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Itai Suez

Affiliations: 
2006 University of California, Berkeley, Berkeley, CA, United States 
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"Itai Suez"
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Jean M. J. Fréchet grad student 2006 UC Berkeley
 (Materials and methods for nanoscale lithography with proximal scanning probes.)

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Rolandi M, Suez I, Scholl A, et al. (2007) Fluorocarbon resist for high-speed scanning probe lithography. Angewandte Chemie (International Ed. in English). 46: 7477-80
Backer SA, Suez I, Fresco ZM, et al. (2007) Covalent formation of nanoscale fullerene and dendrimer patterns. Langmuir : the Acs Journal of Surfaces and Colloids. 23: 2297-9
Backer SA, Suez I, Fresco ZM, et al. (2007) Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 1336-1339
Suez I, Rolandi M, Backer SA, et al. (2007) High-field scanning probe lithography in hexadecane: Transitioning from field induced oxidation to solvent decomposition through surface modification Advanced Materials. 19: 3570-3573
Suez I, Backer SA, Fréchet JM. (2005) Generating an etch resistant "resist" layer from common solvents using scanning probe lithography in a fluid cell. Nano Letters. 5: 321-4
Fresco ZM, Suez I, Backer SA, et al. (2004) AFM-induced amine deprotection: triggering localized bond cleavage by application of tip/substrate voltage bias for the surface self-assembly of nanosized dendritic objects. Journal of the American Chemical Society. 126: 8374-5
Rolandi M, Suez I, Dai H, et al. (2004) Dendrimer monolayers as negative and positive tone resists for scanning probe lithography Nano Letters. 4: 889-893
Fresco ZM, Bensel N, Suez I, et al. (2003) Fluorinated chemically amplified dissolution inhibitors for 157 nm nanolithography Journal of Photopolymer Science and Technology. 16: 27-35
Fresco ZM, Bensel N, Suez I, et al. (2003) Fluorinated Chemically Amplified Dissolution Inhibitors for 157 nm Nanolithography Journal of Photopolymer Science and Technology. 16: 27-35
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