. DOI: 10.1088/1361-6595/Aa8D53 |
0.444 |
|
| 2017 |
Hamilton JR, Tennyson J, Huang S, Kushner MJ. Calculated cross sections for electron collisions with NF3, NF2 and NF with applications to remote plasma sources Plasma Sources Science and Technology. 26: 65010. DOI: 10.1088/1361-6595/Aa6Bdf |
0.329 |
|
| 2017 |
Tian P, Kushner MJ. Controlling VUV photon fluxes in pulsed inductively coupled Ar/Cl2 plasmas and potential applications in plasma etching Plasma Sources Science and Technology. 26: 24005. DOI: 10.1088/1361-6595/26/2/024005 |
0.438 |
|
| 2017 |
Gibson AR, Foucher M, Marinov D, Chabert P, Gans T, Kushner MJ, Booth JP. The role of thermal energy accommodation and atomic recombination probabilities in low pressure oxygen plasmas Plasma Physics and Controlled Fusion. 59: 24004. DOI: 10.1088/1361-6587/59/2/024004 |
0.39 |
|
| 2017 |
Adamovich I, Baalrud SD, Bogaerts A, Bruggeman PJ, Cappelli M, Colombo V, Czarnetzki U, Ebert U, Eden JG, Favia P, Graves DB, Hamaguchi S, Hieftje G, Hori M, Kaganovich ID, ... ... Kushner MJ, et al. The 2017 Plasma Roadmap: Low temperature plasma science and technology Journal of Physics D: Applied Physics. 50: 323001. DOI: 10.1088/1361-6463/Aa76F5 |
0.427 |
|
| 2017 |
Lietz AM, Kushner MJ. Corrigendum: Air plasma treatment of liquid covered tissue: long timescale chemistry (2016 J. Phys. D: Appl. Phys. 49 425204) Journal of Physics D. 50: 119501. DOI: 10.1088/1361-6463/Aa5C2E |
0.352 |
|
| 2017 |
Kruszelnicki J, Engeling KW, Foster JE, Xiong Z, Kushner MJ. Propagation of negative electrical discharges through 2-dimensional packed bed reactors Journal of Physics D. 50: 25203. DOI: 10.1088/1361-6463/50/2/025203 |
0.474 |
|
| 2017 |
Lietz AM, Johnsen E, Kushner MJ. Plasma-induced flow instabilities in atmospheric pressure plasma jets Applied Physics Letters. 111: 114101. DOI: 10.1063/1.4996192 |
0.395 |
|
| 2017 |
Lanham SJ, Kushner MJ. Effects of a chirped bias voltage on ion energy distributions in inductively coupled plasma reactors Journal of Applied Physics. 122: 83301. DOI: 10.1063/1.4993785 |
0.393 |
|
| 2016 |
Bartschat K, Kushner MJ. Electron collisions with atoms, ions, molecules, and surfaces: Fundamental science empowering advances in technology. Proceedings of the National Academy of Sciences of the United States of America. PMID 27317740 DOI: 10.1073/Pnas.1606132113 |
0.418 |
|
| 2016 |
Tian W, Lietz AM, Kushner MJ. The consequences of air flow on the distribution of aqueous species during dielectric barrier discharge treatment of thin water layers Plasma Sources Science and Technology. 25: 55020. DOI: 10.1088/0963-0252/25/5/055020 |
0.337 |
|
| 2016 |
Bruggeman PJ, Kushner MJ, Locke BR, Gardeniers JGE, Graham WG, Graves DB, Hofman-Caris RCHM, Maric D, Reid JP, Ceriani E, Fernandez Rivas D, Foster JE, Garrick SC, Gorbanev Y, Hamaguchi S, et al. Plasma–liquid interactions: a review and roadmap Plasma Sources Science and Technology. 25: 053002. DOI: 10.1088/0963-0252/25/5/053002 |
0.338 |
|
| 2016 |
Lietz AM, Kushner MJ. Air plasma treatment of liquid covered tissue: long timescale chemistry Journal of Physics D. 49: 425204. DOI: 10.1088/0022-3727/49/42/425204 |
0.469 |
|
| 2016 |
Norberg SA, Johnsen E, Kushner MJ. Helium atmospheric pressure plasma jets interacting with wet cells: delivery of electric fields Journal of Physics D: Applied Physics. 49: 185201. DOI: 10.1088/0022-3727/49/18/185201 |
0.389 |
|
| 2016 |
Markosyan AH, Kushner MJ. Plasma formation in diode pumped alkali lasers sustained in Cs Journal of Applied Physics. 120: 193105. DOI: 10.1063/1.4967749 |
0.396 |
|
| 2016 |
Le Picard R, Markosyan AH, Porter DH, Girshick SL, Kushner MJ. Synthesis of Silicon Nanoparticles in Nonthermal Capacitively-Coupled Flowing Plasmas: Processes and Transport Plasma Chemistry and Plasma Processing. 36: 941-972. DOI: 10.1007/S11090-016-9721-6 |
0.335 |
|
| 2015 |
Zhang Y, Kushner MJ, Sriraman S, Marakhtanov A, Holland J, Paterson A. Control of ion energy and angular distributions in dual-frequency capacitively coupled plasmas through power ratios and phase: Consequences on etch profiles Journal of Vacuum Science and Technology. 33: 31302. DOI: 10.1116/1.4915248 |
0.428 |
|
| 2015 |
Cooley JE, Urdahl R, Xue J, Denning M, Tian P, Kushner MJ. Properties of microplasmas excited by microwaves for VUV photon sources Plasma Sources Science and Technology. 24. DOI: 10.1088/0963-0252/24/6/065009 |
0.324 |
|
| 2015 |
Norberg SA, Johnsen E, Kushner MJ. Formation of reactive oxygen and nitrogen species by repetitive negatively pulsed helium atmospheric pressure plasma jets propagating into humid air Plasma Sources Science and Technology. 24. DOI: 10.1088/0963-0252/24/3/035026 |
0.43 |
|
| 2015 |
Schmidt-Bleker A, Norberg SA, Winter J, Johnsen E, Reuter S, Weltmann KD, Kushner MJ. Propagation mechanisms of guided streamers in plasma jets: the influence of electronegativity of the surrounding gas Plasma Sources Science and Technology. 24. DOI: 10.1088/0963-0252/24/3/035022 |
0.483 |
|
| 2015 |
Tian P, Kushner MJ. Controlling VUV photon fluxes in low-pressure inductively coupled plasmas Plasma Sources Science and Technology. 24. DOI: 10.1088/0963-0252/24/3/034017 |
0.433 |
|
| 2015 |
Tian W, Kushner MJ. Long-term effects of multiply pulsed dielectric barrier discharges in air on thin water layers over tissue: Stationary and random streamers Journal of Physics D: Applied Physics. 48. DOI: 10.1088/0022-3727/48/49/494002 |
0.385 |
|
| 2015 |
Liu L, Sridhar S, Zhu W, Donnelly VM, Economou DJ, Logue MD, Kushner MJ. External control of electron energy distributions in a dual tandem inductively coupled plasma Journal of Applied Physics. 118. DOI: 10.1063/1.4928870 |
0.455 |
|
| 2015 |
Norberg SA, Johnsen E, Kushner MJ. Helium atmospheric pressure plasma jets touching dielectric and metal surfaces Journal of Applied Physics. 118: 013301. DOI: 10.1063/1.4923345 |
0.419 |
|
| 2015 |
Zhang Y, Zafar A, Coumou DJ, Shannon SC, Kushner MJ. Control of ion energy distributions using phase shifting in multi-frequency capacitively coupled plasmas Journal of Applied Physics. 117: 233302. DOI: 10.1063/1.4922631 |
0.39 |
|
| 2015 |
Logue MD, Kushner MJ. Electron energy distributions and electron impact source functions in Ar/N2 inductively coupled plasmas using pulsed power Journal of Applied Physics. 117. DOI: 10.1063/1.4904935 |
0.45 |
|
| 2014 |
Babaeva NY, Zatsarinny O, Bartschat K, Kushner MJ. Mechanisms for plasma formation during high power pumping of XPAL Proceedings of Spie. 8962. DOI: 10.1117/12.2044707 |
0.409 |
|
| 2014 |
Song SH, Kushner MJ. Role of the blocking capacitor in control of ion energy distributions in pulsed capacitively coupled plasmas sustained in Ar/CF4/O2 Journal of Vacuum Science and Technology. 32: 21306. DOI: 10.1116/1.4863948 |
0.464 |
|
| 2014 |
Eun CK, Luo X, Wang JC, Xiong Z, Kushner M, Gianchandani Y. A microdischarge-based monolithic pressure sensor Journal of Microelectromechanical Systems. 23: 1300-1310. DOI: 10.1109/Jmems.2014.2312174 |
0.346 |
|
| 2014 |
Babaeva NY, Kushner MJ. Self-organization of single filaments and diffusive plasmas during a single pulse in dielectric-barrier discharges Plasma Sources Science and Technology. 23: 65047. DOI: 10.1088/0963-0252/23/6/065047 |
0.419 |
|
| 2014 |
Xiong Z, Kushner MJ. Branching and path-deviation of positive streamers resulting from statistical photon transport Plasma Sources Science and Technology. 23: 65041. DOI: 10.1088/0963-0252/23/6/065041 |
0.344 |
|
| 2014 |
Zatsarinny O, Bartschat K, Babaeva NY, Kushner MJ. Electron collisions with cesium atoms?benchmark calculations and application to modeling an excimer-pumped alkali laser Plasma Sources Science and Technology. 23: 35011. DOI: 10.1088/0963-0252/23/3/035011 |
0.38 |
|
| 2014 |
Babaeva NY, Kushner MJ. Interaction of multiple atmospheric-pressure micro-plasma jets in small arrays: He/O2 into humid air Plasma Sources Science and Technology. 23: 15007. DOI: 10.1088/0963-0252/23/1/015007 |
0.412 |
|
| 2014 |
Tian W, Tachibana K, Kushner MJ. Plasmas sustained in bubbles in water: optical emission and excitation mechanisms Journal of Physics D. 47: 55202. DOI: 10.1088/0022-3727/47/5/055202 |
0.442 |
|
| 2014 |
