Vincent Donnelly
Affiliations: | Area 11 | AT&T Laboratories |
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| Donnelly VM, Belostotskiy SG, Economou DJ, et al. (2010) Laser Thomson Scattering, Raman Scattering and laser-absorption diagnostics of high pressure microdischarges Journal of Physics: Conference Series. 227 |
| Belostotskiy SG, Donnelly VM, Economou DJ, et al. (2009) Spatially resolved measurements of argon metastable(1s |
| Belostotskiy SG, Khandelwal R, Wang Q, et al. (2008) Measurement of electron temperature and density in an argon microdischarge by laser Thomson scattering Applied Physics Letters. 92 |
| Fuller NCM, Telesca DA, Donnelly VM, et al. (2003) Transition between two states of surface coverage and etch rate during Si etching in inductively coupled Cl2-Ar plasmas with changing mixtures Applied Physics Letters. 82: 4663-4665 |
| Choe JY, Fuller NCM, Donnelly VM, et al. (2000) Transient plasma-induced emission analysis of laser-desorbed species during Cl2 plasma etching of Si Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 18: 2669-2679 |
| Choe JY, Herman IP, Donnelly VM. (1998) Laser-induced thermal desorption analysis of the surface during Ge etching in a Cl2 inductively coupled plasma Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 16: 3266-3273 |
| Choe JY, Herman IP, Donnelly VM. (1997) Analysis of the etching of silicon in an inductively coupled chlorine plasma using laser thermal desorption Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 15: 3024-3031 |
| Donnelly VM, Herman IP, Cheng CC, et al. (1996) Surface chemistry during plasma etching of silicon Pure and Applied Chemistry. 68: 1071-1074 |
| Herman IP, Donnelly VM, Cheng CC, et al. (1996) Surface analysis during plasma etching by laser-induced thermal desorption Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 35: 2410-2415 |
| Chena CC, Guinn KV, Herman IP, et al. (1995) Competitive halogenation of silicon surfaces in HBr/CI 2 plasmas studied with x-ray photoelectron spectroscopy and in situ, real-time, pulsed laser-induced thermal desorption Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 13: 1970-1976 |