Scott Andrew Backer
Affiliations: | 2007 | University of California, Berkeley, Berkeley, CA, United States |
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"Scott Backer"Mean distance: 8.16 | S | N | B | C | P |
Parents
Sign in to add mentor| Jean M. J. Fréchet | grad student | 2007 | UC Berkeley | |
| (New materials and methods for next generation technologies.) | ||||
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Publications
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| Germain J, Rolandi M, Backer SA, et al. (2008) Sulfur as a novel nanopatterning material: An ultrathin resist and a chemically addressable template for nanocrystal self-assembly Advanced Materials. 20: 4526-4529 |
| Backer SA, Suez I, Fresco ZM, et al. (2007) Covalent formation of nanoscale fullerene and dendrimer patterns. Langmuir : the Acs Journal of Surfaces and Colloids. 23: 2297-9 |
| Rolandi M, Okawa D, Backer SA, et al. (2007) Fabrication of magnetic force microscopy probes via localized electrochemical deposition of cobalt Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: L39-L42 |
| Backer SA, Suez I, Fresco ZM, et al. (2007) Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 1336-1339 |
| Backer SA, Sivula K, Kavulak DF, et al. (2007) High efficiency organic photovoltaics incorporating a new family of soluble fullerene derivatives Chemistry of Materials. 19: 2927-2929 |
| Suez I, Rolandi M, Backer SA, et al. (2007) High-field scanning probe lithography in hexadecane: Transitioning from field induced oxidation to solvent decomposition through surface modification Advanced Materials. 19: 3570-3573 |
| Suez I, Backer SA, Fréchet JM. (2005) Generating an etch resistant "resist" layer from common solvents using scanning probe lithography in a fluid cell. Nano Letters. 5: 321-4 |
| Fresco ZM, Suez I, Backer SA, et al. (2004) AFM-induced amine deprotection: triggering localized bond cleavage by application of tip/substrate voltage bias for the surface self-assembly of nanosized dendritic objects. Journal of the American Chemical Society. 126: 8374-5 |
| Fresco ZM, Bensel N, Suez I, et al. (2003) Fluorinated chemically amplified dissolution inhibitors for 157 nm nanolithography Journal of Photopolymer Science and Technology. 16: 27-35 |
| Fresco ZM, Bensel N, Suez I, et al. (2003) Fluorinated Chemically Amplified Dissolution Inhibitors for 157 nm Nanolithography Journal of Photopolymer Science and Technology. 16: 27-35 |