Norberg SA, Tian W, Johnsen E, Kushner MJ. Atmospheric pressure plasma jets interacting with liquid covered tissue: touching and not-touching the liquid Journal of Physics D: Applied Physics. 47: 475203. DOI: 10.1088/0022-3727/47/47/475203 |
0.453 |
|
| 2014 |
Klochko AV, Starikovskaia SM, Xiong Z, Kushner MJ. Investigation of capillary nanosecond discharges in air at moderate pressure: comparison of experiments and 2D numerical modelling Journal of Physics D. 47: 365202. DOI: 10.1088/0022-3727/47/36/365202 |
0.397 |
|
| 2014 |
Babaeva NY, Tian W, Kushner MJ. The interaction between plasma filaments in dielectric barrier discharges and liquid covered wounds: electric fields delivered to model platelets and cells Journal of Physics D. 47: 235201. DOI: 10.1088/0022-3727/47/23/235201 |
0.366 |
|
| 2014 |
Tian W, Kushner MJ. Atmospheric pressure dielectric barrier discharges interacting with liquid covered tissue Journal of Physics D. 47: 165201. DOI: 10.1088/0022-3727/47/16/165201 |
0.377 |
|
| 2014 |
Song S, Yang Y, Chabert P, Kushner MJ. Electron energy distributions in a magnetized inductively coupled plasma Physics of Plasmas. 21: 093512. DOI: 10.1063/1.4896711 |
0.446 |
|
| 2014 |
Weatherford BR, Xiong Z, Barnat EV, Kushner MJ. Spatial profiles of electron and metastable atom densities in positive polarity fast ionization waves sustained in helium Journal of Applied Physics. 116. DOI: 10.1063/1.4895482 |
0.411 |
|
| 2014 |
Wang JC, Zhang D, Leoni N, Birecki H, Gila O, Kushner MJ. Charging of moving surfaces by corona discharges sustained in air Journal of Applied Physics. 116: 43301. DOI: 10.1063/1.4890520 |
0.352 |
|
| 2013 |
Zhang Y, Kushner MJ, Moore N, Pribyl P, Gekelman W. Space and phase resolved ion energy and angular distributions in single- and dual-frequency capacitively coupled plasmas Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 31. DOI: 10.1116/1.4822100 |
0.439 |
|
| 2013 |
Schüngel E, Mohr S, Schulze J, Czarnetzki U, Kushner MJ. Ion distribution functions at the electrodes of capacitively coupled high-pressure hydrogen discharges Plasma Sources Science and Technology. 23: 15001. DOI: 10.1088/0963-0252/23/1/015001 |
0.374 |
|
| 2013 |
Wang JC, Leoni N, Birecki H, Gila O, Kushner MJ. Characteristics of a radio-frequency micro-dielectric barrier discharge array Plasma Sources Science and Technology. 22: 25015. DOI: 10.1088/0963-0252/22/2/025015 |
0.414 |
|
| 2013 |
Babaeva NY, Kushner MJ. Reactive fluxes delivered by dielectric barrier discharge filaments to slightly wounded skin Journal of Physics D. 46: 25401. DOI: 10.1088/0022-3727/46/2/025401 |
0.463 |
|
| 2013 |
Xiong Z, Robert E, Sarron V, Pouvesle JM, Kushner MJ. Atmospheric-pressure plasma transfer across dielectric channels and tubes Journal of Physics D. 46: 155203. DOI: 10.1088/0022-3727/46/15/155203 |
0.403 |
|
| 2013 |
Babaeva NY, Kushner MJ. Control of ion activation energy delivered to tissue and sensitive materials in atmospheric pressure plasmas using thin porous dielectric sheets Journal of Physics D. 46: 125201. DOI: 10.1088/0022-3727/46/12/125201 |
0.397 |
|
| 2013 |
Moore NB, Gekelman W, Pribyl P, Zhang Y, Kushner MJ. 2-dimensional ion velocity distributions measured by laser-induced fluorescence above a radio-frequency biased silicon wafer Physics of Plasmas. 20: 083506. DOI: 10.1063/1.4817275 |
0.393 |
|
| 2013 |
Wang JC, Leoni N, Birecki H, Gila O, Kushner MJ. Electron current extraction from radio frequency excited micro-dielectric barrier discharges Journal of Applied Physics. 113: 33301. DOI: 10.1063/1.4775723 |
0.421 |
|
| 2012 |
Shoeb J, Kushner MJ. Damage by radicals and photons during plasma cleaning of porous low-k SiOCH. II. Water uptake and change in dielectric constant Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 30. DOI: 10.1116/1.4718447 |
0.802 |
|
| 2012 |
Shoeb J, Wang MM, Kushner MJ. Damage by radicals and photons during plasma cleaning of porous low-k SiOCH. I. Ar/O 2 and He/H 2 plasmas Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 30. DOI: 10.1116/1.4718444 |
0.81 |
|
| 2012 |
Logue MD, Shin H, Zhu W, Xu L, Donnelly VM, Economou DJ, Kushner MJ. Ion energy distributions in inductively coupled plasmas having a biased boundary electrode Plasma Sources Science and Technology. 21. DOI: 10.1088/0963-0252/21/6/065009 |
0.519 |
|
| 2012 |
Song S, Kushner MJ. Control of electron energy distributions and plasma characteristics of dual frequency, pulsed capacitively coupled plasmas sustained in Ar and Ar/CF 4 /O 2 Plasma Sources Science and Technology. 21: 55028. DOI: 10.1088/0963-0252/21/5/055028 |
0.422 |
|
| 2012 |
Xiong Z, Robert E, Sarron V, Pouvesle J, Kushner MJ. Dynamics of ionization wave splitting and merging of atmospheric-pressure plasmas in branched dielectric tubes and channels Journal of Physics D. 45: 275201. DOI: 10.1088/0022-3727/45/27/275201 |
0.378 |
|
| 2012 |
Samukawa S, Hori M, Rauf S, Tachibana K, Bruggeman PJ, Kroesen G, Whitehead JC, Murphy AB, Gutsol AF, Starikovskaia S, Kortshagen UR, Boeuf JP, Sommerer TJ, Kushner MJ, Czarnetzki U, et al. The 2012 Plasma Roadmap Journal of Physics D. 45: 253001. DOI: 10.1088/0022-3727/45/25/253001 |
0.391 |
|
| 2012 |
Babaeva NY, Ning N, Graves DB, Kushner MJ. Ion activation energy delivered to wounds by atmospheric pressure dielectric-barrier discharges: Sputtering of lipid-like surfaces Journal of Physics D: Applied Physics. 45. DOI: 10.1088/0022-3727/45/11/115203 |
0.377 |
|
| 2011 |
Shoeb J, Kushner MJ. Mechanisms for sealing of porous low-k SiOCH by combined He and NH 3 plasma treatment Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 29. DOI: 10.1116/1.3626534 |
0.798 |
|
| 2011 |
Wang M, Kushner MJ. Modeling of implantation and mixing damage during etching of SiO2 over Si in fluorocarbon plasmas Journal of Vacuum Science and Technology. 29: 51306. DOI: 10.1116/1.3626533 |
0.547 |
|
| 2011 |
Babaeva NY, Kushner MJ. Guest Editorial: 6th Triennial Special Issue of the IEEE Transactions on Plasma Science - Images in Plasma Science Ieee Transactions On Plasma Science. 39: 2057-2057. DOI: 10.1109/Tps.2011.2164108 |
0.41 |
|
| 2011 |
Shoeb J, Kushner MJ. Polymer cleaning from porous low-k dielectrics in He/H2 plasmas Ieee Transactions On Plasma Science. 39: 2828-2829. DOI: 10.1109/Tps.2011.2152862 |
0.801 |
|
| 2011 |
Xiong Z, Kushner MJ. Ionization Wave Splitting at the T-Junction of a Dielectric Channel Ieee Transactions On Plasma Science. 39: 2320-2321. DOI: 10.1109/Tps.2011.2147803 |
0.338 |
|
| 2011 |
Song S, Kushner MJ. Time-Resolved Electron Energy Distributions and Plasma Characteristics in a Pulsed Capacitively Coupled Plasma Ieee Transactions On Plasma Science. 39: 2542-2543. DOI: 10.1109/Tps.2011.2132743 |
0.447 |
|
| 2011 |
Wang J, Leoni N, Birecki H, Gila O, Kushner MJ. Electron Current From an RF Microdielectric Barrier Discharge Ieee Transactions On Plasma Science. 39: 2168-2169. DOI: 10.1109/Tps.2011.2126606 |
0.425 |
|
| 2011 |
Wang M, Foster JE, Kushner MJ. Plasma propagation through porous dielectric sheets Ieee Transactions On Plasma Science. 39: 2244-2245. DOI: 10.1109/Tps.2011.2126605 |
0.622 |
|
| 2011 |
Babaeva NY, Kushner MJ. Dynamics of Dielectric Barrier Discharges Over Wounded Skin Ieee Transactions On Plasma Science. 39: 2964-2965. DOI: 10.1109/Tps.2011.2126604 |
0.37 |
|
| 2011 |
Babaeva NY, Kushner MJ. Ion energy and angular distributions onto polymer surfaces delivered by dielectric barrier discharge filaments in air: I. Flat surfaces Plasma Sources Science and Technology. 20: 35017. DOI: 10.1088/0963-0252/20/3/035017 |
0.343 |
|
| 2011 |
Sommers BS, Foster JE, Yu Babaeva N, Kushner MJ. Observations of electric discharge streamer propagation and capillary oscillations on the surface of air bubbles in water Journal of Physics D: Applied Physics. 44. DOI: 10.1088/0022-3727/44/8/082001 |
0.35 |
|
| 2011 |
Niermann B, Hemke T, Babaeva NY, Böke M, Kushner MJ, Mussenbrock T, Winter J. Spatial dynamics of helium metastables in sheath or bulk dominated rf micro-plasma jets Journal of Physics D. 44: 485204. DOI: 10.1088/0022-3727/44/48/485204 |
0.468 |
|
| 2011 |
Wollny A, Hemke T, Gebhardt M, Brinkmann RP, Boettner H, Winter J, Gathen VSd, Xiong Z, Kushner MJ, Mussenbrock T. Ionization wave propagation on a micro cavity plasma array Applied Physics Letters. 99: 141504. DOI: 10.1063/1.3647978 |
0.335 |
|
| 2011 |
