Alexander Reed Trimble
Affiliations: | 2002 | University of California, Berkeley, Berkeley, CA, United States |
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"Alexander Trimble"Mean distance: 8.16 | S | N | B | C | P |
Parents
Sign in to add mentor| Dotsevi Y. Sogah | research assistant | 1995-1997 | Cornell | |
| Jean M. J. Fréchet | grad student | 2002 | UC Berkeley | |
| (Design and synthesis of functional polymers for nanoscale electronics.) | ||||
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Publications
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| Tully DC, Trimble AR, Fréchet JMJ. (2000) Dendrimers with thermally labile end groups: An alternative approach to chemically amplified resist materials designed for sub-100 nm lithography Advanced Materials. 12: 1118-1122 |
| Tully DC, Trimble AR, Fréchet JMJ. (2000) Dendrimer-based chemically amplified resist materials American Chemical Society, Polymer Preprints, Division of Polymer Chemistry. 41: 142-143 |
| Trimble AR, Tully DC, Fréchet JMJ, et al. (2000) Patterning of hyperbranched resist materials by electron-beam lithography American Chemical Society, Polymer Preprints, Division of Polymer Chemistry. 41: 325-326 |
| Trimble AR, Tully DC, Frechet JMJ, et al. (2000) Patterning of hyperbranched resist materials by e-beam Proceedings of Spie - the International Society For Optical Engineering. 3999: II/- |
| Tully DC, Trimble AR, Frechet JMJ. (2000) Dendrimer-based chemically amplified resists for sub-100 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 3999: II/- |
| Pasini D, Niu QJ, Meagley RP, et al. (1999) Novel organic resists for nanoscale imaging: From chemically amplified cycloaliphatic resists to dendrimer monolayers Journal of Photopolymer Science and Technology. 12: 405-416 |
| Tully DC, Trimble AR, Fréchet JMJ, et al. (1999) Synthesis and preparation of ionically bound dendrimer monolayers and application toward scanning probe lithography Chemistry of Materials. 11: 2892-2898 |
| Tully DC, Wilder K, Fréchet JMJ, et al. (1999) Dendrimer-based self-assembled monolayers as resists for scanning probe lithography Advanced Materials. 11: 314-318 |
| Tully DC, Trimble AR, Frechet MJ, et al. (1999) Nanoscale patterning of self-assembled dendrimer monolayers using scanning probe lithography American Chemical Society, Polymer Preprints, Division of Polymer Chemistry. 40: 402-403 |
| Tully DC, Trimble AR, Frechet JMJ, et al. (1999) Toward individually addressable nanometer size surface pixels: Ultrathin dendrimer films as resists for scanning probe lithography Proceedings of Spie - the International Society For Optical Engineering. 3678: 544-549 |