Xiong Z, Kushner MJ. Photo-triggering and secondary electron produced ionization in electric discharge ArF* excimer lasers Journal of Applied Physics. 110: 83304. DOI: 10.1063/1.3644953 |
0.417 |
|
| 2011 |
Takashima K, Adamovich IV, Xiong Z, Kushner MJ, Starikovskaia S, Czarnetzki U, Luggenhölscher D. Experimental and modeling analysis of fast ionization wave discharge propagation in a rectangular geometry Physics of Plasmas. 18: 083505. DOI: 10.1063/1.3619810 |
0.349 |
|
| 2010 |
Yang Y, Kushner MJ. Modeling of dual frequency capacitively coupled plasma sources utilizing a full-wave Maxwell solver: II. Scaling with pressure, power and electronegativity Plasma Sources Science and Technology. 19: 55012. DOI: 10.1088/0963-0252/19/5/055012 |
0.491 |
|
| 2010 |
Yang Y, Kushner MJ. Modeling of dual frequency capacitively coupled plasma sources utilizing a full-wave Maxwell solver: I. Scaling with high frequency Plasma Sources Science and Technology. 19: 055011. DOI: 10.1088/0963-0252/19/5/055011 |
0.419 |
|
| 2010 |
Xiong Z, Kushner MJ. Surface corona-bar discharges for production of pre-ionizing UV light for pulsed high-pressure plasmas Journal of Physics D. 43: 505204. DOI: 10.1088/0022-3727/43/50/505204 |
0.43 |
|
| 2010 |
Babaeva NY, Kushner MJ. Intracellular electric fields produced by dielectric barrier discharge treatment of skin Journal of Physics D. 43: 185206. DOI: 10.1088/0022-3727/43/18/185206 |
0.388 |
|
| 2010 |
Yang Y, Kushner MJ. Graded conductivity electrodes as a means to improve plasma uniformity in dual frequency capacitively coupled plasma sources Journal of Physics D. 43: 152001. DOI: 10.1088/0022-3727/43/15/152001 |
0.471 |
|
| 2010 |
Yang Y, Kushner MJ. 450 mm dual frequency capacitively coupled plasma sources: Conventional, graded, and segmented electrodes Journal of Applied Physics. 108: 113306. DOI: 10.1063/1.3517104 |
0.378 |
|
| 2010 |
Wang M, Kushner MJ. High energy electron fluxes in dc-augmented capacitively coupled plasmas. II. Effects on twisting in high aspect ratio etching of dielectrics Journal of Applied Physics. 107: 23309. DOI: 10.1063/1.3290873 |
0.622 |
|
| 2010 |
Wang M, Kushner MJ. High energy electron fluxes in dc-augmented capacitively coupled plasmas I. Fundamental characteristics Journal of Applied Physics. 107: 23308. DOI: 10.1063/1.3290870 |
0.577 |
|
| 2010 |
Yang Y, Strobel M, Kirk S, Kushner MJ. Fluorine Plasma Treatments of Poly(propylene) Films, 2 - Modeling Reaction Mechanisms and Scaling Plasma Processes and Polymers. 7: 123-150. DOI: 10.1002/Ppap.200900114 |
0.466 |
|
| 2010 |
Kirk S, Strobel M, Lee C, Pachuta SJ, Prokosch M, Lechuga H, Jones ME, Lyons CS, Degner S, Yang Y, Kushner MJ. Fluorine Plasma Treatments of Polypropylene Films, 1 - Surface Characterization a Plasma Processes and Polymers. 7: 107-122. DOI: 10.1002/Ppap.200900111 |
0.364 |
|
| 2009 |
Shoeb J, Kushner MJ. Mechanisms for plasma etching of HfO2 gate stacks with Si selectivity and photoresist trimming Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 27: 1289-1302. DOI: 10.1116/1.3231480 |
0.795 |
|
| 2009 |
Agarwal A, Kushner MJ. Plasma atomic layer etching using conventional plasma equipment Journal of Vacuum Science and Technology. 27: 37-50. DOI: 10.1116/1.3021361 |
0.466 |
|
| 2009 |
Shoeb J, Kushner MJ. Simulation of porous low-k dielectric sealing by combined He and NH 3 plasma treatment Ieee International Conference On Plasma Science. DOI: 10.1109/PLASMA.2009.5227599 |
0.792 |
|
| 2009 |
Babaeva NY, Kushner MJ. Effect of inhomogeneities on streamer propagation: II. Streamer dynamics in high pressure humid air with bubbles Plasma Sources Science and Technology. 18: 35010. DOI: 10.1088/0963-0252/18/3/035010 |
0.352 |
|
| 2009 |
Babaeva NY, Kushner MJ. Effect of inhomogeneities on streamer propagation: I. Intersection with isolated bubbles and particles Plasma Sources Science and Technology. 18: 35009. DOI: 10.1088/0963-0252/18/3/035009 |
0.319 |
|
| 2009 |
Kushner M. Plasma Sources Science and Technology: Editorial Plasma Sources Science and Technology. 18: 10101. DOI: 10.1088/0963-0252/18/1/010101 |
0.378 |
|
| 2009 |
Kushner MJ. Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design Journal of Physics D. 42: 194013. DOI: 10.1088/0022-3727/42/19/194013 |
0.354 |
|
| 2008 |
Agarwal A, Kushner MJ. Seasoning of plasma etching reactors: Ion energy distributions to walls and real-time and run-to-run control strategies Journal of Vacuum Science and Technology. 26: 498-512. DOI: 10.1116/1.2909966 |
0.457 |
|
| 2008 |
Bhoj AN, Kushner MJ. Repetitively pulsed atmospheric pressure discharge treatment of rough polymer surfaces: II. Treatment of micro-beads in He/NH3/H 2O and He/O2/H2O mixtures Plasma Sources Science and Technology. 17. DOI: 10.1088/0963-0252/17/3/035025 |
0.393 |
|
| 2008 |
Bhoj AN, Kushner MJ. Repetitively pulsed atmospheric pressure discharge treatment of rough polymer surfaces: I. Humid air discharges Plasma Sources Science and Technology. 17. DOI: 10.1088/0963-0252/17/3/035024 |
0.44 |
|
| 2008 |
Babaeva NY, Kushner MJ. Ion energy and angular distributions into the wafer–focus ring gap in capacitively coupled discharges Journal of Physics D. 41: 62004. DOI: 10.1088/0022-3727/41/6/062004 |
0.372 |
|
| 2008 |
Arakoni RA, Ewing JJ, Kushner MJ. Microdischarges for use as microthrusters: modelling and scaling Journal of Physics D. 41: 105208. DOI: 10.1088/0022-3727/41/10/105208 |
0.34 |
|
| 2007 |
Yang Y, Kushner MJ. Modeling of magnetically enhanced capacitively coupled plasma sources: Two frequency discharges Journal of Vacuum Science and Technology. 25: 1420-1432. DOI: 10.1116/1.2771558 |
0.411 |
|
| 2007 |
Arakoni RA, Bhoj AN, Kushner MJ. H2 generation in Ar/NH3 microdischarges Journal of Physics D: Applied Physics. 40: 2476-2490. DOI: 10.1088/0022-3727/40/8/010 |
0.31 |
|
| 2007 |
Bhoj AN, Kushner MJ. Continuous processing of polymers in repetitively pulsed atmospheric pressure discharges with moving surfaces and gas flow Journal of Physics D: Applied Physics. 40: 6953-6968. DOI: 10.1088/0022-3727/40/22/016 |
0.405 |
|
| 2007 |
Arakoni RA, Babaeva NY, Kushner MJ. O2(1Δ) production and gain in plasma pumped oxygen–iodine lasers: consequences of NO and NO2 additives Journal of Physics D. 40: 4793-4809. DOI: 10.1088/0022-3727/40/16/009 |
0.327 |
|
| 2007 |
Babaeva NY, Arakoni R, Kushner MJ. O2(Δ1) production in high pressure flowing He∕O2 plasmas: Scaling and quenching Journal of Applied Physics. 101: 123306. DOI: 10.1063/1.2743878 |
0.366 |
|
| 2007 |
Babaeva NY, Kushner MJ. Penetration of plasma into the wafer-focus ring gap in capacitively coupled plasmas Journal of Applied Physics. 101: 113307. DOI: 10.1063/1.2736333 |
0.471 |
|
| 2007 |
Agarwal A, Kushner MJ. Characteristics of pulsed plasma doping sources for ultrashallow junction formation Journal of Applied Physics. 101: 63305. DOI: 10.1063/1.2433746 |
0.505 |
|
| 2006 |
Vyas V, Kushner MJ. Scaling of hollow cathode magnetrons for ionized metal physical vapor deposition Journal of Vacuum Science and Technology. 24: 1955-1969. DOI: 10.1116/1.2335864 |
0.355 |
|
| 2006 |
Bhoj AN, Kushner MJ. Multi-scale simulation of functionalization of rough polymer surfaces using atmospheric pressure plasmas Journal of Physics D: Applied Physics. 39: 1594-1598. DOI: 10.1088/0022-3727/39/8/018 |
0.421 |
|
| 2006 |
Babaeva NY, Arakoni RA, Kushner MJ. Production of O2(Δ1) in flowing plasmas using spiker-sustainer excitation Journal of Applied Physics. 99: 113306. DOI: 10.1063/1.2199387 |
0.413 |
|
| 2005 |
Agarwal A, Kushner MJ. Effect of nonsinusoidal bias waveforms on ion energy distributions and fluorocarbon plasma etch selectivity Journal of Vacuum Science and Technology. 23: 1440-1449. DOI: 10.1116/1.2013318 |
0.441 |
|
| 2005 |
Bhoj AN, Kushner MJ. Plasma dynamics during breakdown in an HID lamp Ieee Transactions On Plasma Science. 33: 518-519. DOI: 10.1109/Tps.2005.845931 |
0.413 |
|
| 2005 |
Kushner MJ, Vasenkov AV. Electron velocity distributions in an inductively coupled plasma Ieee Transactions On Plasma Science. 33: 388-389. DOI: 10.1109/Tps.2005.845904 |
0.444 |
|
| 2005 |
Bhoj AN, Kushner MJ. Plasma-polymer interactions in a dielectric barrier discharge Ieee Transactions On Plasma Science. 33: 250-251. DOI: 10.1109/Tps.2005.845899 |
0.447 |
|
| 2005 |
Agarwal A, Kushner MJ. Time evolution of ion energy distributions for plasma doping Ieee Transactions On Plasma Science. 33: 252-253. DOI: 10.1109/Tps.2005.845887 |
0.446 |
|
| 2005 |
Babaeva NY, Kushner MJ. Fourth Triennial Special Issue on Images in Plasma Science Ieee Transactions On Plasma Science. 33: 224-225. DOI: 10.1109/Tps.2005.845885 |
0.331 |
|
| 2005 |
Kushner MJ. Modelling of microdischarge devices: plasma and gas dynamics Journal of Physics D. 38: 1633-1643. DOI: 10.1088/0022-3727/38/11/001 |
0.409 |
|
| 2005 |
Arakoni R, Stafford DS, Babaeva NY, Kushner MJ. O2(Δ1) production in flowing He∕O2 plasmas. II. Two-dimensional modeling Journal of Applied Physics. 98: 73304. DOI: 10.1063/1.2076428 |
0.376 |
|
| 2005 |
Stafford DS, Kushner MJ. O2(Δ1) production in flowing He∕O2 plasmas. I. Axial transport and pulsed power formats Journal of Applied Physics. 98: 73303. DOI: 10.1063/1.2076427 |
0.466 |
|
| 2005 |
Carroll DL, Verdeyen JT, King DM, Zimmerman JW, Laystrom JK, Woodard BS, Benavides GF, Kittell K, Stafford DS, Kushner MJ, Solomon WC. Continuous-wave laser oscillation on the 1315 nm transition of atomic iodine pumped by O 2(a 1Δ) produced in an electric discharge Applied Physics Letters. 86: 1-3. DOI: 10.1063/1.1883317 |
0.343 |
|
| 2005 |
Vyas V, Kushner MJ. Effect of ion streaming on particle-particle interactions in a dusty plasma Journal of Applied Physics. 97: 43303. DOI: 10.1063/1.1841468 |
0.343 |
|
| 2005 |
Sankaran A, Kushner MJ. Etching of porous and solid SiO2 in Ar∕c-C4F8, O2∕c-C4F8 and Ar∕O2∕c-C4F8 plasmas Journal of Applied Physics. 97: 23307. DOI: 10.1063/1.1834979 |
0.459 |
|
| 2004 |
Sankaran A, Kushner MJ. Integrated feature scale modeling of plasma processing of porous and solid SiO2. II. Residual fluorocarbon polymer stripping and barrier layer deposition Journal of Vacuum Science and Technology. 22: 1260-1274. DOI: 10.1116/1.1764822 |
0.462 |
|
| 2004 |
Sankaran A, Kushner MJ. Integrated feature scale modeling of plasma processing of porous and solid SiO2. I. Fluorocarbon etching Journal of Vacuum Science and Technology. 22: 1242-1259. DOI: 10.1116/1.1764821 |
0.454 |
|
| 2004 |
Vasenkov AV, Li X, Oehrlein GS, Kushner MJ. Properties of c-C4F8 inductively coupled plasmas. II. Plasma chemistry and reaction mechanism for modeling of Ar/c-C 4F8/O2 discharges Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 22: 511-530. DOI: 10.1116/1.1697483 |
0.392 |
|
| 2004 |
Li X, Ling L, Hua X, Oehrlein GS, Wang Y, Vasenkov AV, Kushner MJ. Properties of C 4F 8 inductively coupled plasmas. I. Studies of Ar/c-C 4F 8 magnetically confined plasmas for etching of SiO 2 Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 22: 500-510. DOI: 10.1116/1.1697482 |
0.441 |
|
| 2004 |
Subramonium P, Kushner MJ. Extraction of negative ions from pulsed electronegative inductively coupled plasmas having a radio-frequency substrate bias Journal of Vacuum Science and Technology. 22: 534-544. DOI: 10.1116/1.1690251 |
0.45 |
|
| 2004 |
Bhoj AN, Kushner MJ. Avalanche process in an idealized lamp: II. Modelling of breakdown in Ar/ Xe electric discharges Journal of Physics D: Applied Physics. 37: 2510-2526. DOI: 10.1088/0022-3727/37/18/007 |
0.413 |
|
| 2004 |
Moss RS, Eden JG, Kushner MJ. Avalanche processes in an idealized lamp: I. Measurements of formative breakdown time Journal of Physics D: Applied Physics. 37: 2502-2509. DOI: 10.1088/0022-3727/37/18/006 |
0.319 |
|
| 2004 |
Rajaraman K, Kushner MJ. A Monte Carlo simulation of radiation trapping in electrodeless gas discharge lamps Journal of Physics D: Applied Physics. 37: 1780-1791. DOI: 10.1088/0022-3727/37/13/009 |
0.378 |
|
| 2004 |
Carroll DL, Verdeyen JT, King DM, Zimmerman JW, Laystrom JK, Woodard BS, Richardson N, Kittell K, Kushner MJ, Solomon WC. Measurement of positive gain on the 1315 nm transition of atomic iodine pumped by O 2(a 1 Δ) produced in an electric discharge Applied Physics Letters. 85: 1320-1322. DOI: 10.1063/1.1784519 |
0.323 |
|
| 2004 |
Subramonium P, Kushner MJ. Pulsed inductively coupled plasmas as a method to recoup uniformity: Three-dimensional modeling study Applied Physics Letters. 85: 721-723. DOI: 10.1063/1.1776617 |
0.49 |
|
| 2004 |
Stafford DS, Kushner MJ. O2(Δ1) production in He∕O2 mixtures in flowing low pressure plasmas Journal of Applied Physics. 96: 2451-2465. DOI: 10.1063/1.1768615 |
0.392 |
|
| 2004 |
Subramonium P, Kushner MJ. Pulsed plasmas as a method to improve uniformity during materials processing Journal of Applied Physics. 96: 82-93. DOI: 10.1063/1.1751636 |
0.422 |
|
| 2004 |
Kushner MJ. Modeling of microdischarge devices: Pyramidal structures Journal of Applied Physics. 95: 846-859. DOI: 10.1063/1.1636251 |
0.353 |
|
| 2003 |
Zimmerman JM, Skorski LW, Solomon WC, Kushner MJ, Verdeyen JT, Carroll DL. Electrodynamic modeling of the ElectriCOIL system High-Power Lasers and Applications. 4971: 81-86. DOI: 10.1117/12.483511 |
0.312 |
|
| 2003 |
Graves DB, Kushner MJ. Influence of modeling and simulation on the maturation of plasma technology: Feature evolution and reactor design Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 21: S152-S156. DOI: 10.1116/1.1600447 |
0.394 |
|
| 2003 |
Kinder RL, Ellingboe AR, Kushner MJ. H- to W-mode transitions and properties of a multimode helicon plasma reactor Plasma Sources Science and Technology. 12: 561-575. DOI: 10.1088/0963-0252/12/4/308 |
0.361 |
|
| 2003 |
Lay B, Moss RS, Rauf S, Kushner MJ. Breakdown processes in metal halide lamps Plasma Sources Science and Technology. 12: 8-21. DOI: 10.1088/0963-0252/12/1/302 |
0.399 |
|
| 2003 |
Dorai R, Kushner MJ. Consequences of unburned hydrocarbons on microstreamer dynamics and chemistry during plasma remediation of NOx using dielectric barrier discharges Journal of Physics D. 36: 1075-1083. DOI: 10.1088/0022-3727/36/9/305 |
0.455 |
|
| 2003 |
Dorai R, Kushner MJ. A model for plasma modification of polypropylene using atmospheric pressure discharges Journal of Physics D. 36: 666-685. DOI: 10.1088/0022-3727/36/6/309 |
0.385 |
|
| 2003 |
Kushner MJ. Modeling of magnetically enhanced capacitively coupled plasma sources: Ar discharges Journal of Applied Physics. 94: 1436-1447. DOI: 10.1063/1.1633661 |
0.435 |
|
| 2003 |
Vasenkov AV, Kushner MJ. Angular anisotropy of electron energy distributions in inductively coupled plasmas Journal of Applied Physics. 94: 5522-5529. DOI: 10.1063/1.1614428 |
0.44 |
|
| 2003 |
Vasenkov AV, Kushner MJ. Harmonic content and time variation of electron energy distributions in high-plasma-density, low-pressure inductively coupled discharges Journal of Applied Physics. 94: 2223-2233. DOI: 10.1063/1.1592630 |
0.453 |
|
| 2003 |
Sankaran A, Kushner MJ. Fluorocarbon plasma etching and profile evolution of porous low-dielectric-constant silica Applied Physics Letters. 82: 1824-1826. DOI: 10.1063/1.1562333 |
0.455 |
|
| 2003 |
Strobel M, Jones V, Lyons CS, Ulsh M, Kushner MJ, Dorai R, Branch MC. A Comparison of Corona-Treated and Flame-Treated Polypropylene Films Plasmas and Polymers. 8: 61-95. DOI: 10.1023/A:1022817909276 |
0.351 |
|
| 2003 |
Hoard J, Wallington TJ, Bretz RL, Malkin A, Dorai R, Kushner MJ. Importance of O(3P) atoms and OH radicals in hydrocarbon oxidation during the nonthermal plasma treatment of diesel exhaust inferred using relative-rate methods International Journal of Chemical Kinetics. 35: 231-238. DOI: 10.1002/Kin.10122 |
0.462 |
|
| 2002 |
Vasenkov AV, Kushner MJ. Electron energy distributions and anomalous skin depth effects in high-plasma-density inductively coupled discharges. Physical Review. E, Statistical, Nonlinear, and Soft Matter Physics. 66: 066411. PMID 12513416 DOI: 10.1103/Physreve.66.066411 |
0.424 |
|
| 2002 |
Subramonium P, Kushner MJ. Two-dimensional modeling of long-term transients in inductively coupled plasmas using moderate computational parallelism. II. Ar/Cl2 pulsed plasmas Journal of Vacuum Science and Technology. 20: 313-324. DOI: 10.1116/1.1434965 |
0.482 |
|
| 2002 |
Lay B, Rauf S, Kushner MJ. Gap closure in a cold metal halide lamp Ieee Transactions On Plasma Science. 30: 190-191. DOI: 10.1109/Tps.2002.1003988 |
0.374 |
|
| 2002 |
Kinder RL, Kushner MJ. Three-dimensional fields and temperatures in a squat helicon reactor Ieee Transactions On Plasma Science. 30: 134-135. DOI: 10.1109/Tps.2002.1003960 |
0.355 |
|
| 2002 |
Vyas V, Kushner MJ. Formation of Coulomb crystals in a capacitively coupled plasma Ieee Transactions On Plasma Science. 30: 92-93. DOI: 10.1109/Tps.2002.1003939 |
0.414 |
|
| 2002 |
Kushner MJ. Guest editorial third triennial special issue on images in plasma science Ieee Transactions On Plasma Science. 30: 5-5. DOI: 10.1109/Tps.2002.1003895 |
0.343 |
|
| 2002 |
Dorai R, Kushner MJ. Repetitively pulsed plasma remediation of NOx in soot laden exhaust using dielectric barrier discharges Journal of Physics D. 35: 2954-2968. DOI: 10.1088/0022-3727/35/22/310 |
0.366 |
|
| 2002 |
Vyas V, Hebner GA, Kushner MJ. Self-consistent three-dimensional model of dust particle transport and formation of Coulomb crystals in plasma processing reactors Journal of Applied Physics. 92: 6451-6460. DOI: 10.1063/1.1516865 |
0.444 |
|
| 2002 |
Sankaran A, Kushner MJ. Harmonic content of electron-impact source functions in inductively coupled plasmas using an “on-the-fly” Monte Carlo technique Journal of Applied Physics. 92: 736-748. DOI: 10.1063/1.1487455 |
0.421 |
|
| 2001 |
Lu J, Kushner MJ. Trench filling by ionized metal physical vapor deposition Journal of Vacuum Science and Technology. 19: 2652-2663. DOI: 10.1116/1.1399318 |
0.348 |
|
| 2001 |
Zhang D, Kushner MJ. Investigations of surface reactions during C2F6 plasma etching of SiO2 with equipment and feature scale models Journal of Vacuum Science and Technology. 19: 524-538. DOI: 10.1116/1.1349728 |
0.441 |
|
| 2001 |
Kinder RL, Kushner MJ. Wave propagation and power deposition in magnetically enhanced inductively coupled and helicon plasma sources Journal of Vacuum Science and Technology. 19: 76-86. DOI: 10.1116/1.1329122 |
0.394 |
|
| 2001 |
Lu J, Kushner MJ. Sources of azimuthal asymmetries in ionized metal physical vapour deposition processes Plasma Sources Science and Technology. 10: 502-512. DOI: 10.1088/0963-0252/10/3/315 |
0.333 |
|
| 2001 |
Dorai R, Kushner MJ. Effect of multiple pulses on the plasma chemistry during the remediation of NOx using dielectric barrier discharges Journal of Physics D. 34: 574-583. DOI: 10.1088/0022-3727/34/4/319 |
0.326 |
|
| 2001 |
Subramonium P, Kushner MJ. Pulsed inductively coupled chlorine plasmas in the presence of a substrate bias Applied Physics Letters. 79: 2145-2147. DOI: 10.1063/1.1406139 |
0.449 |
|
| 2001 |
Kinder RL, Kushner MJ. Noncollisional heating and electron energy distributions in magnetically enhanced inductively coupled and helicon plasma sources Journal of Applied Physics. 90: 3699-3712. DOI: 10.1063/1.1400091 |
0.444 |
|
| 2001 |
Lu J, Kushner MJ. Inflight electron impact excitation in ionized metal physical vapor deposition Journal of Applied Physics. 89: 878-882. DOI: 10.1063/1.1333026 |
0.374 |
|
| 2000 |
Zhang D, Kushner MJ. Mechanisms for CF2 radical generation and loss on surfaces in fluorocarbon plasmas Journal of Vacuum Science and Technology. 18: 2661-2668. DOI: 10.1116/1.1319816 |
0.416 |
|
| 2000 |
Lu J, Kushner MJ. Effect of sputter heating in ionized metal physical vapor deposition reactors Journal of Applied Physics. 87: 7198-7207. DOI: 10.1063/1.372969 |
0.371 |
|
| 2000 |
Straaten Tvd, Kushner MJ. A Monte-Carlo Model Of Xenon Resonance Radiation Transport In A Plasma Display Panel Cell: Transition From Optically Thick To Thin Regimes Journal of Applied Physics. 87: 2700-2707. DOI: 10.1063/1.372244 |
0.304 |
|
| 2000 |
Zhang D, Kushner MJ. Surface kinetics and plasma equipment model for Si etching by fluorocarbon plasmas Journal of Applied Physics. 87: 1060-1069. DOI: 10.1063/1.371980 |
0.465 |
|
| 2000 |
Dorai R, Hassouni K, Kushner MJ. Interaction between soot particles and NOx during dielectric barrier discharge plasma remediation of simulated diesel exhaust Journal of Applied Physics. 88: 6060-6071. DOI: 10.1063/1.1320004 |
0.423 |
|
| 2000 |
Kushner MJ, Zhang D. An electron impact cross section set for CHF3 Journal of Applied Physics. 88: 3231-3234. DOI: 10.1063/1.1289076 |
0.405 |
|
| 2000 |
Dorai R, Kushner MJ. Consequences of propene and propane on plasma remediation of NOx Journal of Applied Physics. 88: 3739-3747. DOI: 10.1063/1.1288511 |
0.371 |
|
| 1999 |
Kinder RL, Kushner MJ. Consequences of mode structure on plasma properties in electron cyclotron resonance sources Journal of Vacuum Science and Technology. 17: 2421-2430. DOI: 10.1116/1.581978 |
0.393 |
|
| 1999 |
Rauf S, Kushner MJ. Controller design issues in the feedback control of radio frequency plasma processing reactors Journal of Vacuum Science and Technology. 17: 704-712. DOI: 10.1116/1.581690 |
0.392 |
|
| 1999 |
Kushner MJ, Rauf S. Second triennial issue of images in plasma science Ieee Transactions On Plasma Science. 27: 4-5. DOI: 10.1109/Tps.1999.762977 |
0.378 |
|
| 1999 |
Rauf S, Kushner MJ. Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources Ieee Transactions On Plasma Science. 27: 1329-1338. DOI: 10.1109/27.799809 |
0.446 |
|
| 1999 |
Xu X, Kushner MJ. The consequences of remnant surface charges on microdischarge spreading in dielectric barrier discharges Ieee Transactions On Plasma Science. 27: 108-109. DOI: 10.1109/27.763070 |
0.313 |
|
| 1999 |
Kinder RL, Kushner MJ. TE/sub 01/ excitation of an electron cyclotron resonance plasma source Ieee Transactions On Plasma Science. 27: 64-65. DOI: 10.1109/27.763038 |
0.44 |
|
| 1999 |
Keiter ER, Kushner MJ. Radical and electron densities in a high plasma density-chemical vapor deposition reactor from a three-dimensional simulation Ieee Transactions On Plasma Science. 27: 62-63. DOI: 10.1109/27.763037 |
0.422 |
|
| 1999 |
Rauf S, Kushner MJ. Operation of a coplanar-electrode plasma display panel cell Ieee Transactions On Plasma Science. 27: 10-11. DOI: 10.1109/27.762995 |
0.392 |
|
| 1999 |
Rauf S, Kushner MJ. Dynamics of a coplanar-electrode plasma display panel. II. Cell optimization Journal of Applied Physics. 85: 3470-3476. DOI: 10.1063/1.369704 |
0.371 |
|
| 1999 |
Rauf S, Kushner MJ. Dynamics of a coplanar-electrode plasma display panel cell. I. Basic operation Journal of Applied Physics. 85: 3460-3469. DOI: 10.1063/1.369703 |
0.403 |
|
| 1998 |
Hoekstra RJ, Kushner MJ, Sukharev V, Schoenborn P. Microtrenching resulting from specular reflection during chlorine etching of silicon Journal of Vacuum Science & Technology B. 16: 2102-2104. DOI: 10.1116/1.590135 |
0.454 |
|
| 1998 |
Hwang HH, Keiter ER, Kushner MJ. Consequences of three-dimensional physical and electromagnetic structures on dust particle trapping in high plasma density material processing discharges Journal of Vacuum Science and Technology. 16: 2454-2462. DOI: 10.1116/1.581366 |
0.406 |
|
| 1998 |
Rauf S, Kushner MJ. Virtual plasma equipment model: a tool for investigating feedback control in plasma processing equipment Ieee Transactions On Semiconductor Manufacturing. 11: 486-494. DOI: 10.1109/66.705383 |
0.458 |
|
| 1998 |
Barnes PN, Kushner MJ. Reactions in the afterglow of time modulated inductive discharges of Xe and I2 mixtures Journal of Applied Physics. 84: 4727-4730. DOI: 10.1063/1.368799 |
0.344 |
|
| 1998 |
Xu X“, Kushner MJ. Multiple microdischarge dynamics in dielectric barrier discharges Journal of Applied Physics. 84: 4153-4160. DOI: 10.1063/1.368629 |
0.415 |
|
| 1998 |
Xu XP, Kushner MJ. Ion composition of expanding microdischarges in dielectric barrier discharges Journal of Applied Physics. 83: 7522-7532. DOI: 10.1063/1.367515 |
0.438 |
|
| 1998 |
Keiter ER, Kushner MJ. Plasma transport around dust agglomerates having complex shapes Journal of Applied Physics. 83: 5670-5677. DOI: 10.1063/1.367421 |
0.392 |
|
| 1998 |
Rauf S, Kushner MJ. The effect of radio frequency plasma processing reactor circuitry on plasma characteristics Journal of Applied Physics. 83: 5087-5094. DOI: 10.1063/1.367326 |
0.473 |
|
| 1998 |
Grapperhaus MJ, Krivokapic Z, Kushner MJ. Design issues in ionized metal physical vapor deposition of copper Journal of Applied Physics. 83: 35-43. DOI: 10.1063/1.366698 |
0.362 |
|
| 1998 |
Rauf S, Kushner MJ. Diagnostic technique for measuring plasma parameters near surfaces in radio frequency discharges Applied Physics Letters. 73: 2730-2732. DOI: 10.1063/1.122572 |
0.46 |
|
| 1997 |
Hoekstra RJ, Grapperhaus MJ, Kushner MJ. Integrated plasma equipment model for polysilicon etch profiles in an inductively coupled plasma reactor with subwafer and superwafer topography Journal of Vacuum Science and Technology. 15: 1913-1921. DOI: 10.1116/1.580659 |
0.481 |
|
| 1997 |
Kushner MJ. Consequences of asymmetric pumping in low pressure plasma processing reactors: A three-dimensional modeling study Journal of Applied Physics. 82: 5312-5320. DOI: 10.1063/1.366297 |
0.454 |
|
| 1997 |
Rauf S, Kushner MJ. Argon metastable densities in radio frequency Ar, Ar/O2 and Ar/CF4 electrical discharges Journal of Applied Physics. 82: 2805-2813. DOI: 10.1063/1.366111 |
0.395 |
|
| 1997 |
Barnes PN, Kushner MJ. Ion-ion neutralization of iodine in radio-frequency inductive discharges of Xe and I2 mixtures Journal of Applied Physics. 82: 2150-2155. DOI: 10.1063/1.366022 |
0.343 |
|
| 1997 |
Hwang HH, Kushner MJ. Simulation of the formation of two-dimensional Coulomb liquids and solids in dusty plasmas Journal of Applied Physics. 82: 2106-2114. DOI: 10.1063/1.366020 |
0.371 |
|
| 1997 |
Rauf S, Kushner MJ. Model for noncollisional heating in inductively coupled plasma processing sources Journal of Applied Physics. 81: 5966-5974. DOI: 10.1063/1.364385 |
0.449 |
|
| 1997 |
Huang FY, Kushner MJ. Shapes of agglomerates in plasma etching reactors Journal of Applied Physics. 81: 5960-5965. DOI: 10.1063/1.364384 |
0.406 |
|
| 1997 |
Grapperhaus MJ, Kushner MJ. A semianalytic radio frequency sheath model integrated into a two-dimensional hybrid model for plasma processing reactors Journal of Applied Physics. 81: 569-577. DOI: 10.1063/1.364199 |
0.487 |
|
| 1996 |
Huang FY, Hwang HH, Kushner MJ. A model for transport and agglomeration of particles in reactive ion etching plasma reactors Journal of Vacuum Science and Technology. 14: 562-566. DOI: 10.1116/1.580145 |
0.335 |
|
| 1996 |
Kushner MJ, Collison WZ, Ruzic DN. Electron-beam controlled radio frequency discharges for plasma processing Journal of Vacuum Science and Technology. 14: 2094-2101. DOI: 10.1116/1.580086 |
0.439 |
|
| 1996 |
Collison WZ, Kushner MJ. Conceptual design of advanced inductively coupled plasma etching tools using computer modeling Ieee Transactions On Plasma Science. 24: 135-136. DOI: 10.1109/27.491749 |
0.482 |
|
| 1996 |
Pérès I, Kushner MJ. Spatial distributions of power and ion densities in RF excited remote plasma reactors Plasma Sources Science and Technology. 5: 499-509. DOI: 10.1088/0963-0252/5/3/017 |
0.521 |
|
| 1996 |
Barnes PN, Kushner MJ. Formation of XeI(B) in low pressure inductive radio frequency electric discharges sustained in mixtures of Xe and I2 Journal of Applied Physics. 80: 5593-5597. DOI: 10.1063/1.363636 |
0.317 |
|
| 1996 |
Kushner MJ, Collison WZ, Grapperhaus MJ, Holland JP, Barnes MS. A three-dimensional model for inductively coupled plasma etching reactors: Azimuthal symmetry, coil properties, and comparison to experiments Journal of Applied Physics. 80: 1337-1344. DOI: 10.1063/1.362932 |
0.517 |
|
| 1996 |
Gentile AC, Kushner MJ. Microstreamer dynamics during plasma remediation of NO using atmospheric pressure dielectric barrier discharges Journal of Applied Physics. 79: 3877-3885. DOI: 10.1063/1.361805 |
0.375 |
|
| 1996 |
Tan W, Hoekstra RJ, Kushner MJ. A time dependent propagator method for long mean free path transport of neutral particles in plasma processing reactors Journal of Applied Physics. 79: 3423-3431. DOI: 10.1063/1.361389 |
0.401 |
|
| 1996 |
Hoekstra RJ, Kushner MJ. Predictions of ion energy distributions and radical fluxes in radio frequency biased inductively coupled plasma etching reactors Journal of Applied Physics. 79: 2275-2286. DOI: 10.1063/1.361152 |
0.485 |
|
| 1996 |
Stout PJ, Kushner MJ. Modeling of high power semiconductor switches operated in the nonlinear mode Journal of Applied Physics. 79: 2084-2090. DOI: 10.1063/1.361066 |
0.307 |
|
| 1996 |
Hwang HH, Olthoff JK, Brunt RJV, Radovanov SB, Kushner MJ. Evidence for inelastic processes for N3+ and N4+ from ion energy distributions in He/N2 radio frequency glow discharges Journal of Applied Physics. 79: 93-98. DOI: 10.1063/1.360795 |
0.393 |
|
| 1996 |
Gentile AC, Kushner MJ. The effect of CO2 on the plasma remediation of NxOy Applied Physics Letters. 68: 2064-2066. DOI: 10.1063/1.116304 |
0.389 |
|
| 1996 |
Collison WZ, Kushner MJ. Ion drag effects in inductively coupled plasmas for etching Applied Physics Letters. 68: 903-905. DOI: 10.1063/1.116225 |
0.395 |
|
| 1996 |
Hwang HH, Kushner MJ. Regimes of particle trapping in inductively coupled plasma processing reactors Applied Physics Letters. 68: 3716-3718. DOI: 10.1063/1.115983 |
0.355 |
|
| 1996 |
Kushner MJ, Collison WZ, Ruzic DN. Electron-beam controlled radio frequency discharges for plasma processing Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 14: 2094-2101. |
0.324 |
|
| 1996 |
Snodgrass TG, Baum CC, Stewart RA, Shohet JL, Kushner MJ, Booske JH. Plasma purification by ion cyclotron resonance for plasma source ion implantation doping of semiconductors Ieee International Conference On Plasma Science. 170-171. |
0.309 |
|
| 1995 |
Huang FY, Kushner MJ. A hybrid model for particle transport and electron energy distributions in positive column electrical discharges using equivalent species transport Journal of Applied Physics. 78: 5909-5918. DOI: 10.1063/1.360592 |
0.342 |
|
| 1995 |
Gentile AC, Kushner MJ. Reaction chemistry and optimization of plasma remediation of NxOy from gas streams Journal of Applied Physics. 78: 2074-2085. DOI: 10.1063/1.360185 |
0.439 |
|
| 1995 |
Gentile AC, Kushner MJ. Plasma remediation of perchloroethylene in humid gas streams Journal of Applied Physics. 78: 2977-2980. DOI: 10.1063/1.360045 |
0.478 |
|
| 1995 |
Hoekstra RJ, Kushner MJ. The Effect Of Subwafer Dielectrics On Plasma Properties In Plasma Etching Reactors Journal of Applied Physics. 77: 3668-3673. DOI: 10.1063/1.358604 |
0.521 |
|
| 1994 |
Ventzek PLG, Grapperhaus M, Kushner MJ. Investigation of electron source and ion flux uniformity in high plasma density inductively coupled etching tools using two‐dimensional modeling Journal of Vacuum Science & Technology B. 12: 3118-3137. DOI: 10.1116/1.587488 |
0.522 |
|
| 1994 |
Ventzek PLG, Hoekstra RJ, Kushner MJ. Two‐dimensional modeling of high plasma density inductively coupled sources for materials processing Journal of Vacuum Science & Technology B. 12: 461-477. DOI: 10.1116/1.587101 |
0.533 |
|
| 1994 |
Shohet JL, Kushner MJ, Wickesberg EB. Computer simulation of mass-selective plasma-source ion implantation Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 12: 1380-1386. DOI: 10.1116/1.579325 |
0.424 |
|
| 1994 |
Choi SJ, Kushner MJ. A Particle-in-Cell Simulation of Dust Charging and Shielding in Low Pressure Glow Discharges Ieee Transactions On Plasma Science. 22: 138-150. DOI: 10.1109/27.279017 |
0.345 |
|
| 1994 |
Choi SJ, Ventzek PLG, Hoekstra RJ, Kushner MJ. Spatial distributions of dust particles in plasmas generated by capacitively coupled radiofrequency discharges Plasma Sources Science and Technology. 3: 418-425. DOI: 10.1088/0963-0252/3/3/027 |
0.397 |
|
| 1994 |
Shon JW, Kushner MJ. Excitation mechanisms and gain modeling of the high‐pressure atomic Ar laser in He/Ar mixtures Journal of Applied Physics. 75: 1883-1890. DOI: 10.1063/1.356334 |
0.323 |
|
| 1994 |
Choi SJ, Kushner MJ. Mutual shielding of closely spaced dust particles in low pressure plasmas Journal of Applied Physics. 75: 3351-3357. DOI: 10.1063/1.356120 |
0.314 |
|
| 1994 |
Hargis PJ, Greenberg KE, Miller PA, Gerardo JB, Torczynski JR, Riley ME, Hebner GA, Roberts JR, Olthoff JK, Whetstone JR, Van Brunt RJ, Sobolewski MA, Anderson HM, Splichal MP, Mock JL, ... ... Kushner MJ, et al. The Gaseous Electronics Conference radio-frequency reference cell: A defined parallel-plate radio-frequency system for experimental and theoretical studies of plasma-processing discharges Review of Scientific Instruments. 65: 140-154. DOI: 10.1063/1.1144770 |
0.405 |
|
| 1993 |
Stout PJ, Kushner MJ. Monte Carlo Simulation of Surface Kinetics During Plasma Enhanced Chemical Vapor Deposition of Si02 using Oxygen/Tetraethoxysilane Chemistry Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 11: 2562-2571. DOI: 10.1116/1.578607 |
0.363 |
|
| 1993 |
Kushner MJ. Plasma chemistry of He/O2/SiH4 and He/N2O/SiH4 mixtures for remote plasma‐activated chemical‐vapor deposition of silicon dioxide Journal of Applied Physics. 74: 6538-6553. DOI: 10.1063/1.355115 |
0.454 |
|
| 1993 |
Choi SJ, Kushner MJ. The role of negative ions in the formation of particles in low-pressure plasmas Journal of Applied Physics. 74: 853-861. DOI: 10.1063/1.354877 |
0.379 |
|
| 1993 |
Evans D, Rosocha LA, Anderson GK, Coogan JJ, Kushner MJ. Plasma remediation of trichloroethylene in silent discharge plasmas Journal of Applied Physics. 74: 5378-5386. DOI: 10.1063/1.354241 |
0.462 |
|
| 1993 |
Shon JW, Rhoades RL, Verdeyen JT, Kushner MJ. Short pulse electron beam excitation of the high‐pressure atomic Ne laser Journal of Applied Physics. 73: 8059-8065. DOI: 10.1063/1.353921 |
0.314 |
|
| 1993 |
Storch DG, Kushner MJ. Destruction mechanisms for formaldehyde in atmospheric pressure low temperature plasmas Journal of Applied Physics. 73: 51-55. DOI: 10.1063/1.353828 |
0.432 |
|
| 1993 |
Hartig MJ, Kushner MJ. Radially dependent solutions of Boltzmann's equation in low-temperature plasmas using a modified two-term expansion Journal of Applied Physics. 73: 1080-1090. DOI: 10.1063/1.353295 |
0.357 |
|
| 1993 |
Shon JW, Kushner MJ, Hebner GA, Hays GN. Predictions for gain in the fission‐fragment‐excited atomic xenon laser Journal of Applied Physics. 73: 2686-2694. DOI: 10.1063/1.353039 |
0.341 |
|
| 1993 |
Kushner MJ. Pulsed plasma‐pulsed injection sources for remote plasma activated chemical vapor deposition Journal of Applied Physics. 73: 4098-4100. DOI: 10.1063/1.352840 |
0.475 |
|
| 1993 |
Hebner GA, Shon JW, Kushner MJ. Temperature dependent gain of the atomic xenon laser Applied Physics Letters. 63: 2872-2874. DOI: 10.1063/1.110310 |
0.339 |
|
| 1993 |
Ventzek PLG, Sommerer TJ, Hoekstra RJ, Kushner MJ. Two‐dimensional hybrid model of inductively coupled plasma sources for etching Applied Physics Letters. 63: 605-607. DOI: 10.1063/1.109963 |
0.498 |
|
| 1993 |
Choi SJ, Kushner MJ. Simulation of the shielding of dust particles in low pressure glow discharges Applied Physics Letters. 62: 2197-2199. DOI: 10.1063/1.109440 |
0.311 |
|
| 1993 |
Hartig MJ, Kushner MJ. Monte Carlo hydrodynamic simulation of neutral radical transport in low pressure remote plasma activated chemical vapor deposition Applied Physics Letters. 62: 1594-1596. DOI: 10.1063/1.108648 |
0.447 |
|
| 1993 |
Chang MB, Kushner MJ, Rood MJ. Removal of SO<inf>2</inf> and NO from gas streams with combined plasma photolysis Journal of Environmental Engineering (United States). 119: 414-423. DOI: 10.1061/(Asce)0733-9372(1993)119:3(414) |
0.39 |
|
| 1992 |
Sommerer TJ, Kushner MJ. Monte Carlo‐fluid model of chlorine atom production in Cl2, HCl, and CCl4 radio‐frequency discharges for plasma etching Journal of Vacuum Science & Technology B. 10: 2179-2187. DOI: 10.1116/1.586186 |
0.481 |
|
| 1992 |
Weng Y, Kushner MJ. Electron energy distributions in electron cyclotron resonance discharges for materials processing Journal of Applied Physics. 72: 33-42. DOI: 10.1063/1.352144 |
0.447 |
|
| 1992 |
Sommerer TJ, Pak H, Kushner MJ. Cathode heating mechanisms in pseudospark plasma switches Journal of Applied Physics. 72: 3374-3383. DOI: 10.1063/1.351459 |
0.404 |
|
| 1992 |
Sommerer TJ, Kushner MJ. Numerical investigation of the kinetics and chemistry of rf glow discharge plasmas sustained in He, N2, O2, He/N2/O2, He/CF4/O2, and SiH4/NH3 using a Monte Carlo-fluid hybrid model Journal of Applied Physics. 71: 1654-1673. DOI: 10.1063/1.351196 |
0.433 |
|
| 1992 |
Kushner MJ. Simulation of the gas‐phase processes in remote‐plasma‐activated chemical‐vapor deposition of silicon dielectrics using rare gas–silane‐ammonia mixtures Journal of Applied Physics. 71: 4173-4189. DOI: 10.1063/1.350821 |
0.376 |
|
| 1992 |
Pak H, Kushner MJ. Breakdown characteristics in nonplanar geometries and hollow cathode pseudospark switches Journal of Applied Physics. 71: 94-100. DOI: 10.1063/1.350653 |
0.366 |
|
| 1992 |
Moo Been Chang, Kushner MJ, Rood MJ. Gas-phase removal of NO from gas streams via dielectric barrier discharges Environmental Science and Technology. 26: 777-781. DOI: 10.1021/Es00028A017 |
0.357 |
|
| 1992 |
Chang MB, Kushner MJ, Rood MJ. Removal of SO2 and the simultaneous removal of SO2 and NO from simulated flue gas streams using dielectric barrier discharge plasmas Plasma Chemistry and Plasma Processing. 12: 565-580. DOI: 10.1007/Bf01447259 |
0.345 |
|
| 1991 |
Garscadden A, Kushner M, Eden J. Plasma physics issues in gas discharge laser development Ieee Transactions On Plasma Science. 19: 1013-1031. DOI: 10.1109/27.125028 |
0.351 |
|
| 1991 |
Sommerer TJ, Kushner MJ. Translationally hot neutrals in etching discharges Journal of Applied Physics. 70: 1240-1251. DOI: 10.1063/1.349579 |
0.467 |
|
| 1991 |
Alford WJ, Hays GN, Ohwa M, Kushner MJ. The effects of He addition on the performance of the fission-fragment excited Ar/Xe atomic xenon laser Journal of Applied Physics. 69: 1843-1848. DOI: 10.1063/1.348752 |
0.348 |
|
| 1991 |
Chang MB, Balbach JH, Rood MJ, Kushner MJ. Removal of SO2 from gas streams using a dielectric barrier discharge and combined plasma photolysis Journal of Applied Physics. 69: 4409-4417. DOI: 10.1063/1.348367 |
0.399 |
|
| 1991 |
McCaughey MJ, Kushner MJ. A model for particulate contaminated glow discharges Journal of Applied Physics. 69: 6952-6961. DOI: 10.1063/1.347632 |
0.484 |
|
| 1991 |
Hwang HH, James K, Hui R, Kushner MJ. Fluorocarbon impurities in KrF lasers Journal of Applied Physics. 69: 7419-7424. DOI: 10.1063/1.347555 |
0.311 |
|
| 1991 |
Choi SJ, McCaughey MJ, Sommerer TJ, Kushner MJ. Perturbation of the cathode fall in direct‐current glow discharges by particulate contamination Applied Physics Letters. 59: 3102-3104. DOI: 10.1063/1.105777 |
0.433 |
|
| 1991 |
Sommerer TJ, Barnes MS, Keller JH, McCaughey MJ, Kushner MJ. Monte Carlo‐fluid hybrid model of the accumulation of dust particles at sheath edges in radio‐frequency discharges Applied Physics Letters. 59: 638-640. DOI: 10.1063/1.105409 |
0.343 |
|
| 1990 |
Peters PJ, Lan YF, Ohwa M, Kushner MJ. Impact of electron collision mixing on the delay times of an electron beam excited atomic xenon laser Ieee Journal of Quantum Electronics. 26: 1964-1970. DOI: 10.1109/3.62115 |
0.313 |
|
| 1990 |
Ohwa M, Kushner MJ. Energy loading effects in the scaling of atomic xenon lasers Ieee Journal of Quantum Electronics. 26: 1639-1646. DOI: 10.1109/3.102643 |
0.329 |
|
| 1990 |
Kushner MJ. Return current in large aperture electron-beam-excited KrF lasers Ieee Journal of Quantum Electronics. 26: 1546-1554. DOI: 10.1109/3.102634 |
0.354 |
|
| 1990 |
Pak H, Kushner MJ. Multi‐beam‐bulk model for electron transport during commutation in an optically triggered pseudospark thyratron Applied Physics Letters. 57: 1619-1621. DOI: 10.1063/1.104066 |
0.347 |
|
| 1990 |
Yeom GY, Kushner MJ. Si/SiO2 etch properties using CF4 and CHF3 in radio frequency cylindrical magnetron discharges Applied Physics Letters. 56: 857-859. DOI: 10.1063/1.103322 |
0.346 |
|
| 1989 |
Yeom GY, Kushner MJ. Magnetic field effects on cylindrical magnetron reactive ion etching of Si/SiO2 in CF4 and CF4/H2 plasmas Journal of Vacuum Science and Technology. 7: 987-992. DOI: 10.1116/1.575788 |
0.34 |
|
| 1989 |
Kline LE, Kushner MJ. Computer simulation of materials processing plasma discharges Critical Reviews in Solid State and Materials Sciences. 16: 1-35. DOI: 10.1080/10408438908244626 |
0.32 |
|
| 1989 |
Pak H, Kushner MJ. Simulation of the switching performance of an optically triggered pseudo‐spark thyratron Journal of Applied Physics. 66: 2325-2331. DOI: 10.1063/1.344291 |
0.367 |
|
| 1989 |
Kushner MJ. Response times and energy partitioning in electron‐beam‐excited plasmas Journal of Applied Physics. 66: 2297-2306. DOI: 10.1063/1.344286 |
0.353 |
|
| 1989 |
Ohwa M, Moratz TJ, Kushner MJ. Excitation mechanisms of the electron-beam-pumped atomic xenon (5d→6p) laser in Ar/Xe mixtures Journal of Applied Physics. 66: 5131-5145. DOI: 10.1063/1.343747 |
0.317 |
|
| 1989 |
DiCarlo JV, Kushner MJ. Solving the spatially dependent Boltzmann’s equation for the electron‐velocity distribution using flux corrected transport Journal of Applied Physics. 66: 5763-5774. DOI: 10.1063/1.343645 |
0.31 |
|
| 1989 |
Yeom GY, Thornton JA, Kushner MJ. Cylindrical magnetron discharges. II. The formation of dc bias in rf‐driven discharge sources Journal of Applied Physics. 65: 3825-3832. DOI: 10.1063/1.343396 |
0.36 |
|
| 1989 |
Yeom GY, Thornton JA, Kushner MJ. Cylindrical magnetron discharges. I. Current‐voltage characteristics for dc‐ and rf‐driven discharge sources Journal of Applied Physics. 65: 3816-3824. DOI: 10.1063/1.343395 |
0.343 |
|
| 1989 |
Ohwa M, Kushner MJ. The effects of ground‐state dynamics on the emission spectra of electric‐discharge‐pumped XeCl lasers: A model for injection locking Journal of Applied Physics. 65: 4138-4149. DOI: 10.1063/1.343319 |
0.324 |
|
| 1989 |
McCaughey MJ, Kushner MJ. Simulation of the bulk and surface properties of amorphous hydrogenated silicon deposited from silane plasmas Journal of Applied Physics. 65: 186-195. DOI: 10.1063/1.342568 |
0.314 |
|
| 1989 |
McCaughey MJ, Kushner MJ. Electron transport coefficients in dusty argon plasmas Applied Physics Letters. 55: 951-953. DOI: 10.1063/1.101733 |
0.486 |
|
| 1989 |
McCaughey MJ, Kushner MJ. Production of disilane and silyl sticking coefficients during plasma‐enhanced chemical vapor deposition of hydrogenated amorphous silicon Applied Physics Letters. 54: 1642-1644. DOI: 10.1063/1.101375 |
0.453 |
|
| 1989 |
Moratz TJ, Saunders TD, Kushner MJ. High‐temperature kinetics in He and Ne buffered XeF lasers: The effect on absorption Applied Physics Letters. 54: 102-104. DOI: 10.1063/1.101241 |
0.354 |
|
| 1988 |
Kushner MJ, Moratz TJ. Direct dissociation of F2 in electron beam pumped excimer lasers: The effect on electron density Applied Physics Letters. 52: 1856-1858. DOI: 10.1063/1.99606 |
0.317 |
|
| 1988 |
Moratz TJ, Saunders TD, Kushner MJ. Heavy‐ion versus electron‐beam excitation of an excimer laser Journal of Applied Physics. 64: 3799-3810. DOI: 10.1063/1.341386 |
0.367 |
|
| 1988 |
Peck TL, Kushner MJ. Townsend coefficients for electron scattering over dielectric surfaces Journal of Applied Physics. 64: 4404-4409. DOI: 10.1063/1.341262 |
0.344 |
|
| 1988 |
Hebner GA, Verdeyen JT, Kushner MJ. An experimental study of a parallel‐plate radio‐frequency discharge: Measurements of the radiation temperature and electron density Journal of Applied Physics. 63: 2226-2236. DOI: 10.1063/1.341060 |
0.357 |
|
| 1988 |
Kushner MJ. A model for the discharge kinetics and plasma chemistry during plasma enhanced chemical vapor deposition of amorphous silicon Journal of Applied Physics. 63: 2532-2551. DOI: 10.1063/1.340989 |
0.51 |
|
| 1988 |
Kimura WD, Kushner MJ, Seamans JF. Characteristics of a laser triggered spark gap using air, Ar, CH4, H2, He, N2, SF6, and Xe Journal of Applied Physics. 63: 1882-1888. DOI: 10.1063/1.339886 |
0.334 |
|
| 1988 |
Moratz TJ, Kushner MJ. Fission fragment pumping of a neon plasma Journal of Applied Physics. 63: 1796-1798. DOI: 10.1063/1.339872 |
0.404 |
|
| 1987 |
Hebner GA, Kushner MJ. Phase and energy distribution of ions incident on electrodes in radio-frequency discharges Journal of Applied Physics. 62: 2256-2260. DOI: 10.1063/1.339479 |
0.332 |
|
| 1987 |
Kushner MJ. On the balance between silylene and silyl radicals in rf glow discharges in silane: The effect on deposition rates of a‐Si:H Journal of Applied Physics. 62: 2803-2811. DOI: 10.1063/1.339411 |
0.428 |
|
| 1987 |
Kushner MJ. Discharge instabilities initiated by nonuniform laser extraction in electron-beam sustained discharge KrF lasers Journal of Applied Physics. 62: 101-107. DOI: 10.1063/1.339166 |
0.372 |
|
| 1987 |
Kushner MJ. A phenomenological model for surface deposition kinetics during plasma and sputter deposition of amorphous hydrogenated silicon Journal of Applied Physics. 62: 4763-4772. DOI: 10.1063/1.339030 |
0.346 |
|
| 1987 |
Kushner MJ. Application of a particle simulation to modeling commutation in a linear thyratron Journal of Applied Physics. 61: 2784-2794. DOI: 10.1063/1.337868 |
0.326 |
|
| 1986 |
Kushner MJ. A Plasma Chemistry and Surface Model for the Deposition of a–Si:H from RF Glow Discharges: A Study of Hydrogen Content Mrs Proceedings. 68. DOI: 10.1557/PROC-68-293 |
0.361 |
|
| 1986 |
Kimura WD, Kushner MJ, Crawford EA, Byron SR. Laser Interferometric Measurements of a Laser-Preionization-Triggered Spark Column Ieee Transactions On Plasma Science. 14: 246-255. DOI: 10.1109/Tps.1986.4316536 |
0.301 |
|
| 1986 |
Kushner MJ. Mechanisms for Power Deposition in Ar/SiH4 Capacitively Coupled RF Discharges Ieee Transactions On Plasma Science. 14: 188-196. DOI: 10.1109/Tps.1986.4316522 |
0.479 |
|
| 1986 |
Kampas FJ, Kushner MJ. Effect of Silane Pressure on Silane-Hydrogen RF Glow Discharges Ieee Transactions On Plasma Science. 14: 173-178. DOI: 10.1109/Tps.1986.4316520 |
0.4 |
|
| 1986 |
Kushner MJ, Fisher CH, Demboski JS, Petr RA. Performance of and excited state densities in a linear thyratron Journal of Applied Physics. 60: 2766-2770. DOI: 10.1063/1.337108 |
0.307 |
|
| 1985 |
Kushner MJ. Floating Sheath Potentials in Non-Maxwellian Plasmas Ieee Transactions On Plasma Science. 13: 6-9. DOI: 10.1109/Tps.1985.4316351 |
0.395 |
|
| 1985 |
Kushner MJ, Milroy RD, Kimura WD. A laser-triggered spark gap model Journal of Applied Physics. 58: 2988-3000. DOI: 10.1063/1.335848 |
0.438 |
|
| 1985 |
Kushner MJ. Distribution of ion energies incident on electrodes in capacitively coupled rf discharges Journal of Applied Physics. 58: 4024-4031. DOI: 10.1063/1.335580 |
0.386 |
|
| 1985 |
Kushner MJ. Arc expansion in xenon flashlamps Journal of Applied Physics. 57: 2486-2500. DOI: 10.1063/1.335434 |
0.428 |
|
| 1985 |
Kushner MJ, Pindroh AL, Fisher CH, Znotins TA, Ewing JJ. Multidimensional modeling of transverse avalanche laser discharges: Applications to the HgBr laser Journal of Applied Physics. 57: 2406-2423. DOI: 10.1063/1.334349 |
0.374 |
|
| 1984 |
Kushner MJ, Anderson HN, Hargis PJ. Simulation of Spatially Dependent Excitation Rates and Power Deposition in RF Discharges for Plasma Processing Mrs Proceedings. 38. DOI: 10.1557/PROC-38-201 |
0.403 |
|
| 1983 |
Breiland WG, Kushner MJ. Pulsed UV laser Raman spectroscopy of silane in a linear-flow chemical vapor deposition reactor Applied Physics Letters. 42: 395-397. DOI: 10.1063/1.93919 |
0.324 |
|
| 1983 |
Kushner MJ. Monte‐Carlo simulation of electron properties in rf parallel plate capacitively coupled discharges Journal of Applied Physics. 54: 4958-4965. DOI: 10.1063/1.332763 |
0.37 |
|
| 1983 |
Kushner MJ, Warner BE. Large‐bore copper‐vapor lasers: Kinetics and scaling issues Journal of Applied Physics. 54: 2970-2982. DOI: 10.1063/1.332499 |
0.359 |
|
| 1982 |
Hargis PJ, Kushner MJ. Detection of CF2 radicals in a plasma etching reactor by laser-induced fluorescence spectroscopy Applied Physics Letters. 40: 779-781. DOI: 10.1063/1.93257 |
0.338 |
|
| 1982 |
Kushner MJ. Erratum: A kinetic study of the plasma‐etching process. I. A model for the etching of Si and SiO2 in CnFm/H2 and CnFm/O2 plasmas [J. Appl. Phys. 53, 2923 (1982)] Journal of Applied Physics. 53: 6491-6491. DOI: 10.1063/1.331663 |
0.411 |
|
| 1982 |
Kushner MJ. A kinetic study of the plasma‐etching process. II. Probe measurements of electron properties in an rf plasma‐etching reactor Journal of Applied Physics. 53: 2939-2946. DOI: 10.1063/1.331075 |
0.391 |
|
| 1982 |
Kushner MJ. A kinetic study of the plasma‐etching process. I. A model for the etching of Si and SiO2 in CnFm/H2 and CnFm/O2 plasmas Journal of Applied Physics. 53: 2923-2938. DOI: 10.1063/1.331074 |
0.454 |
|
| 1981 |
Kushner MJ, Grossman WM, Culick FEC. Electron collision quenching of CO(v) chemiluminescence in CS2/O2 and CS2/O2/N2O flames Journal of Applied Physics. 52: 3776-3779. DOI: 10.1063/1.329215 |
0.319 |
|
| 1980 |
Kushner MJ. Characteristics of a UF6‐H2/HF nuclear‐pumped laser Journal of Applied Physics. 51: 2421-2428. DOI: 10.1063/1.328011 |
0.309 |
|
| 1979 |
Kushner M, Culick F. A continuous discharge improves the performance of the Cu/CuCl double pulse laser Ieee Journal of Quantum Electronics. 15: 835-837. DOI: 10.1109/Jqe.1979.1070243 |
0.328 |
|
| 1978 |
Kushner MJ, Culick FEC. Extrema of electron density and output pulse energy in a CuCl/Ne discharge and a Cu/CuCl double-pulsed laser Applied Physics Letters. 33: 728-731. DOI: 10.1063/1.90518 |
0.323 |
|
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